JPS6036396A - Method for growing single crystal - Google Patents

Method for growing single crystal

Info

Publication number
JPS6036396A
JPS6036396A JP14352083A JP14352083A JPS6036396A JP S6036396 A JPS6036396 A JP S6036396A JP 14352083 A JP14352083 A JP 14352083A JP 14352083 A JP14352083 A JP 14352083A JP S6036396 A JPS6036396 A JP S6036396A
Authority
JP
Japan
Prior art keywords
temperature
seeding
single crystal
melt
molten liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14352083A
Other languages
Japanese (ja)
Other versions
JPH0327514B2 (en
Inventor
Toshihiko Ibuka
井深 敏彦
Toru Yoshino
徹 吉野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Kasei Polytec Co
Mitsubishi Kasei Corp
Original Assignee
Mitsubishi Kasei Corp
Mitsubishi Monsanto Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Kasei Corp, Mitsubishi Monsanto Chemical Co filed Critical Mitsubishi Kasei Corp
Priority to JP14352083A priority Critical patent/JPS6036396A/en
Publication of JPS6036396A publication Critical patent/JPS6036396A/en
Publication of JPH0327514B2 publication Critical patent/JPH0327514B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/36Single-crystal growth by pulling from a melt, e.g. Czochralski method characterised by the seed, e.g. its crystallographic orientation

Abstract

PURPOSE:To prevent the failure in the seeding, and to improve the productibity of single crystal, by determining the seeding temperature correctly based on the temperature wherein the dendrite crystal melts and disappears in a molten liquid. CONSTITUTION:In the liquid encapsulated pulling method, a dendrite crystal in formed on the surface of the molten liquid by lowering the temperature of the molten liquid. The temperature of the molten liquid is raised slowly and the temperature wherein the dendrite crystal melts and disappears is determined. The seeding is carried out at a temperature lower than the melting temperature by 3-15 deg.C. The seeding can be achieved without failure, and the productivity can be improved by this process.

Description

【発明の詳細な説明】 本発明は、液体カプセル引上法(Liquj−dEnc
apsulated 0zochraleki Met
hod−、以下「LEc法」という。)による単結晶の
育成方法、特に種付は方法に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a liquid capsule drawing method (Liquij-dEnc
apsulated 0zochraleki Met
hod-, hereinafter referred to as "LEc method". ), especially the seeding method.

LEO法は、円形断面を有する、高純度の単結晶が得ら
扛ること、GaA3 、 GaP 等周期律表第1II
 b族及び第vb族元素からなる無機化合物のように、
揮発性の高い成分を含む無機化合物の単結晶も育成でき
ること等の特徴を有している。
The LEO method yields high-purity single crystals with a circular cross section, GaA3, GaP, etc.
Like inorganic compounds consisting of group B and group VB elements,
It has the characteristics of being able to grow single crystals of inorganic compounds containing highly volatile components.

LliiO法では種付けの工程が重要であるが、゛従来
は種付は温度の設定を経験的に行なっていたので一回で
単結晶を得ることは困難であり、数回の試行錯誤を要す
る場合もあった。す々ゎち種付は温度が高温であると種
結晶が融解し、低温すぎると、゛急激に結晶が成長して
多結晶となる。
Although the seeding process is important in the LliiO method, ``Traditionally, seeding was done by setting the temperature empirically, so it was difficult to obtain a single crystal in one go, and several trials and errors were required. There was also. If the temperature is too high, the seed crystals will melt, and if the temperature is too low, the crystals will rapidly grow and become polycrystalline.

しかしながら、種付は操作を繰返すと、種結晶の長さが
短くなり、そ扛に伴って熱伝導の状麺 態が変化するので、種付は温度の設定が困・となるとい
う問題があった。
However, when seeding is repeated, the length of the seed crystal becomes shorter and the state of heat conduction changes as the seeding occurs, making it difficult to set the temperature. Ta.

本発明者等は、種付は温度を正確に設定する方法を開発
することを目的として鋭意研究金型ねた結果、本発明に
到達したものである。
The present inventors have arrived at the present invention as a result of intensive research into molds for the purpose of developing a method for accurately setting the seeding temperature.

本発明の上記の目的は、LEO法によって融液から単結
晶を育成する方法において、上記融液の温度を降下させ
て上記融液の表面に樹状結晶を生成させ、絖いて上記融
液の温度を徐々に上昇させて上記樹状結晶が融解消失す
る温度を測定して、当該温度よシも3〜/ J−℃低い
温度において種付けする方法によって達せら扛る。
The above-mentioned object of the present invention is to reduce the temperature of the melt to generate dendrite crystals on the surface of the melt in a method for growing a single crystal from a melt by the LEO method. The temperature at which the dendrite melts and disappears is measured by gradually increasing the temperature, and the temperature is reached by seeding at a temperature 3~/J-°C lower than that temperature.

本発明方法によシ融液から単結晶を育成するには、通常
のLEO法と同様にP’BN(熱分解雪化ボロン)、石
英等のルツボ中に単結晶の原料例えばGa As 、 
GaP 、 Si等等力カプセル剤あるB2O3ととも
に加え、昇温しで融解する。
In order to grow a single crystal from a melt by the method of the present invention, as in the usual LEO method, raw materials for the single crystal such as GaAs,
GaP, Si isostatic capsules are added together with some B2O3 and melted by raising the temperature.

GaAsの単結晶全成長させる場合、ルツボにGa A
s多結晶または、Ga及びAsを当量添加し、これにB
2O5k加えて、 GaAsの融点(/ 、237℃)
よシも高温に加熱して、ルツボの内容物を融解する。融
解が完了した後、得ら扛た融液を徐々に降温する。降温
は連続的に行なってもよいが、段階的に降温した分が樹
状結晶の生成の状況を観察しやすいので好丑しい。この
場合、オル10°0融液の温度を降下させた後、タ〜/
タ分間温度降下を停止して観察することを繰返すのが好
ましい。融液の温度を降下させながら、モニター用TV
等によシ観察し、Ga AsとB2O3の界面に樹状の
結晶の生成が観察さnると降温全停止し、続いて、徐々
に昇温し、上記樹状結晶が融解消失する温度を精密に測
定する。昇温は、連続的でもよいが段階的に行なう方が
、樹状結晶が融解して消失する温度の測定が容易である
ので好まし伝。段階的に昇温する場合は、−2〜2°C
昇温した後、3〜7分間昇温を停止することを繰返すの
が好ましい。なお、樹状結晶の生成消失は、モニター用
TVによって観察してもよいが、また、種結晶ホルダー
に重量センサーが付属している場合は、該センサーの信
号によって検知してもよい。重量センサーを用いる場合
は、前記降温及び昇温の過程で種結晶を融液に接触させ
ておく必要がある。
When growing a single crystal of GaAs, GaA is placed in the crucible.
s polycrystal or add equivalent amounts of Ga and As, and add B to this.
2O5k plus the melting point of GaAs (/, 237℃)
The container is also heated to a high temperature to melt the contents of the crucible. After the melting is completed, the temperature of the obtained melt is gradually lowered. Although the temperature may be lowered continuously, it is preferable to lower the temperature in stages because it makes it easier to observe the state of dendrite formation. In this case, after lowering the temperature of the 10°0 melt,
It is preferable to repeat the process of stopping and observing the temperature drop for several minutes. Monitor TV while lowering the temperature of the melt.
When the formation of dendritic crystals was observed at the interface between GaAs and B2O3, the temperature was completely stopped, and then the temperature was gradually increased until the temperature at which the dendritic crystals melted and disappeared was reached. Measure precisely. Although the temperature may be raised continuously, it is preferable to raise the temperature in stages because it is easier to measure the temperature at which the dendrites melt and disappear. -2 to 2°C when increasing temperature in stages
After raising the temperature, it is preferable to repeatedly stop the temperature increase for 3 to 7 minutes. Note that the production and disappearance of dendrite crystals may be observed using a monitor TV, or, if a weight sensor is attached to the seed crystal holder, it may be detected by the signal from the sensor. When using a weight sensor, it is necessary to keep the seed crystal in contact with the melt during the temperature-lowering and temperature-raising processes.

種付けは、上記樹状結晶の融解消失する温度よシも3〜
/l’o、好ましくはオ〜/θ℃低い温度で種付を行な
って単結晶成長を行なう。
For seeding, the temperature at which the above-mentioned dendrites melt and disappear is also 3~
Single crystal growth is performed by seeding at a temperature as low as /l'o, preferably 0 to /θ°C.

本発明に用いられる単結晶引上げ装置は通常市販さnて
いるものでよい。また、その他の結晶成長条件は、従来
のLEO法の条件と同様でよい。
The single crystal pulling apparatus used in the present invention may be one that is normally commercially available. Further, other crystal growth conditions may be the same as those of the conventional LEO method.

GaP その他の単結晶の育成の場合も、GaAS単結
晶と同様にできる。
The growth of GaP and other single crystals can be done in the same way as the GaAS single crystal.

本発明方法によると種付けの温度を正確に決定すること
ができるので、種付けに失敗することがなく生産能率が
向上する。また、樹状結晶の生成・消失は重量センサー
によシ検知できるので単結晶育成を自動化することがで
きる。
According to the method of the present invention, the seeding temperature can be determined accurately, so seeding will not fail and production efficiency will be improved. Furthermore, since the formation and disappearance of dendrites can be detected by a weight sensor, single crystal growth can be automated.

本発明を実施例に基づいてさらに具体的に説明する。The present invention will be explained in more detail based on examples.

実施例/ LEO成長装置として、英国Metal Re5ear
ch社”Melbourn” 型結晶成長装置を用いた
Example/ LEO growth equipment manufactured by Metal Re5ear in the UK
A "Melbourn" type crystal growth apparatus manufactured by CH Co., Ltd. was used.

PBN製ルツルツボa/、グ69. As /、夕! 
fj及びB2O3θ、s g を加え、続いて上記装置
内を/θ−’ torrまで減圧にした後窒素を導入し
てグOkg/ dまで加圧した。
PBN crucible a/, g69. As /, Evening!
fj and B2O3θ, s g were added, and then the pressure inside the apparatus was reduced to /θ-' torr, and nitrogen was introduced to increase the pressure to 0 kg/d.

続いて、上記ルツボを加熱してGaAs’i合成しつつ
ルツボの外側においた熱電対で測定して降温は、と・℃
降温しだ後、10分間降温を停止することをオ回繰返し
た。
Next, while heating the crucible to synthesize GaAs'i, the temperature drop was measured with a thermocouple placed outside the crucible.
After the temperature started to decrease, the temperature decrease was stopped for 10 minutes, which was repeated twice.

B2O3とGa As各融液の界面に樹状結晶の生成が
認めら扛たので、降温を停止して10分間一定温度に保
持した。続いて、3゛C昇温させた後5分間昇温全停止
することを2回繰返した。
Since the formation of dendrite crystals was observed at the interface between the B2O3 and GaAs melts, the temperature drop was stopped and the temperature was maintained at a constant temperature for 10 minutes. Subsequently, the temperature was raised by 3°C and then completely stopped for 5 minutes, which was repeated twice.

樹状結晶の融解消失が観察されたので、当該温度から5
℃降温した後、種結晶(く10o〉方向)’1GaAs
融液に接触させて30分間保持して種付けを行なった。
Melting and disappearance of the dendrites was observed, so from the temperature
After cooling down to ℃, seed crystal (10o direction) '1GaAs
Seeding was performed by contacting the melt and holding it for 30 minutes.

種付けは7回で完了した。種付は終了後単結晶引上げを
開始した。
Seeding was completed in 7 times. After seeding was completed, single crystal pulling was started.

5【施例/と同様の方法で合計70ラン(RUN)Ga
 As単結晶を成長させたが、平均の種付は回数は/、
3回/ラン、単結晶が得られたラン数は9ランであった
5 [Example/A total of 70 runs (RUN) Ga
As single crystals were grown, the average number of seedings was /,
The number of runs was 3 times/run, and single crystals were obtained in 9 runs.

従来法によって種付けしたときは、それぞ詐グ回/ラン
、5ランであったので、本発明方法によるときは生産性
が著しく向上したことが明らかである。
When seeding was done by the conventional method, the number of false runs/run was 5, respectively, so it is clear that the productivity was significantly improved when the method of the present invention was used.

実施例λ 実施例/と同じ結晶成長装置を用いPBNルツボ中にG
a As多結晶夕kg、B2O3θ、7kg’i加え実
施例/と同様の操作でアルゴンを導入、3!に9 / 
dまで加圧した。続いて昇温し、モニター用TVでGa
 As及びB2O3が融解したことを確認した後、 G
aAs融液と種結晶(く10θ〉方向)を接触させて、
重量センサー(ロードセル)の信号を観測しながら、実
施例/と同様にして降温した。
Example λ G was grown in a PBN crucible using the same crystal growth apparatus as Example/.
a As polycrystalline Yukg, B2O3θ, 7kg'i were added, and argon was introduced in the same manner as in Example/3! 9 /
The pressure was increased to d. Subsequently, the temperature was raised, and Ga was measured on a monitor TV.
After confirming that As and B2O3 have melted, G
By bringing the aAs melt into contact with the seed crystal (in the 10θ> direction),
While observing the signal from the weight sensor (load cell), the temperature was lowered in the same manner as in Example.

種結晶の重量増加が観測された後、実施例/と同様にし
て昇温した。種結晶の重量かもとの重量になったことを
確認した後、・aAs融液の温度をg ’a降下させて
、20分保持した後単結晶成長を行なった。
After an increase in the weight of the seed crystal was observed, the temperature was raised in the same manner as in Example. After confirming that the weight of the seed crystal was the same as the original weight, the temperature of the aAs melt was lowered by g'a, held for 20 minutes, and then single crystal growth was performed.

実施例コと同様の方法で合計10ランGaAs単結晶を
成長させだが、単結晶が得ら訛たラン数は♂ランであっ
た。
A total of 10 runs of GaAs single crystals were grown in the same manner as in Example 1, but the number of runs in which the single crystals were obtained was ♂ runs.

特許出願人 三菱モンサント化成株式会社三菱化成工業
株式会社 代理人 弁理士 長谷用 − (ほか7名) 手続補正書(自発) 昭和sg年2月z日 2 発 明 の名称 単結晶の育成方法 3 補正をする者 事件との関係 特許出願人 名称(乙0≠)三菱モンサント化成株式会社(ほか7名
) 4代理人〒100 東京都千代田区丸の内二丁目5番2ヨ 5 補正の対象 明細書の発明の詳細な説明の欄6補正
の内容 明細書第乙頁第グ〜j行目を次の通9に訂正する。
Patent applicant Mitsubishi Monsanto Chemical Co., Ltd. Mitsubishi Chemical Industries Co., Ltd. Agent Patent attorney Yo Hase - (and 7 others) Procedural amendment (voluntary) February 2, 1920 SG 2 Name of the invention Method for growing single crystals 3 Amendment Relationship with the case of a person who does Detailed Explanation Column 6 of the Specification of Contents of the Amendment, page 2, lines G to J are corrected to the following passage 9.

[PBN製ルツルツボla /、4を5醇、 As /
、j j 醇及びB2O30,J 醇を加え、続いて上
記装置内を」以 上
[PBN crucible la /, 4 to 5, As /
, j j 醇 and B2O30, J 醇, and then inside the above apparatus.

Claims (4)

【特許請求の範囲】[Claims] (1)液体カプセル引上法によって融液から単結晶を育
成する方法において、上記融液の温度を降下させて上記
融液の表面に樹状結晶を生成させ、続いて上記融液の温
度を徐々に上昇させて上記樹状結晶が融解消失する温度
を測定して、当該温度よりも3〜/、夕°C低い温度に
おいて種付けすることを特徴とする方法。
(1) In a method of growing a single crystal from a melt by the liquid capsule pulling method, the temperature of the melt is lowered to generate dendrites on the surface of the melt, and then the temperature of the melt is lowered. A method characterized in that the temperature at which the dendrite crystals melt and disappear is measured by gradually increasing the temperature, and the seeding is carried out at a temperature that is 3 to 10°C lower than the temperature.
(2)単結晶が周期律表第■b族及び第vb族元累から
なる無機化合物単結晶である特許請求の範囲第1項記載
の方法。
(2) The method according to claim 1, wherein the single crystal is an inorganic compound single crystal consisting of elements of Groups 1b and 5b of the periodic table.
(3)無機化合物単結晶がGa As単結晶である特許
請求の範囲第一項記載の方法。
(3) The method according to claim 1, wherein the inorganic compound single crystal is a GaAs single crystal.
(4)種付は温度が、樹状結晶の融解消失温度よりj〜
/θ゛C低い温度である特許請求の範囲第1項記載の方
法。
(4) For seeding, the temperature is lower than the melting temperature of dendrites.
2. The method according to claim 1, wherein the temperature is /θ゛C lower.
JP14352083A 1983-08-05 1983-08-05 Method for growing single crystal Granted JPS6036396A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14352083A JPS6036396A (en) 1983-08-05 1983-08-05 Method for growing single crystal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14352083A JPS6036396A (en) 1983-08-05 1983-08-05 Method for growing single crystal

Publications (2)

Publication Number Publication Date
JPS6036396A true JPS6036396A (en) 1985-02-25
JPH0327514B2 JPH0327514B2 (en) 1991-04-16

Family

ID=15340645

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14352083A Granted JPS6036396A (en) 1983-08-05 1983-08-05 Method for growing single crystal

Country Status (1)

Country Link
JP (1) JPS6036396A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56164098A (en) * 1980-05-21 1981-12-16 Toshiba Corp Preparation of single crystal

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56164098A (en) * 1980-05-21 1981-12-16 Toshiba Corp Preparation of single crystal

Also Published As

Publication number Publication date
JPH0327514B2 (en) 1991-04-16

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