JPS6029923B2 - Manufacturing method of color filter for single tube color image pickup tube - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing a color filter for a single-tube color image pickup tube using a three-electrode method.

2. Description of the Related Art Conventionally, a three-color parallel color stripe filter has been known as a color filter used in a single-tube color imaging device using a three-electrode system.

As this color filter, an organic filter in which an organic polymer layer is optically pigmented is used. However, since the organic filter described above is thermally weak, it is not possible to directly perform NESA processing (formation processing of a transparent conductive film) on the filter. It was used as a filter for the electrode. In addition to the above-mentioned organic filters, color filters include inorganic filters that utilize multilayer interference films such as optical interference films such as cerium oxide, silicon oxide, titanium oxide, and magnesium oxide. This inorganic filter is thermally and chemically strong and can be processed directly, resulting in excellent resolution and less color shift, but it is difficult and economical to create. It is also expensive and is not used very often. Furthermore, the finer the stripe pitch of the filter mentioned above, the better the resolution, but in the case of a multilayer interference film, since it is produced by the IJ off method, the maximum that can be produced with a good yield is about 20 peaks. Furthermore, from 1 inch pipe 2/
When transitioning to 3-inch pipes, it is necessary to process the stripe pitch even finer. The present invention has been made in view of the above-mentioned points, and the color filter of a single-tube color imaging device using a three-electrode system is constituted by an inorganic filter, which has traditionally been difficult to create, and is fabricated by microfabrication. We aim to make this process easier and reduce the manufacturing process.
An object of the present invention is to provide a method for manufacturing a color filter for a single-tube color image pickup tube with a high yield and at low cost.

In the present invention, instead of the conventional lift-off method used to create inorganic filters, ion etching technology is used to create a manufacturing method that enables the creation of stripes with a pitch of about 10 cm and has a high yield. can be provided. Further, a three-color parallel color stripe filter requires three resist coating steps and three vapor deposition steps, but according to the present invention, only two resist coating steps are required. Furthermore, the color combinations of color filters are cyan (q - yellow (Y) - green (G), magenta (M) - cyan), old (B), and magenta (
M) - Yellow (Y) - Limited to red (R), but red (R)
- Green (G) - Compared to the primary color type with blue legs, it has a higher light utilization rate and is brighter. DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below in order of steps with reference to FIGS. 1 to 8 shown in the drawings.

First, as shown in FIG. 1, a dichrome film 2 made of magenta (M) as a first color is formed by vapor deposition on the entire surface of a face plate 1 made of a non-reflective transparent glass substrate.

Furthermore, the entire surface of the dichroic film 2 is coated with low refractive index glass, S, which does not significantly change the spectral sensitivity characteristics.
The protective film 3 made of a substance such as i02 has a thickness of 0.1 to
It is formed to the size of one Buddha's skin. Next, photoresist 4 [for example, KM Liver (Kodak MicroResist), etc.]
After coating the entire surface, the resist is cured by polymerization by exposure in a predetermined pattern, and by further development, the exposed portion is melted and removed, resulting in the pattern shown in FIG. 2. Then, when direct ion etching is performed on the magenta (M) dichroic film 2 using the photoresist 4 as a mask, all of the dichroic film 2 in the areas where the photoresist 4 is not coated is etched away, as shown in Figure 3. Become. Next, the photoresist 4 coated on the dichroic film 2 shown in FIG. 3 is removed by plasma etching, resulting in the result as shown in FIG. 4.
In addition to what is shown in Figure 4, a second color such as cyan'
A dichroic film 5 made of C) is deposited on the entire surface by vapor deposition.

This situation is shown in Figure 5. Next, a photoresist 4A is coated on the dichroic film 5 in the same manner as described above, and is exposed and developed in a predetermined pattern to obtain what is shown in FIG. 6. When the dichroic film 5 is ion-etched using the photoresist 4A in the state shown in Fig. 6 as a mask, it becomes as shown in Fig. 7. When the remaining resist 4A is further removed by plasma etching, a three-color parallel type film as shown in Fig. 8 is obtained. Color stripe filters can be created.

That is, a magenta (M) transmitted component is transmitted from the dichroic film 2, a cyan (cyan) transmitted component is transmitted from the dichroic film 5, and a musical transmitted component is transmitted from the overlapped portion of the dichroic film 2 and dichroic film 5. You can get each. It should be noted that fine processing with a pitch of about 10 stripes is also possible. Traditionally, inorganic filters have been created using the reverse-swetting method of metal films (when processing difficult-to-harvest materials, an easily soluble material is applied in the opposite pattern to the required pattern, and then a soluble material is stacked on top of the reverse pattern). Later, as the pitch of the stripes became finer, around 10 Buddhas, the pattern became finer. However, there were problems such as the micro-film peeling off quickly and the dimensional accuracy being poor due to side etching. In the present invention described above, since the dichroic film is directly etched by ion etching, fine processing is easy even if the pitch of the stripes is about 10 squares, and it is possible to obtain a third color by overlapping the dichroic films. The present invention provides a method for manufacturing a color filter for single-tube color image pickup tubes, which has the characteristics of reducing the number of vapor deposition steps, reducing the number of scratches, etc., and improving the yield due to the reduction in the number of manufacturing steps. can be provided.

[Brief explanation of the drawing]

1 to 8 shown in the drawings are cross-sectional views of an embodiment of the present invention in the order of its steps. 1: Face plate, 2: Dichro film (magenta),
3: Protective film, 4, 4A: Photoresist, 5: Dichroic film (cyan). [1] [2) (3) [41 [5] (6) (7) [8]

Claims (1)

[Claims] 1 Any first and second colors of the three colors cyan (C), magenta (M), and yellow (Y) that are complementary to red (R), green (G), and blue (B). By partially overlapping each dichroic film, which is a striped optical interference film formed by a combination of two colors, a third color different from the first color and second color is produced from the overlapping part. In the method for manufacturing a color stripe filter, a dichroic film of the first color is formed on the face plate by vapor deposition, and a low refractive index material that does not significantly change the spectral sensitivity characteristics is further applied thereon. A process of forming an SiO_2 film with a thickness in the range of 0.1 to 1 μm as a protective film, and applying a photoresist on the first color dichroic film and the protective film and ion etching the first color dichroic film. a step of forming the film in a required stripe shape; a step of removing the photoresist left after the etching by plasma etching; and a step of forming the dichroic film of the first color after forming the dichroic film of the second color. Similarly, a method of manufacturing a color filter for a single tube color image pickup tube includes the steps of resist coating, ion etching, and plasma etching.