JPS60254408A - Multiple-layer film magnetic head - Google Patents

Multiple-layer film magnetic head

Info

Publication number
JPS60254408A
JPS60254408A JP11198184A JP11198184A JPS60254408A JP S60254408 A JPS60254408 A JP S60254408A JP 11198184 A JP11198184 A JP 11198184A JP 11198184 A JP11198184 A JP 11198184A JP S60254408 A JPS60254408 A JP S60254408A
Authority
JP
Japan
Prior art keywords
magnetic
substrate
film
resist
films
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11198184A
Other languages
Japanese (ja)
Inventor
Kazuyasu Kaneko
金子 一康
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nidec Sankyo Corp
Original Assignee
Nidec Sankyo Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nidec Sankyo Corp filed Critical Nidec Sankyo Corp
Priority to JP11198184A priority Critical patent/JPS60254408A/en
Publication of JPS60254408A publication Critical patent/JPS60254408A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3103Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3109Details
    • G11B5/313Disposition of layers
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3163Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers

Abstract

PURPOSE:To form a multiple-layer film magnetic head which is excellent in finishing accuracy and mass-productivity, by forming a magnetic gap layer composed of a nonmagnetic material on a resist pattern surface formed on a common substrate and alternately forming magnetic films and nonmagnetic films on the substrate. CONSTITUTION:A resist 2 applied to the surface of a nonmagnetic substrate 1 is removed by leaving part of the resist 2 forming a prescribed pattern as it is (Fig. 2) then the surface of the remaining resist 2 and the substrate 1 at the locations where the resist 2 is removed are covered with a nonmagnetic film 3 which is used as a gap spacer. Then the 1st multiple-layer film 4a is formed by sputtering, etc. (Fig. 4), and the 1st multiple-layer film 4a and nonmagnetic film 3 are removed along the line A so that a plane can be formed along the line A (Fig. 5). After the plane is formed, all of the remaining resist 2 is removed and the 2nd multiple-layer film 4b is formed by using the same material and method as those used for the film 4a (Figs. 6 and 7). Then a plate 5 made of the same material as that used for the substrate 1 is firmly adhered to the 1st and 2nd multiple-layer films 4a and 4b so that the films 4a and 4b are put between the substrate 1 and plate 5 and can be protected (Fig. 9). After the plate 5 is fitted, groove holes 6 for winding are formed by piercing the holes 6 from the top to bottom by press working, etc., at every section to be separated individually.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は、磁性膜と被磁性膜とを交互に積層しそなる多
層膜磁気ヘッドに関するものであって、例えばビデオテ
ープレコーダ等に使用可能な磁気ヘッドに関するもので
ある。
DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a multilayer magnetic head in which magnetic films and magnetic films are alternately laminated, and the present invention relates to a magnetic head that can be used in, for example, video tape recorders. It is related to.

従来の技術 磁気テープ、磁気シート、磁気ディスク等の記録媒体に
信号を記録するに当たり、記録密度を高めるには、狭ト
ランク、狭ギヤツブの磁気ヘッドが必要となる。そこで
、結晶化ガラス、非磁性フェライト等の基板上に、蒸着
、スパッタリング、メッキ法等の薄膜形成法により、ア
モルファス、センダスト等の磁性膜と酸化珪素等の非磁
性膜を交互に成長させて多層膜とし、この多層膜の厚さ
をトラック幅とすることにより容易に狭トラツクの磁気
ヘッドを得るようにした技術が提案されている。特公昭
53−25491号公報記載のものはその一つである。
2. Description of the Related Art In recording signals on recording media such as magnetic tapes, magnetic sheets, magnetic disks, etc., magnetic heads with narrow trunks and narrow gears are required to increase the recording density. Therefore, on a substrate of crystallized glass, nonmagnetic ferrite, etc., a multilayer film is created by alternately growing magnetic films such as amorphous or sendust and nonmagnetic films such as silicon oxide using thin film forming methods such as vapor deposition, sputtering, and plating. A technique has been proposed in which a magnetic head with a narrow track can be easily obtained by using the multilayer film as a track width and the thickness of this multilayer film as the track width. The one described in Japanese Patent Publication No. 53-25491 is one of them.

周知のように、高密度記録ヘッド材料としては、飽和磁
束密度Bsが充分大きく、かつ、高周波での実効透磁率
μeが充分大きいことが要求され、アモルファス合金、
センダスト合金等による多層膜ヘッドが注目されている
As is well known, high-density recording head materials are required to have a sufficiently large saturation magnetic flux density Bs and a sufficiently large effective magnetic permeability μe at high frequencies, and amorphous alloys,
Multilayer film heads made of Sendust alloy and the like are attracting attention.

しかるに、従来の多層膜磁気ヘッドは、二つの磁性基板
上にそれぞれ多層膜を形成し、この基板及び多層膜の側
面を鏡面研磨したのち研磨面に非磁性のギャップ部材を
形成し、互いに突き合わせて一体化してなるものである
。そのため、多層膜を構成する磁性材料及び非磁性材料
、さらに基板材料の三つの異種材料を研磨工程において
同時に研磨することになり、各材料の強度、耐摩耗性等
の各種の特性の違いがあることから研磨される度合が各
材料ごとに異なって、所謂「面だれ」が生じ、直線性の
よいギャップ面を得ることが困難であり、ギャップが波
打ち状にくずれたり、基板材との間に空隙を生じたりし
ていた。また、二つの面を研磨して突き合わせ一体化す
ることは、仕上がりの精度を高め難く、かつ、量産性に
も劣っていた。
However, in conventional multilayer magnetic heads, multilayer films are formed on two magnetic substrates, the sides of the substrates and the multilayer films are mirror-polished, a non-magnetic gap member is formed on the polished surfaces, and the magnetic head is butted against each other. It is something that is integrated. Therefore, three different materials, the magnetic and non-magnetic materials that make up the multilayer film, and the substrate material, are polished simultaneously in the polishing process, and each material has different characteristics such as strength and wear resistance. As a result, the degree of polishing differs for each material, resulting in so-called "surface sagging", making it difficult to obtain a gap surface with good straightness, causing the gap to become undulating, and causing gaps between the material and the substrate material. It was creating a void. Furthermore, polishing the two surfaces and butting them together makes it difficult to improve the precision of the finish and is also poor in mass production.

発明が解決しようとする問題点 本発明は、ギャップの直線性が良好であり、かつ、仕上
がり精度が良好で量産性に優れた多層膜磁気ヘッドを提
供することを目的とする。
Problems to be Solved by the Invention It is an object of the present invention to provide a multilayer magnetic head that has good gap linearity, good finishing accuracy, and is excellent in mass production.

問題点を解決するための手段 本発明の多層膜磁気ヘッドは、1枚の共通基板上に巻線
溝を穿設し、少な(とも上記巻線溝から記録媒体摺接面
に至る磁気ギャップ部に非磁性材を被着介在させてなる
磁気ギャップ層を設けると共に、上記基板上に磁性膜と
被磁性膜とを交互に被着形成してなるものである。
Means for Solving the Problems The multilayer magnetic head of the present invention has a winding groove formed on one common substrate, and a small magnetic gap (from the winding groove to the recording medium sliding surface). A magnetic gap layer formed by depositing a non-magnetic material on the substrate is provided, and magnetic films and magnetic films are alternately deposited on the substrate.

作用 本発明によれば、1枚の共通基板上にまずレジストパタ
ーンを形成して、該パターン面に非磁性材でなる磁気ギ
ャップ層を形成し、しかるのち上記基板上に磁性膜と非
磁性膜を交互に被着形成して磁気ヘッドを形成すること
ができ、従来のように、二つのものを突き合わせて一体
化する必要はない。
According to the present invention, a resist pattern is first formed on one common substrate, a magnetic gap layer made of a non-magnetic material is formed on the surface of the pattern, and then a magnetic film and a non-magnetic film are formed on the substrate. The magnetic head can be formed by alternately depositing the two parts, and there is no need to butt and integrate the two parts as in the conventional case.

実施例 以下、図面に示された製造工程の例を参照しながら本発
明の詳細な説明する。
EXAMPLES The present invention will now be described in detail with reference to examples of manufacturing steps shown in the drawings.

第1図において、まず、(1)に示されているように、
ガラス、セラミックス、非磁性フェライト等の非磁性基
板1上に耐熱レジスト2をスピンコータ等を用いて塗布
する。レジスト2の厚さはトランク幅となるべき後述の
多層膜の厚さと同等又はそれ以上(20乃至50μm)
となるように1回又は数回塗布する。次に(2)に示さ
れているように、エツチング法等によってレジスト2の
一部を所定のパターンを残して他の部分を除去する。
In FIG. 1, first, as shown in (1),
A heat-resistant resist 2 is applied onto a non-magnetic substrate 1 made of glass, ceramics, non-magnetic ferrite, etc. using a spin coater or the like. The thickness of the resist 2 is equal to or greater than the thickness of the multilayer film to be described later which is the trunk width (20 to 50 μm).
Apply once or several times. Next, as shown in (2), a part of the resist 2 is removed by etching or the like, leaving a predetermined pattern and other parts.

次に(3)に示されているように、ギャップスペーサと
なる酸化珪素等の非磁性の膜3をレジスト2の表面及び
レジストが除去されて露出した基板1の表面全体を覆う
ようにスパッタリング等によって被着させる。次に(4
)に示されているように、第1多層膜4aをスパッタリ
ング等によって被着形成する。第1多層膜4aは、例え
ばコバルト系アモルファス、センダストやパーマロイの
合金等の磁性材と、例えば酸化珪素等の非磁性材を交互
に積層することによって形成する。第1多層膜4aは、
隣り合うレジスト2相互間の谷間にも形成されるし、レ
ジスト2の上にも形成される。センダストやパーマロイ
の合金等をスパッタリングする場合、磁気特性を向上さ
せるために、300乃至350°Cに強制加熱すること
が望ましい。しかし、レジスト2は熱的に不安定なため
、スパッタによる第1多層膜4aの形成中に加熱される
と有害なガスを放出する危険性がある。しかし、上記の
製造工程では非磁性膜3でレジスト2の全面が被覆され
た状態でスパッタが行われるから、有害ガスが放出され
ることはない。ただし、耐熱レジスト2の安定温度は1
00乃至150°Cであるから、スパッタリングの際は
基板温度に充分注意し、冷却水を通すなどして基板温度
が100°C以下になるようにすることが望ましい。次
に第1図(4)に示されている線Aに沿い面一となるよ
うにレジスト2上に被着形成された第1多層膜4a、非
磁性材の膜3を除去する。その結果、第1図(5)に示
されているように、レジスト2と、レジスト2相互間に
被着形成された第1多層膜4aと、これらレジスト2と
第1多層膜4aとの間に介在する非磁性材の膜3が残る
。次に、(6)に示されているように、残されているレ
ジスト2を総て除去する。次に、(7)に示されている
ように、第2多層膜4bを前記第1多層膜4aの材料と
同じ材料で、かつ、同じ方法で被着形成する。第2多層
膜4bは、レジスト2を除去したあとの谷間に被着形成
されると共に第1多層膜4aの上にも被着形成される。
Next, as shown in (3), a non-magnetic film 3 made of silicon oxide or the like, which will serve as a gap spacer, is sputtered to cover the entire surface of the resist 2 and the exposed surface of the substrate 1 after the resist has been removed. Deposit by. Next (4
), the first multilayer film 4a is deposited by sputtering or the like. The first multilayer film 4a is formed by alternately laminating magnetic materials such as cobalt-based amorphous, sendust, and permalloy alloys, and non-magnetic materials such as silicon oxide. The first multilayer film 4a is
It is formed in the valley between adjacent resists 2, and also on the resist 2. When sputtering alloys such as sendust and permalloy, it is desirable to forcibly heat them to 300 to 350°C in order to improve their magnetic properties. However, since the resist 2 is thermally unstable, there is a risk of emitting harmful gases if it is heated during the formation of the first multilayer film 4a by sputtering. However, in the above manufacturing process, since sputtering is performed with the entire surface of the resist 2 covered with the non-magnetic film 3, no harmful gases are released. However, the stable temperature of heat-resistant resist 2 is 1
00 to 150°C, it is desirable to pay sufficient attention to the substrate temperature during sputtering and to keep the substrate temperature below 100°C by passing cooling water or the like. Next, the first multilayer film 4a and the nonmagnetic material film 3 formed on the resist 2 so as to be flush with each other along the line A shown in FIG. 1(4) are removed. As a result, as shown in FIG. 1(5), the resist 2, the first multilayer film 4a formed between the resists 2, and the gap between the resist 2 and the first multilayer film 4a are formed. A film 3 of non-magnetic material interposed between the two remains. Next, as shown in (6), all remaining resist 2 is removed. Next, as shown in (7), a second multilayer film 4b is formed using the same material and using the same method as the first multilayer film 4a. The second multilayer film 4b is deposited in the valley after the resist 2 is removed, and is also deposited on the first multilayer film 4a.

次に、第1図(7)の線Bに沿い平削り及びランプ加工
を行い、第1多層膜4a上の第2多層膜4bを除去して
面一にする。その結果、(8)に示されているように、
基板1上には第1多層膜4aと第2多層膜4bとが交互
に並べられた状態で形成されると共に、各多層膜4a、
4b相互間に磁気ギャップとなるべき非磁性材の膜3が
形成され、これら各膜の上面が平坦に形成されることに
なる。次に(9)に示されているように、上記各膜の上
面に、これらの膜を基板1との間に挟み込むようにして
基板1と同様の非磁性材でなる対向板5を固着して多層
膜を保護する。次に、(10)に示されているように、
個々に分離すべき部分ごとに、巻線用の溝孔6をプレス
加工等によって上下に貫いて形成する。ただし、巻線用
の溝孔6は、予め基板1と対向板5に形成していてもよ
い。その場合、基板1例の溝孔の周囲には、スパッタリ
ング等による非磁性材の膜3や第1多層膜4a及び第2
多層膜4bの形成の際にこれらの各膜と同様の膜が形成
されるから、事後処理として上記基板1例の溝孔の周囲
に形成された膜を機械加工又は光学的、化学的処理等に
よって取り除き、しかるのち対向板5を固着する。
Next, planing and ramp processing are performed along line B in FIG. 1 (7) to remove the second multilayer film 4b on the first multilayer film 4a to make it flush. As a result, as shown in (8),
On the substrate 1, a first multilayer film 4a and a second multilayer film 4b are formed in an alternating manner, and each multilayer film 4a,
A film 3 of a non-magnetic material to form a magnetic gap between the 4b is formed, and the upper surface of each of these films is formed to be flat. Next, as shown in (9), a counter plate 5 made of the same non-magnetic material as the substrate 1 is fixed to the top surface of each of the above films so that these films are sandwiched between the substrate 1 and the substrate 1. to protect the multilayer film. Next, as shown in (10),
For each portion to be separated individually, a slot 6 for winding is formed vertically through the wire by pressing or the like. However, the winding slots 6 may be formed in advance on the substrate 1 and the opposing plate 5. In that case, a film 3 of a non-magnetic material, a first multilayer film 4a and a second multilayer film 4a, etc. are formed around the groove of the substrate by sputtering or the like.
Since films similar to each of these films are formed when forming the multilayer film 4b, the film formed around the grooves of the above-mentioned one example of the substrate is subjected to mechanical processing or optical or chemical treatment as a post-treatment. Then, the facing plate 5 is fixed.

次に、第1図(10)に示されている鎖線に沿って切り
離し、一つの基板1と、一つの第1多層膜4aと、一つ
の第2多層膜4bと、一つの非磁性材の膜3と、一つの
対向板5からなる一つ一つの磁気ヘッドに分離する。非
磁性材の膜3の部分は前にも述べた通り磁気ギャップと
なる。対向板5は、基板1と同様に耐摩耗材料をはり合
わせ、あるいは、5i02、Si3N4 、Al2O3
等の耐摩擦性のある磁気的絶縁材料を、スパッタリング
、蒸着、イオンブレーティング等によって形成してもよ
い。
Next, one substrate 1, one first multilayer film 4a, one second multilayer film 4b, and one nonmagnetic material are separated along the chain line shown in FIG. 1 (10). The magnetic heads are separated into individual magnetic heads each consisting of a film 3 and one opposing plate 5. The portion of the film 3 made of non-magnetic material becomes a magnetic gap as described above. The opposing plate 5 is made of wear-resistant material bonded to the substrate 1, or made of 5i02, Si3N4, Al2O3.
Abrasion-resistant magnetically insulating materials such as those may be formed by sputtering, vapor deposition, ion blasting, or the like.

次に、第2図及び第3図に示された別の実施例について
説明する。この実施例は、磁気ギャップにアジマス角を
もたせるようにしたものである。
Next, another embodiment shown in FIGS. 2 and 3 will be described. In this embodiment, the magnetic gap has an azimuth angle.

第2図において、(1)、(2)に示されているように
、非磁性基板1上に耐熱レジスト2を塗布し、エツチン
グ等によってレジスト2を所定のパターンに形成する点
は前述の実施例と同様である。
In FIG. 2, as shown in (1) and (2), a heat-resistant resist 2 is applied on a non-magnetic substrate 1, and the resist 2 is formed into a predetermined pattern by etching or the like, as described above. Similar to the example.

次に、第2図(3)に示されているように、残されたレ
ジスト2の両側面のうち、少なくとも磁気ギャップ形成
面となるべき面をアジマス角に相当する角度をもった斜
面2aとする。この斜面2aを形成するには、機械的な
切削加工によってもよいが、レジスト2のエツチング時
に起きるテーバエツチング特性を利用してもよい。こう
して、斜面2aを有してなる所定のパターンのレジスト
2が形成されると、次に第2図(4)に示されているよ
うにギャップスペーサとなる非磁性材の膜3を形成し。
Next, as shown in FIG. 2(3), at least the surface that is to become the magnetic gap forming surface among both side surfaces of the remaining resist 2 is formed into a slope 2a having an angle corresponding to the azimuth angle. do. The slope 2a may be formed by mechanical cutting, or by utilizing the Taber etching characteristics that occur when the resist 2 is etched. After the resist 2 having a predetermined pattern having the slope 2a is formed in this way, a film 3 of a non-magnetic material which will become a gap spacer is then formed as shown in FIG. 2(4).

さらに(5)に示されているように、第1多層膜4aを
スパッタリング等によって被着形成する。第2図(4)
(5)は第1図の(3)(4)の工程に相当し、以下、
第1図の例と同様の工程を経る。
Furthermore, as shown in (5), a first multilayer film 4a is deposited by sputtering or the like. Figure 2 (4)
(5) corresponds to steps (3) and (4) in Figure 1, and the following:
The same steps as in the example of FIG. 1 are performed.

第3図は、こうして基板1上に第1多層膜4aと第2多
層膜4bが交互に並んで形成され、かつ、各多層膜4a
、 4b間に非磁性材のIll!3によってギャップが
形成された状態を示しており、第1図の(8)に対応す
るものである。第3図から明らがなように、ギャップス
ペーサとなるべき非磁性材の膜3はレジスト2に被着形
成されることがら、レジスト2の斜面2aに沿って形成
された非磁性材のII!i3の部分は上記斜面2aと同
じ角度をもった傾斜面となり、これによってアジマス角
が形成されることになる。
FIG. 3 shows that the first multilayer film 4a and the second multilayer film 4b are thus formed on the substrate 1 in an alternating manner, and each multilayer film 4a is
, Ill of non-magnetic material between 4b! 3 shows a state in which a gap is formed, which corresponds to (8) in FIG. As is clear from FIG. 3, since the non-magnetic material film 3 to serve as a gap spacer is formed on the resist 2, the non-magnetic material II formed along the slope 2a of the resist 2 ! The portion i3 becomes an inclined surface having the same angle as the above-mentioned inclined surface 2a, thereby forming an azimuth angle.

ギャップスペーサとなるべき非磁性材の膜3をスパッタ
リングにより形成するに際して、第4図に示されている
ように、基板1及びその上に形成された所定のパターン
のレジスト2の一部にマスク7をかけてスパッタリング
を行い、少なくとも巻線溝から記録媒体摺接部に至る部
分のみに非磁性材の膜3を被着形成させるようにしても
よい。
When forming the non-magnetic material film 3 to serve as a gap spacer by sputtering, as shown in FIG. Alternatively, sputtering may be performed to form the non-magnetic material film 3 only on at least the portion extending from the winding groove to the recording medium sliding contact portion.

このようにして膜3を形成したのちは、前述の工程と同
様の工程を経て磁気ヘッドが形成されるのであるが、完
成した磁気ヘッドの基板1とギャップスペーサとしての
非磁性材のIII+3と巻線溝6の部分のみを仮想的に
示したのが第5図であり、完成した磁気ヘッドの磁気回
路を示したのが第6図である。第6図に示されているよ
うに、非磁性材の膜3で形成されるギャップの部分の漏
洩磁束によって記録再生が行われるので、ギャップを形
成する非磁性材の膜3を形成することは必須であるが、
磁気回路の磁気抵抗はなるべく低い方が効率はよくなる
ため、ギャップを形成する非磁性材の11*3は必須の
部分以外はなるべく占有面積が小さい方がよく、その意
味からも、非磁性材の膜3を形成するに当たって第4図
の例のようにマスク7をかけてスパッタリング等によっ
て被着形成を行うことは有効である。
After forming the film 3 in this way, a magnetic head is formed through the same steps as those described above, but the completed magnetic head substrate 1, a non-magnetic material III+3 as a gap spacer, and a winding. FIG. 5 hypothetically shows only the line groove 6, and FIG. 6 shows the magnetic circuit of the completed magnetic head. As shown in FIG. 6, recording and reproduction are performed by leakage magnetic flux in the gap formed by the non-magnetic film 3, so it is not necessary to form the non-magnetic film 3 that forms the gap. Although it is essential,
The lower the magnetic resistance of the magnetic circuit, the better the efficiency, so it is better for the non-magnetic material 11*3 that forms the gap to occupy as small an area as possible except for the essential parts. In forming the film 3, it is effective to apply a mask 7 and perform deposition by sputtering or the like as in the example shown in FIG.

発明の効果 本発明の多層膜磁気ヘッドは、共通基板上に磁気ギャッ
プ層を設けると共に上記基板上に磁性膜と非磁性膜とを
交互に被着形成してなるものであり、従来の多層膜磁気
ヘッドのように個々の基板上に多層膜を形成したものを
研磨しかつ突き合わせて一体化したものではないから、
直線性のよいギャップを得ることができるし、ギャップ
部を研磨しかつ突き合わせる必要はないから、仕上がり
精度が良好で量産性に優れた多層膜磁気ヘッドを提供す
ることができる。
Effects of the Invention The multilayer magnetic head of the present invention is formed by providing a magnetic gap layer on a common substrate and alternately depositing magnetic films and nonmagnetic films on the substrate. Unlike magnetic heads, multilayer films are formed on individual substrates and are not polished and butted together to integrate them.
Since a gap with good linearity can be obtained and there is no need to polish and butt the gap portion, it is possible to provide a multilayer magnetic head with good finishing accuracy and excellent mass productivity.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の多層膜磁気ヘッドを得るための製造工
程の一例を対象物の変化で示す断面図、第2図は同じく
製造工程の別の例を対象物の変化で示す断面図、第3図
は第2図の製造工程の最終段階の対象物を示す断面図、
第4図は上記各製造工程中の磁気ギャップ形成部材の被
着工程の一例を示す斜面図、第5図は本発明の多層膜磁
気ヘッドの一例を部分的に仮想的に示す斜面図、第6図
は本発明の多層膜磁気ヘッドの磁気回路の例を示す平面
図である。 ■一基板、 3−・−非磁性材の膜でなる磁気ギャップ
層、 4a−・−雨1多層膜、 4b・−第2多層膜、
6・・・−巻線溝。
FIG. 1 is a sectional view showing an example of the manufacturing process for obtaining a multilayer magnetic head of the present invention by changing the object; FIG. 2 is a sectional view showing another example of the manufacturing process by changing the object; Figure 3 is a sectional view showing the object at the final stage of the manufacturing process in Figure 2;
FIG. 4 is a perspective view showing an example of the step of adhering the magnetic gap forming member in each of the manufacturing steps described above; FIG. 5 is a perspective view partially illustrating an example of the multilayer magnetic head of the present invention; FIG. 6 is a plan view showing an example of the magnetic circuit of the multilayer magnetic head of the present invention. ■One substrate, 3--Magnetic gap layer made of a film of non-magnetic material, 4a--Rain 1 multilayer film, 4b--Second multilayer film,
6...-Winding groove.

Claims (1)

【特許請求の範囲】[Claims] 1枚の共通基板上に巻線溝を穿設し、少なくとも上記巻
線溝から記録媒体摺接面に至る磁気ギャップ部に非磁性
材を被着介在させてなる磁気ギャップ層を設けると共に
、上記基板上に磁性膜と被磁性膜とを交互に被着形成し
てなる多層膜磁気ヘッド。
A winding groove is formed on one common substrate, and a magnetic gap layer is provided in which a non-magnetic material is interposed in at least the magnetic gap portion from the winding groove to the recording medium sliding surface, and the above-mentioned A multilayer magnetic head is formed by alternately depositing magnetic films and magnetic films on a substrate.
JP11198184A 1984-05-31 1984-05-31 Multiple-layer film magnetic head Pending JPS60254408A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11198184A JPS60254408A (en) 1984-05-31 1984-05-31 Multiple-layer film magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11198184A JPS60254408A (en) 1984-05-31 1984-05-31 Multiple-layer film magnetic head

Publications (1)

Publication Number Publication Date
JPS60254408A true JPS60254408A (en) 1985-12-16

Family

ID=14574958

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11198184A Pending JPS60254408A (en) 1984-05-31 1984-05-31 Multiple-layer film magnetic head

Country Status (1)

Country Link
JP (1) JPS60254408A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57141009A (en) * 1981-02-23 1982-09-01 Hitachi Ltd Thin film magnetic head and its production

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57141009A (en) * 1981-02-23 1982-09-01 Hitachi Ltd Thin film magnetic head and its production

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