JPS60246668A - Semiconductor integrated circuit - Google Patents

Semiconductor integrated circuit

Info

Publication number
JPS60246668A
JPS60246668A JP59104934A JP10493484A JPS60246668A JP S60246668 A JPS60246668 A JP S60246668A JP 59104934 A JP59104934 A JP 59104934A JP 10493484 A JP10493484 A JP 10493484A JP S60246668 A JPS60246668 A JP S60246668A
Authority
JP
Japan
Prior art keywords
pad
circuit
diode
input
integrated circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP59104934A
Other languages
Japanese (ja)
Inventor
Naoki Yamada
直樹 山田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP59104934A priority Critical patent/JPS60246668A/en
Publication of JPS60246668A publication Critical patent/JPS60246668A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/0203Particular design considerations for integrated circuits
    • H01L27/0248Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
    • H01L27/0251Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices
    • H01L27/0255Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices using diodes as protective elements

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)

Abstract

PURPOSE:To improve the efficiency of an MOS integrated circuit, and to reduce ship size by forming an input/output protective circuit in a region just under an external connecting-lead leading-out buffer for the MOS integrated circuit. CONSTITUTION:An input protective circuit 9 is constituted by a pad 1 and diodes 3, 4. The diode 3 as an N<+>-P<-> junction section and the diode 4 as a P<+>-N<-> junction section are shaped just under the pad 1, and one ends of the diodes 3, 4 are connected to the pad 1 through an aluminum electrode and wirings (b). A spatial region just junder the pad can be used as a practical region, and the efficiency of the circuit can be improved and chip size reduced, thus obtaining circuit consitution generating no waste.

Description

【発明の詳細な説明】 [Qtlの技術分野〕 この発明は、入出力保護回路を備えた半導体集積回路に
関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Technical field of Qtl] The present invention relates to a semiconductor integrated circuit equipped with an input/output protection circuit.

〔従来技術〕[Prior art]

従来の半導体集積回路を図面によって説明する。 A conventional semiconductor integrated circuit will be explained with reference to the drawings.

第1図は従来の一般的なCMO8構成の入カバツフ7回
路図で、Sは入力保護回路で、パッド1゜ポリシリコン
からなる抵抗体2とダイオード3゜4によって構成され
る。5.7’i’iPチャンネルMO8)ラノジスタ、
6.8はNチャンネルMOSトランジスタ、12は電源
端子、13は接地端子である。
FIG. 1 is a circuit diagram of input buffer 7 of a conventional general CMO8 configuration, where S is an input protection circuit, which is composed of a pad 1°, a resistor 2 made of polysilicon, and a diode 3°4. 5.7'i'iP channel MO8) Lanozista,
6.8 is an N-channel MOS transistor, 12 is a power supply terminal, and 13 is a ground terminal.

第2図は第1図の入力保護回路90部分のパターンの概
略を示したものであり、第1図におけるPチャンネルM
O8)ランラスタ5.NチヤンネルMOS)ランンスタ
6からなるインバータと、PチャンネルMOSトランジ
スタ7、Nチャフ子ルMO8)う/ジスク8からなるイ
ンパーク等は省略しである。第3図は小2図の■−■紛
による断面拡大図である。絹3図において、aはカラス
コート、bはアルミニウム電極、Cは絶縁酸化膜である
。パッド1は違抗体2ヶ介してN”P−接合部であるダ
イオード3の一端と、P+へ一接合部であるタイオード
4の一端と接続している。
FIG. 2 schematically shows the pattern of the input protection circuit 90 part in FIG.
O8) Run raster 5. An inverter consisting of an N-channel MOS transistor 6, an impark consisting of a P-channel MOS transistor 7, an N channel transistor 8), and the like are omitted. Figure 3 is an enlarged cross-sectional view of Figure 2, taken from ■-■. In Figure 3, a is a crow coat, b is an aluminum electrode, and C is an insulating oxide film. Pad 1 is connected to one end of diode 3, which is an N''P-junction, and one end of diode 4, which is one junction to P+, through two crosslinkers.

一般にMO3集積回路の場合、その動作時および取扱い
時におけるサージ電圧によって破wk(静電破壊も含む
)か起り易い。その破壊の主なものはゲート・ソース間
の絶縁破壊である。したかつて、MO8集槓目積dの人
出力部(主九人力部)九は、破壊防止のための人力保護
回路9か具偏されている。この人力保護回路9は抵抗体
2とタイオ−ド3,4とで構成され、従米入カ保画回路
9はバッド1の外部に入出力回路の一部として曲設に組
み込まれている。なお、出カ保赦回路も同様にして形成
される。
Generally, in the case of MO3 integrated circuits, damage wk (including electrostatic damage) is likely to occur due to surge voltage during operation and handling. The main cause of this breakdown is dielectric breakdown between the gate and source. In the past, the human power output section (main human power section) 9 of the MO8 assembly d was equipped with a human power protection circuit 9 to prevent destruction. This human power protection circuit 9 is composed of a resistor 2 and diodes 3 and 4, and the input power protection circuit 9 is built into the outside of the pad 1 as part of the input/output circuit. Note that the output protection circuit is also formed in the same manner.

このように人力保鏝回路9や図示しない出カ株護回路か
入出力回路の一部として挿入されることにより、その分
だけ面状か太き(なり回路自体も複雑になる欠点かあっ
た。
In this way, by inserting it as part of the human power protection circuit 9, the output protection circuit (not shown), or the input/output circuit, the surface shape becomes thicker (and the circuit itself becomes more complicated). .

〔発明の概要〕[Summary of the invention]

この発明は、上述の欠点ケ解消するため、従来性われて
いなかったバッドの直下の狽域忙入出カ保鰻回路を設置
することによって回路の効率化およびチップサイズの縮
小化欠はかったものである。
In order to solve the above-mentioned drawbacks, this invention has been made to improve the efficiency of the circuit and reduce the chip size by installing an inlet/output power protection circuit in the trap area directly under the pad, which has not been done before. be.

以下図面につきこの発明の一実M例ケ説明する。An example of this invention will be explained below with reference to the drawings.

〔発明の実施例〕[Embodiments of the invention]

第4図はこの発明の一実施例の摘成図で、大刀保護回路
9の部分をバッド直下に置換したものである。
FIG. 4 is a schematic diagram of one embodiment of the present invention, in which the long sword protection circuit 9 is replaced directly below the pad.

第5図は第4図のm−細線による断面図であり、Iil
、3図で示す抵抗体2のような保峡砥抗をま言まれてい
ない。
FIG. 5 is a sectional view taken along the m-thin line in FIG.
, the resistor 2 shown in Fig. 3 is not mentioned.

!5図において、a、b+cは第3図の場合と同じであ
り、第3図のように抵抗体ケ設けないでバッド1の直下
にN”P−接合部であるタイオート3と、P4N−接合
部であるタイオード4ヶ設け、各ダイオード3,4の一
端をフルミニラム4極すを介して、バッド1と接続して
いる。
! In Fig. 5, a, b+c are the same as in Fig. 3, and instead of providing a resistor as shown in Fig. 3, tie-out 3, which is an N''P- junction, and P4N- are placed directly under pad 1. Four diodes, which are junctions, are provided, and one end of each diode 3, 4 is connected to the pad 1 through a full mini-RAM 4-pole.

また、第6図はこの発明の他の実施的を示すもので、出
力側の促成回路である出カッ・ラフ710を表した回路
図であり、第7図は第6図の断面図である。第6図では
タイオード30.40と各MO8)ランジス250.6
0間に拡散抵抗による抵抗体20を入れである。
Further, FIG. 6 shows another embodiment of the present invention, and is a circuit diagram showing an output rough 710 which is an output side boosting circuit, and FIG. 7 is a sectional view of FIG. 6. . In Figure 6, the diode 30.40 and each MO8) Rungis 250.6
A resistor 20 made of a diffused resistance is inserted between 0 and 0.

第7図において、バッド1の直下のa、b、cは第3図
の場合と同じものを示している。バッド1の直下に拡散
抵抗による抵抗体20ケ弁してN+P−接合部であるダ
イオード30と、 P+ N−接合であるタイオード4
0とを設け、これらダイオード40および拡散抵抗によ
る抵抗体20?介したタイオード30はアルミニウム電
毬ts’e介してバッド1と接続している。
In FIG. 7, a, b, and c immediately below the pad 1 are the same as in FIG. 3. Directly below the pad 1 are a diode 30, which is an N+P- junction with 20 resistors made of diffused resistance, and a diode 4, which is a P+N- junction.
0, and these diodes 40 and a resistor 20 made of a diffused resistor. The diode 30 is connected to the pad 1 through an aluminum wire.

また、第8図はこの発明のさらに他の実施的ゲ示すもの
で、人出刃用のバッド1とダイオード3(3G)、 4
 (40)の間にポリシリコンの抵抗体20′ケ挿入し
た場合の入出力バンド部11の正面図である。
Further, FIG. 8 shows still another embodiment of the present invention, in which a pad 1 and diodes 3 (3G) and 4 for a human blade are shown.
(40) is a front view of the input/output band section 11 when a polysilicon resistor 20' is inserted between the sections (40).

この発明のCMOSインバータ回路では、従来、バッド
1のほかに入出力回路の一部として組み込まれていた入
力保護回路9、および保護回路である出カバソファ10
か、パッド11IL下の空間領域に置換されたこと釦よ
り、四路は効率的になり、チップサイズは大幅に縮小さ
れる。また、タイオード自体は従来よりも保護タイオー
ドとしての面状か大きくなり、従来のものよりも耐圧か
上かり+1ii段に設置していた抵抗体2のよ5な保護
抵抗ケ押入する必要もな(なる。
In the CMOS inverter circuit of the present invention, in addition to the pad 1, an input protection circuit 9, which has been conventionally incorporated as a part of the input/output circuit, and an output cover sofa 10, which is a protection circuit.
Furthermore, since the button is replaced in the space area under the pad 11IL, the four paths become more efficient and the chip size is significantly reduced. In addition, the surface of the diode itself as a protective diode is larger than that of the conventional one, and the withstand voltage is higher than that of the conventional one, so there is no need to insert a protective resistor such as the resistor 2 installed in the +1II stage ( Become.

なお、第5図のようにバッド1がタイオード3゜4との
コンタクト上にならないように2つのコンタクトをバッ
ド1の外部に比較的小さくもうけるように工夫しである
As shown in FIG. 5, two relatively small contacts are provided outside the pad 1 so that the pad 1 does not come into contact with the diode 3.4.

なお、この発明はMO8集槙回メロにおける人出力保睦
回路をパッド直下に&V(することで、チップサイズの
縮小比および回路の効率化ケはかることを例にとって説
明したか、入出力保護回路にかぎらずパッド直下の空間
領域ケ利用することかできる他の半導体回路にも通用で
きることはいうまでもない。
In addition, this invention has been explained by taking as an example the fact that by placing the output protection circuit directly under the pad in the MO8 collection, the input/output protection circuit is Needless to say, the present invention is applicable not only to other semiconductor circuits but also to other semiconductor circuits that can utilize the space area directly under the pad.

〔発明の効果〕〔Effect of the invention〕

以上詳細に説明したよう圧、この%明はMO8集積回路
の外部接続リード増量しバッドの下層領域にダイオード
またはダイオードと抵抗体からなる入出力保腹回路乞形
成したので、従来利用されていなかったバッドは下の空
間領域ケ冥用領域とすることかでき、回路の効率化やチ
ップサイズの縮小化ケはかることかでき、無駄のない回
路構成か得られる効果ヲJKする。
As explained in detail above, this method has not been used in the past because it increases the number of external connection leads of the MO8 integrated circuit and forms an input/output voltage insulating circuit consisting of a diode or a diode and a resistor in the lower layer area of the pad. The pad can be used as a storage area for the lower space area, which can improve circuit efficiency and reduce chip size, and has the effect of achieving a lean circuit configuration.

【図面の簡単な説明】[Brief explanation of drawings]

第1図ミニ従来のcMos信成の人力ハラフッ回路図、
第2図は第1図の保護回路部分のパターンを示す図、#
g3図は第2図のIt −ft mKよる防向拡大図、
第4図はこの発明の一実施例のパターンケ示す図、第5
図は第3図の1−1 mによる1θI面拡大図、第6図
はこの発明による入カハッフ7回路図、第7図は第6図
の狭部の断面拡大図、第8図はこの光間の他の実211
i1例のパターンをボす図である。 図中、1はパッド、2は抵抗体、3,4はタイオード、
5,7はPチャンネルA10Sトラノジスタ、6,8は
NチャンネルMO3)ランジスタ、9は入力保鰻回路、
10は出力ハック7.11は入出力パッド部、12は電
源端子、13は接地端子である。 なお、図中の同一符号は同一または相当部分を示す。 代理人 大 岩 増雄 (外2名) 第1図 第4図 旧 第3図 第6図 L j 第7図 第8図 11 手わ“、補止古(1,1発) 1、事件の表示 14願昭59−104934号2、発
明の名称 ’l” j’X体9.4I°」回路3、補正
をする者 事件との関係 特許出願人 住 所 東京都千代EB区丸の内−利士2番3シ)名 
称 (601)三菱電機株式会社 代表者片山仁八部 4代理人 5、油止の対象 明細書の発明の、XT細な、i9明の欄および図面6、
補正の内容 (1) 明細書第2010打の「bはアルミニウム電極
Jを、[bはアルミニウム電極および配線」と袖+]す
る。 (2)同じく第3頁5〜6省1の「量水しない出力保護
回路」を、「出力保護回路(第6図の10)」 と袖l
l:する。 (3) 同じく第3頁17行のrバット的ド」を、「パ
ット1の直下」と補iEする。 (4) 同じく第4頁13行の「・・・・・・入れであ
る。 」の次に、r70.80はMOSトランジスタである。 」を加入する。 (5)同じく第4頁5行、20行の「アルミニウム電極
b」を、それぞれ「アルミニウム電極および配線b」と
補止する。 (6)図面第3図と第7図を別紙のように補正する。 以上 第3図 第7図
Figure 1 Mini conventional cMos Nobunari human power circuit diagram,
Figure 2 is a diagram showing the pattern of the protection circuit part in Figure 1, #
Figure g3 is an enlarged view of the defense by It-ft mK in Figure 2,
FIG. 4 is a diagram showing a pattern of an embodiment of the present invention, and FIG.
The figures are an enlarged view of the 1θI plane taken at 1-1 m in Fig. 3, Fig. 6 is an input huff 7 circuit diagram according to the present invention, Fig. 7 is an enlarged cross-sectional view of the narrow part of Fig. 6, and Fig. 8 is an enlarged view of this light beam. Other fruit between 211
It is a figure showing the pattern of example i1. In the figure, 1 is a pad, 2 is a resistor, 3 and 4 are diodes,
5 and 7 are P-channel A10S transistors, 6 and 8 are N-channel MO3) transistors, 9 is an input protection circuit,
10 is an output hack 7. 11 is an input/output pad section, 12 is a power supply terminal, and 13 is a ground terminal. Note that the same reference numerals in the figures indicate the same or corresponding parts. Agent Masuo Oiwa (2 others) Figure 1 Figure 4 Old Figure 3 Figure 6 L j Figure 7 Figure 8 Figure 11 Hands, supplementary old (1,1 shot) 1. Indication of the incident 14 Application No. 59-104934 2, Name of the invention 'l'j' Number 3 shi) name
(601) Mitsubishi Electric Co., Ltd. Representative Hitoshi Katayama 4 Agent 5, XT details, i9 light column and drawing 6 of the invention in the subject specification of Yushi,
Contents of amendment (1) In line 2010 of the specification, "b stands for aluminum electrode J, [b stands for aluminum electrode and wiring"]. (2) Similarly, the "output protection circuit that does not discharge water" in section 1 of page 3, sections 5-6, was changed to "output protection circuit (10 in Figure 6)".
l: Yes. (3) Similarly, on page 3, line 17, the word ``r bat-like do'' is supplemented with ``directly below putt 1''. (4) Similarly, on page 4, line 13, next to ``...is inserted.'', r70.80 is a MOS transistor. ” to join. (5) Similarly, "aluminum electrode b" in lines 5 and 20 of page 4 are supplemented with "aluminum electrode and wiring b," respectively. (6) Correct the figures 3 and 7 as shown in the attached sheet. Above Figure 3 Figure 7

Claims (1)

【特許請求の範囲】[Claims] MO3集槓目積の外部接続リード取出しパッドの下層領
域にタイオードまたはダイオードと抵抗体からなる入出
力保護回路を形成したことt%徴とする半導体Vat回
路。
A semiconductor Vat circuit characterized in that an input/output protection circuit consisting of a diode or a diode and a resistor is formed in the lower region of the external connection lead extraction pad of the MO3 integrated circuit.
JP59104934A 1984-05-22 1984-05-22 Semiconductor integrated circuit Pending JPS60246668A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59104934A JPS60246668A (en) 1984-05-22 1984-05-22 Semiconductor integrated circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59104934A JPS60246668A (en) 1984-05-22 1984-05-22 Semiconductor integrated circuit

Publications (1)

Publication Number Publication Date
JPS60246668A true JPS60246668A (en) 1985-12-06

Family

ID=14393922

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59104934A Pending JPS60246668A (en) 1984-05-22 1984-05-22 Semiconductor integrated circuit

Country Status (1)

Country Link
JP (1) JPS60246668A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0337482A2 (en) * 1988-04-14 1989-10-18 Kabushiki Kaisha Toshiba Semiconducteur protection device
JPH02501696A (en) * 1987-10-19 1990-06-07 ユニシス・コーポレーション Virtual ESD protection circuit using electric field congestion
DE4336562A1 (en) * 1993-10-27 1995-05-04 Itt Ind Gmbh Deutsche Short-circuit structure for CMOS circuits
US5923048A (en) * 1996-05-30 1999-07-13 Nec Corporation Semiconductor integrated circuit device with test element
WO2000019222A3 (en) * 1998-09-30 2000-06-08 Siemens Ag Semiconductor switching circuit with an integrated self-testing circuit

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02501696A (en) * 1987-10-19 1990-06-07 ユニシス・コーポレーション Virtual ESD protection circuit using electric field congestion
JPH0553304B2 (en) * 1987-10-19 1993-08-09 Unisys Corp
EP0337482A2 (en) * 1988-04-14 1989-10-18 Kabushiki Kaisha Toshiba Semiconducteur protection device
US5148249A (en) * 1988-04-14 1992-09-15 Kabushiki Kaisha Toshiba Semiconductor protection device
DE4336562A1 (en) * 1993-10-27 1995-05-04 Itt Ind Gmbh Deutsche Short-circuit structure for CMOS circuits
US5923048A (en) * 1996-05-30 1999-07-13 Nec Corporation Semiconductor integrated circuit device with test element
WO2000019222A3 (en) * 1998-09-30 2000-06-08 Siemens Ag Semiconductor switching circuit with an integrated self-testing circuit

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