JPS6024378A - Mass production type decomposing device by glow discharge - Google Patents

Abstract

PURPOSE:To form efficiently an amorphous layer having uniform quality on a substrate by disposing concentrically a cylindrical outside electrode plate having a triple construction and a cylindrical inside electrode plate, providing the substrate between both electrode plates and performing the supply, diffusion and suction of gas with the electrodes. CONSTITUTION:A cylindrical outside electrode plate 10 having a triple construction is constituted of an electrode plate 12 for ejecting gas provided uniformly with plural ejecting holes 18, an electrode plate 13 for diffusing gas provided uniformly with plural diffusing holes 19 and an electrode plate 14 for a circumferential wall constituting the outside wall of a reaction chamber 9. An inside electrode plate 11 provided uniformly with plural suction holes 20 is concentrically disposed at the center thereof. Plural photosensitive drums 8 are installed uniformly between the plates 10 and 11 and gaseous raw material is introduced through an introducing pipe 15 into the reaction chamber 9 and is directed toward the central axis of the chamber 9 through the plates 13, 13. An amorphous layer is formed on the surface of each drum 8 and the gas is sucked through the suction holes 20 of the plate 11. The amorphous layer having uniform quality is thus formed.

Description

[Detailed description of the invention] The present invention relates to an improvement in a mass-produced glow discharge decomposition device.

Recently, amorphous (non-crystalline) 4J tt color photoelectric parts such as amorphous silicon (hereinafter abbreviated as ε, -Si) have been used in electrophotographic photoreceptors, solar cells, optical sensors, etc. It is attracting a lot of attention because it has advantages such as high charging suitability and the ability to efficiently produce an amorphous film. For example, in the field of electrophotographic photoreceptors, a-Si
By using this as a photocarrier generation layer and using glow discharge decomposition rules for film formation, a photoreceptor with high quality has been obtained.

However, in mass-produced glow discharge decomposition equipment that forms films on multiple substrates in one operation, not only is the efficiency of using the introduced gas inefficient, but the amount of gas ejected to each substrate is uneven. As a result, quality deposits are observed in each of the photoreceptors produced, resulting in problems such as a decrease in the b-point production yield and a decrease in the reliability of the photoreceptor.

That is, as shown in Fig. 1, in a conventional mass-produced glow discharge decomposition device using a capacitively coupled glow discharge method, a glow discharge electrode plate (2) of a predetermined shape is formed in one reaction chamber (1). - A plurality of photoreceptor drums (3
) are respectively gas ejection parts (4a) (4b) (4c) (
4d) and gas suction part (sa) (5b) (50)
When electric power is applied to the gas flow state created during (5a), Qi is driven to rotate while being aligned with this Tii electrode plate (2), and is further connected to the electrode plate (2) by a high frequency power source (6). An a-Si layer was formed on the photoreceptor 1' ram (3).

However, in the above-mentioned mass-produced device, the electrode plate (2) takes up its own space in the reaction chamber (1), and therefore the volumetric force of the reaction chamber (1) is As the grain size increased, extra gas had to be introduced into the reaction chamber (1).

In addition, each gas ejection part (4a
) to (4α), so depending on the gas flow rate and the shape of the gas piping, each gas jetting part (4a)
) to (4d) do not necessarily eject the same amount of gas, and as a result, the gas density and film formation nuvides of n) increase between the drums in the reaction chamber, and the layer thickness and doping of the a-Si layer increase. There was a difference in quality between drums 411 and 411.

Therefore, the purpose of the present invention is to increase the utilization efficiency of the introduced gas and to make the amount of gas ejected to each substrate approximately equal.
As a result, it is possible to provide a sewing mold raw discharge disassembly machine that can make the quality of each layer (amorphous on a plate) uniform and improve manufacturing yield and reliability of the amorphous layer. It's about doing.

According to the present invention, in order to achieve the above object, a gas is provided at a predetermined interval in the reaction chamber into which the amorphous layer forming gas is introduced, and the gas is diffused into the reaction chamber. -1, (↓An external electrode plate consisting of a plurality of electrode plates with several gas passage holes arranged in a group, and a cylindrical internal electrode plate having a gas suction part are arranged concentrically. , both electrode plates face each other via a plurality of cylindrical substrates having surfaces for forming an amorphous layer, and an amorphous layer is formed on the surface of the substrate by glow discharge generated in the reaction chamber. A mass-produced glow discharge decomposition device is provided.

Hereinafter, the present invention will be explained in detail by taking as an example the cost of disassembling glow discharge for forming an a-Si layer on a photoreceptor drum.

Figure 2 shows that a-
3i [by a capacitive coupling method that does not require stratification.

Cylindrical reaction chamber (9) in a mass-produced glow discharge decomposition device
), in the same figure, (10) is a cylindrical external electrode plate made of triple 1t'J construction, (111 is a cylindrical internal electrode plate, and both electrode plates (101flll are concentric circles). It is located.

The external electrode plate 0■ is connected to the gas injection mold 4' from the inside of the plate 1.
121, gas diffusion electrode plate 1311 and reaction chamber (
9) consists of a peripheral wall electrode plate (14) constituting the outer wall of
They are successively arranged around the circumference at intervals with appropriate spacers (not shown).

If the peripheral wall electrode plate (141) is also used as the outer wall of the reaction chamber (9), the space required for attaching the electrodes is not required, the volume of the reaction chamber (9) can be reduced, and the efficiency of introducing gas can be increased. It is preferable that the peripheral wall electrode plate 04) does not need to replace the entire peripheral wall of the reaction chamber (9), and the cost incurred due to the generation of extra glow discharge can be ignored. You may replace it with

Gas 11N output power (back plate (121 and old internal electrode plate)
In between, eight photoreceptor drums (8) are arranged at each vertex of a regular octagon so that each photoreceptor drum (8)
) is 6 days! There are now 17 locations in 5 wards.

The electrode plates 1 (121 + 131 + 141) are electrically connected to have the same potential and are applied from an external high-frequency power source (not shown). 8) surface and internal mold (
G plate ([11 and F, glow discharge occurs between the surfaces of the light drum (8), and no glow discharge occurs between the electrode plates +t21++3+a41, so there is no wasteful consumption of power, and the electrode A uniform high-frequency electric field is generated inside the reaction chamber (9) without disturbing the original low discharge generated between the plate (11) (121) and the photoreceptor drum (8).

− gas supply source (not shown) is common to the tube (not shown)
It is connected to the 77% human tube (151) which is branched into 4 trees through the Four inlets (16
) are connected to each of the (;4).

An insulating ring (171) is connected to the end where the introduction pipe 09 is connected to the inlet (Llil), and an electrode plate (1
The leak and the 2a entry pipe +t51 are insulated.

The gas ejection electrode plate (12) and the gas diffusion "quasi-diffuse plate (131) each have a plurality of ejection holes (181 and enlarged ff'j holes (I9) uniformly distributed over the entire surface of each plate. It has been set up.

The injection hole (l&) and the diffusion hole (Igl) can both be of any shape such as circular or square, and the diameter or size of each hole and the number of holes are determined by the injection hole (Igl) and the diffusion hole (Igl).
The a-Si layer forming gas introduced into the rH4
'fA plate (12) When passing through the ejection holes 0&, the gas is sufficiently diffused and the gas ejection electrode plate (12) is appropriately set so that the gas is ejected substantially uniformly over the entire surface. For example, if the nozzle a & and the diffusion jL +1!1 are circular, the nozzle diameter of the nozzle 1.18I should be between 0.5 and 2, and the diameter of the diffusion hole (+91) between 1 and 4. (18
It is preferable to enlarge the hole diameter of 1 and make it smaller than the hole 11 ([! Hole (
18) are preferably provided over the entire surface of the gas ejection electrode plate t121 at intervals of 511 m to I Cm.

In this way, the gas forming the Si layer is introduced into the reaction chamber (9) through the core entry tube (151) for gas diffusion.
Since diffusion progresses significantly through the fi plate (13),
A substantially equal amount of gas is ejected over the entire plate surface from the gas ejection electrode plate (121) toward the central axis of the reaction chamber (9), and is exposed to glow discharge.

On the other hand, the cylindrical internal electrode plate 1 is provided with a plurality of suction hole rows over the entire plate surface.

It is preferable that this suction hole QO is provided with the same hole diameter and density as the ejection hole (+81).The internal electrode plate (lυ is a gas suction rotary pump (not shown) as shown in FIG. 3).
The gas suction pipe (20) connected to the gas suction pipe (20) is introduced from above or below, and the open end of the gas suction pipe (21)
When 2 is placed 11t on the central axis of the internal electrode plate (1, 11), the residual gas is evenly sucked inward from the suction hole C2υ of the internal electrode plate (old internal electrode plate) over its entire circumferential surface. become.

In this way, when gas is sucked from the cylindrical internal electrode plate placed at the center of the reaction chamber (8), a uniform high-frequency electric field is generated in the glow discharge area, and the reaction chamber (9)
), a uniform gas flow is created around all the photoreceptor drums (8), and a homogeneous a-8iK1 is formed.

Furthermore, two or more gas diffusion electrode plates may be provided in order to cause the gas introduced into the reaction chamber (9) to be ejected from the gas ejection electrode plate 1121 in a -JΔ diffused state.

As described above, according to the mass-produced glow discharge decomposition apparatus of the present invention, which forms films on multiple substrates in a single operation, in addition to increasing the utilization efficiency of the introduced gas, the glow discharge area becomes a uniform high-frequency electric field. In addition, a uniform gas flow condition is created around each substrate, and as a result, a homogeneous amorphous layer is formed on each substrate, resulting in a marked improvement in manufacturing yield and a highly reliable and excellent Amorphous P'd is obtained.

Note that the present invention is not limited to the examples, and can be applied to any glow discharge decomposition device that is equipped with an internal glow discharge electrode (7 plates) and forms an amorphous layer on a plurality of substrates. Those skilled in the art will easily understand that this applies to

[Brief explanation of the drawing]

Fig. 1 is a schematic section 1 showing a conventional mass-produced glow and discharge decomposition device, Fig. 2 is a cutaway cross-sectional view of a reaction chamber used in an embodiment of the present invention, and Fig. 3 is a gas suction i'g of the present invention. '3.4': □
It is 1 with a perspective view showing 'j. 3.8... Photosensitive drum, 10... External electrode plate, 1
1... Internal electrode plate, 12. Polarization plate for gas jetting, 13
...Electrode plate for gas diffusion, 14...1M wall electrode plate Applicant: Kyocera Corporation Takao Kawamura Figure 1 Figure 2 1θ

Claims (3)

[Claims] (1) Inside the reaction chamber into which the amorphous layer forming gas is introduced,
an external electrode plate consisting of a plurality of electrode plates provided at predetermined intervals and having a plurality of gas passage holes through them so that the gas introduced into the reaction chamber is diffused into the reaction chamber; cylindrical internal electrode plates having a cylindrical inner electrode plate are arranged concentrically, and both electrode plates face each other via a plurality of cylindrical substrates having surfaces for forming an amorphous layer, and the glow generated in the reaction chamber is A mass-produced glow discharge decomposition device that generates amorphous H on the surface of the substrate by electric discharge. (2) Among the plurality of external electrode plates, the size of the gas passage hole provided in the electrode plate placed on the inside is made smaller than the gas passage hole provided in the electrode plate placed on the outside. A mass-produced glow discharge decomposition device according to claim 1, characterized in that: (3) Among the plurality of external electrode plates, the number of gas passage holes provided in the electrode plate placed on the inside is greater than the number of gas passage holes provided in the electrode plate placed on the outside. A mass-produced glow discharge decomposition apparatus according to claim 1, characterized in that the glow discharge decomposition device has a large number of oxidants.