JPS60237638A - Production of thin film type magnetic recording medium - Google Patents

Production of thin film type magnetic recording medium

Info

Publication number
JPS60237638A
JPS60237638A JP9372784A JP9372784A JPS60237638A JP S60237638 A JPS60237638 A JP S60237638A JP 9372784 A JP9372784 A JP 9372784A JP 9372784 A JP9372784 A JP 9372784A JP S60237638 A JPS60237638 A JP S60237638A
Authority
JP
Japan
Prior art keywords
gas
vapor deposition
magnetic
thin film
magnetic recording
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9372784A
Other languages
Japanese (ja)
Other versions
JPH0458655B2 (en
Inventor
Kazumine Itou
和峰 伊東
Takahiro Kawana
隆宏 川名
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP9372784A priority Critical patent/JPS60237638A/en
Publication of JPS60237638A publication Critical patent/JPS60237638A/en
Publication of JPH0458655B2 publication Critical patent/JPH0458655B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE:To enable formation of a thin magnetic metallic film having the magnetic characteristic uniform on each part by providing a specifically constituted means for introducing gas near a vapor deposition region and supplying uniformly the gas during vapor deposition. CONSTITUTION:The means for introducing gas provided near the vapor deposition region is constituted of a tubular body 7 provided with plural gas releasing ports 6 and a tubular member 8 provided with a slit 9 having a prescribed width on the side opposite from the ports 6. Vapor deposition is executed while the gas such as oxygen is uniformly ejected in the transverse direction of a non-magnetic substrate. The thin magnetic metallic film having the magnetic characteristic uniform in each part is formed on the non-magnetic substrate.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は、非磁性支持体上に金属磁性薄膜を被着形成し
てなるS膜量磁気記録媒体の製法に関する。
DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a method for manufacturing a magnetic recording medium having an S film content, which is formed by depositing a metal magnetic thin film on a non-magnetic support.

背景技術とその問題点 近年、磁気記録の高密度化の目的で、非磁性支持体上に
、真空蒸着等の方法により数百人〜略lμの厚みの金属
磁性薄膜を形成させた薄膜型の磁気記録媒体について研
究が盛んである。このような薄膜型磁気記録媒体におい
て、高い抗磁力Hcを有する金属磁性薄膜を得る方法と
して、蒸着時にその蒸着領域に対して酸素ガスを吹き付
ける方法が提案されている。
BACKGROUND TECHNOLOGY AND PROBLEMS In recent years, for the purpose of increasing the density of magnetic recording, thin-film type magnetic thin films have been developed, in which a metal magnetic thin film with a thickness of several hundred to about 1μ is formed on a non-magnetic support by a method such as vacuum evaporation. Research on magnetic recording media is active. As a method for obtaining a metal magnetic thin film having a high coercive force Hc in such a thin film magnetic recording medium, a method has been proposed in which oxygen gas is sprayed onto the deposition region during deposition.

従来、かかる酸素ガスの供給は第1図に示すように非磁
性支持体の中方向に対応して管側壁に所定間隔でガス放
出口(1)を設けたガス導入管(2)を配し、このガス
導入管(2)に導入した酸素ガスを、ガス放出口+1)
より吹き出させて蒸着領域に供給するようになしている
。しかるに図示のようにガス導入管(2)の片側から@
素ガス(3)を導入した場合、どうしても非磁性支持体
の中方向に関して曲il! (1)で示すように吹き出
すガス比に分布ができ、極近傍で見た場合、酸素ガス量
がガス導入側より漸次減少する。このため非磁性支持体
上に被着形成された金属磁性vtllN!は、その非磁
性支持体のi1方向に関して抗磁力Heに大きなバラツ
キが生ずる慣れがあった。
Conventionally, such oxygen gas was supplied by arranging a gas inlet pipe (2) with gas discharge ports (1) provided at predetermined intervals on the side wall of the pipe corresponding to the inside of a non-magnetic support as shown in FIG. , the oxygen gas introduced into this gas inlet pipe (2) is transferred to the gas outlet +1)
The gas is blown out and supplied to the vapor deposition area. However, as shown in the figure, from one side of the gas introduction pipe (2) @
When elementary gas (3) is introduced, it is inevitable that there will be a curve in the middle direction of the non-magnetic support! As shown in (1), there is a distribution in the ratio of gases blown out, and when viewed from the very vicinity, the amount of oxygen gas gradually decreases from the gas introduction side. For this reason, a metal magnetic vtllN! is deposited on a non-magnetic support. used to have large variations in coercive force He in the i1 direction of the nonmagnetic support.

発明の目的 本発明は、上述の点に鑑み、蒸着時に非磁性支特休の中
方向に均一にガスを吹き出して各部均一な磁気特性を有
する金属磁性薄膜を形成できるようにした薄膜型磁気記
録媒体の製法を提供するものである。
Purpose of the Invention In view of the above-mentioned points, the present invention provides a thin-film magnetic recording device which enables the formation of a metal magnetic thin film having uniform magnetic properties in each part by uniformly blowing out gas in the direction of the non-magnetic support layer during vapor deposition. The present invention provides a method for producing a medium.

発明の概要 本発明は、所定の間隔で複数のガス放出口を有したガス
を導入する第1の管と、ガス放出口側を囲む様にガス溜
めを形成し第1の管と所定の間隔のスリットを形成する
部材とよりなるガス導入手段を、蒸着領域近傍に配して
蒸着時にガスを蒸着領域に導入するようになすものであ
る。
Summary of the Invention The present invention includes a first pipe for introducing gas having a plurality of gas discharge ports at predetermined intervals, a gas reservoir formed to surround the gas discharge port side, and a gas reservoir formed at a predetermined interval from the first pipe. A gas introducing means comprising a member forming a slit is disposed near the vapor deposition region to introduce gas into the vapor deposition region during vapor deposition.

この製法によれば、非磁性支持体の中方向に均一にガス
が吹き出して各部均一な磁気特性の金属磁性薄膜か形成
される。
According to this manufacturing method, gas is blown out uniformly in the direction of the non-magnetic support, forming a metal magnetic thin film having uniform magnetic properties in all parts.

実施例 以)、図面を参照して本発明の詳細な説明する。Example Hereinafter, the present invention will be described in detail with reference to the drawings.

本例では第2図及び第3図に示す如きガス導入手段(4
)が設けられる。このガス導入手段(4)は、複数のガ
ス放出口(6)を有したガスを導入する管体(7)と、
この管体(7)をそのガス放出口(6)の形成される範
囲にわたって気密的に取り囲む管部材(8)とによって
構成される。この場合、管体(7)は断面円形となされ
、管部材(8)は断面楕円形となされる。管体(7)の
複数のガス放出口(6)は、管軸方向に沿って例えば等
間隔に形成される。管部材(8)においては、複数のガ
ス放出口(6)とは反対側にガスを外部に放出するため
のスリット状の開口(9)が設けられ、この開口(9)
の中りは後述する非磁性支持体の中以上とされる。管部
材(8)内においては、管体(7)を挾んでガス放出口
(6)側にこれを取り囲むように第1のガス溜めaのが
形成され、反対の開口(9)側に第2のガス溜め(11
)が形成される。そして、両ガス溜め0ωと(11)の
中間部に管体(7)と管部材(8)との間で所定間隔の
スリン)、(12)が形成される。
In this example, the gas introduction means (4
) is provided. The gas introducing means (4) includes a gas introducing pipe body (7) having a plurality of gas discharge ports (6);
The pipe member (8) hermetically surrounds the pipe body (7) over the area where the gas discharge port (6) is formed. In this case, the tube body (7) has a circular cross section, and the tube member (8) has an elliptical cross section. The plurality of gas discharge ports (6) of the tube body (7) are formed, for example, at equal intervals along the tube axis direction. In the pipe member (8), a slit-shaped opening (9) for releasing gas to the outside is provided on the opposite side from the plurality of gas discharge ports (6), and this opening (9)
The medium is said to be larger than the medium of the non-magnetic support described later. In the pipe member (8), a first gas reservoir a is formed to sandwich the pipe body (7) and surround it on the gas discharge port (6) side, and a first gas reservoir a is formed on the opposite opening (9) side. 2 gas reservoirs (11
) is formed. And, in the middle part of both gas reservoirs 0ω and (11), a sulin (12) is formed at a predetermined interval between the tube body (7) and the tube member (8).

このガス導入手段(4)では第4図に示すように、管体
(7)内に一方の側からガス(3)が導入されると、こ
のガス(3)は管体(7)のガス放出口(6)から第1
のガス溜めαψに放出される。放出時のガス圧分布は第
1図で説明したと同様にガス放出口(6)の位置近傍に
ピークをもった中方向に不均一な分布となる。
In this gas introduction means (4), as shown in FIG. From the discharge port (6) to the first
is released into the gas reservoir αψ. The gas pressure distribution at the time of discharge becomes a non-uniform distribution in the middle direction with a peak near the position of the gas discharge port (6), as described in FIG. 1.

第1のガス溜めaΦに噴出された後、ガス(3)は管体
(7)及び管部材(8)間のスリット(12)を通って
第2のガス溜め(11)に至る。この過程にお゛いてス
リット(12)の間隔は極めて狭く、スリット(12)
をガス流が通りにくくなるため、ガス流は第1のガス溜
めaω内で中方向(管体(7)の管軸方向)に運動を始
める。これにより第1のガス溜めαのでのガス分布は均
一となり、第2のガス溜め(11)からスリット状の開
口(9)を通って噴出されるガスは中方向で完全に均一
となる。
After being ejected into the first gas reservoir aΦ, the gas (3) passes through the slit (12) between the tube body (7) and the tube member (8) and reaches the second gas reservoir (11). In this process, the interval between the slits (12) is extremely narrow, and the slits (12)
Since it becomes difficult for the gas flow to pass through, the gas flow starts to move in the middle direction (in the tube axis direction of the tube body (7)) within the first gas reservoir aω. As a result, the gas distribution in the first gas reservoir α becomes uniform, and the gas ejected from the second gas reservoir (11) through the slit-shaped opening (9) becomes completely uniform in the middle direction.

なお、上例の構成においてスリット(12)よりのガス
(3)は中方向に均一な圧力をもって噴出するので、原
理的には第2のガス溜め(il)及び開口(9)を省略
し、スリット(12)が外部に臨むような構成とするこ
ともできる。
In addition, in the configuration of the above example, the gas (3) from the slit (12) is ejected in the middle direction with uniform pressure, so in principle, the second gas reservoir (il) and the opening (9) can be omitted. It is also possible to have a configuration in which the slit (12) faces the outside.

また、上例では所謂2重管構造としたが、2重管構成で
ある必要もなく、又2重管であっても管部材(8)が断
面楕円形であるa−要もなく、形状は適宜変更し得るも
のである。
In addition, although the above example has a so-called double pipe structure, it is not necessary to have a double pipe structure, and even if the pipe member (8) is a double pipe, there is no need for the pipe member (8) to have an elliptical cross section. can be changed as appropriate.

而して本例では上述のガス導入手段(4)を第5図に承
ずlI稗梨型磁気記録媒体の製造に用いる蒸着装置(2
0)内に配置する。この蒸着装置(20)は、真空チャ
ンバー(21)内に金属キャン(22)が設けられ、こ
れを縞って非磁性支持体(23)が供給リール(24)
から巻取リール(25)に移送するように配される。一
方金属キャン(22)に対向する下方に金属磁性材料例
えばCo、 Fe、 Ni或はそれらの合金等の蒸着源
(26)が配置される。蒸着源(26)と非磁性支持体
(23)間には金属蒸気流を遮蔽するシャッター(27
)が配され、このシャッター(27)によって蒸着源(
26)から蒸発した金属磁性粒子が非磁性支持体(23
)上に所定の入射角をもって斜め蒸着される。この非磁
性支持体(23)の蒸着領域に近接した位置に、ガス導
入手段(4)がそのスリット状の開口(9)の長さ方向
を非磁性支持体(23)の111方向と一致する如く配
され、このガス導入手段(4)を通じて酸素ガスが蒸着
領域に均一に供給される。(28)は酸素ガス供給弁、
(29)は真空チャンバーの排気弁である。
In this example, the above-mentioned gas introduction means (4) is replaced by a vapor deposition apparatus (2) used for manufacturing a lI cylindrical magnetic recording medium as shown in FIG.
0). This vapor deposition apparatus (20) has a metal can (22) provided in a vacuum chamber (21), and a non-magnetic support (23) is attached to a supply reel (24) by striping the metal can (22).
from there to the take-up reel (25). On the other hand, a vapor deposition source (26) of a metal magnetic material such as Co, Fe, Ni, or an alloy thereof is arranged below the metal can (22). A shutter (27) is provided between the vapor deposition source (26) and the non-magnetic support (23) to block metal vapor flow.
) is arranged, and the vapor deposition source (
The metal magnetic particles evaporated from the non-magnetic support (23)
) at a predetermined angle of incidence. At a position close to the vapor deposition area of this non-magnetic support (23), a gas introduction means (4) is arranged so that the length direction of its slit-shaped opening (9) coincides with the 111 direction of the non-magnetic support (23). Oxygen gas is uniformly supplied to the deposition region through the gas introducing means (4). (28) is an oxygen gas supply valve;
(29) is the exhaust valve of the vacuum chamber.

ルrる構成によれば、金属磁性材料の蒸着時にガス導入
手段(4)を通じて所定量の酸素ガスが蒸着領域に供給
され、この#l素ガスは非磁性支持体(23)の中方向
に関して均一に供給される。従って、各部間条件の雰囲
気中で金属磁性nが形成されるので、その磁性11膜の
抗磁力Heは各部均一となり、抗磁力Hcにバラツキの
ない商品質のW#験梨型磁気記録媒体得られる。また上
例のガス放出手段(4)では、スリット状の開口(9)
の中dと肉厚tを調整することにより、ガスの長手方向
(放出方向)への分布も自由に制御できる。
According to this configuration, a predetermined amount of oxygen gas is supplied to the vapor deposition region through the gas introducing means (4) during vapor deposition of the metal magnetic material, and this #l elementary gas is supplied to the non-magnetic support (23) in the middle direction. Evenly distributed. Therefore, since the metal magnetic n is formed in the atmosphere under the conditions between each part, the coercive force He of the magnetic 11 film is uniform in each part, and a commercial quality W# pear-shaped magnetic recording medium with no variation in coercive force Hc can be obtained. It will be done. Further, in the gas release means (4) of the above example, the slit-shaped opening (9)
By adjusting the medium d and the wall thickness t, the distribution of gas in the longitudinal direction (release direction) can also be freely controlled.

尚、上例では酸素ガスを供給する場合について述べたが
、他の所要ガスを供給する場合にも適用できる。
Although the above example describes the case where oxygen gas is supplied, the present invention can also be applied to the case where other required gases are supplied.

発明の効果 本発明によれば、所定の間隔で袂数のガス放出口を有し
たガスを導入する第1の管と、ガス放出口側を囲む様に
ガス溜めを形成し第1の管との間で所定の間隔のスリッ
トを形成する部材とよりなるガス導入手段を用いること
により、中方向に均一にガスを吹き出すことができる。
Effects of the Invention According to the present invention, a first pipe into which gas is introduced has a number of gas discharge ports at predetermined intervals, and a first pipe having a gas reservoir formed so as to surround the gas discharge port side. By using a gas introduction means made of a member that forms slits at predetermined intervals between the two, gas can be uniformly blown out in the middle direction.

従って、このガス導入手段によゲζ蒸着時に所定ガスを
蒸着領域に導入することにより、各部均一の磁気特性を
有する金属磁性薄膜が形成され、磁気特性にバラツキの
ない薄膜型磁気記録媒体を製造することができる。
Therefore, by introducing a predetermined gas into the evaporation region during the ζ vapor deposition using this gas introduction means, a metal magnetic thin film having uniform magnetic properties in each part is formed, and a thin film magnetic recording medium with uniform magnetic properties can be manufactured. can do.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来のガス放出手段の例を不す説明図、第2図
は本発明に適用されるガス放出手段の一例を承ず断面図
、第3図はその展開図、第4図は部分破断斜視図、第5
図は本発明に適用される蒸着装置である。 (4)はガス放出手段、(6)はガス放出口、(7)は
管体、(8)は管部材、(9)は開口、(IIは第1の
ガス溜め、(11)は第2のガス溜め、(12)はスリ
ット、(20)は蒸着装置、(23)は非磁性支持体、
(26)は金属磁性材の蒸着韓である。 第2図 第3図 第4図
Fig. 1 is an explanatory diagram excluding an example of a conventional gas emitting means, Fig. 2 is a cross-sectional view of an example of the gas emitting means applied to the present invention, Fig. 3 is an exploded view thereof, and Fig. 4 is an explanatory diagram showing an example of the gas emitting means applied to the present invention. Partially cutaway perspective view, No. 5
The figure shows a vapor deposition apparatus applied to the present invention. (4) is a gas discharge means, (6) is a gas discharge port, (7) is a tube body, (8) is a tube member, (9) is an opening, (II is a first gas reservoir, (11) is a first 2 gas reservoir, (12) slit, (20) vapor deposition device, (23) non-magnetic support,
(26) is a metal magnetic material vapor deposited plate. Figure 2 Figure 3 Figure 4

Claims (1)

【特許請求の範囲】[Claims] 所定の間隔で複数のガス放出口を有したガスを導入する
第1の管と、前記ガス放出口側を囲む様にガス溜めを形
成し前記第1の管と所定間隔のスリットを形成する部材
とよりなるガス導入手段が、蒸着領域近傍に配されて蒸
着時に所定ガスが蒸着領域に導入されることを特徴とす
る薄膜型磁気記録媒体の製法。
A first pipe for introducing gas having a plurality of gas discharge ports at predetermined intervals, and a member that forms a gas reservoir so as to surround the gas discharge port side and forms slits at predetermined intervals with the first pipe. A method for producing a thin film magnetic recording medium, characterized in that a gas introducing means consisting of the following is arranged near a vapor deposition region, and a predetermined gas is introduced into the vapor deposition region during vapor deposition.
JP9372784A 1984-05-10 1984-05-10 Production of thin film type magnetic recording medium Granted JPS60237638A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9372784A JPS60237638A (en) 1984-05-10 1984-05-10 Production of thin film type magnetic recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9372784A JPS60237638A (en) 1984-05-10 1984-05-10 Production of thin film type magnetic recording medium

Publications (2)

Publication Number Publication Date
JPS60237638A true JPS60237638A (en) 1985-11-26
JPH0458655B2 JPH0458655B2 (en) 1992-09-18

Family

ID=14090443

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9372784A Granted JPS60237638A (en) 1984-05-10 1984-05-10 Production of thin film type magnetic recording medium

Country Status (1)

Country Link
JP (1) JPS60237638A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01211322A (en) * 1988-02-19 1989-08-24 Sony Corp Production of perpendicular magnetic recording medium
JP2009084675A (en) * 2007-09-10 2009-04-23 Ulvac Japan Ltd Vapor-emitting device, apparatus for vapor-depositing organic thin film, and method for vapor-depositing organic thin film

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01211322A (en) * 1988-02-19 1989-08-24 Sony Corp Production of perpendicular magnetic recording medium
JP2009084675A (en) * 2007-09-10 2009-04-23 Ulvac Japan Ltd Vapor-emitting device, apparatus for vapor-depositing organic thin film, and method for vapor-depositing organic thin film

Also Published As

Publication number Publication date
JPH0458655B2 (en) 1992-09-18

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