JPS60234975A - Treatment of platelike body by immersion - Google Patents

Abstract

PURPOSE:To carry out inexpensive treatment giving high quality finish at a high treatment speed by holding platelike bodies to be treated in a carrier, immersing the carrier in a treating soln., and swinging the bodies in the treating soln. as though circular arcs are described. CONSTITUTION:Platelike bodies 1 to be treated are held in a carrier 4 attached to the tip of an arm 5, and the carrier 4 is immersed in a treating soln. in a treating tank 2 by a transferring means 7. A piston crank 11 is then driven by actuating a low-speed motor 10 to swing the arm 5 on a rotating shaft 6. The carrier 4 is swung in the treating soln. as through circular arcs are described, so the treating soln. is well stirred. The whole surface of each of the bodies 1 to be treated contacts uniformly with the treating soln. by stirring, and high quality finish is rapidly obtd.

Description

[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method for immersion treatment of plate-shaped objects such as semiconductor wafer fog light mask plates, printed circuit boards, and glass plates for liquid crystal displays. In particular, the present invention relates to a method for immersing a plate-shaped object in a processing liquid while swinging it in an arc. Note that the above-mentioned immersion treatment includes all kinds of treatment performed by immersing the object to be treated in a treatment liquid, such as cleaning, chemical coating, development, plating, and dyeing.

[Conventional technology and its problems]

Generally, in the 16-immersion process, the processing liquid in the processing tank does not stagnate locally, and all parts of the object to be processed are always in contact with fresh processing liquid, so that the entire surface of the object to be processed is uniform. This is an important matter that affects the quality improvement of the processed object and the processing speed by dipping treatment. Therefore, in the immersion tank -
If only the object to be treated is thrown in, the treatment liquid will partially stagnate, which is undesirable, so various measures have been taken in the past.

For example, in Utility Model Application Publication No. 53-7 (1872), a heavy roller with an elliptical cross section is connected to the outer periphery of the semiconductor wafer on a plurality of semiconductor wafer lower blades that are vertically supported in the processing liquid. A device is disclosed in which a semiconductor wafer is rotated and swung under F by installing rollers in contact with each other and rotating the rollers.As another known example,
For example, there is one disclosed in Japanese Patent Application Laid-Open No. 51-94769. In the publication, as shown in the third figure, a storage container (42) for semiconductor wafers (41) is attached to an eccentric cam (43).
) is disclosed.

As described above, immersion processing apparatuses have been known that perform predetermined processing while rocking the workpiece, but all of these conventional apparatuses simply swing the workpiece vertically (and downwardly). Since it only rotates within its own plane, the object to be processed must be moved down in the processing solution along that plane. Therefore, although the object to be processed is shaken, the contact resistance between it and the processing liquid is small (the processing liquid is not stirred much by the surface of the object to be processed, and it does not come into contact with the surface of the object to be processed). Currently, it is not possible to obtain the expected rocking effect because the exchange of liquid is relatively small.Furthermore, it is necessary to improve the rocking effect in these immersion processing devices that swing up and down. In order to achieve this, it is necessary to increase the swing stroke, but on the other hand, it is necessary to prevent even a part of the workpiece from being exposed from the surface of the processing liquid during the swing, and the water depth of the immersion tank must be increased by an amount commensurate with the swing stroke. If you can't hit it deeply, you will inevitably need a large I- treatment solution and the running cost will be 1 or 1 (very V point).

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It is an object of the present invention to provide a dipping treatment method that has high quality, high processing speed, and low running cost.

[11 Steps and Effects for Solving the Problems] The present invention provides a method for storing a plate-shaped object to be processed in a carrier and immersing the carrier in a processing liquid to perform a predetermined processing. For example, by making the arm rotatable by a predetermined angle about one end of the arm as the center of rotation, and causing the arm to make a so-called oscillating motion, the processing solution is strongly stirred in the processing tank. The apparatus is characterized in that the surface of the object to be treated is swung in an arc in order to forcibly replace the processing liquid in contact with the surface of the object to be treated, and therefore, the apparatus employing the present invention includes: A carrier that holds an object to be processed and, for example, a carrier that is installed so as to be able to rotate with one end of the carrier as the center of rotation, and that supports the carrier so that the surface of the object to be processed is perpendicular to the radial direction of rotation. It consists of an arm and a drive means for rotating this arm.Hereinafter, embodiments of the apparatus for carrying out the method according to the present invention will be described with reference to the drawings.

〔Example〕

FIG. 1 is a perspective view showing an embodiment of the apparatus for carrying out the method according to the present invention, in which the plate-shaped object to be processed (1) is, for example, a semiconductor wafer, and the processing tank (2) is made of, for example, resin. The processing liquid in the rectangular chemical bath is, for example, ultrapure water, and is an immersion device for performing a cleaning process by immersing the semiconductor wafer fi+ in the ultrapure water.

In the figure, the carrier (4) has a large number of ribs on at least the opposing inner walls, thereby vertically storing a plurality of objects to be processed (1), and allowing the processing liquid to flow through the required portions of the lower part of the carrier (4). It is a box with a cutout for
The arm (5) has a rotation axis (6) near one end thereof,
Conveyance - A rod-shaped body made of plastic, for example, which is attached to the 4th step (7), and is swung twice in the IF direction G on the other end side about the rotation axis (6). I:b
There is one that can move and rotate. In addition, the Gagaru conveyance means (
7) is a so-called transport port box that can move up and down as shown by the arrow (Δ) in the same figure, and can also move along a movement path installed along various processing tanks. ]. By appropriately driving this conveying means (7), the entire arm (5) can be moved to a desired processing tank or position. The operation is such that when the carrier (4) is put into the processing tank (2), the entire arm (5) descends, and when the immersion process is completed and the carrier (4) is taken out of the processing tank (2), the entire arm (5) rises. Thereafter, when it is necessary to immerse the material in another processing tank, it is moved to a predetermined processing tank. Further, as shown by the arrow (B,), a driving means is provided to rotate the arm (5) around the rotation axis (6), and it is fixed to the conveying means (7) as a driving source. It is composed of a low-speed motor OI and a piston crank (11) whose crankshaft is attached to the rotating shaft of the motor (+01) and whose -L end of the piston loft is engaged with the arm (5). There is.

By the way, the support part of the carrier (4) of this arm (5) is a hanger (4) with a finger hook (12) fixed downward at the tip of the arm (5) and protruding from the outer surface of the carrier (4). 13) so that the carrier (4) is removably fixed to the arm (5).

And, such a finger hook (12) is, for example,
Although it is made of a metal material whose surface is coated with a chemical-resistant resin, it goes without saying that other materials, shapes, and structures may be used. However, for example, a hook or the like can be hung on the tip.
1- A device that simply suspends the carrier (4), such as a long wire with a shell, is not preferable because the swinging motion of the arm (5) is not transmitted to the carrier (4). If the carrier (4) is supported by the arm (5), then at least the movement of the arm (5) has a key torism. Further, the object to be processed (1) has an arm (
The object to be processed il+ is placed on the carrier (4) in a direction that is important in the radial direction of the rotation of the arm (5), that is, in the embodiment as shown in FIG.
is held by. In addition, the object to be processed (1.1 is
It does not matter if it is held somewhat deviated from the orthogonal direction.

Figure 2 is a perspective view showing another embodiment of the apparatus for carrying out the method according to the invention. In this embodiment, the arm (20) is rotatable about a rotating shaft (21) provided at one end of the conveying means (7) in a plane perpendicular to the longitudinal direction of the conveying means (7). The driving means for the arm (20) includes a low-speed motor (23) fixed at a key point of the 119 feeding means (7), and a speed reduction mechanism (24) meshed with the rotating shaft of the motor (23). ), the rotary shaft (21) of the arm (20) is driven by the rotation of the shaft (23) at low speed, and the movement of the rotary shaft (21) swings the workpiece (11) in an arc shape. is configured to operate.

It goes without saying that the method according to the present invention is not limited to the first embodiment, but may also include the following embodiments.

For example, (a), the rotation axis (21) of the arm with respect to the vertical direction,
It is also possible to make the rotation flfi in a plane that is deviated from the plane that is important to the conveying means (7) for the names, angles, and angles (in the case of FIG. 2).

(bl) Instead of providing the rotating shaft at the end of A-1, it may be provided in the middle of the arm, and a so-called balance structure may be used in which carriers are provided at both ends of the arm.

fc) When performing only a single immersion treatment, the arm does not need to be installed on a conveying means such as a conveying robot as in the embodiment described in -1-, and the means for moving the arm may be installed in a processing tank, for example. It can be installed on the main body part of , etc. or other fixed part.

(d) The carrier may be detachable from the arm or may be fixed to the arm, as in the above embodiment;
Furthermore, it may be integrally constructed with the arm.

(e) The driving means uses, for example, an eccentric cam rocking mechanism in addition to the piston crank mechanism as shown in FIG. Alternatively, the motor may not be used as a driving source, and the motor may be driven by, for example, a pneumatic or hydraulic cylinder 4ir,'.

(fl) Furthermore, the rotation axis (6) or (21) of A person (5) or (2 (+)) is provided at the end of the arm as in the embodiment marked with -1. The workpiece (1) in the carrier can be rotated by providing one arm drive at one end of the carrier.
It is also possible to set it so that the

〔Effect of the invention〕

As described above, in the immersion treatment method of the present invention, the arm is configured to swing by a predetermined angle, so that the plate-shaped object to be treated swings in an arc. Therefore, the contact resistance of the surface of the object to be processed in the processing liquid is large, and the object to be processed and the processing liquid come into effective contact with each other. It also has a stirring action.

Therefore, the processing liquid does not stagnate in some areas (fresh processing liquid does not come into contact with any part of the surface of the object to be processed).
It has practical effects such as reducing processing unevenness, improving local layer thickness, improving immersion processing quality, and increasing processing speed. In addition, as mentioned above, each time the object to be treated and the treatment liquid come into contact with each other, and each time there is an agitation action on the device itself, the concentration of the active ingredient in the treatment liquid changes, etc. Therefore, even if the activity of the processing liquid decreases slightly, the immersion process can be continued and the processing liquid can be used effectively, and a sufficient yt'/R effect can be obtained even if the arcuate swing stroke is made small. As a result, the processing tank becomes smaller, and as a result, the amount of processing liquid used is reduced, and the running stroke can be reduced.As mentioned above, the so-called so-called In an immersion processing device in a balance mode, if the total weight of the carrier and the workpiece are balanced against each other, the advantage is that it can be driven with much smaller force than conventional devices that move the carrier up and down in the vertical direction. be.

The applicant has proposed that the apparatus illustrated in FIG.
5) A cleaning treatment experiment was conducted in which the semiconductor wafer was immersed in ultrapure water and oscillated in an arc with a total length of about 60 am and an arc swing angle of 4 degrees, with a cycle of 30 times. However, in such a device, the vertical stroke of the arm tip is approximately 3 cm, but simply converting l'7# body length to 1-1-6
．． 2↑: Totos l□ r with the conventional device of d Senzurono Jke
+- is the same; (11
5, it was confirmed that the cleaning effect was higher than Ei. It should be noted that the dimensions of such an apparatus, as well as the oscillating period, oscillating angle, etc., should naturally be changed depending on the type of immersion treatment, the type of treatment liquid, the object to be treated, etc., and the present invention is based on such numerical values. It is not limited to.

Furthermore, it goes without saying that the immersion treatment method according to the present invention is even more effective if the treatment liquid in the treatment tank is forcibly circulated.

[Brief explanation of the drawing]

FIG. 1 is a perspective view showing one embodiment of the immersion treatment apparatus for implementing the method according to the present invention, and FIG. 2 is a perspective view showing another embodiment of the immersion treatment apparatus for implementing the method according to the present invention. , No. 3 is a sectional view showing an example of a conventional oscillating immersion device. l...Product to be processed, 4.14...Carrier, 5,20
... Arm, 6.21 ... Rotation axis, 10.23 ...
・Motor, 11... Piston crank, 24... Reduction mechanism Fig. 3

Claims (1)

[Claims] When a carrier holding a plate-shaped object to be treated is immersed in a processing liquid in a processing tank to perform a predetermined surface treatment on the object, the carrier is rotated around the rotation axis of the arm that holds the carrier at its end. A method for immersion treatment of a plate-shaped object, characterized in that the object to be treated is swung in an arc in a treatment liquid by rotating the arm.