JPS60215585A - Airtight sealing method - Google Patents

Airtight sealing method

Info

Publication number
JPS60215585A
JPS60215585A JP59073441A JP7344184A JPS60215585A JP S60215585 A JPS60215585 A JP S60215585A JP 59073441 A JP59073441 A JP 59073441A JP 7344184 A JP7344184 A JP 7344184A JP S60215585 A JPS60215585 A JP S60215585A
Authority
JP
Japan
Prior art keywords
metal
layer
solder
metal layer
sealing method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP59073441A
Other languages
Japanese (ja)
Inventor
武部 勝郎
笠原 慎司
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP59073441A priority Critical patent/JPS60215585A/en
Publication of JPS60215585A publication Critical patent/JPS60215585A/en
Pending legal-status Critical Current

Links

Landscapes

  • Ceramic Products (AREA)
  • Manufacture Of Electron Tubes, Discharge Lamp Vessels, Lead-In Wires, And The Like (AREA)
  • Image-Pickup Tubes, Image-Amplification Tubes, And Storage Tubes (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 〔技術分野〕 本発明はガラスまたはセラミックと金属部品との気密封
止方法KFlaする。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field] The present invention relates to a method for hermetically sealing glass or ceramic and metal parts.

〔従来技術〕[Prior art]

従来、ガラスまたはセラミックと金属部品との気密封止
は電子管の製造工程に用いられているが、製造工程中お
よび電子管動作中での高温に対する耐熱性が要求される
ことから、金ろう、銀ろう等を用いるろう付は法が一般
に用いられている。
Conventionally, hermetic sealing between glass or ceramic and metal parts has been used in the manufacturing process of electron tubes, but since heat resistance against high temperatures during the manufacturing process and electron tube operation is required, gold solder and silver solder are used. Brazing methods are generally used.

しかしながら、ある積の電子管や他の装置において、気
密封止にあたって高温に加熱できないものがある。従っ
てこうした電子管等のR造におけるガラスまたはセラミ
ックと金、禍部品との気密封止には比較的低温での工程
が要求される。
However, some types of electron tubes and other devices cannot be heated to high temperatures for hermetic sealing. Therefore, a process at a relatively low temperature is required for hermetically sealing the glass or ceramic and the gold or anti-corrosion components in R-structured electron tubes and the like.

こうした電子管の代表例として撮像管がある。An image pickup tube is a typical example of such an electron tube.

撮像管のフェースプレートとシリンダとを気密封止する
方法の一つに、第1図に示すように、フェースプレート
1に接合した金属板3とシリンダ2に接合した金属金具
4とを接合する方法がある。
One method of airtightly sealing the face plate and cylinder of an image pickup tube is to join a metal plate 3 joined to the face plate 1 and a metal fitting 4 joined to the cylinder 2, as shown in FIG. There is.

この場合、フェースプレートlと金属板3との接合は、
(1)有機接着剤、例えはトールシール(商品名)を用
いて接着する方法、(2)フェースプレート1と金属板
3との間にインジウムを介在させて熱圧着する方法、(
3)ガラス・セラミック接着用はんだを用いて接合する
方法、等が用いられる。
In this case, the joining between the face plate l and the metal plate 3 is as follows:
(1) A method of bonding using an organic adhesive, such as Tall Seal (trade name); (2) a method of thermocompression bonding with indium interposed between the face plate 1 and the metal plate 3;
3) A method of bonding using glass-ceramic bonding solder, etc. is used.

しかしながら、(1)および(2)の方法では、トール
シールおよびインジウムの耐熱性はフェースプレー)l
に形成された光導電膜6よシ低いため、封止後のガス出
しのための加熱温度は100υ前後に保たなければなら
ず、有効なガス出しができないという欠点がめる。まだ
、(3)の方法では、はんだの濡れが接合部5の全体に
行き渡らなかったシ、はんだと接合物との界面に気泡を
生ずるなどして気密性が低下する等の欠点がある。
However, in methods (1) and (2), the heat resistance of the tall seal and indium is
Since the temperature is lower than that of the photoconductive film 6 formed in the photoconductive film 6, the heating temperature for venting gas after sealing must be maintained at around 100 υ, which has the disadvantage that effective gas venting cannot be performed. However, method (3) has drawbacks such as solder wetting not being spread over the entire joint 5 and bubbles being generated at the interface between the solder and the bonded material, resulting in a decrease in airtightness.

〔発明の目的〕 本発明の目的は、上記欠点を除去し、気密性に優れ、封
止部が200’ON度までの1lll−1′熱性を有す
る、ガラスまたはセラミックと金属部品との気密封止方
法を提供することにある。
[Object of the Invention] The object of the present invention is to eliminate the above-mentioned drawbacks, and to provide an air-tight seal between glass or ceramic and metal parts, which has excellent air-tightness and a sealing part that has 111-1' heat resistance up to 200'ON degrees. The objective is to provide a method to stop

〔発明の構成〕[Structure of the invention]

本発明の気密封止方法は、ガラスまたはセラミツク表面
に第1の金属層、中間金属層および第2の金属層を順次
積層する工程とk siJ記第2の金属異面と、接合す
べき金属部材の表面とをはんだで溶着する工程とを含ん
で構成される。
The hermetic sealing method of the present invention includes a step of sequentially laminating a first metal layer, an intermediate metal layer, and a second metal layer on a glass or ceramic surface, a second metal different surface, and a metal to be bonded. The method includes a step of welding the surface of the member with solder.

〔実施例の説明〕[Explanation of Examples]

次に、本発明を実施例を用い、図面を診照して説明する
Next, the present invention will be explained using examples and with reference to the drawings.

第2図は本発明の一実施例を説明するための図であり、
撮像管のフェースプレートと金属板との封止部の断面図
である。
FIG. 2 is a diagram for explaining one embodiment of the present invention,
FIG. 3 is a cross-sectional view of a sealing portion between the face plate of the image pickup tube and a metal plate.

ガラス製のフェースプレー)1を、クロム酸ト硫酸の混
合溶液、純水そしてアルコール温液に順次浸漬して洗浄
後乾燥した。次に、光導電膜を蒸着する部分を覆ったの
ち、金属板3と接合する面に真空蒸着法によって厚さ約
50OAのクロム(Cr )層IOを、さらに中間金属
層として厚さ約5000Aの銅(Cr)7411を連続
的に積層したのち、この上に電解めっき法によシ厚さ約
5μmの金(Au)めっき層12を形成した。
A glass face plate) 1 was immersed in a mixed solution of chromic acid and sulfuric acid, pure water, and a warm alcohol solution in order, washed, and then dried. Next, after covering the part on which the photoconductive film is to be deposited, a chromium (Cr) layer IO with a thickness of about 500A is applied to the surface to be bonded to the metal plate 3 by vacuum evaporation, and an intermediate metal layer with a thickness of about 5000A is applied. After continuously laminating copper (Cr) 7411, a gold (Au) plating layer 12 having a thickness of about 5 μm was formed thereon by electrolytic plating.

一方、金属板3としてはフェースプレートlに近い熱膨
張係数を有するインバー合金を使用し、希硝酸に浸漬し
たのち熱水素処理にょシ表面を清浄なものとしだ。
On the other hand, as the metal plate 3, an invar alloy having a coefficient of thermal expansion close to that of the face plate 1 is used, and after being immersed in dilute nitric acid, the surface is cleaned by thermal hydrogen treatment.

次に、このように処理したフェースプレー)1の金めっ
き面に金属板3を対向させ、その接合部にガラス・セラ
ミック接着用はんだ、例えばセラソルザ$297(商品
名)を供給し、超音波振動はんだとてを用いて空気中で
セラソルザを接合部に溶着させた。この処理によシ接着
力が大きく、気密性に優れたはんだ層13が形成された
Next, the metal plate 3 is placed opposite the gold-plated surface of the face plate 1 treated in this way, and solder for adhesion of glass and ceramics, such as Cerasolza $297 (trade name), is supplied to the joint, and ultrasonic vibration is applied. Cerasolzer was welded to the joint in air using a solder tip. Through this treatment, a solder layer 13 with high adhesive strength and excellent airtightness was formed.

このようにして金属板3がはんだ付けされたフェースプ
レートlを用いた撮像管は、従来の有機接着剤やインジ
ウムを用いたものに比べ、光導電面の劣化しない温度(
約200℃)までの加熱が可能であるため、管内のガス
出しの効果は犬となる。
An image pickup tube using a face plate l to which a metal plate 3 is soldered in this way has a temperature that does not deteriorate the photoconductive surface (
Since it is possible to heat up to approximately 200°C, the effectiveness of releasing gas from inside the pipe is significant.

5− なお、フェースプレート1に蒸着した第1の金属層とし
てのTi層11はガラスとの接着giIfを保つためで
めシ、チタン(TI)の代シにパラジウム(Pd ) 
、りoム(Cr)、タンク# (Ta )+ニッケル(
Ni)クロム合金を用いても同じ効果がある。また、第
2の金属l−としてのAu層12は、はんだと合金を形
成しやすい性質を有するものであ夛、Auのほか銀(A
g ) *すず(8n)を用いることができる。
5- Note that the Ti layer 11 as the first metal layer deposited on the face plate 1 is made of palladium (Pd) instead of titanium (TI) in order to maintain adhesion to the glass.
, rim (Cr), tank # (Ta) + nickel (
The same effect can be obtained by using a Ni) chromium alloy. In addition, the Au layer 12 as the second metal l- has a property of easily forming an alloy with solder, and in addition to Au, the Au layer 12 has the property of easily forming an alloy with solder.
g) *Tin (8n) can be used.

本実施例には、中間金属層を設は九が、これは主に第2
金属層の貴金属の使用鎗の節減等の経済的理由による。
In this example, an intermediate metal layer is provided, but this is mainly used for the second metal layer.
This is due to economic reasons such as reducing the use of precious metals in the metal layer.

第1金属層に第2金M層を直接積層して何ら支障を生じ
ないことは−をまたない。
There is no problem in directly laminating the second gold M layer on the first metal layer.

なお、中間金属層としてのCu層11は、第1および第
2の金属層と、例えばCu−Tl 、 C11−Au合
金層を形成し良好な気密接合を完成するもので@t)、
’CuO代シにN1i用いることもできる。
Note that the Cu layer 11 as an intermediate metal layer forms, for example, a Cu-Tl or C11-Au alloy layer with the first and second metal layers to complete a good airtight joint.
'N1i can also be used for CuO.

第3図は本発明の他の実施例を説明するための外部ミラ
ー型ガスレーザ装置の一例の構成図である。
FIG. 3 is a configuration diagram of an example of an external mirror type gas laser device for explaining another embodiment of the present invention.

6− 外部ミラー型ガスレーザ装fit20は、熱膨張係数の
小さいセラミック製の外囲器21と、この外囲器21内
に固定されたレーザ管22と、ミラー23を保持し外囲
器210両端に固定されたミラー支持体24とから主に
構成されている。このミラー支持体24は、外囲器21
内にほこシや湿気等の浸入を防ぐために外囲器210両
端と気密封止されている。
6- The external mirror type gas laser device FIT20 includes an envelope 21 made of ceramic with a small coefficient of thermal expansion, a laser tube 22 fixed in the envelope 21, and a mirror 23, which are held at both ends of the envelope 210. It mainly consists of a fixed mirror support 24. This mirror support body 24 is
Both ends of the envelope 210 are hermetically sealed to prevent dust, moisture, etc. from entering.

第4図は第3図におけるA部の拡大図でsb、セラミッ
ク製外囲器21の端部とインバー合金製のミラー支持体
24との接合部の断面を示している。この外囲器21と
ミラー支持体24との接合は第2図の場合とほぼ同様に
して行なった。すなわち、外囲器21を混酸、純水およ
びアルコール溶液に順次浸漬して清浄としたのち、空気
中で約500°0に加熱して有機物を焼却し除去した。
FIG. 4 is an enlarged view of part A in FIG. 3, and shows a cross section of the joint between the end of the ceramic envelope 21 and the invar alloy mirror support 24. The envelope 21 and the mirror support 24 were joined together in substantially the same manner as in the case shown in FIG. That is, the envelope 21 was cleaned by sequentially immersing it in mixed acid, pure water, and alcohol solution, and then heated in air to approximately 500°0 to incinerate and remove organic matter.

そして、接合すべき端部表面にCu層I Q 、 Cu
層11およびAuNl2を順次被着したのち、表面を清
浄としたミラー支持体を対向させ接合部にセラソルザを
供給し、超音波振動はんだごてを用いて溶着した。この
ようにして接合され次外囲器21とミラー支持体24と
はレーザ装置使用上十分な接着強度、気密性および耐熱
性を有したものとなった。
Then, Cu layers IQ, Cu
After layer 11 and AuNl2 were sequentially deposited, mirror supports whose surfaces had been cleaned were placed facing each other, Cerasolzer was supplied to the joint, and welding was performed using an ultrasonic vibration soldering iron. The outer envelope 21 and the mirror support 24 bonded together in this manner have adhesive strength, airtightness, and heat resistance sufficient for use in a laser device.

上記実施例においては、ガラスまたはセラミックに接合
される金属部品は、単にその表面を清浄として用いられ
たが、清浄後表面に金めっきjfAft設けはんだとの
合金化を行なえばよシ接宥強度の大きい封止を行うこと
ができる。また、金属部品はインバー合金に限らすアル
ミニウム、銅等はんだ付は可能な全ての金H4f、用い
ることができる。
In the above embodiments, the surface of the metal component to be bonded to glass or ceramic was simply cleaned. However, after cleaning, the surface may be gold plated and alloyed with solder to increase the tolerance strength. Large seals can be made. Further, the metal parts are limited to invar alloy, but any gold H4F that can be soldered, such as aluminum or copper, can be used.

そして、使用するはんだKよp封止部の耐熱性は約20
0℃までのものとすることが可能である。
The heat resistance of the solder Kyop sealing part used is approximately 20
Temperatures down to 0°C are possible.

なお、はんだ付けに超音波振動はんだごてによる接着法
を用いたが、はんだの薄片を接合部にはさみ、接合物を
加圧しながら加熱する熱圧着法を用いることも可能であ
る。
Although a bonding method using an ultrasonic vibration soldering iron was used for soldering, it is also possible to use a thermocompression bonding method in which a thin piece of solder is sandwiched between the joints and the bonded object is heated while being pressurized.

〔発明の効果〕〔Effect of the invention〕

以上詳細に説明したように、本発明によれば、気密性に
優れ、封止部が200″0程度までの耐熱性を有する、
ガラスまたはセラミックと金属部品との気密封止が可能
となシ、作業も比較的簡単であるためその効果は大きい
As explained in detail above, according to the present invention, the sealing portion has excellent airtightness and has heat resistance up to about 200″0.
The effect is great because glass or ceramic and metal parts can be hermetically sealed and the work is relatively simple.

【図面の簡単な説明】 第1図は従来の気密封止方法を説明するための図、第2
図は本発明の一実施例を説明するための図、第3図は本
発明の他の実施例を説明するための図、第4図は第3図
におけるA部の拡大図である0 1・・・・・・フェースプレート、2・・団・シリンダ
、3・・・・・・金属板、4・・・・・・金属金具、5
・・・・・・接合面、6・・・・・・光導電膜、lO・
・・・・・クロム層、11・旧・・銅層、12・・・・
・・金めつき層、13・旧・・はんだ層、20・・・・
・・外部ミラー型ガスレーザ装置、21・・・・・・外
囲器、22・・・・・・レーザ管、23・・・・・・ミ
ラー、24・・団・ミラー支持体。 9− f7. 7 図 Yz図
[Brief explanation of the drawings] Figure 1 is a diagram for explaining the conventional hermetic sealing method;
The figure is a diagram for explaining one embodiment of the present invention, FIG. 3 is a diagram for explaining another embodiment of the present invention, and FIG. 4 is an enlarged view of section A in FIG. 3.・・・・・・Face plate, 2...Group/cylinder, 3...Metal plate, 4...Metal fittings, 5
...... Junction surface, 6... Photoconductive film, lO・
・・・Chromium layer, 11・Old・Copper layer, 12・・・・
...Gold plating layer, 13. Old...Solder layer, 20...
... External mirror type gas laser device, 21 ... Envelope, 22 ... Laser tube, 23 ... Mirror, 24 ... Group mirror support. 9-f7. 7 Figure Yz diagram

Claims (4)

【特許請求の範囲】[Claims] (1) ガラスまたはセラミックの弐面に第1の金属層
、第2の金属層を順次積層する工程と、前記第2の金網
表面と接合すべき金属部材の表面とをはんだで溶着する
工程とを含むことを特徴とする気密封止方法。
(1) A step of sequentially laminating a first metal layer and a second metal layer on the second surface of glass or ceramic, and a step of welding the surface of the second wire mesh and the surface of the metal member to be joined with solder. A hermetic sealing method characterized by comprising:
(2)前記第1の金属層の材質がチタン、パラジウム、
クロム、タンタル、ニッケルクロム合金ノいずれかであ
る特許請求の範囲第(1)項記載の気密封止方法。
(2) The material of the first metal layer is titanium, palladium,
The hermetic sealing method according to claim (1), wherein the material is chromium, tantalum, or a nickel-chromium alloy.
(3)前記第2の金属ノーの材質が金、すす、銀のいず
れかである%F請求の範囲第(1)項または第(2)項
記載の気密封止方法。
(3) The hermetic sealing method according to claim (1) or (2), wherein the material of the second metal is gold, soot, or silver.
(4)前記第1の金属層と第2の金属層の間に、少なく
とも一槓以上の中間金属層を設ける特許請求の範囲第(
1)項、第(2)項、または第3項記載の気密封止方法
(4) At least one or more intermediate metal layers are provided between the first metal layer and the second metal layer.
The hermetic sealing method according to item 1), item (2), or item 3.
JP59073441A 1984-04-12 1984-04-12 Airtight sealing method Pending JPS60215585A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59073441A JPS60215585A (en) 1984-04-12 1984-04-12 Airtight sealing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59073441A JPS60215585A (en) 1984-04-12 1984-04-12 Airtight sealing method

Publications (1)

Publication Number Publication Date
JPS60215585A true JPS60215585A (en) 1985-10-28

Family

ID=13518327

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59073441A Pending JPS60215585A (en) 1984-04-12 1984-04-12 Airtight sealing method

Country Status (1)

Country Link
JP (1) JPS60215585A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61140039A (en) * 1984-12-10 1986-06-27 シーメンス、アクチエンゲゼルシヤフト X ray image amplifier
WO1996026808A1 (en) * 1995-03-01 1996-09-06 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Metallised under-layer for (soldering) filler materials
WO2007099959A1 (en) * 2006-02-28 2007-09-07 Hamamatsu Photonics K.K. Photomultiplier and radiation detecting apparatus
WO2007099960A1 (en) * 2006-02-28 2007-09-07 Hamamatsu Photonics K.K. Photomultiplier and radiation detecting apparatus
JP2010530838A (en) * 2007-06-23 2010-09-16 フラウンホファー ゲセルシャフト ツール フェールデルンク ダー アンゲヴァンテン フォルシュンク エー.ファオ. Method for permanently joining two parts by brazing with glass or metal brazing
US7812532B2 (en) 2006-02-28 2010-10-12 Hamamatsu Photonics K.K. Photomultiplier tube, radiation detecting device, and photomultiplier tube manufacturing method
US7902509B2 (en) 2006-02-28 2011-03-08 Hamamatsu Photonics K.K. Photomultiplier tube and radiation detecting device

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61140039A (en) * 1984-12-10 1986-06-27 シーメンス、アクチエンゲゼルシヤフト X ray image amplifier
WO1996026808A1 (en) * 1995-03-01 1996-09-06 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Metallised under-layer for (soldering) filler materials
WO2007099959A1 (en) * 2006-02-28 2007-09-07 Hamamatsu Photonics K.K. Photomultiplier and radiation detecting apparatus
WO2007099960A1 (en) * 2006-02-28 2007-09-07 Hamamatsu Photonics K.K. Photomultiplier and radiation detecting apparatus
JP2007234365A (en) * 2006-02-28 2007-09-13 Hamamatsu Photonics Kk Photomultiplier tube and radiation detecting device
US7812532B2 (en) 2006-02-28 2010-10-12 Hamamatsu Photonics K.K. Photomultiplier tube, radiation detecting device, and photomultiplier tube manufacturing method
US7838810B2 (en) 2006-02-28 2010-11-23 Hamamatsu Photonics K.K. Photomultiplier tube and a radiation detecting device employing the photomultiplier tube
US7847232B2 (en) 2006-02-28 2010-12-07 Hamamatsu Photonics K.K. Photomultiplier tube and radiation detecting device employing the photomultiplier tube
US7902509B2 (en) 2006-02-28 2011-03-08 Hamamatsu Photonics K.K. Photomultiplier tube and radiation detecting device
JP2010530838A (en) * 2007-06-23 2010-09-16 フラウンホファー ゲセルシャフト ツール フェールデルンク ダー アンゲヴァンテン フォルシュンク エー.ファオ. Method for permanently joining two parts by brazing with glass or metal brazing
EP2176185B1 (en) * 2007-06-23 2016-03-16 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Method for the permanent connection of two components by means of glass or metal solder

Similar Documents

Publication Publication Date Title
JP2003050341A (en) Optical parts composite and method for manufacturing the same
JPH0330463B2 (en)
JPS60215585A (en) Airtight sealing method
JP2760987B2 (en) Joining method of ceramics and metal
US4189084A (en) Low cost assembly processes for non-linear resistors and ceramic capacitors
US4863090A (en) Room temperature attachment method employing a mercury-gold amalgam
JPS63287038A (en) Package structure
JPS6256597A (en) Method for plating electronic parts
JP2841262B2 (en) Soldering method
JPH0672779A (en) Method for joining carbon member
JPS59221556A (en) Manufacture of solar heat collector
JPS5821424B2 (en) Method for manufacturing semiconductor material supporting substrate
JPS60239373A (en) Alumina and metal bonding method
JPS6083356A (en) Semiconductor device
JPH07106458A (en) Airtight semiconductor device
JPH02208957A (en) Electronic equipment sealing material
JPS6081070A (en) Bonded structure of sic sintered body and metal member
JPS608271Y2 (en) solar heat collector tube
JPH08119760A (en) Soldering of sic
JPH0155584B2 (en)
JPH06216268A (en) Ic package
JP3712532B2 (en) Assembly of semiconductor element and electrode
JPH0555638A (en) Connecting method for thermoelctric converter
JPS60116156A (en) Aluminum alloy package
JPH01147087A (en) Pretreatment of copper-tungsten alloy before plating