JPS6021377A - 付着量分布制御手段つき真空蒸着めつき装置 - Google Patents
付着量分布制御手段つき真空蒸着めつき装置Info
- Publication number
- JPS6021377A JPS6021377A JP12888483A JP12888483A JPS6021377A JP S6021377 A JPS6021377 A JP S6021377A JP 12888483 A JP12888483 A JP 12888483A JP 12888483 A JP12888483 A JP 12888483A JP S6021377 A JPS6021377 A JP S6021377A
- Authority
- JP
- Japan
- Prior art keywords
- vapor
- deposited
- substrate
- valve
- distribution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007740 vapor deposition Methods 0.000 title abstract description 5
- 238000007747 plating Methods 0.000 title description 2
- 239000000758 substrate Substances 0.000 claims abstract description 16
- 239000000463 material Substances 0.000 claims abstract description 15
- 238000001704 evaporation Methods 0.000 claims abstract description 13
- 230000008020 evaporation Effects 0.000 claims abstract description 10
- 230000008021 deposition Effects 0.000 claims description 13
- 238000007738 vacuum evaporation Methods 0.000 claims description 7
- 238000000151 deposition Methods 0.000 abstract description 15
- 239000007769 metal material Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000002452 interceptive effect Effects 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000002517 constrictor effect Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
- C23C14/044—Coating on selected surface areas, e.g. using masks using masks using masks to redistribute rather than totally prevent coating, e.g. producing thickness gradient
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12888483A JPS6021377A (ja) | 1983-07-15 | 1983-07-15 | 付着量分布制御手段つき真空蒸着めつき装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12888483A JPS6021377A (ja) | 1983-07-15 | 1983-07-15 | 付着量分布制御手段つき真空蒸着めつき装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6021377A true JPS6021377A (ja) | 1985-02-02 |
| JPH0351789B2 JPH0351789B2 (enrdf_load_stackoverflow) | 1991-08-07 |
Family
ID=14995732
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12888483A Granted JPS6021377A (ja) | 1983-07-15 | 1983-07-15 | 付着量分布制御手段つき真空蒸着めつき装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6021377A (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6173875A (ja) * | 1984-09-17 | 1986-04-16 | Mitsubishi Heavy Ind Ltd | 流路幅調整板付き真空蒸着装置 |
| JPS62290868A (ja) * | 1986-06-11 | 1987-12-17 | Sumitomo Heavy Ind Ltd | 連続真空蒸着装置 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5410949U (enrdf_load_stackoverflow) * | 1977-06-23 | 1979-01-24 | ||
| JPS5811785A (ja) * | 1981-07-14 | 1983-01-22 | コムビナ−ト・フアウ・エ−・ベ−・ロコモ−テイフバウ−エレクトロテヒニツシエ・ウエルケ“ハンス・バイムレル” | 亜鉛蒸発器を運転する方法および該方法を実施するための蒸発器 |
-
1983
- 1983-07-15 JP JP12888483A patent/JPS6021377A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5410949U (enrdf_load_stackoverflow) * | 1977-06-23 | 1979-01-24 | ||
| JPS5811785A (ja) * | 1981-07-14 | 1983-01-22 | コムビナ−ト・フアウ・エ−・ベ−・ロコモ−テイフバウ−エレクトロテヒニツシエ・ウエルケ“ハンス・バイムレル” | 亜鉛蒸発器を運転する方法および該方法を実施するための蒸発器 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6173875A (ja) * | 1984-09-17 | 1986-04-16 | Mitsubishi Heavy Ind Ltd | 流路幅調整板付き真空蒸着装置 |
| JPS62290868A (ja) * | 1986-06-11 | 1987-12-17 | Sumitomo Heavy Ind Ltd | 連続真空蒸着装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0351789B2 (enrdf_load_stackoverflow) | 1991-08-07 |
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