JPS60212225A - Photochemical reaction apparatus - Google Patents

Abstract

PURPOSE:To prevent ultraviolet rays from being interrupted in its transmission by preventing the accumulation of a reaction product to an ultraviolet ray pervious window, by blowing cooled gas to the inner surface of the ultraviolet ray pervious window. CONSTITUTION:Photo-reaction gas is supplied into a reaction vessel 1 having an ultraviolet ray pervious window 14 by gas supply and exhaust mechanisms 11, 12 and a substrate 14 being an article to be treated is irradiated by an ultraviolet ray source 3 from the outside of the reaction vessel 1 through the pervious window 14 and, further, cooled gas is blown to the inner surface of the pervious window 14 by a gas injection mechanism 5. As a result, photochemical reaction is suppressed in the vicinity of the inner surface of the pervious window 14 by cooling said inner surface and a reaction product is not accumulated to the pervious window 14. By this simple structure, the reaction product is not accumulated to the ultraviolet ray pervious window and the transmission of ultraviolet rays is not interrupted.

Description

[Detailed description of the invention] The present invention relates to a photochemical reaction device.

Recently, 11i
A method of forming a thin film of amorphous silicon that can be used for f is being researched. On the other hand, various insulating films and
A vaporization method is also used to form a film, and many vaporization methods have been proposed depending on the application, but among these, the photochemical vapor deposition method that uses photochemical reactions has an extremely fast film formation rate and is suitable for large surface # It has the advantage of being able to form a uniform coating even on grains, and has recently attracted particular attention.

In the conventional L deposition method using a photochemical reaction and without chemical vapor deposition, the substrate is placed inside a reaction chamber with a window that transmits ultraviolet rays, a single reaction gas is flowed, and an ultraviolet light source is connected from outside the container. The gas is subjected to a photochemical reaction, and the reaction product is evaporated or deposited on the substrate,
It has been found that, although it has the above-mentioned great advantages, on the other hand, it has the disadvantage that the reaction products are also deposited or deposited on the transmission window of the container, causing aging, which greatly impedes the transmission of ultraviolet rays.

For this reason, conventional methods have been to apply oil to the transmission window or to flow inert gas such as argon to suppress vapor deposition or accumulation on the transmission window, but these measures have little effect and can last for a long time. When using 4IvI, the transmission of ultraviolet rays was gradually inhibited.

Therefore, the present invention was completed by applying the fact that photochemical reactions are significantly suppressed at low temperatures.It has a simple structure, no products are deposited on the ultraviolet transmitting window, and the ultraviolet light transmits through the window. It is an object of the present invention to provide a photochemical reaction device 4 in which the photochemical reaction device 4 is free from being damaged. The purpose of this is to provide a reaction vessel with a UV transmission window, 14 gas supply/exhaust structures for supplying photoreactive gas into the reaction vessel, and an object to be treated by bending the transmission window from outside the reaction vessel. an ultraviolet light source that irradiates the substrate;
This is achieved by a photochemical reaction device including a mechanism for spraying cooled gas onto the inner surface in the transmission direction.

The present invention will be specifically described below based on embodiments shown in the drawings.

The reaction vessel IK has a photoreactive gas introduction hole 11 and a reduced pressure value -
An exhaust hole 12 is provided, and a substrate support stand 13 made of quartz glass is disposed at the center of the interior so as to be movable up and down. The upper surface is provided with an ultraviolet ray transmitting window 14 made of quartz glass, and the lamp body 2 is integrally mounted above the window 14.
A plurality of ultraviolet lamps 3, which are sources of ultraviolet light, are arranged in parallel at the top of the lamp with a reflective member 21 interposed therebetween. Here, the ultraviolet lamp 3 is a low-pressure mercury lamp with a tube diameter of 18 mm, a lighting I start pressure of 350 V, a lighting point of 90 V, and a magnetic current of 5 AC lighting, but it is not limited to this. Non-pole type lamp equipment and plasma generation equipment fi
It may be t, and in short, it is sufficient if it generates a predetermined amount of ultraviolet rays. Furthermore, the interior of the lamp body 2 can be made to flow with gas or be evacuated as necessary.

A temperature controller (not shown) is attached to the substrate support stand 13, and the base &4 supported by this is an alumina plate having an outer diameter of 160mm and is heated to about 150°C. In addition,
“This substrate support stand 13 can be made to be rotatable like a turntable or movable within the reaction vessel l, and a large number of substrates 4 can be effectively processed by taking them in and out with a transport mechanism. A mixed gas consisting of argon as a carrier gas, mercury gas as a photosensitizer, and silicon tetrahydride as a decomposition vaporization gas is supplied from the introduction hole 11 into the reaction vessel l. When using a photoreactive gas that reacts, it is preferable to provide a plurality of introduction holes 11 to introduce each gas separately and mix them in the reaction vessel 1. 11 is equipped with a temperature sea bream dish,
It is best to heat each gas to the optimum temperature to enhance the photochemical reaction.

Next, Touka! A pipe-shaped gas supply mechanism 5 is disposed in the periphery immediately below 414, and an appropriate number of nozzles 51 are attached to this gas ejection mechanism 5. The injection hole 52 is connected to a cooling gas supply port 47 (not shown), and for example, cooled argon gas is supplied from the nozzle 51 to the inner rock surface of the y*A bottom 14. (The cooling gas is sprayed onto φ to cool it. The cooling gas is not limited to argon gas, but it must be inert and must not transmit ultraviolet rays.

In the above apparatus, the pressure inside the reaction vessel 1 is reduced and the ultraviolet lamp 3 is turned on. Then, an argon gas having a temperature of 9 degrees below zero is sprayed from the nozzle 51 onto the transmission window 14, and from the introduction hole 11, argon of 5 vtx Hg, silicon tetrahydride of 3 vtx Hg, and mercury vapor of 33 will be introduced. The ultraviolet rays pass through the transmission window 14 and are irradiated onto the substrate 4, whereby silicon tetrahydride is photodecomposed and amorphous silicon is vapor-deposited or deposited on the substrate 4. At this time, a portion of the photoreactive gas rises and moves toward the transmission window 14, but since the transmission window 14 is cooled, photodecomposition of silicon tetrahydride in this vicinity is suppressed.

In particular, when the transmission window 14 is cooled to -30°C 8If,
p (is hardly photodecomposed and therefore does not accumulate on the transmission window 14 and does not become cloudy even after hours of operation. In addition, the transmission window 1
4. Cool down to -30℃ 1. Even if you don't use it, the effect is great even if you use it for example at 10 degrees, but even if you use it a little, the adhesion will be weak and you can easily wipe it off.

As explained above, in the present invention, a mechanism is provided to blow cooled gas onto the inner surface of the transmission window to cool it, so that photochemical reactions are suppressed in this vicinity and no products are deposited. Therefore, according to Fuiri l'114,
It is possible to provide a photochemical reaction device which is simple in structure, does not deposit products on the ultraviolet transmitting window, and does not inhibit the transmission of the UV-I/L.

[Brief explanation of the drawing]

The drawing is a KJr drawing of the unexploded 811 real persimmon example. 1... Reaction vessel 2... Light body 3... Ultraviolet condensing lamp 4... Group ~ 14... Transparent A panel 5... Gas ejection structure 51... Nozzle applicant Ushio Inc. Agent for Co., Ltd. Patent attorney Toranosuke Tahara 321 Procedural amendment (spontaneous) August 10, 1980 Manabu Shiga, Commissioner of the Patent Office 1, Indication of the case 1981 Patent No. 1 No. 67518 2 Name of the invention Photochemical reaction device 3, Relationship with the case of the person making the amendment Patent applicant representative Inuzo Yumoto 4, agent” (s41r) Patent attorney Toranosuke Tahara 5 Date of amendment order 6 Supplement j [Number of inventions increased due to N/A 7, Specifications subject to amendment Column 8 of the Detailed Description of the Invention of the Book, Contents of the Amendment As shown in the appendix, on page 7 of the specification box, line 3, after "...is lit.", "However, the inside of the reaction vessel 1 must be lightened." The photochemical reaction may be allowed to occur under normal pressure.'' is added. Written amendment to the above procedure (voluntary) August 28, 1980 Manabu Shiga, Commissioner of the Patent Office1, Indication of the case 1982 Patent No. 1 No. 675182, Title of the invention Photochemical reaction device 3, Person making the amendment Related Patent applicant representative Inuzo Yumoto 4, agent method n As shown in the attached document, in the 3rd line of the 6th line of the specification, after ``...'' is followed by ``However, the pressure inside the reaction vessel 1 will not be reduced. may be allowed to undergo a photochemical reaction under normal pressure.'' is added. that's all

Claims (1)

[Claims] A reaction vessel that transmits ultraviolet rays vertically, a gas supply/exhaust mechanism that supplies a photoreactive gas into the reaction vessel, and an ultraviolet light source that irradiates a substrate, which is an object to be processed, from outside the reaction vessel through a transmission window. , a mechanism for spraying cooled gas onto the inner surface of a Rayrφ window.