JPS60211704A - Conductor and method of producing same - Google Patents

Conductor and method of producing same

Info

Publication number
JPS60211704A
JPS60211704A JP6746384A JP6746384A JPS60211704A JP S60211704 A JPS60211704 A JP S60211704A JP 6746384 A JP6746384 A JP 6746384A JP 6746384 A JP6746384 A JP 6746384A JP S60211704 A JPS60211704 A JP S60211704A
Authority
JP
Japan
Prior art keywords
sulfide
conductive layer
conductor
sulfur
cuprous
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6746384A
Other languages
Japanese (ja)
Inventor
隆 北村
正己 青木
隆 大橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bridgestone Corp
Original Assignee
Bridgestone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bridgestone Corp filed Critical Bridgestone Corp
Priority to JP6746384A priority Critical patent/JPS60211704A/en
Priority to DE8585302262T priority patent/DE3573188D1/en
Priority to EP19850302262 priority patent/EP0160406B1/en
Publication of JPS60211704A publication Critical patent/JPS60211704A/en
Priority to US07/007,695 priority patent/US4755394A/en
Pending legal-status Critical Current

Links

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 本発明は硫化第二銅を導電層とする導電体及びその製造
方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a conductor having a conductive layer made of cupric sulfide and a method for manufacturing the same.

従来ニトリル基を含む高分子物質、例えばアクリル繊維
やアクリルフィルム等に硫化第一銅を付着せしめること
で導電層を有する繊維、フィルム等が知られている。こ
れらは染色化学における銅染色法としてニトリル基への
一価の銅イオンの配位結合を利用したものである。この
場合、導電層である硫化第一銅(Cu2S)は実際には
化学量論的にわずかにずれた組成CuxS(/、i;L
−χ62 ンであり、P型半導体的挙動を示すことが報
告されている。
BACKGROUND ART Fibers, films, and the like have been known that have conductive layers formed by adhering cuprous sulfide to polymeric substances containing nitrile groups, such as acrylic fibers and acrylic films. These are copper dyeing methods in dyeing chemistry that utilize the coordination bond of monovalent copper ions to nitrile groups. In this case, the conductive layer, cuprous sulfide (Cu2S), actually has a slightly stoichiometrically shifted composition CuxS(/,i;L
-χ62 and has been reported to exhibit P-type semiconductor behavior.

本来硫化第二銅(Cu S)は硫化第一銅((A工S。Originally, cupric sulfide (CuS) is cuprous sulfide ((A Engineering S.

1.66ル42)に比べ1オ一ダー以上の高い導電層を
示すことが知られているが、この硫化第二銅を導電層と
して用いた導電性繊維、フィルム等は得られていない。
Although it is known to exhibit a conductive layer that is one order of magnitude higher than that of 1.66 L42), conductive fibers, films, etc. using this cupric sulfide as a conductive layer have not been obtained.

これは主に、二価の銅イオンが一価の銅イオンに比ベニ
ドリル基の配位する能力が劣るためとされている。
This is thought to be mainly due to the inferior ability of divalent copper ions to coordinate with benidryl groups compared to monovalent copper ions.

本発明者らは硫化第二銅の導電性を利用した導電材料を
得るべく、鋭意研究した結果、従来の硫化第一銅を導電
層とする導電体に、硫黄または含硫黄化合物を反応させ
ることにより、導電層の大部分を硫化第一銅から硫化第
二銅へと変化させ、ニトリル基を含む高分子物質への付
着性能をそこなうことなしに高い導電性を付与すること
に成功し、本発明をなすに至った。
The present inventors have conducted intensive research to obtain a conductive material that utilizes the conductivity of cupric sulfide. As a result, the inventors have discovered that sulfur or a sulfur-containing compound is reacted with a conventional conductor having a conductive layer made of cuprous sulfide. By changing most of the conductive layer from cuprous sulfide to cupric sulfide, we succeeded in imparting high conductivity without impairing the adhesion performance to polymeric materials containing nitrile groups. He came up with an invention.

以下に本発明について詳しく説明する。The present invention will be explained in detail below.

本発明において用いられる硫化第一銅を導電層とする導
電体は、#!1im、フィルム、発泡体、粉体等いかな
る形状のものでもよい。但し、母体となる高分子物質は
ニトリル基を有することが必要である。
The conductor having a conductive layer made of cuprous sulfide used in the present invention is #! It may be of any shape such as 1 mm, film, foam, powder, etc. However, the parent polymer substance must have a nitrile group.

ニトリル基を有する高分子物質としては、例えばアクリ
ル繊維、アクリル系繊維、ニトリル基含有ポリウレタン
フォーム(アクリロニトリルがグラフl したポリマー
ポリオールを用いたポリウレタンフォーム等)、アクリ
ロニトリル; メタクリロニトリル;エタクリロニトリ
ル;α−プロピルアクリロニトリル等のα−置換アクリ
ロニトリルの誘導体;ビニリデンシアニド;α−メチレ
ンゲルタロニトリル等分子中に少なくとも1個のニトリ
ル基を有する化合物の単独重合体若しくはこれらの共重
合体又は上記のニトリル基を有する化合物と共重合可能
な他の重合不飽和ビニル化合物(例えばアクリル酸、メ
タクリル酸又はこれらのエステル;アクリルアミド;酢
酸ビニル;塩化ビニル;塩化ビニリデン;ビニルスルホ
ン酸;メタリルスルホン酸、P−スチレンスルホン酸又
はこれらの塩類;アクリル酸、メタクリル酸のジメチル
アミノエチルエステル、ジエチルアミノエチルエステル
;および相当するN−置換アミノプロピルエステル、N
−置換アミノブチルエステル;ビニルピリジン等)との
共重合体から形成される。
Examples of polymeric substances having nitrile groups include acrylic fibers, acrylic fibers, nitrile group-containing polyurethane foams (polyurethane foams using polymer polyols with acrylonitrile graphs, etc.), acrylonitrile; methacrylonitrile; ethacrylonitrile; - Derivatives of α-substituted acrylonitrile such as propyl acrylonitrile; vinylidene cyanide; homopolymers of compounds having at least one nitrile group in the molecule such as α-methylene geltalonitrile, copolymers thereof, or the above nitrile groups Other polymerizable unsaturated vinyl compounds that can be copolymerized with compounds having Sulfonic acids or their salts; dimethylaminoethyl ester, diethylaminoethyl ester of acrylic acid, methacrylic acid; and the corresponding N-substituted aminopropyl ester, N
-substituted aminobutyl ester; vinylpyridine, etc.).

前述したニトリル基を有する高分子物質に硫化第一銅か
らなる導電層を設ける方法としては、例えばニトリル基
含有高分子物質を第二銅塩(例えば硫酸銅)と還元性物
質(例えばヒドロキシルアミン)とが混在せる溶液(p
 H1,5〜4.o。
As a method for providing a conductive layer made of cuprous sulfide on a polymeric material having a nitrile group as described above, for example, a polymeric material containing a nitrile group is mixed with a cupric salt (e.g., copper sulfate) and a reducing substance (e.g., hydroxylamine). (p
H1,5~4. o.

90〜120°Cで第二銅イオンが第一銅イオンに還元
される)に接触させることにより第一銅イオンをニトリ
ル基に配合結合させることができる。また」二記第二銅
イオンを第一銅イオンに還元する還元性物質として、他
に硫酸第一鉄、バナジン酸アンモニウム、フルフラール
等を単独又はlJl用して用いてもよい。さらに第一銅
イオン法の改良法であるサンドクリル法、電解第一銅イ
オン法、酸化還元電位法等を用いて第一銅イオンをニト
リル基に配位結合させることも可能である。
Cuprous ions can be covalently bonded to the nitrile groups by contacting the nitrile group (at 90-120° C., cupric ions are reduced to cuprous ions). In addition, ferrous sulfate, ammonium vanadate, furfural, etc. may be used alone or in combination as reducing substances that reduce cupric ions to cuprous ions. Furthermore, it is also possible to coordinately bond a cuprous ion to a nitrile group using a sandocryl method, an electrolytic cuprous ion method, an oxidation-reduction potential method, etc., which are improved methods of the cuprous ion method.

なお、硫化第一銅を導電層とする導電体中の硫化第一銅
の量は1重量%以上、好ましく3重量%以上である。
The amount of cuprous sulfide in the conductor having cuprous sulfide as a conductive layer is 1% by weight or more, preferably 3% by weight or more.

次に本発明の特徴とする硫化第一銅からなる導電層を硫
化第二銅からなる導電層に変化させる為の硫化反応は、
硫黄または含硫黄化合物の溶液もしくは蒸気を、硫化第
一銅を導電層とする導電体に均一に反応させることが重
要である。例えば硫黄のベンゼン、トルエン、キシレン
、エーテル、アルコール溶液等に硫化第一銅を導電層と
する導電体を浸積することにより、硫化反応が進行し、
硫化第一銅から硫化第二銅への変化が認められるが、こ
れらの溶液に遊離硫黄を発生させるアミン類、例えばn
−ブチルアミン、エタノールアミン、モルホリン、エチ
レンジアミン、ピペリジン等を添加することにより、硫
化反応が促進される。この際、溶液中の硫黄の濃度は0
.5〜3重量%の範囲、またアミンの濃度は0.1〜3
重量%の範囲が好ましい。
Next, the sulfurization reaction for changing the conductive layer made of cuprous sulfide into the conductive layer made of cupric sulfide, which is a feature of the present invention, is as follows:
It is important to uniformly react a solution or vapor of sulfur or a sulfur-containing compound to a conductor whose conductive layer is cuprous sulfide. For example, by immersing a conductor having cuprous sulfide as a conductive layer in a solution of sulfur such as benzene, toluene, xylene, ether, or alcohol, the sulfurization reaction proceeds.
A change from cuprous sulfide to cupric sulfide is observed, but amines that generate free sulfur, such as n
- The sulfurization reaction is promoted by adding butylamine, ethanolamine, morpholine, ethylenediamine, piperidine, etc. At this time, the concentration of sulfur in the solution is 0
.. 5 to 3% by weight, and the concentration of amine is 0.1 to 3% by weight.
A weight percent range is preferred.

またこれら硫黄の溶液に紫外線や電子線、γ線などを照
射することによっても遊離硫黄を発生させて、短時間で
硫化第一銅を硫化第二銅へと変えることもできる。
Free sulfur can also be generated by irradiating these sulfur solutions with ultraviolet rays, electron beams, gamma rays, etc., and cuprous sulfide can be converted into cupric sulfide in a short time.

その他に含硫黄化合物として硫化アンモニウム、硫化ナ
トリウム、硫化カリウム等の水溶液及びこれらの多硫化
物、即ちポリ硫化アンモニウム、ポリ硫化ナトリウム、
ポリ硫化カリウム水溶液なども硫化第一銅を硫化第二銅
に変えることができる。この際溶液中の含1m4硫黄化
合物の濃度は2〜20重量%の範囲が好ましい。
In addition, aqueous solutions of ammonium sulfide, sodium sulfide, potassium sulfide, etc. as sulfur-containing compounds, and polysulfides of these, i.e. ammonium polysulfide, sodium polysulfide,
Potassium polysulfide aqueous solution can also convert cuprous sulfide to cupric sulfide. At this time, the concentration of the 1 m4 sulfur-containing compound in the solution is preferably in the range of 2 to 20% by weight.

本発明の硫化第二銅からなる導電層を有する導電体は導
電層が導電体中に3〜20重量%の範囲設けられている
のが好ましく、これより少ないと導電性が低く始妻参≠
唸4、またこれより多くても導電層の向上はなく経済的
でない。
In the conductor having a conductive layer made of cupric sulfide of the present invention, it is preferable that the conductive layer is provided in the conductor in an amount of 3 to 20% by weight; if the amount is less than this, the conductivity is low and
Even if the number is 4 or more, the conductive layer will not be improved and it is not economical.

導電層はすべてが硫化第二銅になっている場合が最も導
電性が高く好ましいものであるが、少なくとも20%含
有されていれば、硫化第一銅のみからなる場合に比べ2
倍以上の導電層を示し十分実用に供することができる。
It is preferable that the conductive layer is made entirely of cupric sulfide because it has the highest conductivity, but if it contains at least 20%, it will have a higher conductivity than when it is made only of cuprous sulfide.
It has a conductive layer that is more than twice as large and can be put to practical use.

本発明によるニトリル基を含む高分子物質に硫化第二銅
からなる導電層が形成された導電体は、導電性が硫化第
一銅からなる導電体より少なくとも2倍以上、好ましく
は5倍以上優れたものであり、その用途としては、例え
ば電波吸収材料として電波暗室吸壁材、天井材、床材な
ど、電磁波シールド材料として各種事務機器、OA機器
等のカスケラト材料等、電波反射材料として不飽和ポリ
エステル樹脂との積層体としてパラボラアンテナ等の成
形材料、発熱体用抵抗体として面状発熱体抵抗素子、テ
ープ状発熱体抵抗素子等、静電気関係材料として静電気
障害防止用フオーム、電子材料関係の静電気遮蔽材料、
集塵機用導電マット材、低周波治療用材料やイオン静電
気治療用材料として電床用マット、敷布団、マツトレス
、小型温湿布用マット等の広い分野の材料として使用さ
れる。
The conductor according to the present invention, in which a conductive layer made of cupric sulfide is formed on a polymeric substance containing a nitrile group, has electrical conductivity that is at least twice as good, preferably at least five times as good as that of a conductor made of cuprous sulfide. Its uses include, for example, electromagnetic wave absorbing materials such as anechoic chamber wall materials, ceiling materials, and flooring materials; electromagnetic wave shielding materials such as caskerat materials for various office equipment and OA equipment; and unsaturated materials as radio wave reflecting materials. As a laminate with polyester resin, it is used as a molding material for parabolic antennas, etc. As a resistor for a heating element, it is used as a sheet heating element resistance element, as a tape heating element resistance element, etc. As a static electricity-related material, it is used as a foam for preventing static electricity damage, and as a static electricity related to electronic materials. shielding material,
It is used as a conductive mat material for dust collectors, a material for low frequency therapy, a material for ionic electrostatic therapy, and as a material for a wide range of fields, such as mats for electric beds, mattresses, mattresses, and small warm compress mats.

次に実施例及び比較例を挙げて本発明を説明するが、何
らこれら実施例に限定されるものではない。
Next, the present invention will be explained with reference to Examples and Comparative Examples, but the present invention is not limited to these Examples in any way.

なお、実施例中に示す%はすべて重量%のことである。Note that all percentages shown in the examples are percentages by weight.

実施例1 アクリル繊維を二価の銅塩と含硫黄還元剤の水溶液で処
理することで得られた、硫化第一銅を導電層とする導電
性繊維(サンダーロン5S−N■日本蚕毛染色社製)の
亀甲編み(メリヤス編の一種)加工された布(厚さ1.
1mm)を、糸が連続している方向に54mm、それと
直角方向に50mmの大きさに5枚切り、1枚は標準試
料として処理を行なわず、外の4枚についてはそれぞれ
下記の条件で硫化処理を行なった。
Example 1 Conductive fiber with cuprous sulfide as a conductive layer obtained by treating acrylic fiber with an aqueous solution of a divalent copper salt and a sulfur-containing reducing agent (Thunderon 5S-N Japan Silk Hair Dying) (manufactured by the company) processed tortoiseshell knit (a type of stockinette knit) cloth (thickness 1.
1 mm) was cut into 5 pieces of 54 mm in the direction of continuous thread and 50 mm in the perpendicular direction. One piece was not treated as a standard sample, and the other four pieces were sulfurized under the following conditions. Processed.

処理l 硫黄1%トルエン溶液に−H授精処理2 硫黄
1%、モルホリン1%トルエン溶液に−1授精 処理3 硫黄1%、n−ブチルアミン1%トルエン溶液
に−1授精 処理4 硫黄1%忰トルエン溶液に授精後直ちに高圧水
銀灯(出力4Kw東芝製)に て30秒紫外線を照射した。
Treatment 1 -H insemination treatment in 1% sulfur toluene solution 2 -1 insemination treatment 3 in sulfur 1%, morpholine 1% toluene solution -1 insemination treatment 4 in sulfur 1%, n-butylamine 1% toluene solution 4 Immediately after the solution was inseminated, it was irradiated with ultraviolet rays for 30 seconds using a high-pressure mercury lamp (output 4Kw manufactured by Toshiba).

これらの処理をした布をトルエンにて十分に洗浄し、乾
燥後、接触抵抗の影響を防ぐために、糸が連続している
方向の両端に2mm幅で導電性銀塗料(ドータイ)D−
550、藤倉化成製)を塗布し、工時間以上放置乾燥さ
せた後胴の電極を接続し、サンプルサイズ50mm角の
布の面抵抗を抵抗計にて測定した。標準試料として未処
理品の抵抗値も併せて測定した。表1にその結果を示す
。これら処理品は緑色もしくは深緑色を呈しており、未
処理品のオリーブ色とは外観上も異なっていた。
After thoroughly washing the treated cloth with toluene and drying, conductive silver paint (Dotai) D- is applied to both ends in the direction in which the threads are continuous in a 2 mm width to prevent the influence of contact resistance.
550 (manufactured by Fujikura Kasei Co., Ltd.) was applied and left to dry for more than the working time, the electrodes on the rear body were connected, and the sheet resistance of a cloth with a sample size of 50 mm square was measured using a resistance meter. The resistance value of an untreated product was also measured as a standard sample. Table 1 shows the results. These treated products had a green or deep green color, which was different in appearance from the olive color of the untreated products.

表1 抵抗の測定結果 これらの導電性m維のX線回析を測定したところ未処理
品は回折角2θ=46.3° 。
Table 1 Resistance measurement results When the X-ray diffraction of these conductive m-fibers was measured, the untreated product had a diffraction angle of 2θ=46.3°.

32.1’ 、27.7’にCu1.BSに針呑相当す
る回折ピークを示したが、上記の硫化処理したサンプル
は抵抗値の低下している順に従い、これらのCul、8
sの回折ピークが減少し、新たに20=47.8’ 、
31.7” 、29.2”にCuSに相当する解析ピー
クが現われた。
Cu1.32.1' and 27.7'. Although the BS showed a diffraction peak corresponding to a pinhole, the sulfurized samples described above were in the order of decreasing resistance value, and these Cul, 8
The diffraction peak of s decreases and is newly 20=47.8',
Analysis peaks corresponding to CuS appeared at 31.7" and 29.2".

実施例2 実施例1で用いた導電性繊維(サングーロンSS−内の
加工布を表2に示すような条件でポリ硫化アンモニ壬つ
ム水溶液(ポリ硫化アンモ−後、実施例1と同様に糸の
連続している方向の面抵抗値を測定した。(表2) 表2 NO04の条件で処理したサンプルについてX線回析を
測定したところ、Cu1.8Sの回折角2 θ =46
.3 ° 、 32.1’ 、27.7 ° イリ 近
のピークはほとんど消失しており新たにCuSの回折角
である2θ=47.8’ 、31.7” 。
Example 2 The conductive fibers (Sangouron SS) used in Example 1 were treated with an aqueous polyammonium sulfide solution (ammonium polysulfide) under the conditions shown in Table 2. (Table 2) Table 2 When X-ray diffraction was measured for the sample treated under NO04 conditions, the diffraction angle 2 θ = 46
.. The peaks near 3°, 32.1', and 27.7° have almost disappeared, and the diffraction angles of CuS, 2θ=47.8', 31.7'', have been newly established.

29.2’のピーク′がはっきりと現われていた。A peak of 29.2' appeared clearly.

実施例3 アクリロニトリルを20%含有するポリマーポリオール
100重量部に対して水を4.4重量部、TDI−80
を48.5重量部その他整泡剤及び触媒を添加して密度
0.025g/crn’のニトリル基含有ポリウレタン
フォームを製造し、さらに熱処理によりセル膜を除去し
た。これを水酸化ナトリウムの15%水溶液に30分間
浸積重、水洗乾燥後水溶液にo、1 mole/Im度
の硫酸銅及び0.1 mole/In度のチオ硫酸ナト
リウム混合水溶液中で60°Cで60分間加熱処理後、
水洗乾燥したところ灰黒色の発泡体が得られた。この発
泡体の体積固有抵抗値は17.8Ωcmであった。この
発泡体をポリ硫化アンモニウム5%水溶液に60°Cで
20分浸授精、水洗乾燥したところ黒色の発泡体となっ
た。体積固有抵抗値を測定した結果2.72Ωcmに低
下していた。
Example 3 4.4 parts by weight of water and TDI-80 were added to 100 parts by weight of a polymer polyol containing 20% acrylonitrile.
A nitrile group-containing polyurethane foam having a density of 0.025 g/crn' was produced by adding 48.5 parts by weight of other foam stabilizers and catalysts, and the cell membrane was further removed by heat treatment. This was immersed in a 15% aqueous solution of sodium hydroxide for 30 minutes, washed with water, dried, and then heated at 60°C in a mixed aqueous solution of 1 mole/Im copper sulfate and 0.1 mole/In sodium thiosulfate. After heat treatment for 60 minutes at
After washing with water and drying, a gray-black foam was obtained. The volume resistivity value of this foam was 17.8 Ωcm. This foam was immersed in a 5% polyammonium sulfide aqueous solution at 60° C. for 20 minutes, washed with water and dried, resulting in a black foam. As a result of measuring the volume resistivity value, it was found to have decreased to 2.72 Ωcm.

実施例4 ポリアクリロニトリルの粉末なジメチルホルムア湾己≠
#;ドに溶解させ3.3%の溶液とし、ガラス板上で溶
媒蒸発法で、暑さ5JLmのフィルムを成膜した。この
フィルムを0 、05mole/lの硫酸銅及びチオ硫
酸ナトリウム混合溶液中で60”0.90分間処理した
ところ、体積固有抵抗値0.58Ωcmの導電性フィル
ムが得られた。さらにこのフィルムを1%硫黄及びn−
ブチルアミン1%トルエンの混合溶液中で60 ’0.
60分浸授精、洗浄、乾燥したところ、体積固有抵抗値
0.09ΩCmの導電性フィルムとなった。
Example 4 Powdered dimethyl form of polyacrylonitrile≠
A 3.3% solution was prepared by dissolving the solution in #; and a film having a heat strength of 5 JLm was formed on a glass plate by the solvent evaporation method. When this film was treated in a mixed solution of copper sulfate and sodium thiosulfate of 0.05 mole/l for 60 inches and 0.90 minutes, a conductive film with a volume resistivity of 0.58 Ωcm was obtained. % sulfur and n-
Butylamine in a mixed solution of 1% toluene for 60'0.
After immersion insemination for 60 minutes, washing, and drying, a conductive film with a volume resistivity of 0.09 ΩCm was obtained.

Claims (2)

【特許請求の範囲】[Claims] (1)ニトリル基を含む高分子物質に硫化第二銅からな
る導電層が形成されてなる導電体。
(1) A conductor in which a conductive layer made of cupric sulfide is formed on a polymeric material containing a nitrile group.
(2)硫化第一銅を導電層とするニトリル基を含む高分
子物質からなる導電体に、硫黄及び/又は含硫黄化合物
を反応させることにより導電層を硫化第二銅に変えるこ
とを特徴とする優れた導電性を有する導電体の製造方法
(2) It is characterized by changing the conductive layer to cupric sulfide by reacting sulfur and/or a sulfur-containing compound to a conductor made of a polymer material containing a nitrile group and having cuprous sulfide as the conductive layer. A method for manufacturing a conductor having excellent conductivity.
JP6746384A 1984-04-06 1984-04-06 Conductor and method of producing same Pending JPS60211704A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP6746384A JPS60211704A (en) 1984-04-06 1984-04-06 Conductor and method of producing same
DE8585302262T DE3573188D1 (en) 1984-04-06 1985-04-01 Electroconductive articles and a method of producing the same
EP19850302262 EP0160406B1 (en) 1984-04-06 1985-04-01 Electroconductive articles and a method of producing the same
US07/007,695 US4755394A (en) 1984-04-06 1987-01-28 Electroconductive articles and a method of producing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6746384A JPS60211704A (en) 1984-04-06 1984-04-06 Conductor and method of producing same

Publications (1)

Publication Number Publication Date
JPS60211704A true JPS60211704A (en) 1985-10-24

Family

ID=13345670

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6746384A Pending JPS60211704A (en) 1984-04-06 1984-04-06 Conductor and method of producing same

Country Status (1)

Country Link
JP (1) JPS60211704A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62290011A (en) * 1986-02-26 1987-12-16 タキロン株式会社 Epoxy resin based low electric resistance material and manufacture thereof
JPH04192218A (en) * 1990-11-27 1992-07-10 Idemitsu Kosan Co Ltd Method for manufacturing surface conductive high polymer material
JP2015054889A (en) * 2013-09-11 2015-03-23 独立行政法人産業技術総合研究所 Surface treatment method for polymer material

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62290011A (en) * 1986-02-26 1987-12-16 タキロン株式会社 Epoxy resin based low electric resistance material and manufacture thereof
JPH058528B2 (en) * 1986-02-26 1993-02-02 Takiron Kk
JPH04192218A (en) * 1990-11-27 1992-07-10 Idemitsu Kosan Co Ltd Method for manufacturing surface conductive high polymer material
JP2015054889A (en) * 2013-09-11 2015-03-23 独立行政法人産業技術総合研究所 Surface treatment method for polymer material

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