JPS61116712A - Manufacture of conductor - Google Patents

Manufacture of conductor

Info

Publication number
JPS61116712A
JPS61116712A JP23637884A JP23637884A JPS61116712A JP S61116712 A JPS61116712 A JP S61116712A JP 23637884 A JP23637884 A JP 23637884A JP 23637884 A JP23637884 A JP 23637884A JP S61116712 A JPS61116712 A JP S61116712A
Authority
JP
Japan
Prior art keywords
sulfur
sulfide
conductor
copper ions
cupric
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP23637884A
Other languages
Japanese (ja)
Inventor
正己 青木
隆 大橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bridgestone Corp
Original Assignee
Bridgestone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bridgestone Corp filed Critical Bridgestone Corp
Priority to JP23637884A priority Critical patent/JPS61116712A/en
Priority to EP19850302262 priority patent/EP0160406B1/en
Priority to DE8585302262T priority patent/DE3573188D1/en
Publication of JPS61116712A publication Critical patent/JPS61116712A/en
Pending legal-status Critical Current

Links

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は導電体の製造方法に係り、特に高分子物質に硫
化第二銅を付着させた導電体の製造方法に関するもので
ある。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a method for manufacturing an electric conductor, and particularly to a method for manufacturing an electric conductor in which cupric sulfide is attached to a polymeric substance.

[従来の技術] 従来、導電性高分子材料を製造する方法として、ニトリ
ル基を含む高分子物質1例えばアクリル繊維やアクリロ
ニトリルフィルム等に硫化第一銅を刺着せしめることで
導電層を有する繊維、フィルム等を製造する方法が知ら
れている。しかして、硫化第一銅を付着させるには、二
価の銅化合物と還元剤を含む水溶液中あるいは一価の銅
化合物の水溶液中に、高分子物質を浸漬することにより
一価の銅イオンを吸着させ、次いであるいは同時に、こ
れを硫黄原子及び硫黄イオンの両方もしくはいずれか一
方を放出し得る化合物を含む水溶液で処理することによ
り、銅イオンが硫化第一銅としてニトリル基等の高分子
物質の官能基に配置したものとする。
[Prior Art] Conventionally, as a method for producing a conductive polymer material, a fiber having a conductive layer is produced by pricking cuprous sulfide onto a polymer substance 1 containing a nitrile group, such as an acrylic fiber or an acrylonitrile film. Methods for manufacturing films and the like are known. However, in order to attach cuprous sulfide, monovalent copper ions are removed by immersing a polymeric substance in an aqueous solution containing a divalent copper compound and a reducing agent or in an aqueous solution of a monovalent copper compound. By adsorbing copper ions and then or simultaneously treating them with an aqueous solution containing a compound capable of releasing sulfur atoms and/or sulfur ions, copper ions can be converted into cuprous sulfide into polymeric substances such as nitrile groups. Assume that it is placed in a functional group.

このようにして得られる導電層の硫化第一銅(CIJ2
S)は、実際には化学量論的にわずかにずれた組成Cu
  S(1,75≦xく2)であす、P型半導体挙動を
示すことが報告されている。
Cuprous sulfide (CIJ2) of the conductive layer thus obtained
S) actually has a slightly stoichiometrically shifted composition Cu
It has been reported that S (1,75≦x2) exhibits P-type semiconductor behavior.

しかしながら、このような方法により製造される硫化第
一銅を導電層とする導電体は、導電性の面からは十分満
足できるものとはいえなかった。
However, a conductor having a conductive layer made of cuprous sulfide produced by such a method cannot be said to be fully satisfactory in terms of conductivity.

一方、本来、硫化第二銅(Cu S)は硫化第一銅に比
べlオーダー以上の高い導電性゛を示すことが知られて
いる。しかしながら、二価の銅イオンは一価の銅イオン
に比べ、官能基への配位能力が劣るため、硫化第二銅を
導電層とする複合導電体の製造は困難であった。
On the other hand, it is known that cupric sulfide (CuS) originally exhibits a high electrical conductivity on the order of 1 or more compared to cuprous sulfide. However, since divalent copper ions have poorer ability to coordinate with functional groups than monovalent copper ions, it has been difficult to manufacture composite conductors using cupric sulfide as a conductive layer.

本発明者らは先に硫化第二銅の優れた導電性を利用した
導電材料を得るべく、検討した結果、従来の硫化第一銅
を導電層とする導電体に、硫黄又は含硫黄化合物を反応
させることにより、導電層の表層部からの大部分を硫化
第一銅から硫化第二銅へと変化させることができること
を見い出し、本出願人より出願した(特願昭59−67
463号、以下「先願」という、)。
The inventors of the present invention previously conducted studies to obtain a conductive material that utilizes the excellent conductivity of cupric sulfide. As a result, they added sulfur or sulfur-containing compounds to a conductor having a conductive layer made of cuprous sulfide. It was discovered that by reaction, most of the surface layer of the conductive layer could be changed from cuprous sulfide to cupric sulfide, and the applicant filed an application (Japanese Patent Application No. 59-67
No. 463, hereinafter referred to as the "prior application").

[発明が解決しようとする問題点] しかしながら、L記先願の方法は、高分子物質に予め硫
化第一銅を配位させる工程と、更に硫黄又は硫黄化合物
で処理してこれを硫化第二銅にする工程とを含み、処理
工程が多い、また、処理浴の廃液も多量なものとなる。
[Problems to be Solved by the Invention] However, the method of the prior application L requires a step of coordinating cuprous sulfide to a polymeric substance in advance, and then treating it with sulfur or a sulfur compound to form a compound with cuprous sulfide. There are many processing steps, including the step of converting copper into copper, and the amount of waste liquid from the processing bath is also large.

[問題点を解決するだめの手段] 本発明者らは上記の問題点を解消し、製造工程をより単
純なものにするべく、鋭意研究を重ねた結果、一価の銅
イオンを吸着した高分子物質を直接硫黄あるいは含硫黄
化合物と反応させることにより、硫化第一銅の層の形成
工程を経ることなく、導電性に優れた硫化第二銅の層を
もつ、導電体を得ることができることを見い出し、本発
明に到達した。
[Means to Solve the Problems] In order to solve the above-mentioned problems and simplify the manufacturing process, the inventors of the present invention have conducted intensive research and found that a high By directly reacting a molecular substance with sulfur or a sulfur-containing compound, it is possible to obtain a conductor with a cupric sulfide layer with excellent conductivity without going through the step of forming a cuprous sulfide layer. They discovered this and arrived at the present invention.

本発明は、 一価の銅イオンを吸着した高分子物質を硫黄及び/又は
含硫黄化合物と反応させることにより、一価の銅イオン
を硫化第二銅に変えることを特徴とする導電体の製造方
法、 を要旨とするものである。
The present invention is directed to the production of an electrical conductor characterized by converting monovalent copper ions into cupric sulfide by reacting a polymeric substance adsorbing monovalent copper ions with sulfur and/or a sulfur-containing compound. The method is summarized as follows.

本発明において用いられる一価の銅イオンを吸着させる
母体となる高分子物質としては、ニトリル基、ウレタン
基、エーテル基、エステル基等の極性基を含む高分子物
質が挙げられ、特に、ニトリル基含有ポリマーが好まし
い。
Examples of polymeric substances used in the present invention that serve as a matrix for adsorbing monovalent copper ions include polymeric substances containing polar groups such as nitrile groups, urethane groups, ether groups, and ester groups, and in particular, nitrile groups. Containing polymers are preferred.

このような高分子物質の母体の形状としては特に制限は
なく、繊維、フィルム、フオーム、粉体、シート等いか
なる形状のものでもよい。
There is no particular restriction on the shape of the matrix of such a polymeric substance, and it may be in any shape such as fiber, film, foam, powder, or sheet.

木聚明において、高分子物質に一価の銅イオンを吸着さ
せるには、まず一価の銅化合物の水溶液又は二価の銅化
合物と還元剤とを含む水溶液中に、前述の高分子物質を
浸漬する。使用される銅化合物のうち、一価の銅化合物
としては、塩化第一銅、ヨウ化第−銅、シアン化第−銅
、チオシアン耐錆等が挙げられ、二価の銅化合物として
は、硫酸第二銅、塩化第二銅、硝酸第二銅、酢酸第二銅
、シュウ酸相等が挙げられる。また二価の銅化合物と併
せて使用される還元剤としては、金属銅、硫M第一鉄1
次亜リン酸ナトリウム、ヒドロキシルアミン及びその塩
、バナジン877モノ、フルフラール、グルコース等カ
挙ifられる。
In Mujumei, in order to adsorb monovalent copper ions onto a polymeric substance, first the aforementioned polymeric substance is added to an aqueous solution of a monovalent copper compound or an aqueous solution containing a divalent copper compound and a reducing agent. Soak. Among the copper compounds used, examples of monovalent copper compounds include cuprous chloride, cupric iodide, cupric cyanide, and thiocyanide, and examples of divalent copper compounds include sulfuric acid. Examples include cupric acid, cupric chloride, cupric nitrate, cupric acetate, and oxalic acid phase. In addition, reducing agents used in conjunction with divalent copper compounds include metallic copper, ferrous sulfate,
Examples include sodium hypophosphite, hydroxylamine and its salts, vanadine 877 mono, furfural, and glucose.

この一価の銅イオンを吸着させる工程における処庁温度
は50−120”cが好ましく、また高分子物質の浸漬
時間は、銅化合物の濃度や、反応温度によっても異なる
が1例えば、塩化第一銅の0.4rnol/l濃度の溶
液中、60’Cで浸漬した場合において、好ましい銅イ
オン吸着量を得るためには90分程度が必要である。
The treatment temperature in this step of adsorbing monovalent copper ions is preferably 50-120"C, and the immersion time of the polymer substance varies depending on the concentration of the copper compound and the reaction temperature. When immersed in a copper solution with a concentration of 0.4rnol/l at 60'C, about 90 minutes are required to obtain a preferable amount of copper ion adsorption.

このようにして銅イオンを吸着させた高分子物質は、浴
から取り出し、必要に応じて水洗した後、あるいは、浴
中に浸漬した状態のままで、硫黄及び/又は含硫黄化合
物と反応させる0反応に際しては、銅イオンを吸着した
高分子物質に、硫黄又は含硫黄化合物の溶液もしくは蒸
気を均一に反応させることが重要である。
The polymer substance that has adsorbed copper ions in this way is removed from the bath, washed with water if necessary, or left immersed in the bath and reacted with sulfur and/or sulfur-containing compounds. During the reaction, it is important to uniformly react a solution or vapor of sulfur or a sulfur-containing compound with a polymeric substance that has adsorbed copper ions.

硫黄溶液としては、例えば硫黄のベンゼン、トルエン、
キシレン、エーテル、アルコール溶液等が挙げられ、こ
の溶液に、一価の銅イオンを吸着した高分子物質を浸漬
することにより、硫化反応が起こり、銅イオンは硫化第
二銅に変化する。この際、硫黄溶液に遊離硫黄を発生さ
せるアミン類、例えばn−ブチルアミン、エタノールア
ミン、モルホリン、エチレンジアミン、ピペリジン等を
添加することにより、硫化反応を促進することができる
。この際、硫黄溶液中の!黄の濃度は0.5〜3重量%
の範囲が好ましく、またアミン類を添加する場合、その
濃度は0.1〜3重量%の範囲が好ましい。
Examples of sulfur solutions include sulfur benzene, toluene,
Examples include xylene, ether, and alcohol solutions. By immersing a polymeric material that has monovalent copper ions adsorbed in this solution, a sulfurization reaction occurs, and the copper ions are converted to cupric sulfide. At this time, the sulfurization reaction can be promoted by adding amines that generate free sulfur, such as n-butylamine, ethanolamine, morpholine, ethylenediamine, piperidine, etc., to the sulfur solution. At this time, in the sulfur solution! Yellow concentration is 0.5-3% by weight
The concentration is preferably in the range of 0.1 to 3% by weight when amines are added.

硫黄反応はまた、これら硫黄溶液に紫外線や電子線、γ
線等を照射することによっても!離硫黄を発生させるこ
とができることから促進され、短時間で銅イオンを硫化
第二銅へと変えることができる。
The sulfur reaction also exposes these sulfur solutions to ultraviolet light, electron beams, and gamma
Also by irradiating lines etc! This is facilitated by the ability to generate sulfur removal, and it is possible to convert copper ions to cupric sulfide in a short time.

なお、N、員溶液の他に含硫黄化合物の溶液も同様に使
用できるが、含硫黄化合物の溶液としては、硫化アンモ
ニウム、硫化ナトリウム、硫化カリウム、及びこれらの
多硫化物、即ちポリ硫化アンモニウム、ポリ硫化ナトリ
ウム、ポリ硫化カリウム等の水溶液が挙げられる。溶液
中の含硫黄化合物の濃度は2〜20重量%の範囲が好ま
しい。
In addition, in addition to the nitrogen-containing solution, solutions of sulfur-containing compounds can also be used, but as solutions of sulfur-containing compounds, ammonium sulfide, sodium sulfide, potassium sulfide, and polysulfides thereof, i.e., polyammonium sulfide, Examples include aqueous solutions of sodium polysulfide, potassium polysulfide, and the like. The concentration of the sulfur-containing compound in the solution is preferably in the range of 2 to 20% by weight.

このような硫化反応の反応温度は、常温でもよいが、処
理時間を短縮するためには、加熱により50〜100℃
とするのが好ましい。
The reaction temperature for such a sulfurization reaction may be room temperature, but in order to shorten the treatment time, it may be heated to a temperature of 50 to 100°C.
It is preferable that

なお、本発明においては、得られる導電体の導電性を高
め、かつこれを効率よく製造するために、母体となる高
分子物質を予めアルカリ水溶液で処理して、あるいは母
体がフオームである場合には爆発法によりフオームに残
存するセル膜を除去した後、又は除去せずにそのままア
ルカリ水溶液で処理して1表面を粗化し″ておくことが
好ましい。
In the present invention, in order to increase the conductivity of the obtained conductor and to manufacture it efficiently, the base polymer material is treated with an alkaline aqueous solution in advance, or when the base material is a foam, It is preferable to roughen the surface of the foam by removing the cell membrane remaining on the foam by an explosive method, or by treating it with an alkaline aqueous solution as it is without removing it.

本発明により製造される導電体は優れた導電性を有する
ものであり、その用途としては、母体の形状によっても
異なるが、例えば電波吸収材料として電波暗室用吸収壁
材、天井材、床材など、電磁波シールド材料として各種
事務機器、OA機器等のガスケット材料等、電波反射材
料として不飽和ポリエステル樹脂との積層体としてパラ
ボラアンテナ等の成形材料、発熱体用抵抗体として面状
発熱体抵抗素子、テープ状発熱体抵抗素子等、静電気関
係材料として静電気障害防止用フオーム、電子材料関係
の静電気遮蔽材料、集塵機用導電マット材、低周波治療
用材料やイオン静電気治療用材料として電床用マット、
敷布団、マツトレス。
The conductor manufactured by the present invention has excellent conductivity, and its uses vary depending on the shape of the base material, but for example, it can be used as a radio wave absorbing material, such as absorbing wall materials for anechoic chambers, ceiling materials, floor materials, etc. , gasket materials for various office equipment and OA equipment as electromagnetic wave shielding materials, molding materials for parabolic antennas as laminates with unsaturated polyester resin as radio wave reflecting materials, planar heating element resistance elements as resistors for heating elements, Tape-shaped heating element resistance elements, etc., static electricity-related materials such as foam for preventing static electricity damage, static electricity shielding materials for electronic materials, conductive mat materials for dust collectors, mats for electric beds as materials for low-frequency treatment and ionic static electricity treatment,
Futon, pine tress.

小型温湿布用マット等、広い分野の材料として使用され
る。
It is used as a material in a wide range of fields, such as small warm compress mats.

[作用] 一価の銅イオンを吸着した高分子物質を殖菌及び/又は
含硫黄化合物と反応させることにより、一価の銅イオン
は極めて優れた導電性を有する硫化第二銅に効率良く変
えられる。従って、導電性に潰れた高性能の複合導電体
を容易に製造することができる。
[Effect] By reacting a polymer substance that has adsorbed monovalent copper ions with germs and/or sulfur-containing compounds, monovalent copper ions are efficiently converted to cupric sulfide, which has extremely excellent conductivity. It will be done. Therefore, it is possible to easily produce a high-performance composite conductor that is electrically conductive.

[実施例] 以下に実施例及び比較例を挙げて、本発明を更に具体的
に説明するが、本発明はその要旨を超えない限り以下の
実施例に限定されるものではない。
[Examples] The present invention will be described in more detail with reference to Examples and Comparative Examples below, but the present invention is not limited to the following Examples unless the gist thereof is exceeded.

実施例I、2 アクリロニトリルを20%含有するポリマーポリオール
100重量部に対して、水を4.4重量部、TDI−8
0を48,5重量部、その他整泡剤及び触媒を添加して
、0.0250g/crn’のフオームを作成し、更に
爆発法によりセル膜を除去した。
Examples I and 2 4.4 parts by weight of water and TDI-8 were added to 100 parts by weight of a polymer polyol containing 20% acrylonitrile.
0.0250 g/crn' was prepared by adding 48.5 parts by weight of 0.0, other foam stabilizers and catalysts, and the cell membrane was removed by an explosion method.

このものを水酸化ナトリウムの15重量%水溶液に60
分間浸漬し、水洗、乾燥後、塩化第一銅39.6gと塩
s8gを11の水に溶解混合した浴中に、60℃で90
分間(実施例1)又は120分間(実施例2)浸漬処理
した。処理後、フオームを軽く水洗し1次いで、ポリ硫
化アンモニウムの5重量%水溶液中に60℃で30分間
浸漬した後、水洗、乾燥した。フオームは濃い黒縁色と
なり、その表面抵抗(ρS)及び体積固有抵抗(ρマ)
は第1表に示す通りであった。また、X線回折の結果、
全ての試料中について2θ=29.2°、31.7°、
47.8°にCuSに相当する回折ピークが現われた。
This material was added to a 15% aqueous solution of sodium hydroxide for 60 minutes.
After soaking for 1 minute, rinsing with water, and drying, it was placed in a bath containing 39.6 g of cuprous chloride and 8 g of salt dissolved in 11 parts of water at 90°C at 60°C.
The samples were immersed for 1 minute (Example 1) or 120 minutes (Example 2). After the treatment, the foam was lightly washed with water, then immersed in a 5% by weight aqueous solution of polyammonium sulfide at 60° C. for 30 minutes, washed with water, and dried. The foam has a deep black edge color, and its surface resistance (ρS) and volume resistivity (ρMA)
were as shown in Table 1. In addition, as a result of X-ray diffraction,
2θ=29.2°, 31.7° in all samples,
A diffraction peak corresponding to CuS appeared at 47.8°.

なお、各々の試料のCuSの付着率(重量%)は第1表
に示す通りであった・ 第1表 比較例1 実施例1で用いたと同様のフオームを同じく水酸化ナト
リウムの15重量%水溶液に60分間浸漬し、水洗、乾
燥した。得られたフオームを、塩化第一銅39.6gと
塩酸8gをl立の水に溶解混合し、60℃に加熱し、更
にポリ硫化アンモニウムの5重量%水溶液を加えた浴中
に、60分間浸漬した。その後7オームを取り出し水洗
、乾燥したところ、フオームにほとんど変色はみられず
表面抵抗、体積固有抵抗は共に10’以上と大きく、X
線回折からもCuSに相当する回折ピークはみられなか
った。
The CuS adhesion rate (wt%) of each sample was as shown in Table 1. Table 1 Comparative Example 1 A foam similar to that used in Example 1 was also added to a 15% by weight aqueous solution of sodium hydroxide. The sample was soaked in water for 60 minutes, washed with water, and dried. The obtained foam was mixed by dissolving 39.6 g of cuprous chloride and 8 g of hydrochloric acid in 1 liter of water, heated to 60°C, and then placed in a bath containing a 5% by weight aqueous solution of ammonium polysulfide for 60 minutes. Soaked. After that, when I took out the 7 ohm, washed it with water, and dried it, there was almost no discoloration of the foam, and the surface resistance and volume resistivity were both large, over 10'.
No diffraction peak corresponding to CuS was observed in line diffraction.

一方、反応浴中に生成した黒縁色の粉末をX線回折した
ところ、CuSに相当する回折ピークがみられた。
On the other hand, when the black-rimmed powder produced in the reaction bath was subjected to X-ray diffraction, a diffraction peak corresponding to CuS was observed.

このことから、ワンショット法ではCuSは生成するが
、フオーム表面に付着しないことが判明した。
From this, it was found that although CuS was generated in the one-shot method, it did not adhere to the foam surface.

[効果] 以上詳述した通り、本発明の導電体の製造方法は、銅イ
オンを吸着した高分子物質を殖菌及び/又は含硫黄化合
物と反応させるものであり、一価て有用でエノる・ の銅イオンを直接的に導電性に優れた硫化第二銅に変え
ることができる。
[Effects] As detailed above, the method for producing a conductor of the present invention involves reacting a polymer material adsorbing copper ions with propagating bacteria and/or a sulfur-containing compound, which is uniquely useful and effective. - Can directly convert copper ions into cupric sulfide, which has excellent conductivity.

従って、本発明によれば、非常に簡略化された工程で容
易に、硫化第二銅を導’7を層として有する導電性に優
れた導電体を製造することができる。
Therefore, according to the present invention, it is possible to easily produce a highly conductive conductor having cupric sulfide conductor 7 as a layer through a very simplified process.

しかして、設備的には一価の銅イオンの浴と硫化反応の
浴の2つの浴のみあればよく、しかも、両温の間に水洗
のための装置を設ければ、生産を継続して行なった場合
にも、両温はほどんど汚れることがなく、従来の方法で
は不可能であった連続生産を可能なものとすることがで
きる。また、このように処理浴が少なく、浴汚染を防止
することが可能なことから、廃液の量は大幅に低減され
In terms of equipment, it is only necessary to have two baths, the monovalent copper ion bath and the sulfurization reaction bath, and if a water washing device is installed between the two temperatures, production can be continued. Even when this process is carried out, both temperatures are hardly contaminated, and continuous production, which was impossible with conventional methods, is possible. Furthermore, since the number of processing baths is small and bath contamination can be prevented, the amount of waste liquid is significantly reduced.

湿式処理で問題となる廃液処理の頻度を大幅に減少させ
ることができる。更に、反応工程数が、従来法に比べて
減少されるので全体的にみた加工時間を減少することが
でき、生産効率を大幅に向上させることができる。
The frequency of waste liquid treatment, which is a problem with wet treatment, can be significantly reduced. Furthermore, since the number of reaction steps is reduced compared to conventional methods, the overall processing time can be reduced, and production efficiency can be greatly improved.

Claims (1)

【特許請求の範囲】[Claims] (1)一価の銅イオンを吸着した高分子物質を硫黄及び
/又は含硫黄化合物と反応させることにより、一価の銅
イオンを硫化第二銅に変えることを特徴とする導電体の
製造方法。
(1) A method for producing a conductor, which is characterized by converting monovalent copper ions into cupric sulfide by reacting a polymeric substance that has adsorbed monovalent copper ions with sulfur and/or a sulfur-containing compound. .
JP23637884A 1984-04-06 1984-11-09 Manufacture of conductor Pending JPS61116712A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP23637884A JPS61116712A (en) 1984-11-09 1984-11-09 Manufacture of conductor
EP19850302262 EP0160406B1 (en) 1984-04-06 1985-04-01 Electroconductive articles and a method of producing the same
DE8585302262T DE3573188D1 (en) 1984-04-06 1985-04-01 Electroconductive articles and a method of producing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23637884A JPS61116712A (en) 1984-11-09 1984-11-09 Manufacture of conductor

Publications (1)

Publication Number Publication Date
JPS61116712A true JPS61116712A (en) 1986-06-04

Family

ID=16999899

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23637884A Pending JPS61116712A (en) 1984-04-06 1984-11-09 Manufacture of conductor

Country Status (1)

Country Link
JP (1) JPS61116712A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0459822A (en) * 1990-06-29 1992-02-26 Polyplastics Co Molding polyester resin having high melt thermal stability and its molded article
JPH04192218A (en) * 1990-11-27 1992-07-10 Idemitsu Kosan Co Ltd Method for manufacturing surface conductive high polymer material

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0459822A (en) * 1990-06-29 1992-02-26 Polyplastics Co Molding polyester resin having high melt thermal stability and its molded article
JPH04192218A (en) * 1990-11-27 1992-07-10 Idemitsu Kosan Co Ltd Method for manufacturing surface conductive high polymer material

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