JPS60210531A - 基板反応法によるシエブレル相化合物薄膜の製造方法 - Google Patents

基板反応法によるシエブレル相化合物薄膜の製造方法

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Publication number
JPS60210531A
JPS60210531A JP59065407A JP6540784A JPS60210531A JP S60210531 A JPS60210531 A JP S60210531A JP 59065407 A JP59065407 A JP 59065407A JP 6540784 A JP6540784 A JP 6540784A JP S60210531 A JPS60210531 A JP S60210531A
Authority
JP
Japan
Prior art keywords
copper
substrate
thin film
temp
mos2
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59065407A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6319445B2 (enExample
Inventor
Masao Taniguchi
雅男 谷口
Masataka Wakihara
脇原　将孝
Hirofumi Hinode
日野出　洋文
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Institute of Technology
Original Assignee
Tokyo Institute of Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Institute of Technology filed Critical Tokyo Institute of Technology
Priority to JP59065407A priority Critical patent/JPS60210531A/ja
Publication of JPS60210531A publication Critical patent/JPS60210531A/ja
Publication of JPS6319445B2 publication Critical patent/JPS6319445B2/ja
Granted legal-status Critical Current

Links

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  • Inorganic Compounds Of Heavy Metals (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
JP59065407A 1984-04-02 1984-04-02 基板反応法によるシエブレル相化合物薄膜の製造方法 Granted JPS60210531A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59065407A JPS60210531A (ja) 1984-04-02 1984-04-02 基板反応法によるシエブレル相化合物薄膜の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59065407A JPS60210531A (ja) 1984-04-02 1984-04-02 基板反応法によるシエブレル相化合物薄膜の製造方法

Publications (2)

Publication Number Publication Date
JPS60210531A true JPS60210531A (ja) 1985-10-23
JPS6319445B2 JPS6319445B2 (enExample) 1988-04-22

Family

ID=13286139

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59065407A Granted JPS60210531A (ja) 1984-04-02 1984-04-02 基板反応法によるシエブレル相化合物薄膜の製造方法

Country Status (1)

Country Link
JP (1) JPS60210531A (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63170348U (enExample) * 1987-04-28 1988-11-07

Also Published As

Publication number Publication date
JPS6319445B2 (enExample) 1988-04-22

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