JPS60205881A - Production of magnetic head slider - Google Patents

Production of magnetic head slider

Info

Publication number
JPS60205881A
JPS60205881A JP6227484A JP6227484A JPS60205881A JP S60205881 A JPS60205881 A JP S60205881A JP 6227484 A JP6227484 A JP 6227484A JP 6227484 A JP6227484 A JP 6227484A JP S60205881 A JPS60205881 A JP S60205881A
Authority
JP
Japan
Prior art keywords
substrate
slider
mask material
grooves
thickness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6227484A
Other languages
Japanese (ja)
Inventor
Mitsuo Oshiki
押木 満雄
Kazuo Nakamura
和男 中村
Ryoei Hikita
疋田 良栄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP6227484A priority Critical patent/JPS60205881A/en
Publication of JPS60205881A publication Critical patent/JPS60205881A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/10Structure or manufacture of housings or shields for heads

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Adjustment Of The Magnetic Head Position Track Following On Tapes (AREA)

Abstract

PURPOSE:To prevent the bending deformation of a small block substrate and to produce a slider with high accuracy by forming grooves to the counter surface of a recording medium of the small substrate of a parent body for slider to separate unit sliders with the same thickness as a mask material. CONSTITUTION:Grooves 31-3n are formed to a counter surface B of a recording medium of a small substrate 2 where plural magnetic heads consisting of N and S poles are arranged. Thus unit sliders are obtained by those grooves that have the depth equal to or larger than the thickness of a mask material 5 used in the next process. The surface is lapped and a mask material of chrome, titanium, etc. is formed on the surface B with 10-20mum thickness. Then the material 5 is divided by grooves 31-3n and therefore the tension of the material 5 is reduced. Thus the stress is released when the mask film is formed. In such a way, the bending deformation of the substrate 2 and produces a slider of high accuracy is prevented.

Description

【発明の詳細な説明】 (Ml 発明の技術分野 本発明は磁気ディスク装置に用いられる磁気ヘッドスラ
イダ−の形成方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION Technical Field of the Invention The present invention relates to a method of forming a magnetic head slider used in a magnetic disk drive.

O1+)従来技術と問題点 磁気ディスク装置に用いられる負圧スライダーは磁気記
録を行う磁気ヘッドを備え、記録媒体の回転に伴い発生
する空気流により浮上して前記記録媒体と所定の間隙を
保ちな゛がら媒体面上に磁気記録を行う。このような負
圧スライダーは、記録の効率化と、記録精度を良くする
ため、極低浮上と、浮上安定性が要求される。そこでこ
の要求を満たすため、高精度の形状を持った負圧スライ
ダーを形成する必要があり、従来は第1図(a)〜+d
+の負圧スライダーの形成過程を説明するための斜視図
に示すような負圧スライダー形成方法が用いられていた
O1+) Prior Art and Problems A negative pressure slider used in a magnetic disk device is equipped with a magnetic head that performs magnetic recording, and is floated by airflow generated as the recording medium rotates to maintain a predetermined gap with the recording medium. Magnetic recording is performed on the medium surface. Such a negative pressure slider is required to have extremely low flying height and flying stability in order to improve recording efficiency and recording accuracy. Therefore, in order to meet this requirement, it is necessary to form a negative pressure slider with a highly accurate shape, and conventionally
A negative pressure slider forming method as shown in a perspective view for explaining the process of forming a + negative pressure slider has been used.

すなわち、負圧スライダーの形成過程は、まず第1図1
alに示すように、ブロック基板1表面の長手方向およ
び短手方向に磁極N、 Sをペアとする複数の薄膜磁気
ヘッドをマトリックス状に配列形成する。次にこのブロ
ック基板1を第1図1alのX−Yに示す位置にて切断
し、長手方向に並列に複数の磁気ヘッドを有する第1回
申)のブロック基板2を形成する。なお、このブロック
基板2をブロック基板1と区別するため、ブロック小基
板と呼ぶことにする。次に、第1図(C1に示すように
、ブロック小基板2の磁気媒体と対向する面Bにイオン
エツチング用のクロームやチタン等のマスク材を10μ
m〜20.crmの厚さに成膜する。次に、第1図(d
lに示すように、前記第1図(C)にて成膜されたマス
クをパターンニングする。このパターンニングされたブ
ロック小基板2をドライミリング法により微細加工を行
い、第1図+e)に示すような複数の高精度な負圧スラ
イダーを形成する。次に、この複数の負圧スライダーを
1個毎に分離し、第1図(f)に示すような負圧スライ
ダーを形成する。
In other words, the process of forming the negative pressure slider is first shown in Fig. 1.
As shown in FIG. 1A, a plurality of thin film magnetic heads each having a pair of magnetic poles N and S are arranged in a matrix in the longitudinal and lateral directions of the surface of the block substrate 1. Next, this block substrate 1 is cut at the position indicated by X-Y in FIG. Note that in order to distinguish this block substrate 2 from the block substrate 1, it will be referred to as a block small substrate. Next, as shown in FIG. 1 (C1), a mask material such as chrome or titanium for ion etching is applied to the surface B of the block small substrate 2 facing the magnetic medium with a thickness of 10 μm.
m~20. A film is formed to a thickness of crm. Next, Figure 1 (d
As shown in FIG. 1, the mask formed in FIG. 1(C) is patterned. This patterned block small substrate 2 is microfabricated by dry milling to form a plurality of highly accurate negative pressure sliders as shown in FIG. 1+e). Next, the plurality of negative pressure sliders are separated one by one to form a negative pressure slider as shown in FIG. 1(f).

上述した負圧スライダーの第1図(c+のマスク形成工
程において、マスク材となるクロームやチタン等の膜厚
は10μm〜20μm程度の厚さで被着する必要がある
。この膜厚を持ったマスク材の内部応力は大きく、その
ためかかるマスク形成過程においてブロック小基板2を
第2図に示すように湾曲変形させる。それがため、負圧
スライダーの形状精度が得られないといった欠点がある
In the mask forming process shown in Figure 1 (c+) of the negative pressure slider described above, the film thickness of the mask material, such as chrome or titanium, must be deposited to a thickness of about 10 μm to 20 μm. The internal stress of the mask material is large, and therefore, during the mask forming process, the block small substrate 2 is deformed into a curve as shown in Fig. 2.Therefore, there is a drawback that the shape accuracy of the negative pressure slider cannot be obtained.

(C1発明の目的 本発明は上述した従来の負圧スライダー形成法の欠点に
鑑みて創案されたもので、マスク形成過程でブロック小
基板が変形することを防ぎ、高精度な形状の負圧スライ
ダーが得られる磁気ヘッドスライダ−形成方法を提供す
ることを目的とするものである。
(C1 Purpose of the Invention The present invention was devised in view of the drawbacks of the conventional negative pressure slider forming method described above. It prevents deformation of the block small substrate during the mask forming process, and creates a negative pressure slider with a highly accurate shape. It is an object of the present invention to provide a method for forming a magnetic head slider that provides the following.

(d) 発明の構成 そしてこの目的は本発明によれば、長手方向の基板表面
に複数の薄膜磁気ヘッドを並列して形成した、複数個の
スライダーの母体であるブロック基板の記録媒体対向面
にドライエツチング法により微細加工を行な今際に、上
記媒体対向面に微細加工用のマスク材を形成するに先立
って各単位スライダーに分離するための溝を該マスク材
の厚さと同等又はそれ以上の深さに形成するようにした
ことを特徴とする磁気ヘッドスライダ−の形成方法によ
り達せられる。
(d) Structure and object of the invention According to the present invention, a plurality of thin film magnetic heads are formed in parallel on the surface of the substrate in the longitudinal direction, and a block substrate, which is the base of a plurality of sliders, is formed on the surface facing the recording medium. When performing microfabrication using the dry etching method, before forming a mask material for microfabrication on the surface facing the medium, grooves for separating each unit slider are formed with a thickness equal to or greater than the thickness of the mask material. This is achieved by a method of forming a magnetic head slider characterized in that the magnetic head slider is formed to a depth of .

(el 発明の実施例 以下、添付図面により本発明の一実施例を詳細に説明す
る。第3図(a)〜(C)はかかる実施例による負圧ス
ライダーの形成過程を説明するための斜視図であり、第
1図と同一符号は同一部位を示している。
(el Embodiment of the Invention An embodiment of the present invention will be described below in detail with reference to the accompanying drawings. FIGS. 3(a) to 3(C) are perspective views for explaining the process of forming a negative pressure slider according to this embodiment. 1, the same reference numerals as in FIG. 1 indicate the same parts.

すなわち、第3図(a)はN、 Sの磁極からなる磁気
ヘッドが複数個並列に設けられたブロック小基板2の斜
視図を示している。次に第3回申)に示すようにブロッ
ク小基板2の記録媒体対向面Bに、各単位スライダーに
分離するための溝31〜3nを設ける。この溝31〜3
nは次工程の成膜に使用するマスク材の厚さと同等かそ
れ以上の深さに形成する。
That is, FIG. 3(a) shows a perspective view of a block small substrate 2 on which a plurality of magnetic heads each having N and S magnetic poles are provided in parallel. Next, as shown in Part 3), grooves 31 to 3n for separating each unit slider are provided on the recording medium facing surface B of the block small substrate 2. This groove 31-3
n is formed to a depth equal to or greater than the thickness of the mask material used for film formation in the next step.

次にこの溝31〜3nを有する媒体対向面Bは、ラッピ
ングしてから第3図(C1に示すように、全面にクロム
やチタン等のマスク材が10μm〜20μm程度の厚さ
で成膜される。
Next, the medium facing surface B having the grooves 31 to 3n is lapped and then a masking material such as chromium or titanium is deposited on the entire surface to a thickness of about 10 μm to 20 μm, as shown in FIG. 3 (C1). Ru.

前記マスク材の成膜状態は第4図のブロック小基板の側
面図に示すようなる。すなわち、成膜されたマスク材5
は溝31〜3n部分で分断されるか、最悪の場合でも該
溝と記録媒体対向面上部のエツジ部41〜4nで成膜の
厚さが薄くなりその張力は弱くなる。その結果、マスク
材5の成膜により発生する応力が開放され、成膜された
ブロック小基板2は平面の状態が保て、従来法による湾
曲等の歪が防止できる。
The film formation state of the mask material is as shown in the side view of the block small substrate in FIG. That is, the mask material 5 formed into a film
is divided at the grooves 31 to 3n, or in the worst case, the film thickness becomes thinner and the tension becomes weaker between the grooves and the edge portions 41 to 4n above the surface facing the recording medium. As a result, the stress generated by the film formation of the mask material 5 is released, and the film-formed block small substrate 2 can maintain a flat state, and distortions such as curvature caused by conventional methods can be prevented.

上記マスク材の成膜工程以後の形成工程は従来工程とほ
ぼ同じであり、成膜された記録媒体対向面Bのパターン
ニングおよびドライミリング法による微細加工と、前記
溝31〜3n部に沿ったブロック小基板2の切断加工に
よる負圧スライダ一単位の分離が行われ、所望の負圧ス
ライダーが形成される。
The formation process after the film formation process of the mask material is almost the same as the conventional process, including patterning of the formed recording medium facing surface B and fine processing by dry milling, and A negative pressure slider unit is separated by cutting the block small substrate 2, and a desired negative pressure slider is formed.

(fl 発明の効果 以上の説明から明らかなように本発明は、複数個の負圧
スライダーの母体であるブロック基板の記録媒体対向面
に所定の溝を設けた後マスク材を成膜するよう構成した
ことにより、マスク材の成膜による応力が開放され、ブ
ロック基板の湾曲等の歪の発生を防止でき、高精度の負
圧スライダーを得ることができる。
(fl Effects of the Invention As is clear from the above explanation, the present invention has a structure in which a mask material is formed after forming a predetermined groove on the recording medium facing surface of a block substrate, which is the base of a plurality of negative pressure sliders. As a result, stress caused by film formation of the mask material is released, distortion such as curvature of the block substrate can be prevented, and a highly accurate negative pressure slider can be obtained.

【図面の簡単な説明】[Brief explanation of drawings]

第1図(a)〜(f)は従来の負圧スライダーの形成過
程を説明するための斜視図、第2図は従来のブロツク基
板に対するマスク材形成工程における当該基板変形状態
を示す図、第3図Ta)〜to)は本発明の実施例によ
る負圧スライダーの形成過程を説明するための斜視図、
第4図は本発明の実施例におけるマスク材の成膜状態を
説明するためのブロック基板の側面図である。 図において、1はブロック基板、2は磁気ヘッドが並列
に設けられたブロック小基板、3ばマスク材、31〜3
nは溝、41〜4nはエツジ部、5はマスク材第1図 第2図
1(a) to 1(f) are perspective views for explaining the process of forming a conventional negative pressure slider, FIG. Figures 3 Ta) to 3 are perspective views for explaining the process of forming a negative pressure slider according to an embodiment of the present invention;
FIG. 4 is a side view of the block substrate for explaining the state of film formation of the mask material in the embodiment of the present invention. In the figure, 1 is a block substrate, 2 is a block small substrate on which magnetic heads are provided in parallel, 3 is a mask material, 31 to 3
n is a groove, 41 to 4n are edge portions, and 5 is a mask material (Fig. 1, Fig. 2).

Claims (1)

【特許請求の範囲】[Claims] 長手方向の基板表面に複数の1!膜磁気ヘツドを並列し
て形成した、複数個のスライダーの母体であるブロック
基板の記録媒体対向面にドライエツチング法により微細
加工を行なう際に、上記媒体対向面に微細加工用のマス
ク材を形成するに先立って各単位スライダーに分離する
ための溝を該マスク材の厚さと同等又はそれ以上の深さ
に形成するようにしたことを特徴とする磁気ヘッドスラ
イダ−の形成方法。
Multiple 1! on the substrate surface in the longitudinal direction! When carrying out microfabrication by dry etching on the recording medium facing surface of a block substrate, which is the base of a plurality of sliders on which film magnetic heads are formed in parallel, a mask material for microfabrication is formed on the medium facing surface. 1. A method for forming a magnetic head slider, comprising: forming grooves for separating each unit slider to a depth equal to or greater than the thickness of the mask material.
JP6227484A 1984-03-29 1984-03-29 Production of magnetic head slider Pending JPS60205881A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6227484A JPS60205881A (en) 1984-03-29 1984-03-29 Production of magnetic head slider

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6227484A JPS60205881A (en) 1984-03-29 1984-03-29 Production of magnetic head slider

Publications (1)

Publication Number Publication Date
JPS60205881A true JPS60205881A (en) 1985-10-17

Family

ID=13195396

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6227484A Pending JPS60205881A (en) 1984-03-29 1984-03-29 Production of magnetic head slider

Country Status (1)

Country Link
JP (1) JPS60205881A (en)

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