JPS60201316A - 反射光学系 - Google Patents

反射光学系

Info

Publication number
JPS60201316A
JPS60201316A JP59057581A JP5758184A JPS60201316A JP S60201316 A JPS60201316 A JP S60201316A JP 59057581 A JP59057581 A JP 59057581A JP 5758184 A JP5758184 A JP 5758184A JP S60201316 A JPS60201316 A JP S60201316A
Authority
JP
Japan
Prior art keywords
optical system
reflective
optical
aspherical
optical member
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59057581A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0533370B2 (enrdf_load_stackoverflow
Inventor
Takamasa Hirose
広瀬　隆昌
Akiyoshi Suzuki
章義 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59057581A priority Critical patent/JPS60201316A/ja
Publication of JPS60201316A publication Critical patent/JPS60201316A/ja
Publication of JPH0533370B2 publication Critical patent/JPH0533370B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G02B17/0812—Catadioptric systems using two curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP59057581A 1984-03-26 1984-03-26 反射光学系 Granted JPS60201316A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59057581A JPS60201316A (ja) 1984-03-26 1984-03-26 反射光学系

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59057581A JPS60201316A (ja) 1984-03-26 1984-03-26 反射光学系

Publications (2)

Publication Number Publication Date
JPS60201316A true JPS60201316A (ja) 1985-10-11
JPH0533370B2 JPH0533370B2 (enrdf_load_stackoverflow) 1993-05-19

Family

ID=13059815

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59057581A Granted JPS60201316A (ja) 1984-03-26 1984-03-26 反射光学系

Country Status (1)

Country Link
JP (1) JPS60201316A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008286888A (ja) * 2007-05-15 2008-11-27 Canon Inc 露光装置
JP2009158719A (ja) * 2007-12-26 2009-07-16 Canon Inc 露光装置およびデバイス製造方法
JP2017049438A (ja) * 2015-09-02 2017-03-09 株式会社目白６７ 観察装置
KR20240135355A (ko) 2023-03-03 2024-09-10 캐논 가부시끼가이샤 광학 장치, 투영 광학계, 노광 장치 및 물품 제조 방법

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008286888A (ja) * 2007-05-15 2008-11-27 Canon Inc 露光装置
JP2009158719A (ja) * 2007-12-26 2009-07-16 Canon Inc 露光装置およびデバイス製造方法
JP2017049438A (ja) * 2015-09-02 2017-03-09 株式会社目白６７ 観察装置
WO2017038219A1 (ja) * 2015-09-02 2017-03-09 株式会社目白６７ 観察装置
KR20240135355A (ko) 2023-03-03 2024-09-10 캐논 가부시끼가이샤 광학 장치, 투영 광학계, 노광 장치 및 물품 제조 방법

Also Published As

Publication number Publication date
JPH0533370B2 (enrdf_load_stackoverflow) 1993-05-19

Similar Documents

Publication Publication Date Title
US6157498A (en) Dual-imaging optical system
JP3747958B2 (ja) 反射屈折光学系
US7712905B2 (en) Imaging system with mirror group
USRE38403E1 (en) Projection optical system and projection exposure apparatus
US7239453B2 (en) Projection optical system and projection exposure apparatus
JP3747951B2 (ja) 反射屈折光学系
JP3395801B2 (ja) 反射屈折投影光学系、走査型投影露光装置、及び走査投影露光方法
JP5396673B2 (ja) 投影露光装置、投影露光方法及び投影対物レンズ
US5969882A (en) Catadioptric optical system
US5781278A (en) Projection optical system and exposure apparatus with the same
JPH05281469A (ja) 異なる屈折率の材質からなる適合された複数の要素を用いた広帯域光学縮小系
US7339743B2 (en) Very-high aperture projection objective
KR20020089204A (ko) 반사굴절 축소 렌즈
JPH08211294A (ja) 投影露光装置
US4688904A (en) Reflecting optical system
USRE38438E1 (en) Catadioptric reduction projection optical system and exposure apparatus having the same
US20020080498A1 (en) Projection optical system
US20040075894A1 (en) Catadioptric reduction objective
KR102205062B1 (ko) 자외선 손상에 대한 감수성이 감소된 윈-다이슨 투사렌즈
JP2002244046A (ja) カタディオプトリック縮小レンズ
KR100288990B1 (ko) 반사 굴절 축소 대물 렌즈
JPS60201316A (ja) 反射光学系
JP2000098228A (ja) 投影露光装置及び露光方法、並びに反射縮小投影光学系
JP2010519600A (ja) 瞳補正を有する反射屈折投影対物系
JP2005512151A (ja) カタジオプトリック縮小対物レンズ

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term