JPS60196701A - 回折格子の製造方法 - Google Patents

回折格子の製造方法

Info

Publication number
JPS60196701A
JPS60196701A JP5210084A JP5210084A JPS60196701A JP S60196701 A JPS60196701 A JP S60196701A JP 5210084 A JP5210084 A JP 5210084A JP 5210084 A JP5210084 A JP 5210084A JP S60196701 A JPS60196701 A JP S60196701A
Authority
JP
Japan
Prior art keywords
region
film
photoresist film
type
diffraction grating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5210084A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0374804B2 (enrdf_load_stackoverflow
Inventor
Shigeyuki Akiba
重幸 秋葉
Katsuyuki Uko
宇高　勝之
Kazuo Sakai
堺　和夫
Yuichi Matsushima
松島　裕一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KDDI Corp
Original Assignee
Kokusai Denshin Denwa KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kokusai Denshin Denwa KK filed Critical Kokusai Denshin Denwa KK
Priority to JP5210084A priority Critical patent/JPS60196701A/ja
Priority to US06/710,984 priority patent/US4660934A/en
Priority to GB08507413A priority patent/GB2157849B/en
Publication of JPS60196701A publication Critical patent/JPS60196701A/ja
Publication of JPH0374804B2 publication Critical patent/JPH0374804B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Optics & Photonics (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Optical Integrated Circuits (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
JP5210084A 1984-03-21 1984-03-21 回折格子の製造方法 Granted JPS60196701A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP5210084A JPS60196701A (ja) 1984-03-21 1984-03-21 回折格子の製造方法
US06/710,984 US4660934A (en) 1984-03-21 1985-03-12 Method for manufacturing diffraction grating
GB08507413A GB2157849B (en) 1984-03-21 1985-03-21 Method for manufacturing a diffraction grating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5210084A JPS60196701A (ja) 1984-03-21 1984-03-21 回折格子の製造方法

Publications (2)

Publication Number Publication Date
JPS60196701A true JPS60196701A (ja) 1985-10-05
JPH0374804B2 JPH0374804B2 (enrdf_load_stackoverflow) 1991-11-28

Family

ID=12905424

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5210084A Granted JPS60196701A (ja) 1984-03-21 1984-03-21 回折格子の製造方法

Country Status (1)

Country Link
JP (1) JPS60196701A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5033816A (en) * 1987-12-18 1991-07-23 Thomson-Csf Method for making a diffraction lattice on a semiconductor material
JP2004513504A (ja) * 2000-04-18 2004-04-30 オブドゥカト　アクティエボラーグ 構造体に関連する基板及びその製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5033816A (en) * 1987-12-18 1991-07-23 Thomson-Csf Method for making a diffraction lattice on a semiconductor material
JP2004513504A (ja) * 2000-04-18 2004-04-30 オブドゥカト　アクティエボラーグ 構造体に関連する基板及びその製造方法

Also Published As

Publication number Publication date
JPH0374804B2 (enrdf_load_stackoverflow) 1991-11-28

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees