JPS60194075A - 炭素皮膜の製造方法 - Google Patents
炭素皮膜の製造方法Info
- Publication number
- JPS60194075A JPS60194075A JP59049166A JP4916684A JPS60194075A JP S60194075 A JPS60194075 A JP S60194075A JP 59049166 A JP59049166 A JP 59049166A JP 4916684 A JP4916684 A JP 4916684A JP S60194075 A JPS60194075 A JP S60194075A
- Authority
- JP
- Japan
- Prior art keywords
- carbon film
- film
- gas
- poly
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Carbon And Carbon Compounds (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59049166A JPS60194075A (ja) | 1984-03-16 | 1984-03-16 | 炭素皮膜の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59049166A JPS60194075A (ja) | 1984-03-16 | 1984-03-16 | 炭素皮膜の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60194075A true JPS60194075A (ja) | 1985-10-02 |
JPS6147904B2 JPS6147904B2 (enrdf_load_stackoverflow) | 1986-10-21 |
Family
ID=12823492
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59049166A Granted JPS60194075A (ja) | 1984-03-16 | 1984-03-16 | 炭素皮膜の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60194075A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012156202A (ja) * | 2011-01-24 | 2012-08-16 | Kaneka Corp | グラフェン/高分子積層体およびその利用 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3033357U (ja) * | 1996-07-09 | 1997-01-21 | 株式会社リアル | 折りたたみ式整髪用ブラシ |
-
1984
- 1984-03-16 JP JP59049166A patent/JPS60194075A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012156202A (ja) * | 2011-01-24 | 2012-08-16 | Kaneka Corp | グラフェン/高分子積層体およびその利用 |
Also Published As
Publication number | Publication date |
---|---|
JPS6147904B2 (enrdf_load_stackoverflow) | 1986-10-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4923716A (en) | Chemical vapor desposition of silicon carbide | |
US5476679A (en) | Method for making a graphite component covered with a layer of glassy carbon | |
US4476178A (en) | Composite silicon carbide coatings for carbon-carbon materials | |
KR100287489B1 (ko) | 저온에서결정성탄화규소피막을형성시키는방법 | |
JP2001521045A5 (enrdf_load_stackoverflow) | ||
JPS59128281A (ja) | 炭化けい素被覆物の製造方法 | |
JPH05509132A (ja) | 化学蒸着法のための素材 | |
EP0266860B1 (en) | Infusible preceramic polymers via plasma treatment | |
US5082696A (en) | Method of forming semiconducting amorphous silicon films from the thermal decomposition of dihalosilanes | |
US5061514A (en) | Chemical vapor deposition (CVD) process for plasma depositing silicon carbide films onto a substrate | |
JPS60194075A (ja) | 炭素皮膜の製造方法 | |
JPS643801B2 (enrdf_load_stackoverflow) | ||
JP4592373B2 (ja) | 導電性モリブデンナイトライドゲート電極膜の形成方法 | |
JP2005310861A (ja) | 炭化窒化珪素膜の形成方法 | |
Jingsheng et al. | Nucleation and growth of diamond on silicon substrate coated with polymer | |
Min et al. | Atomic Layer Deposition of TiN Thin Films by Sequential Introduction of Ti Precursor and NH3 | |
JP4591917B2 (ja) | 導電性モリブデンナイトライド膜形成方法 | |
Sreenivas et al. | Effects of nitrogen doping on the growth and properties of plasma-enhanced chemical-vapor-deposited diamond-like-carbon films | |
Mathur et al. | Vapor deposition of parylene-F using hydrogen as carrier gas | |
EP0262980B1 (en) | Method of forming semiconducting amorphous silicon films from the thermal decomposition of dihalosilanes | |
WO2024147339A1 (ja) | SiC含有膜、及びその製造方法 | |
KR100229439B1 (ko) | 반도체 소자용 확산방지막 제조 방법 | |
KR101128303B1 (ko) | 막형성재료, 막형성방법 및 소자 | |
CN119913477A (zh) | 一种沉积碳化硅涂层及其制备方法和应用 | |
JPS5988307A (ja) | 炭化けい素被覆物の製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |