JPS60192945A - マスク・プリント方法 - Google Patents

マスク・プリント方法

Info

Publication number
JPS60192945A
JPS60192945A JP59048802A JP4880284A JPS60192945A JP S60192945 A JPS60192945 A JP S60192945A JP 59048802 A JP59048802 A JP 59048802A JP 4880284 A JP4880284 A JP 4880284A JP S60192945 A JPS60192945 A JP S60192945A
Authority
JP
Japan
Prior art keywords
mask
layer
pattern
chip
coordinates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59048802A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6333702B2 (enExample
Inventor
Satoshi Niihara
新井原　聡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP59048802A priority Critical patent/JPS60192945A/ja
Publication of JPS60192945A publication Critical patent/JPS60192945A/ja
Publication of JPS6333702B2 publication Critical patent/JPS6333702B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59048802A 1984-03-14 1984-03-14 マスク・プリント方法 Granted JPS60192945A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59048802A JPS60192945A (ja) 1984-03-14 1984-03-14 マスク・プリント方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59048802A JPS60192945A (ja) 1984-03-14 1984-03-14 マスク・プリント方法

Publications (2)

Publication Number Publication Date
JPS60192945A true JPS60192945A (ja) 1985-10-01
JPS6333702B2 JPS6333702B2 (enExample) 1988-07-06

Family

ID=12813342

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59048802A Granted JPS60192945A (ja) 1984-03-14 1984-03-14 マスク・プリント方法

Country Status (1)

Country Link
JP (1) JPS60192945A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62183517A (ja) * 1986-02-07 1987-08-11 Canon Inc 露光方法
US4784182A (en) * 1987-10-05 1988-11-15 Nobuyuki Sugimura Bladder type accumulator associated with a sensor

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62183517A (ja) * 1986-02-07 1987-08-11 Canon Inc 露光方法
US4784182A (en) * 1987-10-05 1988-11-15 Nobuyuki Sugimura Bladder type accumulator associated with a sensor

Also Published As

Publication number Publication date
JPS6333702B2 (enExample) 1988-07-06

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