JPS60189934A - Applying method of viscous liquid - Google Patents

Applying method of viscous liquid

Info

Publication number
JPS60189934A
JPS60189934A JP4626284A JP4626284A JPS60189934A JP S60189934 A JPS60189934 A JP S60189934A JP 4626284 A JP4626284 A JP 4626284A JP 4626284 A JP4626284 A JP 4626284A JP S60189934 A JPS60189934 A JP S60189934A
Authority
JP
Japan
Prior art keywords
substrate
viscous liquid
processed
treated
viscous
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4626284A
Other languages
Japanese (ja)
Inventor
Shuji Nakao
中尾 修治
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP4626284A priority Critical patent/JPS60189934A/en
Publication of JPS60189934A publication Critical patent/JPS60189934A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16Coating processes; Apparatus therefor
    • G03F7/162Coating on a rotating support, e.g. using a whirler or a spinner

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To form a viscous-liquid applying film with a flat surface with no irregularities on the surface of a substrate to be treated, a surface section thereof has irregularities, by action to a viscous liquid of centrifugal force by rotating on its own axis and revolving the substrate to be treated on which the viscous liquid adheres. CONSTITUTION:A substrate to be treated 50 is sucked under a vacuum so that the central section of the surface of the substrate coincides with the central section of the surface of a base plate 1. The substrate to be treated 50 is turned at low speed by operating a motor 3 while a rotating disk 8 is rotated at low speed by operating a motor 10. A required quantity of a viscous liquid is injected and attached to the central section of the surface of the substrate 50 to be treated from a viscous-liquid injection pipe 7. The substrate 50 to be treated is turned at high speed, and the viscous liquid adhering to the central section of the surface is spread to the peripheray of the surface of the substrate 50 to be treated by the centrifugal force of the revolution. The number of revolution of the motor 10 is increased and the rotating disk 8 is turned at high speed at the same time as the viscous liquid is spread, and large centrifugal force in the direction vertical to the surface of the substrate 50 to be treated is worked to the viscous liquid by the revolution.

Description

【発明の詳細な説明】 〔発明の技術分野〕 仁の発明は表面部に凹凸のある半導体集積回路装置(I
C)基板などの被処理基板の表面上に粘性液を塗布する
方法に関するものである。
[Detailed Description of the Invention] [Technical Field of the Invention] Jin's invention is a semiconductor integrated circuit device (I) having an uneven surface.
C) It relates to a method of applying a viscous liquid onto the surface of a substrate to be processed, such as a substrate.

〔従来技術〕[Prior art]

従来、表面部に凹凸のあるIC基板などの被処理基板の
表面上にフォトレジスト剤、シリカ溶液などの粘性液を
塗布する場合には、スピンコーターが用いらり、でいた
Conventionally, a spin coater has been used to apply a viscous liquid such as a photoresist agent or a silica solution onto the surface of a substrate to be processed such as an IC substrate that has an uneven surface.

第1図はスピンコーターの一例の主要構成要素を示す要
部断面図である0 図において、(1)は表面部に凹凸のある被処理基板−
が上面上に載置され真空吸着される載置台、(2)は載
置台(1)の下面の中心部に一端部が固着され載置台(
1)を図示矢印の方向に高速回転させる回転軸、(3)
は回転軸(2)の他端部に設けられ回転軸(2)を図示
矢印の方向に高速回転させるモータ、(4)は回転軸(
2)の軸線に沿い一端部が載置台(1)の上面に開口し
他端部が回転軸(2)の側面に開口するように設けられ
載置台(1)の上面上に載置された被処理基板−を真空
吸着するための真空孔、(5)は回転軸(2)を取り囲
み回転軸(2)側が開口するコの字状の横断面形状を有
し真空孔(4)の開口を覆うように設けられ後述の真空
ホースを真空孔(4)に連結させる連結環である。なお
、連結環(5)の開口端面は比較的柔軟なQ IJング
(図示せず)などを介して回転軸(2)の側面に気密に
接し回転軸(2)の回転に支障のないように構成さ」t
ている。(6)は一端部が連結環(5)の側壁を貫通し
て連結環(5)内に開口し他端部が真空装橋′(図示せ
ず)に連結された真空ホース、(7)は載置台(1)の
上面の中心部の上方の位置に設けられ載置台(11の上
面上に真空吸着された被処理基板−の表面の中心部上に
所要量の粘性液を射出し付着させる粘性液射出管である
FIG. 1 is a cross-sectional view of the main components of an example of a spin coater. In FIG.
The mounting table (2) is placed on the upper surface and is vacuum-adsorbed, and the mounting table (2) has one end fixed to the center of the lower surface of the mounting table (1).
A rotating shaft (3) that rotates 1) at high speed in the direction of the arrow shown in the figure.
(4) is a motor that is installed at the other end of the rotating shaft (2) and rotates the rotating shaft (2) at high speed in the direction of the arrow in the figure;
Along the axis of 2), one end opened on the top surface of the mounting table (1) and the other end opened on the side surface of the rotating shaft (2), and was placed on the top surface of the mounting table (1). The vacuum hole (5) for vacuum suctioning the substrate to be processed has a U-shaped cross-sectional shape that surrounds the rotation shaft (2) and opens on the rotation shaft (2) side, and the opening of the vacuum hole (4). This is a connecting ring that is provided to cover the vacuum hole (4) and connects a vacuum hose (described later) to the vacuum hole (4). The opening end surface of the connecting ring (5) is in airtight contact with the side surface of the rotating shaft (2) via a relatively flexible QIJ ring (not shown), etc., so that the rotation of the rotating shaft (2) is not hindered. Composed of
ing. (6) is a vacuum hose with one end penetrating the side wall of the connecting ring (5) and opening into the connecting ring (5), and the other end connected to a vacuum bridge (not shown); (7) is installed above the center of the top surface of the mounting table (11) and injects a required amount of viscous liquid onto the center of the surface of the substrate to be processed, which is vacuum-adsorbed onto the top surface of the mounting table (11). This is a viscous liquid injection tube.

次に、このスピンコーターの作用について説明台(1)
の上面の中心部と一致するようにして載置台(1)の上
面上に載置し真空吸着する。次に、粘性液射出管(7)
から所要量の粘性液を被処理基板−の表面の中心部上に
射出し付着させたのちに、回転軸(2)を図示矢印の方
向に回転させて被処理基板−を回転させると、被処理基
板−の表面の中心部上に射出された粘性液が、被処理基
板−の回転による遠心力によって、被処理基板間の表面
の周縁へ向って広が抄周縁から粘性液の不要部分が外部
へ飛散し、被処理基板−の表面上に粘性液塗布膜(51
)が成膜される。
Next, we will explain the operation of this spin coater at the table (1).
It is placed on the top surface of the mounting table (1) so that it coincides with the center of the top surface, and vacuum suction is applied. Next, viscous liquid injection tube (7)
After injecting and depositing the required amount of viscous liquid onto the center of the surface of the substrate to be processed, the rotating shaft (2) is rotated in the direction of the arrow in the figure to rotate the substrate to be processed. The viscous liquid injected onto the center of the surface of the processing substrate spreads toward the periphery of the surface between the processing substrates due to the centrifugal force caused by the rotation of the processing substrate, and the unnecessary portion of the viscous liquid is removed from the paper periphery. It scatters to the outside and forms a viscous liquid coating film (51) on the surface of the substrate to be processed.
) is deposited.

ところで、このスピンコーターを用いる従来の粘性液の
塗布方法では、被処理基板−の表面上の粘性液には、被
処理基板(ト)の回転によって被処理基板−の表面に沿
い中心部から周縁に向う方向の遠心力が作用するが、被
処理基板−の表面の垂直方向に作用する力が重力のみで
あるので、粘性液塗布膜(51)の表面に、被処理基板
−の表面部の凹凸に対応した凹凸ができる0この粘性液
塗布IIIK51)の表面の凹凸は、微細加工を必要と
するICなどの製造においては、重大な欠点となってい
た。
By the way, in the conventional method of applying a viscous liquid using this spin coater, the viscous liquid on the surface of the substrate to be processed is coated along the surface of the substrate from the center to the periphery by rotation of the substrate to be processed. However, since the only force acting in the direction perpendicular to the surface of the substrate to be processed is gravity, the surface of the substrate to be processed is The unevenness on the surface of this viscous liquid coating IIIK51), which creates unevenness corresponding to the unevenness, has been a serious drawback in the manufacture of ICs and the like that require microfabrication.

〔発明の概要〕[Summary of the invention]

この発明は、かかる欠点を除去する目的でなされたもの
で、表面部に凹凸のある被処理基板の表面上の中心部に
所要量の粘性液を付着させ、この粘性液が付着した被処
理基板を、その表面の中心を通る法線を軸線として自転
させるとともに被処理基板の中心軸のこの被処理基板の
粘性液付着面側の延長線上に中心を有する所定半径の円
周に沿うて公転させることによって、被処理基板のこれ
らの自転・公転による遠心力の粘性液への作用により、
表面部に凹凸のある被処理基板の表面上に凹凸のない平
担な表面を有する粘性液塗布膜を成膜することができる
方法を提供するものである。
The present invention has been made with the aim of eliminating such drawbacks, and involves depositing a required amount of viscous liquid onto the center of the surface of a substrate to be processed, which has an uneven surface, and is rotated about its axis about a normal line passing through the center of its surface, and also revolved along a circumference of a predetermined radius whose center is on an extension of the central axis of the substrate to be processed on the side of the viscous liquid adhering surface of the substrate to be processed. Due to the action of centrifugal force on the viscous liquid due to these rotations and revolutions of the substrate to be processed,
The present invention provides a method capable of forming a viscous liquid coating film having a flat surface with no unevenness on the surface of a substrate to be processed whose surface portion is uneven.

〔発明の実施例〕[Embodiments of the invention]

第2図はこの発明の一実施例の粘性液の塗布方法に用い
る粘性液塗布装置の主要構成要素を一部断面で示す正面
図である。
FIG. 2 is a front view, partially in cross section, of the main components of a viscous liquid coating device used in a viscous liquid coating method according to an embodiment of the present invention.

図忙おいて、第1図に示した符号と同一符号は同等部分
を示す。(8)は図示矢印の方向如回転する回転円板、
(9)は回転−旬板(8)の下面の中心部に一端部が固
着され回転円板(8)を図示矢印の方向に回転させる回
転軸、QIは回転軸(9)の他端部に設けられ回転軸(
9)を回転させるモータ、(11a)および(llb)
はそれぞれ一方の端部が回転円板(8)の上面の周縁部
の回転軸(9)の軸線に関し対称の位置に固着され第1
図に示したスピンコーターのモータ(3)を載置台(1
)の表面が回転軸(9)の軸線の方向に向けこれに沿う
ように支持するモータ支持板、Dza)および(12b
)はそれぞれ一方の端部が回転円板(8)の上面のモー
タ支持板(11a)および(111))との同着部分か
ら中心部側へ所要間隔をおいた部分に固着され粘性液射
出管(7)をその先端部が載置台(1)の表面の中心部
と対向するように支持する粘性液射出管支持板、0埠お
よびQ4)はそれぞれ載置台(11の斜め上方および斜
め下方の位置に設けられ載置台(1)の表面上に真空吸
着された被処理基板間を加熱するための赤外線を放射す
る赤外線ランプ、06およびMはそれぞれ赤外線ランプ
(至)およびαるが放射する赤外線を被処理基板−の表
面上に集光する集光ミラーである〇 次に、このように構成された粘性液塗布装置の作用につ
いで説明する0 まず、被処理基板−をその表面の中心部・が載置台(1
)の表面の中心部と一致するようKして載置台(1)の
表面上に真空吸着する。次に、モータ(3)を作動させ
て被処理基板−を低速度で回転させるとともにモータ0
0を作動させて回転円板(8)を低速度で回転させる。
In the figures, the same reference numerals as those shown in FIG. 1 indicate equivalent parts. (8) is a rotating disk that rotates in the direction of the illustrated arrow;
(9) is a rotating shaft whose one end is fixed to the center of the lower surface of the rotating disc (8) and rotates the rotating disc (8) in the direction of the arrow shown in the figure, and QI is the other end of the rotating shaft (9) The rotating shaft (
9), (11a) and (llb)
are fixed at symmetrical positions with respect to the axis of the rotating shaft (9) on the peripheral edge of the upper surface of the rotating disk (8).
The motor (3) of the spin coater shown in the figure is placed on the mounting table (1).
motor support plates Dza) and (12b) that support the surfaces of
) have one end fixed to a part of the upper surface of the rotating disk (8) at a required distance from the part where it is attached to the motor support plate (11a) and (111)) toward the center, and the viscous liquid is injected. The viscous liquid injection tube support plates, 0 and Q4) that support the tube (7) so that its tip faces the center of the surface of the mounting table (1) are located diagonally above and diagonally below the mounting table (11), respectively. The infrared lamps 06 and M radiate infrared rays to heat the space between the substrates to be processed that are vacuum-adsorbed on the surface of the mounting table (1); This is a condensing mirror that focuses infrared rays onto the surface of the substrate to be processed.Next, we will explain the operation of the viscous liquid coating device configured in this way.First, place the substrate to be processed at the center of its surface.・Gas mounting table (1
) and vacuum suction onto the surface of the mounting table (1). Next, the motor (3) is operated to rotate the substrate to be processed at a low speed, and the motor (3) is rotated at a low speed.
0 to rotate the rotating disk (8) at a low speed.

次に、粘性液射出管(7)から所要量の粘性液を被処理
基板■の表面の中心部に射出し付着させる。次いで、モ
ータ(3)の回転数を上げて被処理基板輪を高速度で回
転させ、この被処理基板−の回転による遠心力によって
被処理基板−の表面の中心部に付着した粘性液を被処理
基板−の表面の周縁へ広げる0これと同時に、モータθ
1の回転数を上げて回転円板(8)を高速度で回転させ
、ここ回転円板(8)の回転によって、被処理基板−の
表面上の粘性液に被処理基板−の表面と垂直方向の大き
な遠心力を作用させる。そうすると、被処理基板…自体
の回転による遠心力と回転円板(8)の回転による遠心
力とによって、被処理基板−の表面上に凹凸のない平担
な表面を有する粘性液塗布膜が成膜される。しかるのち
、被処理基板−および回転円板(8)を回転させた状態
で、赤外線ランプ0→。
Next, a required amount of viscous liquid is injected from the viscous liquid injection pipe (7) onto the center of the surface of the substrate to be processed (2) and is deposited thereon. Next, the rotation speed of the motor (3) is increased to rotate the substrate wheel at high speed, and the centrifugal force caused by the rotation of the substrate causes the viscous liquid attached to the center of the surface of the substrate to be coated. At the same time, the motor θ
1 and rotate the rotating disk (8) at high speed, and the rotation of the rotating disk (8) causes the viscous liquid on the surface of the substrate to be processed to be perpendicular to the surface of the substrate to be processed. Apply a large centrifugal force in the direction. Then, due to the centrifugal force caused by the rotation of the substrate to be processed and the centrifugal force caused by the rotation of the rotating disk (8), a viscous liquid coating film having a flat surface with no unevenness is formed on the surface of the substrate to be processed. Filmed. Thereafter, while the substrate to be processed and the rotating disk (8) are being rotated, the infrared lamp 0→.

0→を点灯して、被処理基板■の表面上に成膜された粘
性液塗布膜を強制的に加熱し、乾燥して固化すると、第
3図に断面図を示すように、表面部に凹凸のある被処理
基板−の表面上に凹凸のない平担な表面を有する粘性液
塗布膜(52)が成膜される。
0 → is turned on and the viscous liquid coating film formed on the surface of the substrate to be processed (■) is forcibly heated, dried and solidified. A viscous liquid coating film (52) having a flat surface with no unevenness is formed on the surface of the substrate to be processed which has unevenness.

なお、この実施例の方法に用いる粘性液塗布装置では、
被処理基板−の表面上に成膜された粘性液塗布膜を強制
的に加熱・乾燥・固化したが、必ずしも粘性液塗布膜を
強制的に加熱・乾燥・固化する必要はなく、粘性液塗布
膜を自然に乾燥・固化してもよい。
In addition, in the viscous liquid coating device used in the method of this example,
Although the viscous liquid coating film formed on the surface of the substrate to be processed was forcibly heated, dried, and solidified, it is not necessarily necessary to forcibly heat, dry, and solidify the viscous liquid coating film. The membrane may be dried and solidified naturally.

〔発明の効果〕〔Effect of the invention〕

以上、説明したように、この発明の粘性液の塗布方法で
は、表面部に凹凸のある被処理基板の表面上の中心部に
所要量の粘性液を付着し、この粘性液が付着された被処
理基板を、その表面の中心を通る法線を軸線として自転
させるとともに被処理基板の中心軸のこの被処理基板の
粘性液付着面側の延長線上に中心を有する所定半径の円
周に沿うて公転きせるので、被処理基板のこれらの自転
・公転による遠心力の粘性液への作用によって表面部に
凹凸のある被処理基板の表面上忙凹凸のない平担な表面
を有する粘性液塗布膜を成膜することができる。
As described above, in the viscous liquid application method of the present invention, a required amount of viscous liquid is applied to the center of the surface of the substrate to be processed which has an uneven surface, and the viscous liquid is applied to the substrate. The substrate to be treated is rotated around the normal line passing through the center of its surface as an axis, and rotated along the circumference of a predetermined radius whose center is on an extension of the central axis of the substrate to be treated on the viscous liquid adhering surface side of the substrate to be treated. Since the substrate to be processed revolves around its axis, centrifugal force due to these rotations and revolutions of the substrate to be processed acts on the viscous liquid. It is possible to form a film.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はスピンコーターの一例の主要構成要素を示す要
部断面図、第2図はこの発明の一実施例の粘性液の塗布
方法に用いる粘性液塗布装置の主要構成要素を一部断面
で示す正面図、第3図は第2図の粘性液塗布装置によっ
て被処理基板の表面上に成膜された粘性液塗布膜の状態
を示す断面図である。 図において、(11、(2)および(3)はそれぞれ被
処理基板をその表面の中心を通る法線を軸線として自転
させる載置台1回転軸およびモータ、(8) 、 (9
)および0〔はそれぞれ被処理基板を所定半径の円周に
沿うて公転させる@躬円板9回転軸およびモータ、0[
有]および0→は粘性液塗布膜を強制的に加熱・乾燥・
固化させる赤外線ランプ、句は被処理基板、(52)は
粘性液塗布膜である。 なお、図中同一符号はそれぞれ同一まだは相当部分を示
す。 代理人 大 岩 増 雄 第1図 第2図 第3図 、f2
FIG. 1 is a cross-sectional view of the main components of an example of a spin coater, and FIG. 2 is a partial cross-sectional view of the main components of a viscous liquid coating device used in a viscous liquid coating method according to an embodiment of the present invention. The front view and FIG. 3 are cross-sectional views showing the state of the viscous liquid coating film formed on the surface of the substrate to be processed by the viscous liquid coating apparatus of FIG. 2. In the figure, (11, (2) and (3) are respectively the rotating shaft and motor of the mounting table 1 that rotates the substrate to be processed about the normal line passing through the center of its surface, and (8) and (9).
) and 0[ are the rotating shaft and motor of the disk 9 that rotates the substrate to be processed along a circumference of a predetermined radius, and 0[
] and 0 → forcefully heat, dry, and dry the viscous liquid coating film.
The solidifying infrared lamp is the substrate to be processed, and (52) is the viscous liquid coating film. Note that the same reference numerals in the figures indicate corresponding parts. Agent Masuo Oiwa Figure 1 Figure 2 Figure 3, f2

Claims (2)

【特許請求の範囲】[Claims] (1) 表面部に凹凸のある被処理基板の表面上の中心
部に所要量の粘性液を付着させ、この粘性液が付着した
上記被処理基板をその表面の中心を通る法線を軸線とし
て自転させるーとともに上記被処理基板の中心軸のこの
被処理基板の粘性液付着面側の延長線上に中心を有する
所定半径の円周に沿うて公転させ、上記被処理基板の上
記自転・公転による遠心力の上記粘性液への作用によっ
て上記被処理基板の表面上に粘性液塗布膜を成膜するこ
とを特徴とする粘性液の塗布方法。
(1) A required amount of viscous liquid is applied to the center of the surface of a substrate to be processed which has an uneven surface, and the axis of the substrate to be processed with this viscous liquid attached is set to the normal line passing through the center of the surface. The substrate to be processed is rotated on its own axis and revolved along a circumference of a predetermined radius whose center is on an extension of the central axis of the substrate to be processed on the viscous liquid adhering surface side of the substrate to be processed, and the substrate to be processed is rotated and revolved. A method for applying a viscous liquid, comprising forming a viscous liquid coating film on the surface of the substrate to be processed by applying centrifugal force to the viscous liquid.
(2)粘性液塗布膜が被処理基板の回転状態において強
制的に加熱・乾燥−固化されることを特徴とする特許請
求の範囲第1項記載の粘性液の塗布方法0
(2) A method for applying a viscous liquid according to claim 1, wherein the viscous liquid coating film is forcibly heated, dried and solidified while the substrate to be processed is being rotated.
JP4626284A 1984-03-09 1984-03-09 Applying method of viscous liquid Pending JPS60189934A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4626284A JPS60189934A (en) 1984-03-09 1984-03-09 Applying method of viscous liquid

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4626284A JPS60189934A (en) 1984-03-09 1984-03-09 Applying method of viscous liquid

Publications (1)

Publication Number Publication Date
JPS60189934A true JPS60189934A (en) 1985-09-27

Family

ID=12742288

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4626284A Pending JPS60189934A (en) 1984-03-09 1984-03-09 Applying method of viscous liquid

Country Status (1)

Country Link
JP (1) JPS60189934A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6475074A (en) * 1987-09-16 1989-03-20 Matsushita Electric Ind Co Ltd Film forming device
US5095848A (en) * 1989-05-02 1992-03-17 Mitsubishi Denki Kabushiki Kaisha Spin coating apparatus using a tilting chuck
US5264246A (en) * 1989-05-02 1993-11-23 Mitsubishi Denki Kabushiki Kaisha Spin coating method
US5810941A (en) * 1995-07-14 1998-09-22 Moynagh; Kelan Thomas Cleaning method for high precision molding components

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6475074A (en) * 1987-09-16 1989-03-20 Matsushita Electric Ind Co Ltd Film forming device
US5095848A (en) * 1989-05-02 1992-03-17 Mitsubishi Denki Kabushiki Kaisha Spin coating apparatus using a tilting chuck
US5264246A (en) * 1989-05-02 1993-11-23 Mitsubishi Denki Kabushiki Kaisha Spin coating method
US5810941A (en) * 1995-07-14 1998-09-22 Moynagh; Kelan Thomas Cleaning method for high precision molding components

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