JPS60182128A - 薄膜形成装置 - Google Patents

薄膜形成装置

Info

Publication number
JPS60182128A
JPS60182128A JP59036045A JP3604584A JPS60182128A JP S60182128 A JPS60182128 A JP S60182128A JP 59036045 A JP59036045 A JP 59036045A JP 3604584 A JP3604584 A JP 3604584A JP S60182128 A JPS60182128 A JP S60182128A
Authority
JP
Japan
Prior art keywords
gas
reaction vessel
window
reaction
entrance window
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59036045A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0544818B2 (enExample
Inventor
Yasuhiro Mochizuki
康弘 望月
Takaya Suzuki
誉也 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP59036045A priority Critical patent/JPS60182128A/ja
Publication of JPS60182128A publication Critical patent/JPS60182128A/ja
Publication of JPH0544818B2 publication Critical patent/JPH0544818B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P14/3411—
    • H10P14/24—
    • H10P14/3442—
JP59036045A 1984-02-29 1984-02-29 薄膜形成装置 Granted JPS60182128A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59036045A JPS60182128A (ja) 1984-02-29 1984-02-29 薄膜形成装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59036045A JPS60182128A (ja) 1984-02-29 1984-02-29 薄膜形成装置

Publications (2)

Publication Number Publication Date
JPS60182128A true JPS60182128A (ja) 1985-09-17
JPH0544818B2 JPH0544818B2 (enExample) 1993-07-07

Family

ID=12458736

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59036045A Granted JPS60182128A (ja) 1984-02-29 1984-02-29 薄膜形成装置

Country Status (1)

Country Link
JP (1) JPS60182128A (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3025837U (ja) * 1995-06-09 1996-06-25 佐々木通商株式会社 トレイを兼ねるコーヒーパック等の函

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5239073U (enExample) * 1975-09-11 1977-03-19
JPS52127065A (en) * 1976-04-16 1977-10-25 Matsushita Electric Ind Co Ltd Gas phase growing method of semiconductor and its device
JPS58119336A (ja) * 1982-01-08 1983-07-15 Ushio Inc 光反応蒸着装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5239073U (enExample) * 1975-09-11 1977-03-19
JPS52127065A (en) * 1976-04-16 1977-10-25 Matsushita Electric Ind Co Ltd Gas phase growing method of semiconductor and its device
JPS58119336A (ja) * 1982-01-08 1983-07-15 Ushio Inc 光反応蒸着装置

Also Published As

Publication number Publication date
JPH0544818B2 (enExample) 1993-07-07

Similar Documents

Publication Publication Date Title
US5229081A (en) Apparatus for semiconductor process including photo-excitation process
US4058638A (en) Method of optical thin film coating
US3939798A (en) Optical thin film coater
WO1993013244A1 (fr) Appareil de formation de couche mince a reaction en surface
JPS60245217A (ja) 薄膜形成装置
KR850001974B1 (ko) 광화학적 증착방법 및 장치
JPS60182128A (ja) 薄膜形成装置
JPH0480116B2 (enExample)
JP3456933B2 (ja) 半導体処理装置のクリーニング方法および半導体処理装置
JP3174787B2 (ja) 光ｃｖｄ装置
JPS5968923A (ja) 薄膜形成装置
JPS6118125A (ja) 薄膜形成装置
JPS61271819A (ja) 薄膜形成方法
JPS59224118A (ja) 光化学気相反応法
JP3010066B2 (ja) 光励起プロセス装置
JPS6156279A (ja) 成膜方法
JPS59209643A (ja) 光化学気相成長装置
JPS6118124A (ja) 薄膜形成装置
JPS6075328A (ja) 光気相反応方法および反応装置
JPS61271820A (ja) 薄膜形成装置
JPS61196529A (ja) 薄膜形成装置
JPH0563552B2 (enExample)
JPS6156278A (ja) 成膜方法
JPS60236215A (ja) レ−ザｃｖｄ方法
JPS6150147B2 (enExample)