JPS60164385A - Manufacture of semiconductor laser chip - Google Patents

Manufacture of semiconductor laser chip

Info

Publication number
JPS60164385A
JPS60164385A JP59020339A JP2033984A JPS60164385A JP S60164385 A JPS60164385 A JP S60164385A JP 59020339 A JP59020339 A JP 59020339A JP 2033984 A JP2033984 A JP 2033984A JP S60164385 A JPS60164385 A JP S60164385A
Authority
JP
Japan
Prior art keywords
wafer
adhesive sheet
scratches
roller
cleavage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP59020339A
Other languages
Japanese (ja)
Inventor
Haruo Tanaka
田中 治夫
Masahito Mushigami
雅人 虫上
Masayoshi Muranishi
正好 村西
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rohm Co Ltd
Original Assignee
Rohm Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm Co Ltd filed Critical Rohm Co Ltd
Priority to JP59020339A priority Critical patent/JPS60164385A/en
Publication of JPS60164385A publication Critical patent/JPS60164385A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/02Structural details or components not essential to laser action
    • H01S5/0201Separation of the wafer into individual elements, e.g. by dicing, cleaving, etching or directly during growth
    • H01S5/0202Cleaving

Abstract

PURPOSE:To eliminate the need for cleaning after a cleavage process and to allow small pieces to be separated one by one from an adhesive sheet by a method wherein a wafer whereupon scratches are created at a constant pitch whereat cleavage is initiated is attached to an adhesive sheet and a pressing member is caused to roll up to cover the entire wafer surface. CONSTITUTION:A wafer 1, with scratches 2 for initiating cleavage created on one side, is attached to an adhesive sheet 6 composed of soft plastic formed on an adhesive surface A so that the scratches 2 may be exposed. The laminate is placed on an elastic member 7 constituted of a flat rubber sheet, with the wafer facing down. Pressure is applied upon the adhesive sheet 6 from behind by a small-radius roller 8. The roller 8 applies a local pressure to the wafer 1 and the wafer 1 bends. Cleavage proceeds starting at the scratches 2 and small pieces 5 are left in the track of the roller 8.

Description

【発明の詳細な説明】 本発明は、半導体レーザのチップを製造する方法の改良
に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an improvement in a method for manufacturing semiconductor laser chips.

半導体レーザのチップは、ウェハがら、ヘト開分断され
た細長い小月を更にその長手方向に適当ピンチで細断し
てイυられるものであり、従来は第1図に示すように、
ウェハ1の一端縁上にダイヤモンドスクライバ−等で所
定ピッチのケガキ傷2を形成し、そのケガキ傷2が露呈
するようにウェハ1を銅板3に接着剤4で貼着固定した
後、銅板3を第2図に示すように凸曲湾曲させ、これに
より各ケカ゛キ傷2を起点として、へき開を行なってチ
ンプ形成用の小片5群を形成する方法がとられていた。
Semiconductor laser chips are made by cutting the wafer into thin strips, which have been cut into pieces, and then cutting them into pieces in the longitudinal direction with appropriate pinches. Conventionally, as shown in FIG.
Scratches 2 are formed at a predetermined pitch on one end edge of the wafer 1 using a diamond scriber or the like, and the wafer 1 is fixed to a copper plate 3 using an adhesive 4 so that the scribe scratches 2 are exposed. As shown in FIG. 2, a method was used in which the material was curved in a convex manner, and then cleavage was performed using each chipping wound 2 as a starting point to form five groups of small pieces for forming chimps.

しかし、このような方法では次のような欠点があった。However, this method has the following drawbacks.

即ち、この方法でへき開処理した後には、接着剤4を洗
浄除去して、小片5群を取り外すのであるが、銅板3の
変形作用なウニ/Xlに伝えるために用いる接着剤4は
、強力な接着力を有するものが選択され、かつこのよう
な接着剤4は洗浄が困難で、小片取り出しに手間取るも
のであった。
That is, after the cleavage process is performed using this method, the adhesive 4 is washed and removed and the 5 groups of small pieces are removed. However, the adhesive 4 used to convey the deformation effect of the copper plate 3 to the An adhesive 4 having adhesive strength was selected, and such an adhesive 4 was difficult to clean and took time to remove small pieces.

また、洗浄処理によって、銅板3から分離可能となった
小片5は、バラバラになって、元のウェハ1に対する配
列順序が不明となり、ウエノ11の中央側の良質のもの
と、不良品の発生確率が高い外端部分のものとの区別が
わからなくなって、品質管理上の取り扱いに問題が生じ
やすり・とり・う欠点があった。また、バラバラになっ
た小片群が互いに触れ合える状態になるために、反射面
となるへき開面に傷が付くような不具合も生しやくなっ
ていた。
In addition, the small pieces 5 that can be separated from the copper plate 3 through the cleaning process are broken into pieces, and the order in which they are arranged with respect to the original wafer 1 is unknown. It was difficult to tell the difference between the outer edge and the outer edge, which caused problems in handling for quality control. In addition, since the separated small pieces could come into contact with each other, problems such as scratches on the cleavage planes, which serve as reflective surfaces, were likely to occur.

本発明は、上述の事情に鑑みてなされたものであって、
・\外聞手段に改良を加えて前記した欠点を一掃できる
ようにすることを目的とする。
The present invention has been made in view of the above circumstances, and includes:
・The purpose is to make improvements to the external means to eliminate the above-mentioned drawbacks.

以下、本発明を図面に示す実施例に基づいて詳細に説明
する。先ず、第3図に示すように、一端縁上に、へき開
起点用のケガキ傷2群が形成されたウェハ1を、片面が
粘着面Aに形成された軟質プラスチック製の粘着シート
6(例えば、ビニールシー))上に、ケガキ傷2が露呈
するように貼着するか、もしくはウェハ1を粘着シート
6に貼着してからケガキ傷2を形成する。
Hereinafter, the present invention will be described in detail based on embodiments shown in the drawings. First, as shown in FIG. 3, a wafer 1 having two groups of scribe scratches for cleavage starting points formed on one edge is placed on a soft plastic adhesive sheet 6 (for example, Either the wafer 1 is pasted onto the vinyl sheet 6) so that the scribe scratches 2 are exposed, or the scribe scratches 2 are formed after the wafer 1 is pasted on the adhesive sheet 6.

次に、第4図に示すように、ウェハ1が下になる姿勢に
して、この粘着シート6をゴム製の偏平シートからなる
弾性部相マ上に載置した後、tji陪シート6の外面か
ら抑圧部材としての小径ローラ8を抑圧転勤させる。そ
うすると、f55図に示すように、ウェハ1はローラ作
用部において、下方に局部的に加圧されて湾曲し、ケガ
キ傷2を起点として、へき開か進んでローラ通過跡にお
いて小片5群が形成される。なお、この場合、第6図に
示すようにケガキ傷2の存在側を弾性部材7に近付けた
傾斜姿勢でローラ8を抑圧作用させると、ケガキ傷2に
応力が集中して、へき開が円滑かつ確実に進行する。ま
た、抑圧部材8として、ローラに代えて、先端を丸くし
た棒材、例えばピンセントなどを粘着テープ外面にこす
りつけても同様に、へき開処理することができる。さら
にまた、より高能率化を図る手段としては、第7図およ
びvJB図に示すように、ローラ状に構成した弾性部材
7と抑圧部材としての小径ローラ8との間に、粘着シー
ト6に貼着したウェハ1を通過させるものが考えられる
。そして、この場合も、抑圧ローラ8を第9図に示すよ
うに、少し傾斜させておくとよい。前記粘着シート6の
ベースはプラスチックの池、紙、布、金属フィルムなど
、いかなるものを用いてもよいが、伸展性のある飼料の
ベースを用いると、へき開処理後にシート6を伸展して
各小片5をシート6から剥がし取る場合に、隣接する小
片間で、・\き開面をすって、傷刊けることがなくなり
、取り扱いが容易となる。
Next, as shown in FIG. 4, with the wafer 1 facing down, this adhesive sheet 6 is placed on an elastic member made of a flat rubber sheet, and then the outer surface of the adhesive sheet 6 is The small-diameter roller 8 as a suppressing member is transferred to suppress. Then, as shown in Fig. f55, the wafer 1 is locally pressed downward in the roller action area and curved, and starting from the scribing scratch 2, it cleaves and advances, forming 5 groups of small pieces at the roller passage trace. Ru. In this case, as shown in FIG. 6, if the roller 8 is pressed in an inclined position with the side where the scribe scratches 2 are located close to the elastic member 7, stress will be concentrated on the scribe scratches 2 and the cleavage will be smooth and smooth. progress for sure. Alternatively, instead of using a roller as the suppressing member 8, a bar with a rounded tip, such as a pin, may be rubbed against the outer surface of the adhesive tape to perform the same cleavage process. Furthermore, as a means for achieving higher efficiency, as shown in FIG. It is conceivable to allow the attached wafer 1 to pass through. Also in this case, it is preferable to tilt the suppression roller 8 slightly as shown in FIG. The base of the adhesive sheet 6 may be made of any material such as plastic, paper, cloth, metal film, etc. However, if a feed base with extensibility is used, the sheet 6 can be stretched after cleavage to form each small piece. When peeling off the sheet 5 from the sheet 6, there will be no damage caused by scraping the open surface between adjacent pieces, making handling easier.

以上のように、本発明によれば1、へき開処理後に各小
片を収り外すのに、洗浄処理が全(不要となり、粘着シ
ートから直接剥離して簡単に1つずつ取り外すことかで
き、しかも元のウェハに対する小片の位置(=1けを容
易に確認しながら、取りケ(す − シ ^C71鞍 
入 す・h 、P、、暫 等1p L ブS11 シ 
t? −す・また、簡単に取り外せ乞ために、次の]1
程への移行時にも、粘着シートに小片群を貼着したまま
、ウェハ板単位で処理でき、取り扱い」二からも有益で
ある。
As described above, according to the present invention, 1. The cleaning process is no longer necessary to remove each small piece after the cleavage process, and the pieces can be easily removed one by one by peeling directly from the adhesive sheet. While easily checking the position of the small piece with respect to the original wafer, remove it.
Input・h、P、、temporary etc. 1p L bu S11 shi
T? -In addition, for easy removal, please see the following]1
Even during the process, it is possible to process each wafer with the small pieces attached to the adhesive sheet, which is advantageous in terms of handling.

【図面の簡単な説明】[Brief explanation of drawings]

第1図および第2図は従来のへき開手段を示し、第1図
は処理前、第2図は処理後の状態を示す。 tj43図は本発明の実施例による処理111ノの状態
を示すウェハの斜視図、第4図は−・・\き開処理手段
を示す一部切欠斜視図、第5しlはその作用状態を示す
側面図、第6図はその正面図、第7し1は池の−き開処
理手段を示す斜視図、第33図はその一部を示す側面図
、第9図はその正面図である。 1はウェハ、2はケガキ傷、6は粘λ′1シー)、■は
弾性部材、8は抑圧部祠。 出願人 口 −ム株式会利 代理人 弁理士 岡III 和秀 第6図 第8図 策9図
1 and 2 show a conventional cleavage means, with FIG. 1 showing the state before processing and FIG. 2 showing the state after processing. Fig. 43 is a perspective view of a wafer showing the state of processing 111 according to the embodiment of the present invention, Fig. 4 is a partially cutaway perspective view showing the open processing means, and Fig. 5 shows its operating state. Fig. 6 is a front view thereof, Fig. 7 is a perspective view showing a pond opening processing means, Fig. 33 is a side view showing a part thereof, and Fig. 9 is a front view thereof. . 1 is a wafer, 2 is a scribing scratch, 6 is a sticky λ'1 sheet), ■ is an elastic member, and 8 is a suppressor. Applicant Population - Mu stock interest agent Patent attorney Oka III Kazuhide Figure 6 Figure 8 Figure 9

Claims (4)

【特許請求の範囲】[Claims] (1)一端縁表面に、へき開起点用のケガキ傷を所定ピ
ッチで形成したウェハを、前記ケガキ傷が露呈される歌
態で粘着シート上に貼着し、弾性部材上にウェハが該弾
性部材側となるように位置させて、前記粘着シート外面
から弾性部材側に向けて局部的に外力を加える抑圧部材
を、ウェハ全面にわたって順次作用させることを特徴と
する半導体レーザのチップ製造方法。
(1) A wafer with scribing scratches for cleavage starting points formed at a predetermined pitch on the surface of one edge is pasted on an adhesive sheet in a manner that exposes the scribing scratches, and the wafer is placed on the elastic member. A method for manufacturing a semiconductor laser chip, characterized in that a suppressing member is positioned so as to be on the side of the adhesive sheet and applies an external force locally from the outer surface of the adhesive sheet toward the elastic member, and the suppressing member is sequentially applied over the entire surface of the wafer.
(2)前記弾性部材が偏平なゴムシートであり、前記抑
圧部材がローラである特許請求の範囲第1項に記載の半
導体レーザのチップ製造方法。
(2) The semiconductor laser chip manufacturing method according to claim 1, wherein the elastic member is a flat rubber sheet, and the suppressing member is a roller.
(3)前記弾性部材が大径のゴムローラであり、前記抑
圧部材が、このゴムローラに対向する小径のローラであ
る特許請求の範囲第1項に記載の半導体レーザのチップ
製造方法。
(3) The semiconductor laser chip manufacturing method according to claim 1, wherein the elastic member is a large-diameter rubber roller, and the suppressing member is a small-diameter roller facing the rubber roller.
(4)前記粘着シートのベースが伸展自在な材料で構成
されている特許請求の範囲第1項ないし第3項のうちの
いずれかに記載の半導体レーザのチップ製造方法。
(4) The semiconductor laser chip manufacturing method according to any one of claims 1 to 3, wherein the base of the adhesive sheet is made of a stretchable material.
JP59020339A 1984-02-06 1984-02-06 Manufacture of semiconductor laser chip Pending JPS60164385A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59020339A JPS60164385A (en) 1984-02-06 1984-02-06 Manufacture of semiconductor laser chip

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59020339A JPS60164385A (en) 1984-02-06 1984-02-06 Manufacture of semiconductor laser chip

Publications (1)

Publication Number Publication Date
JPS60164385A true JPS60164385A (en) 1985-08-27

Family

ID=12024378

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59020339A Pending JPS60164385A (en) 1984-02-06 1984-02-06 Manufacture of semiconductor laser chip

Country Status (1)

Country Link
JP (1) JPS60164385A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62296578A (en) * 1986-06-17 1987-12-23 Matsushita Electric Ind Co Ltd Separaton of semiconductor crystal
CN103943566A (en) * 2013-01-23 2014-07-23 株式会社迪思科 Rollers
JP2015039872A (en) * 2013-08-23 2015-03-02 三星ダイヤモンド工業株式会社 Substrate breaking device

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4731405U (en) * 1971-04-20 1972-12-08
JPS53141573A (en) * 1977-05-16 1978-12-09 Toshiba Corp Pellet dividing method of semiconductor wafer
JPS5493356A (en) * 1977-12-30 1979-07-24 Fujitsu Ltd Cut out mehtod of semiconductor chip
JPS5921040A (en) * 1982-07-27 1984-02-02 Nec Corp Cleaving method

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4731405U (en) * 1971-04-20 1972-12-08
JPS53141573A (en) * 1977-05-16 1978-12-09 Toshiba Corp Pellet dividing method of semiconductor wafer
JPS5493356A (en) * 1977-12-30 1979-07-24 Fujitsu Ltd Cut out mehtod of semiconductor chip
JPS5921040A (en) * 1982-07-27 1984-02-02 Nec Corp Cleaving method

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62296578A (en) * 1986-06-17 1987-12-23 Matsushita Electric Ind Co Ltd Separaton of semiconductor crystal
CN103943566A (en) * 2013-01-23 2014-07-23 株式会社迪思科 Rollers
JP2015039872A (en) * 2013-08-23 2015-03-02 三星ダイヤモンド工業株式会社 Substrate breaking device
CN104416682A (en) * 2013-08-23 2015-03-18 三星钻石工业股份有限公司 Substrate Cutting Device

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