JPS60153104A - Method of producing zinc oxide nonlinear resistor - Google Patents

Method of producing zinc oxide nonlinear resistor

Info

Publication number
JPS60153104A
JPS60153104A JP59009124A JP912484A JPS60153104A JP S60153104 A JPS60153104 A JP S60153104A JP 59009124 A JP59009124 A JP 59009124A JP 912484 A JP912484 A JP 912484A JP S60153104 A JPS60153104 A JP S60153104A
Authority
JP
Japan
Prior art keywords
manufacturing
molded
pbo
reactant
zinc oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP59009124A
Other languages
Japanese (ja)
Inventor
正夫 林
渡辺 三鈴
田川 良彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Meidensha Corp
Meidensha Electric Manufacturing Co Ltd
Original Assignee
Meidensha Corp
Meidensha Electric Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Meidensha Corp, Meidensha Electric Manufacturing Co Ltd filed Critical Meidensha Corp
Priority to JP59009124A priority Critical patent/JPS60153104A/en
Publication of JPS60153104A publication Critical patent/JPS60153104A/en
Pending legal-status Critical Current

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  • Thermistors And Varistors (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 し技術分14LF J この発明は酸化亜鉛非直線抵抗体の製造方法に関する。[Detailed description of the invention] 14LF J The present invention relates to a method for manufacturing a zinc oxide nonlinear resistor.

〔従来技術と間鴎点〕[Conventional technology and difference]

一般に酸化亜鉛非直線抵抗体(以下zT10素子と称す
)としては主添7Jl] 物としてのBi2O2及びそ
の他数棟の41t N14酸化物ケ含んだ配付の素子が
使用ζ扛る。この素子は耐久性の同上ケ図るためと、素
子外周部の絶縁コーティングのために4001C〜90
0℃の熱処理工程を施すが、この熱処理を行うと素子の
電圧−流非直線特性が大きく低下してしまう欠点がある
。この時性低下を起す原因はBL20g結晶44遺が熱
処理に↓ジ変化しでしまうからである。また、上記素子
はある嵯流シロ域(f通100μA〜IA)での非1区
線%1生はその非面線指数(田が20以上であるが、そ
rし以下あるいはそn以上では極端に特性が低下する欠
点がある。さらに1主添刀LI物でめる8120gはB
t冗素のクラーク数が2×10 と資源的に乏しい。
In general, as a zinc oxide nonlinear resistor (hereinafter referred to as a zT10 element), an element containing 7Jl as the main additive, Bi2O2, and several other 41tN14 oxides is used. This element is made of 4001C to 90% for durability and insulation coating on the outer periphery of the element.
A heat treatment step at 0° C. is performed, but this heat treatment has the disadvantage that the voltage-current nonlinear characteristics of the device are greatly reduced. The reason for this decrease in properties is that the BL20g crystal 44 undergoes a diversion due to heat treatment. In addition, the above element has a non-surface line index of 20 or more in a certain torrential flow range (f of 100 μA to IA), but if There is a drawback that the characteristics are extremely deteriorated.Furthermore, the 8120g that comes with 1 main attachment LI item is B
The number of t-redundant Clarks is 2×10, which is a poor resource.

〔発明の目的〕[Purpose of the invention]

この発明は上記の欠点を除去し、熱処理にLり非直線特
性を低下させない工うにするとともに課電時にも一ル1
流の少なる↓うにした酸化匪鉛非直線抵抗体の製造方法
を提供すること全目的とする。
The present invention eliminates the above-mentioned drawbacks, and provides a method that does not deteriorate the nonlinear characteristics due to heat treatment.
The overall object of the present invention is to provide a method for manufacturing a lead oxide nonlinear resistor with a reduced flow rate.

[発明の4既要」 この発明は上記−の目的ra成するために、予めPbO
、5b20sk800〜] 100’C,で熱処理した
粉体に、Zllo 、 vnoz l Sl:120!
l + Cr2O5にJO2。
[4 Summary of the Invention] In order to achieve the above-mentioned objective ra, this invention
, 5b20sk800~] 100'C, Zllo, vnozl Sl: 120!
JO2 to l + Cr2O5.

r3tO2とAj?20g Hf02とほう硅酸非錯カ
ラス、及び8102 、 A/2o、とほう硅酸亜゛鉛
ガラスを各別に混合した粉体とともに〃口出成形し、そ
の成杉体を熱処理して形成した構成にある。
r3tO2 and Aj? 20g Hf02, borosilicate non-complex glass, and 8102, A/2o, and zinc borosilicate glass were mixed separately and molded together by extrusion molding, and the formed cedar body was heat-treated to form the structure. It is in.

し実施例] 以下図1釦?参照してこの発明の一実施例を説明する。Examples] Figure 1 button below? An embodiment of the present invention will be described with reference to the drawings.

まず、PiQ、5h203k モル比で2=1のI!j
l18でJり「定−1秤量し、遠心ボールミルで頃(袖
付した恢、アルミナルツボ中でi o o o ’cの
熱で4時間仮焼を行なった。このようにして仮・魂した
仮゛暁扮r前記ゼールミルで粉砕して反応・物τ得る。
First, PiQ, 5h203k I! with a molar ratio of 2=1! j
At 118, the sample was weighed at a constant temperature of 1,000 liters, and then calcined in a centrifugal ball mill for 4 hours at a temperature of IOOO'C in an aluminum crucible.゛暚扮r The reaction product τ is obtained by pulverizing it in the Zeel mill.

その咬、ZnO: 98. Omoi!兆、MnO2:
 0.5 mOl<%* ’9b20g:0、5 +u
oi1%* Cr2O5: 0.5 mol N、 8
LC12: O,/imolj%を所定−#H)駕し、
こルらに111記反応物r砿肩比で2%〃口え、こ几ら
の粉体τ良<梶ケし、円也状に刀l圧成形する。手の麦
、IJ兄形体r受気中で1100℃、0時出1楯成した
咬、IJy:、ノ杉坏の1向岡枯l’t、 UF mし
、Ag、<qik南布し、590 に、1時間の熱処理
τ行う。
Its bite, ZnO: 98. Omoi! Trillion, MnO2:
0.5 mOl<%*'9b20g:0,5 +u
oi1%* Cr2O5: 0.5 mol N, 8
LC12: O, /imolj% given -#H),
Add 2% of the 111th reactant to these powders, mash the powder, and press-form into a circular shape. Hand wheat, 1100 degrees Celsius in IJ brother's body, 0:00 1st bite, IJy:, Nosugi's 1 Mukaoka dry l't, UF m, Ag, <qik Nanbushi , 590, heat treatment τ for 1 hour is performed.

第1図e工上記実施例に工って模造ざnたZ、O素子の
電圧電流特性と、B((’2 を添〃口しないznOg
子の電圧電流′4性を示す特性図で、図中、曲線Aが本
実施例による素子のもの、曲線Bが5t02に添加しな
い素子のものである。この第1図力)ら明らかのように
、ばυIL領域での非直#iI%性は本実施例のものは
極端に鰺化しない、しかし、後者の素子のものは従来技
術として述べたと同じように非直線特性が@L喘に懸(
なる。
FIG.
In the figure, curve A is for the device according to this embodiment, and curve B is for the device not added to 5t02. As is clear from this first figure, the non-direct #iI% property in the υIL region of this embodiment does not become extremely distorted, but the latter element is the same as that described as the prior art. As shown, the non-linear characteristics are related to @L (
Become.

第2図はB L n 2 の添刀0鎗t&えた硼仕の0
.]α1,0値(電流か01・IIAと1.(lIln
A間の非[ifM指数)tボす曲線Aと、V+InA/
−の変化rボす曲線Bの特性図である。
Figure 2 shows B L n 2's attached sword 0 spears & eteta sushi 0.
.. ]α1,0 value (current or 01・IIA and 1.(lIln
The non-[ifM index)t curve A between A and V+InA/
FIG. 3 is a characteristic diagram of a curve B representing a change in -.

第8図U 181) ’Gc/)恒1M槽中でv1+m
A ノ”%の直υ市旺圧ff1l=11■したときの湘
tLdL訛増加−感11/1゜の特性図で、図中、@−
Aは41実施例にLる素子、直線Bは5LO2?l:添
加しだい素子である。
Figure 8 U 181) 'Gc/)v1+m in a constant 1M tank
This is a characteristic diagram of xiangtLdL accent increase-sensation 11/1° when ``%'s direct pressure ff1l = 11■.In the figure, @-
A is the L element in the 41st embodiment, and straight line B is 5LO2? l: It is an element as soon as it is added.

上記第1図から第8図で明らかのように本実疵ν11に
Lる素子はfo2 if添加しない素子に比軟してWJ
rtた非llJ線特性、及びガ命特注r萱している。
As is clear from FIGS. 1 to 8 above, the element with the actual flaw ν11 has a weak WJ compared to the element without fo2 if addition.
It has non-IIJ line characteristics and is custom-made.

また、焼結体の熱処理温度は500℃〜850″Gが良
く、それ以下では〃紡時性が咬くならず8511 ℃以
上でぽ非l[線瞥性が低下する。、ざらに、熱処理時間
は素子の大きさに↓9異なるか、1時間以上が好ft、
<、昇温、降温速度は素子に急熱、急冷等にLり虫が入
らない程度の2011℃/時以下が好ましい。なお、焼
成温度は1000〜1800℃が艮くそn以下であると
緻密な焼結体とQ工ならず、1800℃以上ではρhO
の伸Mk招き非1負線性が悪(なるう焼成時1−は1〜
20時04Jが改くl時間以内では均一な焼結体が得ら
扛ない。そして20時間以上では表面付近のPh02S
b203揮発が無視できなくなる。
In addition, the heat treatment temperature of the sintered body is preferably 500°C to 850"G; below that, the spinning properties will be poor, and above 8511°C, the lineability will deteriorate. The time should vary by ↓9 depending on the size of the element, or preferably 1 hour or more.
The rate of temperature increase and decrease is preferably 2011° C./hour or less, which prevents insects from entering the device during rapid heating and cooling. Note that if the firing temperature is below 1000 to 1800°C, it will not produce a dense sintered body, and if it is higher than 1800°C, the rhoO
The elongation of Mk leads to poor non-1 negative linearity (1- is 1 to 1 during firing)
A uniform sintered body cannot be obtained within 1 hour after 20:04J. And for more than 20 hours, Ph02S near the surface
b203 volatilization cannot be ignored.

上記の結果から都O累子製造方法における各添加成分の
範囲はpho l Bb2011反応吻((0,2〜2
0w t、%、MnO2,((0,1〜511IO/、
イ、5h2o、 2 o、 t〜51nO/%、 Cr
2O3f O,l 〜51noA%、、dt02 (f
”0.1〜5mO/%とす′るのが奸ましく、この範囲
より少いと幼果が墳、わjLず、多いと非a緑性が低下
する。
From the above results, the range of each additive component in the Miyako O Seiko production method is pho l Bb2011 reaction ((0,2~2
0wt,%,MnO2,((0,1~511IO/,
A, 5h2o, 2o, t~51nO/%, Cr
2O3f O,l ~51noA%,,dt02 (f
It is preferable to set the content to 0.1 to 5 mO/%; if the content is less than this range, the young fruit will become mounded, and if it is more than this, the non-greenness will decrease.

なお、旧記実施例では遠心ボールミル、アルミナルツボ
等t1史用したが、こfLらは別の種類のものでもLい
In the previous embodiments, a centrifugal ball mill, an alumina crucible, etc. were used, but other types of these may also be used.

仄に、この発明の第2実施例について述べるに、Ph0
1Sh2031/r−エリ反応物を得る手段は前記第1
実施例と同様である。pl−、o I Bh2O5の反
応物會得た彼、ZnO: 97.997 mo/%、M
]102 : 0.5 mo7!%、5b20s : 
0.5 +no/”%%Cr2O* : 0.5 ln
o/(′%I 5107 :Q5mo/’!%、A/2
0B : ’/ 1no/%r所定量秤噴000 し、こ扛らに前記反応物r京積比で2%加え、Cnらの
粉体r曵く混合し、円板状に加圧成形する。
To briefly describe the second embodiment of this invention, Ph0
The means for obtaining the 1Sh2031/r-Eli reactant is the first
This is similar to the example. pl-, o I Bh2O5 reactants were obtained, ZnO: 97.997 mo/%, M
]102: 0.5 mo7! %, 5b20s:
0.5 +no/”%%Cr2O*: 0.5 ln
o/('%I 5107 :Q5mo/'!%, A/2
0B: '/1no/%r predetermined amount 000, add 2% of the above reactants at a volume ratio of 000, mix with the powder of Cn et al., and press-form into a disk shape. .

その懐は前記実施例と同様に処理する。The funds are processed in the same manner as in the previous embodiment.

第4図は第2実施例ICよって製造さ扛た2゜O素子の
1圧電流特性と、+3□02 あるいはA I420 
gだけ會11A )Ju したZT10素子の―圧a匠
特性を示す特性図で、図中、曲線Aは本実施例による素
子のもの、曲線Bは8t02 だけt添カロした素子の
もの1曲朦CはAl120sだけt層別した素子のもの
であろう第5図は第2実施例において、ki120s(
7,)はt固足し、 8102 の添刀LI緻(+−変
えて製造した素子の非IIj線指数α値を示す曲線Aと
、5tO2の添加量だけt変えて製造した素子のα値を
示す曲aBと、Ax2o3の添加量だけt叢えて製造し
た素子のα値を示す曲線Cの特性図である。
Figure 4 shows the 1-voltage current characteristics of the 2°O element manufactured by the second embodiment IC, and the +3□02 or A I420
This is a characteristic diagram showing the -pressure characteristics of the ZT10 element with 11A) Ju. In the figure, curve A is for the element according to this example, and curve B is for the element with t added by 8t02. C may be that of an element with t layers of Al120s. In the second embodiment, FIG.
7,) is fixed at t, and curve A showing the non-IIj line index α value of the element manufactured by changing the addition amount of 8102 (+--), and the α value of the element manufactured by changing the addition amount of 5tO2. FIG. 2 is a characteristic diagram of a curve aB shown in FIG.

第6図は180℃の1亘温槽中でvllnA の85%
の直流電圧を印加したときの一扛一流増7Jl]蚕/工
Figure 6 shows 85% of vllnA in a 180°C temperature bath.
When applying a DC voltage of 7 Jl] Silkworm/Engineering.

の特性図で、図中、直線Aは第2実施例による素子、1
α・−Bはに/!20s’に添加した素子である。なお
、S L O2だけt添加した素子は第2実施例と同じ
特性であった。
In the diagram, straight line A indicates the element according to the second embodiment, 1
α・-B hani/! This is an element added to 20s'. Note that the element to which only S L O2 was added had the same characteristics as the second example.

上l己第4図から第6図で明らかの工うに本実施例によ
る素子はJO2、A/203 k各々単独に添〃口した
素子に比較して鏝rした非直線特性及び痔命特性ケ有す
る。
As is clear from FIGS. 4 to 6 above, the device according to this example has improved non-linear characteristics and hemorrhoid characteristics compared to the devices in which JO2 and A/203K are individually impregnated. have

なお、第2実施例における素子の熱処理温にや時間等は
第1実施例と、同様に行わ牡る。また、各添加成分の範
囲u pho + 5bzOs反応物’k 0.2〜2
(1w +、%、M、02に0.1〜51nO1%、1
3620% i 0.1〜5 rno/%、0r203
 ′f:0.1〜5 In011 %、I02に0、1
〜5 mol!%、Al120s ’c ”2/100
0〜”/10100O/%とするのが好ましく、この範
囲Lv少いと効果は現わfしず、多いと非直線性が低下
する。
Note that the heat treatment temperature, time, etc. of the element in the second example were carried out in the same manner as in the first example. In addition, the range of each additive component u pho + 5bzOs reactant 'k 0.2 ~ 2
(1w +, %, M, 0.1 to 51nO1%, 1
3620% i 0.1~5 rno/%, 0r203
'f: 0.1~5 In011%, 0, 1 in I02
~5 mol! %, Al120s'c"2/100
It is preferable to set it to 0~''/10100O/%, and if this range Lv is small, no effect will appear, and if it is large, non-linearity will decrease.

仄に、この発明の第8実施例について述べるに、pbo
 、 Bb20q K工り反応物を得る手段は前記第1
実施例と同様である。、Pl−、O、5b203の反応
物を得た後、ZnO: 9 ’8. Omo/ %、M
r)02 :0.5 mo/%、13120s : 0
.5 mob!%、cr2o8: 0.5 no/%、
8t02: 0.5 ’mo1%、はう硅tlRm W
tlガラス: 0.2 w↑1%tJ′9r足量秤量し
、こ扛らに前記反応物ケ繊曾比で2%〃口え、こnらの
粉体を良く混合し、円板状に加圧成形する。その後は前
記実施例と同様に処理する。
To briefly describe the eighth embodiment of this invention, pbo
, Bb20q The means for obtaining the K-engineered reactant is the first method described above.
This is similar to the example. , Pl-, O, 5b203, and then ZnO: 9'8. Omo/%, M
r) 02: 0.5 mo/%, 13120s: 0
.. 5 mob! %, cr2o8: 0.5 no/%,
8t02: 0.5'mo1%, crawling silicon tlRm W
tl glass: 0.2 w ↑ 1% tJ'9r Weigh the amount, add 2% of the above reactant to the fiber, mix well, and form into a disk shape. Pressure mold. Thereafter, processing is performed in the same manner as in the previous embodiment.

第7図は第8実施世1によって製造さルたZ。O素子の
′げ正電流特性と、5102 あるいはほう硅酸亜鉛ガ
ラスだけfm加した2゜02子の電圧電流特性r示す特
性図で、図中、曲線へは本実施例による素子のもの、曲
線BはJO2だけc th= /J11した素子のもの
9曲線Cはぼうd +舜亜鉛ガラスだけkm刀目した素
子のものである。
Figure 7 shows the Z manufactured by the 8th generation 1. This is a characteristic diagram showing the positive current characteristics of an O element and the voltage and current characteristics of a 2°02 element with fm added only to 5102 or zinc borosilicate glass. Curve B is for an element in which only JO2 is c th= /J11.9 curve C is for an element in which only d+Shun zinc glass is made by km.

第8図は第8実施例において、はう硅酸能鉛ガラスtv
、固定し、5t02 の@別置を震えて製造した素子の
非直線指数α値會ボす曲線Aと、8 j02の添加量だ
け忙叢えて製造した素子のα11L會示す曲線Bと、は
つ硅酸亜鉛ガラスの添加量だけr変えて製造した素子の
α1直rボす曲線Cの特性図である、 第9図は180℃の恒温槽中でV1□A の85%の直
流′電圧r印力化だときの一扛醒流増)AJ ’a”4
゜の特性図で、図中、直ブ課へは第3実施例による素子
、直線BはJO2’を添ノ用した素子である。なお、は
う硅酸*、m沙ラスt rs lJu’ した素子は第
8実施ψ11によるものと同じ特注であった。
FIG. 8 shows the silicate-capable lead glass tv in the eighth embodiment.
, curve A showing the non-linear index α value of the device manufactured by fixing 5t02 @separately, and curve B showing the α11L relationship of the device manufactured by adding 8j02. Figure 9 is a characteristic diagram of α1 direct current curve C of devices manufactured by changing the amount of zinc silicate glass added. AJ 'a"4
In the diagram, the straight line B is the element according to the third embodiment, and the straight line B is the element using JO2'. Incidentally, the element made of silicic acid* and msarastrslJu' was custom-made as in the eighth embodiment ψ11.

L把第7図から第8図で明らかのLうに本実施例に↓る
素子は5tO2あるいはほう硅酸非錯カラスを各々単独
に添加した素子VC比較して人亀WL域まで曖扛た非直
線特flE’r有する。
7 to 8, the element shown in this example has a vague non-conformance up to the human WL range when compared with the element VC to which 5tO2 or borosilicate non-complex glass was added individually. It has a straight line characteristic flE'r.

な2.第8実施例における素子の熱処理温#や1¥j 
1k41等Hm14mN!+と同様に行わnる、また、
各蚕刀1IbX、分の範囲はPh09l11b205反
応物70.2〜20wt、%、MnO2k (1,1〜
51nol!%、gb20A k O−1〜5 lno
/%+ Cr2O5k 0.1〜5+m○r%、 81
02 ’l(0゜1〜5 m012%、はう硅喰唾鉛ガ
ラスを0.2 wt%とするのが好ましく、この範囲L
す少いと効果は墳わ扛ず、多いと非直Ivjl性が低下
する。
2. Heat treatment temperature # and 1 yen of the element in the 8th example
1k41st grade Hm14mN! Proceed in the same manner as +, and
Each silkworm 1IbX, minute range is Ph09l11b205 reactant 70.2~20wt,%, MnO2k (1,1~
51nol! %, gb20A k O-1~5 lno
/%+ Cr2O5k 0.1~5+m○r%, 81
02'l (0゜1~5m012%, it is preferable that the amount of lead glass is 0.2 wt%, and this range L
If it is too small, the effect will not be strong, and if it is too large, the non-directness will be reduced.

仄に、この発明の第4実施例について述べるに、PhO
+ S h2 +] 3にL9反応物?1″得る手段は
前記第1実施例と同様である。Pbo + 5h20B
の反応物を得た後、zn〇 二 97.997’+no
 I! % 、)14n02 : 0. 5 no# 
% 1Sh20s : 0.5 +no1%、0r20
s : 0.5 unoj?%、 JO2:0、5 m
o71!%、Au2os : 8/1ooo 1n、ツ
/!%、はう硅酸亜鉛ガラス: 0.2 w士3%勿所
定量秤槍し、こnらに前記反応物を重鎗比で2%加え、
こ扛らの粉体を良<611会し、円叡状にノJl]圧成
形する。その後は前記実施例と同様に処理する。
To briefly describe the fourth embodiment of this invention, PhO
+ S h2 +] L9 reactant in 3? The means for obtaining 1" is the same as in the first embodiment. Pbo + 5h20B
After obtaining the reactant, zn〇 2 97.997'+no
I! %,)14n02: 0. 5 no#
% 1Sh20s: 0.5 +no1%, 0r20
s: 0.5 unoj? %, JO2: 0, 5 m
o71! %, Au2os: 8/1ooo 1n, tsu/! %, zinc silicate glass: 0.2 w/3% was weighed in a predetermined amount, and 2% of the above reactant was added thereto,
These powders are crushed and pressed into a circular shape. Thereafter, processing is performed in the same manner as in the previous embodiment.

第10図は第4実施例に工って製造された2゜0素子の
電圧電流特性と、第4実施例エリはう硅酸m m カy
 X + 8102 kl120s F ’6別に除去
したZ、fl素子の電圧電流特性を示1−特性図で、図
中、曲線Aは本実施例による素子9曲aSぼほう硅1W
it<鉛ガラスr除去した素子1曲+YMCは5to2
に除去した素子9曲線りはAIt、o、 k除去した素
子のものである。
FIG. 10 shows the voltage-current characteristics of the 2°0 element manufactured according to the fourth example, and the voltage-current characteristics of the 2°0 element manufactured according to the fourth example.
X + 8102 kl120s F'6 This is a 1-characteristic diagram showing the voltage-current characteristics of the Z and fl elements that have been removed separately.
it < lead glass r removed element 1 song + YMC is 5to2
The curve of element 9 removed in 1 is that of the element with AIt, o, k removed.

第11図は第4実施例において、S 102 以外ケ実
施例の配付とし、5102 の添加1jt’に&えて製
造した素子の非直線指数α値を示す曲線Aと、第4実施
例↓ジはう硅酸亜鉛ガラス?除去した配合で、d102
 の添7JII射τ変えて装造した素子のα1直tボす
曲線Bと、同じく第4実施例工pJO2i除去した配合
で、はう硅酸亜鉛ガラスの添加に#r変えて製造した素
子のα1直(11−ボす曲#Cと、同じく第4実施例j
 jQ A/20. i除去した配合で、sL(’+2
 の添加Jli會変えて製造した素子のα1直tボす曲
線りの特性図である。
FIG. 11 shows a curve A showing the nonlinear index α value of a device manufactured by adding 1jt' of 5102, and a curve A showing the nonlinear index α value of the device manufactured by adding 1jt' of 5102 in Example 4 except for S 102. Zinc silicate glass? With the removed formulation, d102
Attachment 7: α1 straight t curve B of the device fabricated with JII radiation τ changed, and curve B of the device fabricated with the same formulation in which pJO2i was removed from the fourth embodiment, but with the addition of zinc silicate glass changed to #r. α1 straight (11-Boss song #C, same as 4th example j
jQ A/20. For the formulation with i removed, sL('+2
FIG. 3 is a characteristic diagram of the α1 straight t curve of the device manufactured by changing the addition Jli.

第12図は180℃の恒温1曹中でvl[nへの85%
の直流電圧t1:lJ力口したときの湘扛屯流増加率6
1/、。ケ示す特性図で、図中直線Aは本実施例素子、
11線Bはほう硅酸匪鉛ガラスを除去したときの素子の
ものである。
Figure 12 shows 85% of vl[n in 180°C constant temperature 1 soda
When the DC voltage t1:lJ is applied, the increase rate of the current is 6.
1/. In the characteristic diagram shown in the figure, straight line A indicates the element of this example,
Line 11 B shows the element with the borosilicate glass removed.

上記第10図から第12図で明らかのLうに本実施し1
1による素子はki420B +はう硅酸非錯ガラスを
虜)Ju した素子やAj?20g 1 、:1102
 ケ虜加した素子に比較して非直1課特性及び寿命特性
が擬n、またt3jo2.はう硅憤弗鉛ガラスを添JJ
u L、た素子に比較してIOA以上での非llj線特
性が浸nている。
This is clearly shown in Figures 10 to 12 above.
The element based on 1 is ki420B + silicic acid non-complex glass) Ju element or Aj? 20g 1, :1102
Compared to the element with which the capacitor was applied, the non-inverter characteristic and the life characteristic are pseudo-n, and t3jo2. Added silica fluoride glass JJ
The non-llj line characteristics at IOA or higher are significantly higher than those of the other elements.

なお、第4実施例における素子の熱処理温度や時間等は
第1実施例と同様に行わ扛る。また、各添加成分ノ4n
囲はPbOl ah20s反応’1111 i 0.2
〜20w t、%−MnO2’!!? 0.1〜5 m
o/!%、8h20g k 0.1〜5mo/%、 c
r2o8k 0.1〜5 mo/%、JD2 ’f)0
.2 0.1〜5mO/%、Aj?20g2 / 〜2”/3
11001(+00 1no/%、はう硅酸非錯ガラス0.01〜5wt%と
するのが好ましく、この範囲ニジ少いと効果a現わ几ず
、多いと非il線性が低下する6また、A/2r)3は
上記範囲りり少いと効果がなく、多いと寿命特性が低下
する、 し発明の効果] 以上述べたLうに、この発明に工jLば、熱処理によっ
ても結晶構造の変化ケ起ζないので、非fσ線特性を低
下させず、かつイ流が10μAと少ない′f4績から非
直線特性値が高く、課電時にも湘rしば流の少なく、ま
た、課一時間による漏れ電流の増力日も少ないため耐久
性が著しく増)JD L、しかもB12O3糸素子の(
Bl のクラーク数2 X t o−5)に比較してP
h(11(Ph のクラーク数1.5X10−’)全期
用するので資源として豊aである等の利点tもっている
Note that the heat treatment temperature, time, etc. of the element in the fourth example are the same as in the first example. In addition, each additive component 4n
The box is PbOl ah20s reaction '1111 i 0.2
~20 w t,%-MnO2'! ! ? 0.1~5m
o/! %, 8h20g k 0.1-5mo/%, c
r2o8k 0.1~5 mo/%, JD2'f)0
.. 2 0.1-5mO/%, Aj? 20g2 / ~2”/3
11001 (+00 1no/%, silicic acid non-complex glass is preferably 0.01 to 5wt%. If the amount is small in this range, the effect A will not be noticeable, and if it is too large, the non-il radiation property will decrease.) /2r) If 3 is less than the above range, there will be no effect, and if it is more than 3, the life characteristics will be reduced. Effects of the Invention] As stated above, if the present invention is applied, heat treatment will also cause changes in the crystal structure. Therefore, the non-linear characteristic value is high due to the low current of 10μA, and the current is small even when the current is applied, and the leakage current due to one hour of application is low. (Durability is significantly increased because there are fewer days to increase strength) JD L, and B12O3 yarn element (
P compared to Clark number 2
h (11 (Clarke number of Ph 1.5 x 10-')) Since it is used throughout the term, it has the advantage of being abundant as a resource.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの発明゛の一実施例によって製造されたZn
(1素子のrt圧圧電時特性5tO2’f添力uしない
znO素子の電圧電流特性図、第2図はi3 +02 
の罐を変えて添加し製造上nた2ゎO素子の非直線指数
とV + mA / qa の変化ケ示す特性図、渠8
図は第1図における商jL咀流増〃ロ巡特1生図、第4
図はこの発明の第2実施yt1に工って嫂遺さ几た2ゎ
O素子と、8t02 めるいはAx2oBだけ110し
たznO素子の電圧電相特性図、45図Its Al、
+o= k固vし、5102の添加11−変えて製造さ
nた2ゎ0素子、8102 だけの添加Itケ変えて製
造されたZnO#、子及びki20.の添加量だけt変
えて製造さ几たz00素子の非![線指畝時性図、巣6
図は第2実施例における一n鑞流増加感特性図、第7図
はこの発明の第8実施例によって製造さrしたZが)素
子と、6t02あるいはほう硅酸II+!鉛ガラスだけ
t施/jLI したZn(+素子のゼ圧゛也訛符性図、
81!8図はeよう硅を宵曲釦ガラスの′#を固定し、
5t02 のl公〃l材を変えて製造′2!rシた2、
0素子、B to 2 の庁加寸だけτ変えて製造さ几
たznO素子及びほう硅IW!if!鉛ガラスの雇〃0
肴だけr菱えて硬漬さnた2ゎ()素子の非直−指式時
性図、49図は第8実施例に2ける−1+−’4 #、
 11加嘉を示す特性図、第10図σこの発明の17!
4央施例に工って製造メれたZっ0素子と、はう硅酸亜
鉛ガラス、5tO2、A/!20s k各々除去した2
o0素子の電圧−流特性図、第11図はdt02 以外
、を第4実施例の配合とし、JO2のMS加緻111−
変えて製造したZnO素子、はう硅酸+l11縮ガラス
を除去した配付で、d102 の座7JII虐を変えて
製造した2n0素子、5tO2f除去した配合でほう硅
酸亜mlガラスの添加着r変えて」lI造した2ゎO素
子及びIdl 2 o 5 −ど除去した配合で5tO
2の逐力11tL−震えて製造したZnO素子の非直線
指数特性図、;A12図は第4実施例における一tc軍
流増〃l惠特性図である□@1吟開 第4図 1流(A) 第5図 Si 02 A力Di(mo? ’/J第9図 課V吋間 第7図 霞違(A) 第8図 5iO24力117t(moF ”ム)膠を詩M 第10図 覧((A) @11図 5i024力Di(mo7 °ん)
FIG. 1 shows Zn produced according to an embodiment of the present invention.
(rt piezoelectric characteristic of one element 5tO2'f voltage-current characteristic diagram of znO element without addition u, Figure 2 is i3 +02
A characteristic diagram showing the change in the nonlinear index and V + mA / qa of the n2ゎO element due to the manufacturing process when different cans of
The figure shows the quotient jL current increase in figure 1,
The figure is a voltage-electric phase characteristic diagram of a 2ゎO element built and left over from the second implementation of this invention, and a ZnO element with 8t02 and only Ax2oB of 110, Figure 45 Its Al,
+o = k hard v, n2ゎ0 element fabricated with 5102 addition 11-change, ZnO# fabricated with 8102 only addition It change, and ki20. Non-Z00 elements manufactured by changing the amount of addition T! [Digitary furrow sex diagram, nest 6
The figure shows a characteristic diagram of the increasing feeling of solder flow in the second embodiment, and FIG. Zn with only lead glass applied/jLI
81! Figure 8 shows how to fix the evening music button glass'# on the e-like
Manufactured by changing the material of 5t02'2! rshita2,
0 element, ZnO element manufactured by changing only the size of B to 2 by τ, and the fused IW! If! Lead glass employment 〃0
Figure 49 shows the non-direct-finger type timing diagram of the 2ゎ() element, which was pickled only by the side dish.
11 Characteristic diagram showing Kaka, Figure 10 σ 17 of this invention!
4 Z0 elements manufactured in the center, zinc silicate glass, 5tO2, A/! 20s k each removed 2
The voltage-current characteristic diagram of the o0 element, FIG.
A ZnO element manufactured by changing the silicic acid + l11 reduced glass was removed, a 2n0 element manufactured by changing the d102 seat 7JII, and a formulation in which 5tO2f was removed and the addition of borosilicate ml glass was changed. 5tO by removing the 2ゎO element and Idl 2 o 5-
Figure A12 is the non-linear exponential characteristic diagram of the ZnO element manufactured with 11tL of force of 2; Figure A12 is the characteristic diagram of the 1tc force increase in the 4th embodiment. □@1Ginkai Figure 4 (A) Fig. 5 Si 02 A force Di (mo? ' / J Fig. 9 Section V 后 7 盞 DIFFERENCE (A) Fig. 8 5iO24 Force 117t (moF ``mu) Glue wo Poem M Fig. 10 View ((A) @11 Figure 5i024 force Di (mo7 °n)

Claims (1)

【特許請求の範囲】 111 予めPhO+ B12O3にノブ「足の温度で
反応させた後、その反応物k Z)10 + M102
* 131’)20M+Cr20M+F3tO2に添加
し混合して〃I圧成形し、その成形体i %処理成形し
たことt特徴とする酸化1亜鉛非Im−線抵抗体の製造
方法。 (21前記pho + 8b7OA反応物70.2から
20wt。 %+ M、n02k (11から5 +nO/%、8b
20g k 0.1から5 cno12%、C120x
、 T (11から5 rno/1%、J02 kO8
1から5 tnoA%、2 znoに添〃口したことt
特徴とする特許請求1/、)範囲第1項に記載の嘴化也
鉛非1■線抵抗体の製造方法。 (31前”L Pbo * 13b205 )開会がモ
ル比で2=1から2:1.5である反応・吻とした特許
請求の範囲第1項にdピ・成の酸化(止鉛非10線砥抗
体の製造方法。 (4) 予めPbo 、 8620g k Fir ’
Mの1LA度−(゛反応させた後、その反応物k zn
o + Mr、o、、 l 5h2f)A rCr2(
’15 + 8102 + A/20x にR+> )
Ju L混合して〃l圧或ノヒし、その成形体τ熱処理
成形したこと勿特徴とする酸化亜鉛非血巌砥抗体の製造
方法。 +F)+ t+Hc: pho + 5b2o3* 0
.2 カら211 wt、 X。 MrU02 z 0.1 カら5 moe 9i 、 
5h2Us k O,l カら5 mo/ %、”r2
0s ’r 0.1から5 nno/!%、5(02f
O8lから5 +no/%、A/20g i ”2/1
o00 ”ら2°/xooorno/%τznOに蚕〃
ルたこと勿特斂とする特許請求の範囲第4.LAにjピ
幀の酸化曲鉛非l[線抵抗体の製造方法。 f61 it記P1−.0 、81−120gの割合が
モル比で2=1から2 : 1.5である反応物とした
特it!F、請求の範囲第4項に記載の酸化I11!鉛
非直線抵抗体の製造方法。 (7)予めPbO+ 8h20s rl’)r足の温度
で反応させた後、その反応物k Z、O+ MHO2+
 Bb20s、Cr2’)S + 5tO2,はう硅酸
匪姶ガラスに添加し混合して加圧成形し、その成形体を
熱処理成形したことr特徴とする酸化亜鉛非直線抵抗体
の製造方法。 ・8) 前記pbo 、 Bh20S i 0.2から
20 w t、%。 MnO2z 0.1から5 +11o1%、Sh20g
 ’it 0.1から5 nno/、%、cr2o! 
= o、 iから5[n01%、 5tO2i 0.1
から5 mrJr % +はう硅は亜鉛ガラスt0.0
1から5w↑1%rzr]OK添刀口したことケ特徴と
する特許請求の範囲第7項に記載のE舜化1(ト鉛非直
線抵抗体の製造方法。 (9)前記Ph0 、8b20gの割合がモル比で2=
1から2:1.5である反応物とした特許請求の範囲第
7項1c記載の酸化亜鉛非i[線抵抗体の製造方法。 uol 予めPbO+ 8b203 ’c Par定の
温度で反応させた後、その反応物?tZnO、MnO2
、’h20a、Cr2O,,5i02 + A/203
、はう硅醪能鉛ガラスに添加し混合して加圧成形し、ぞ
の成形体r熱処理成形したこと【%家とする酸化111
i鉛非直線抵抗体の製造方法。 till N1ne Pbo %5b20s t 0.
2から2 (1wt、 、% 。 MoO2’i 0.1から5 Ina11%、t3(−
,20s (II” 0.1から5 +noA%、cr
2o5 r o、 lから5 ma1g%、8 t02
f O,I Xl)う5 mol! X−A/20s 
k ”/ カら000 2071 Floo ”Oi!%、はう硅@能鉛ガラス
0601かう5wt、%葡znOに層別したことケ特徴
とする特許請求の範囲第10項に記載の酸化亜鉛非11
巌砥抗体の製造方法。 u力 Ail tj己p1−、Q l bh20Mの肖
11曾がモル比で2:lから2二1.5である反応°吻
とした特許請求の範囲第10項1c記城のrIli2化
曲鉛非直線抵抗体の製造方法。
[Claims] 111 PhO + B12O3 is reacted in advance at foot temperature, and then the reactant k Z) 10 + M102
*131') A method for manufacturing a zinc oxide non-Im-wire resistor, characterized in that the mixture is added to 20M+Cr20M+F3tO2, then I pressure molded, and the molded product is processed and molded. (21 pho + 8b7OA reactant 70.2 to 20 wt.% + M, n02k (11 to 5 + nO/%, 8b
20g k 0.1 to 5 cno12%, C120x
, T (11 to 5 rno/1%, J02 kO8
1 to 5 tnoA%, 2 having touched zno
Claim 1: A method for manufacturing a lead-free single-wire resistor according to claim 1. (31 ago"L Pbo * 13b205) Claim 1 states that the opening is a reaction/proboscis in which the molar ratio is from 2=1 to 2:1.5. Method for producing abrasive antibody. (4) Pbo, 8620g k Fir' in advance
1 LA degree of M - (゛After reacting, the reactant k zn
o + Mr, o,, l 5h2f) A rCr2(
'15 + 8102 + A/20x to R+> )
A method for producing a non-bloody abrasive antibody made of zinc oxide, which is characterized in that Ju L is mixed, pressed, and the molded product is heat-treated and molded. +F) + t+Hc: pho + 5b2o3* 0
.. 2 Kara 211 wt, X. MrU02 z 0.1 Kara5 moe 9i,
5h2Us k O,l 5 mo/%,”r2
0s 'r 0.1 to 5 nno/! %, 5 (02f
O8l to 5 +no/%, A/20g i ”2/1
o00 ” et 2°/xooorno/%τznOni silkworm〃
Claim 4. Claim 4. A method for manufacturing wire resistors using curved lead oxide in LA. f61 Itki P1-. 0,81-120g of reactants in a molar ratio of 2=1 to 2:1.5! F, oxidation I11 according to claim 4! A method for manufacturing a lead nonlinear resistor. (7) After reacting in advance at a temperature of PbO+ 8h20s rl') r, the reactant k Z, O+ MHO2+
A method for manufacturing a zinc oxide nonlinear resistor, characterized in that Bb20s, Cr2')S + 5tO2, is added to silicic acid glass, mixed, pressure molded, and the molded product is heat treated and molded. -8) The pbo, Bh20S i 0.2 to 20 wt, %. MnO2z 0.1 to 5 +11o1%, Sh20g
'it 0.1 to 5 nno/, %, cr2o!
= o, i to 5[n01%, 5tO2i 0.1
From 5 mrJr % + Insulation is zinc glass t0.0
1 to 5w↑1%rzr] The ratio is molar ratio 2 =
A method for manufacturing a zinc oxide non-i[wire resistor] according to claim 7, wherein the reactants have a ratio of 1 to 2:1.5. uol PbO+ 8b203 'c After reacting at a constant temperature of Par, the reactant? tZnO, MnO2
,'h20a,Cr2O,,5i02 + A/203
Added to lead glass, mixed and pressure molded, the molded product was heat treated and molded.
i A method for manufacturing a lead nonlinear resistor. till N1ne Pbo %5b20s t 0.
2 to 2 (1wt, ,%. MoO2'i 0.1 to 5 Ina11%, t3(-
,20s (II" 0.1 to 5 +noA%, cr
2o5 r o, l to 5 ma1g%, 8 t02
f O, I Xl) U5 mol! X-A/20s
k” / Kara000 2071 Floo “Oi! Zinc oxide non-11 according to claim 10, characterized in that it is stratified into %, silicon @ lead glass 0601 5wt, and %znO.
Method for producing Iwato antibody. U force Ail tj self p1-, Q l bh20M's ratio is 2:1 to 221.5 in molar ratio.Claim 10.1c. A method of manufacturing a nonlinear resistor.
JP59009124A 1984-01-20 1984-01-20 Method of producing zinc oxide nonlinear resistor Pending JPS60153104A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59009124A JPS60153104A (en) 1984-01-20 1984-01-20 Method of producing zinc oxide nonlinear resistor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59009124A JPS60153104A (en) 1984-01-20 1984-01-20 Method of producing zinc oxide nonlinear resistor

Publications (1)

Publication Number Publication Date
JPS60153104A true JPS60153104A (en) 1985-08-12

Family

ID=11711888

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59009124A Pending JPS60153104A (en) 1984-01-20 1984-01-20 Method of producing zinc oxide nonlinear resistor

Country Status (1)

Country Link
JP (1) JPS60153104A (en)

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