JPS60135850A - 状態マツプ方法及びその装置 - Google Patents

状態マツプ方法及びその装置

Info

Publication number
JPS60135850A
JPS60135850A JP58249426A JP24942683A JPS60135850A JP S60135850 A JPS60135850 A JP S60135850A JP 58249426 A JP58249426 A JP 58249426A JP 24942683 A JP24942683 A JP 24942683A JP S60135850 A JPS60135850 A JP S60135850A
Authority
JP
Japan
Prior art keywords
wavelength
values
value
wavelength value
epma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58249426A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0247698B2 (cg-RX-API-DMAC7.html
Inventor
Hiroyoshi Soejima
啓義 副島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Shimazu Seisakusho KK
Original Assignee
Shimadzu Corp
Shimazu Seisakusho KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp, Shimazu Seisakusho KK filed Critical Shimadzu Corp
Priority to JP58249426A priority Critical patent/JPS60135850A/ja
Publication of JPS60135850A publication Critical patent/JPS60135850A/ja
Publication of JPH0247698B2 publication Critical patent/JPH0247698B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP58249426A 1983-12-26 1983-12-26 状態マツプ方法及びその装置 Granted JPS60135850A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58249426A JPS60135850A (ja) 1983-12-26 1983-12-26 状態マツプ方法及びその装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58249426A JPS60135850A (ja) 1983-12-26 1983-12-26 状態マツプ方法及びその装置

Publications (2)

Publication Number Publication Date
JPS60135850A true JPS60135850A (ja) 1985-07-19
JPH0247698B2 JPH0247698B2 (cg-RX-API-DMAC7.html) 1990-10-22

Family

ID=17192792

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58249426A Granted JPS60135850A (ja) 1983-12-26 1983-12-26 状態マツプ方法及びその装置

Country Status (1)

Country Link
JP (1) JPS60135850A (cg-RX-API-DMAC7.html)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01209648A (ja) * 1988-02-17 1989-08-23 Shimadzu Corp Ｘ線マイクロアナライザによる分析方法
JP2003536084A (ja) * 2000-06-07 2003-12-02 ケーエルエー−テンカー・コーポレーション 電子ビームによって誘導されるｘ線微量分析を使用した薄膜の厚さ測定
JP2021076411A (ja) * 2019-11-06 2021-05-20 株式会社島津製作所 試料成分推定方法、試料成分推定装置、試料成分推定プログラム、学習方法および学習プログラム

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57142551A (en) * 1981-02-27 1982-09-03 Nippon Steel Corp Determination of foreign matter in metal
JPS5814039A (ja) * 1981-07-17 1983-01-26 Seiko Instr & Electronics Ltd 電子ビ−ムマクロアナライザ装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57142551A (en) * 1981-02-27 1982-09-03 Nippon Steel Corp Determination of foreign matter in metal
JPS5814039A (ja) * 1981-07-17 1983-01-26 Seiko Instr & Electronics Ltd 電子ビ−ムマクロアナライザ装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01209648A (ja) * 1988-02-17 1989-08-23 Shimadzu Corp Ｘ線マイクロアナライザによる分析方法
JP2003536084A (ja) * 2000-06-07 2003-12-02 ケーエルエー−テンカー・コーポレーション 電子ビームによって誘導されるｘ線微量分析を使用した薄膜の厚さ測定
JP2021076411A (ja) * 2019-11-06 2021-05-20 株式会社島津製作所 試料成分推定方法、試料成分推定装置、試料成分推定プログラム、学習方法および学習プログラム

Also Published As

Publication number Publication date
JPH0247698B2 (cg-RX-API-DMAC7.html) 1990-10-22

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees