JPS60133726A - パタ−ンの欠陥検査装置に用いる境界の処理方法 - Google Patents
パタ−ンの欠陥検査装置に用いる境界の処理方法Info
- Publication number
- JPS60133726A JPS60133726A JP58240833A JP24083383A JPS60133726A JP S60133726 A JPS60133726 A JP S60133726A JP 58240833 A JP58240833 A JP 58240833A JP 24083383 A JP24083383 A JP 24083383A JP S60133726 A JPS60133726 A JP S60133726A
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- frame memories
- processing method
- unit
- reference information
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000007547 defect Effects 0.000 title claims description 19
- 238000003672 processing method Methods 0.000 title claims description 13
- 230000015654 memory Effects 0.000 claims abstract description 35
- 238000007689 inspection Methods 0.000 claims description 12
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 claims description 3
- 238000000034 method Methods 0.000 claims description 2
- 238000006243 chemical reaction Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58240833A JPS60133726A (ja) | 1983-12-22 | 1983-12-22 | パタ−ンの欠陥検査装置に用いる境界の処理方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58240833A JPS60133726A (ja) | 1983-12-22 | 1983-12-22 | パタ−ンの欠陥検査装置に用いる境界の処理方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60133726A true JPS60133726A (ja) | 1985-07-16 |
JPH0374823B2 JPH0374823B2 (enrdf_load_stackoverflow) | 1991-11-28 |
Family
ID=17065369
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58240833A Granted JPS60133726A (ja) | 1983-12-22 | 1983-12-22 | パタ−ンの欠陥検査装置に用いる境界の処理方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60133726A (enrdf_load_stackoverflow) |
-
1983
- 1983-12-22 JP JP58240833A patent/JPS60133726A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPH0374823B2 (enrdf_load_stackoverflow) | 1991-11-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4926489A (en) | Reticle inspection system | |
US4628531A (en) | Pattern checking apparatus | |
JPH0691003B2 (ja) | レチクル/マスクの検査方法とその検査装置 | |
US4623256A (en) | Apparatus for inspecting mask used for manufacturing integrated circuits | |
US7872745B2 (en) | Pattern inspection apparatus and pattern inspection method | |
US5850467A (en) | Image data inspecting method and apparatus providing for equal sizing of first and second image data to be compared | |
JP2004212221A (ja) | パターン検査方法及びパターン検査装置 | |
JPS643050B2 (enrdf_load_stackoverflow) | ||
JPS60126830A (ja) | パタ−ンの欠陥検査装置に用いる走査方法 | |
JPH10282684A (ja) | レーザ描画装置 | |
JPS60133726A (ja) | パタ−ンの欠陥検査装置に用いる境界の処理方法 | |
JPS6171630A (ja) | パタ−ンの欠陥検査装置に用いるパタ−ンの判定方法 | |
JPS60126828A (ja) | パタ−ンの欠陥検査装置に用いるデ−タ処理方法 | |
JPS6147635A (ja) | パタ−ンの欠陥検査装置に用いるパタ−ンの判定方法 | |
JPS60126829A (ja) | パタ−ンの欠陥検査装置に用いる走査速度の自動制御方法 | |
JPS6356702B2 (enrdf_load_stackoverflow) | ||
JPH0374822B2 (enrdf_load_stackoverflow) | ||
JPS6239811B2 (enrdf_load_stackoverflow) | ||
JPS60133724A (ja) | パタ−ンの欠陥検査装置に用いる歪み補正方法 | |
JPH0384441A (ja) | レチクルの検査方法 | |
JPH04326380A (ja) | プリンタ装置の露光位置補正方式 | |
JP2532110B2 (ja) | 電子線露光方法 | |
JPH041846B2 (enrdf_load_stackoverflow) | ||
JPH011251A (ja) | パタ−ン欠陥検査装置 | |
JPS60103616A (ja) | 欠陥検査方法および装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |