JPS6013308B2 - semiconductor equipment - Google Patents

semiconductor equipment

Info

Publication number
JPS6013308B2
JPS6013308B2 JP9653877A JP9653877A JPS6013308B2 JP S6013308 B2 JPS6013308 B2 JP S6013308B2 JP 9653877 A JP9653877 A JP 9653877A JP 9653877 A JP9653877 A JP 9653877A JP S6013308 B2 JPS6013308 B2 JP S6013308B2
Authority
JP
Japan
Prior art keywords
lid
bottom plate
wall
insulating material
contact
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP9653877A
Other languages
Japanese (ja)
Other versions
JPS5323274A (en
Inventor
ライナ・エマイス
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG filed Critical Siemens AG
Publication of JPS5323274A publication Critical patent/JPS5323274A/en
Publication of JPS6013308B2 publication Critical patent/JPS6013308B2/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/02Containers; Seals
    • H01L23/04Containers; Seals characterised by the shape of the container or parts, e.g. caps, walls
    • H01L23/043Containers; Seals characterised by the shape of the container or parts, e.g. caps, walls the container being a hollow construction and having a conductive base as a mounting as well as a lead for the semiconductor body
    • H01L23/051Containers; Seals characterised by the shape of the container or parts, e.g. caps, walls the container being a hollow construction and having a conductive base as a mounting as well as a lead for the semiconductor body another lead being formed by a cover plate parallel to the base plate, e.g. sandwich type
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Description

【発明の詳細な説明】 本発明は、金属製の底板と金属製の蓋からなる平形容器
を備え、前記底板と蓋とが絶縁物質で機械的に相互に結
合されそして前記容器内に半導体素子が封入され、前記
底板および蓋に押し付けられてこれらと熱的および電気
的に接触する半導体装置に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention comprises a flat container consisting of a metal bottom plate and a metal lid, the bottom plate and the lid are mechanically connected to each other with an insulating material, and a semiconductor device is placed inside the container. The present invention relates to a semiconductor device which is sealed and pressed against the bottom plate and the lid to make thermal and electrical contact therewith.

公知のこの種半導体装置は、可視・性の絶縁物質リング
を用いて封止されるか、可塑性絶縁物質を用いてモール
ドされていた。
Known semiconductor devices of this type have been encapsulated with a ring of visible insulating material or molded with a plastic insulating material.

液状絶縁物質の流入を避けるために、場合によっては、
可孫性の絶縁物質リングと、可塑性絶縁物質により形成
された絶縁体とを組合わせることも行われてきた。この
場合、半導体素子と底板ないし素子と蓋との間で「単に
加圧接触のみが行われるときには、封止に対して厳格な
要求が課せられる。というのは、液状のないし可塑状態
にある合成樹脂が、毛細管作用により底板、蓋および半
導体素子間の接触面を濡らす煩向があるからである。さ
らにモールドのために、注形用のあるいはトランスファ
ーモールドのための型が必要である。このような型は高
価であり、半導体装置の価格を引き上げることになる。
本発明の目的は、最初に述べた形式の半導体装置を改良
し、複雑な型を用いることないこ簡単に封止を行えるよ
うにすることにある。
In some cases, to avoid the inflow of liquid insulating material,
Combinations of flexible insulating material rings and insulators formed from plastic insulating materials have also been used. In this case, if only a pressurized contact is made between the semiconductor component and the bottom plate or the component and the lid, strict requirements are imposed on the sealing. This is because the resin tends to wet the bottom plate, the lid, and the contact surfaces between the semiconductor elements due to capillary action.Furthermore, a mold for casting or transfer molding is required for molding. This type is expensive and increases the price of the semiconductor device.
The object of the invention is to improve a semiconductor device of the type mentioned at the outset so that it can be sealed easily without the use of complex molds.

本発明は、蓋を底部および壁部を備えたつば状体として
形成し、半導体素子の一方の電極を底部に接触させ、つ
ば状体の壁部が入り込む溝を底板に設け、半導体素子の
他の電極を溝から隔たった底板の表面に接触させそして
溝を、壁部が浸されるまで絶縁性の物質で充たすことを
特徴とする。
In the present invention, the lid is formed as a flange-like body having a bottom part and a wall part, one electrode of the semiconductor element is brought into contact with the bottom part, a groove is provided in the bottom plate into which the wall part of the flange-like body enters, and the semiconductor element and other parts are provided. the electrode is brought into contact with a surface of the bottom plate remote from the groove, and the groove is filled with an insulating material until the wall is immersed.

溝を絶縁物質で充たすにあたり、半導体素子の電極と接
触する面が絶縁物質と触れない範囲内の充填を行うのが
望ましい。こうすれば、絶縁物質による接触面の濡れを
防ぐための特別の封止処置が不要となる。半導体素子を
蓋内に保持するようにすると有利である。これを伴い、
組立てが著しく簡単になる。底板に、閉止可能な排気口
を設けることができる。
When filling the trench with an insulating material, it is desirable to fill the trench to such an extent that the surface of the semiconductor element that will be in contact with the electrode does not come into contact with the insulating material. This eliminates the need for special sealing measures to prevent wetting of the contact surfaces by the insulating material. Advantageously, the semiconductor component is retained within the lid. Along with this,
Assembly becomes significantly easier. The bottom plate can be provided with a closable exhaust port.

この開□はtリベットを用いて閉じられる。排気口を通
して、容器組立ての際に封じ込まれた空気は、絶縁物質
を通過することないこ排気される。以下本発明を図示の
実施例について詳しく説明する。
This opening □ is closed using a t-rivet. Through the exhaust port, air trapped during container assembly is exhausted without passing through the insulating material. The present invention will be described in detail below with reference to the illustrated embodiments.

半導体装置の容器の蓋を「第1図に符号1で示す。The lid of the container for semiconductor devices is designated by the reference numeral 1 in FIG.

この蓋は、銅やアルミニウムのような熱良導性の金属か
らなる。蓋はつば状に形成され、底部2と壁部3を備え
る。蓋i‘ま半導体素子軍Qを受容する働きをし、この
場合「壁部3の内蓬は、蓋亀から半導体素子】0が落ち
出さないように「素子10の外径と適合されている。半
導体装置の容器の底板を第2図に符号亀で示す。
The lid is made of a metal with good thermal conductivity, such as copper or aluminum. The lid is shaped like a collar and has a bottom part 2 and a wall part 3. The lid i' serves to receive the semiconductor element Q, and in this case, the inner wall of the wall 3 is adapted to the outer diameter of the element 10 to prevent the semiconductor element 0 from falling out from the lid. The bottom plate of the semiconductor device container is indicated by a turtle in FIG.

底板4は「蓋亀の壁部3の形状を適合し,た形の溝5を
有する。両部分は、例えばリング状であり得る。溝5で
取り囲まれた面は半導体素子IQの接触面として働き、
符号6を付されている。底板4は、排気口7を備える。
溝5はト段部亀2を有することができる。菱に排気口を
設けることも可能である。装置の組立てに際しては、溝
5内に液状の「硬化可能なないいま他の方法で固化する
絶縁物質を充たし(第3図)、次いで蓋1を底板4上に
、壁部3が絶縁材料9中に浸たるよう戦層する。
The bottom plate 4 has a groove 5 in the shape of a "shaped wall 3 of the lid turtle". Both parts can be ring-shaped, for example. The surface surrounded by the groove 5 serves as a contact surface of the semiconductor element IQ. work,
It is designated by the reference numeral 6. The bottom plate 4 includes an exhaust port 7.
The groove 5 can have a step turtle 2. It is also possible to provide an exhaust port on the diamond. To assemble the device, the groove 5 is filled with a liquid curable or otherwise solidified insulating material (FIG. 3), then the lid 1 is placed on the bottom plate 4 and the wall 3 is filled with an insulating material 9. The battle layer is immersed inside.

この場合、壁部3が、その全域で溝5の壁と等しい間隔
を持つようにして、蓋1と底板4との心合わせを行うと
有利である。壁部3をできる限り薄くして「押し出され
る絶縁物質の量を可能な限り少なくするのが望ましい。
壁部3を溝5内に浸す際「絶縁物質の一部だけが押しの
けられ、この結果液面が上昇する。
In this case, it is advantageous to center the lid 1 and the base plate 4 in such a way that the wall 3 has an equal spacing over its entire area with the wall of the groove 5. It is desirable to make the wall 3 as thin as possible so that the amount of insulating material extruded is as small as possible.
When the wall 3 is dipped into the groove 5, only part of the insulating material is displaced, so that the liquid level rises.

この際、毅部軍2も充たされ、これに伴って、蓋1と底
板亀との間の、絶縁物質9の沿面距離が増大する。絶縁
物質9の体積は「壁部3の浸贋時、物質9が接触面6ま
で上昇しないように選ぶのが望ましい。こうすれば〜底
板4と半導体素子IQとの電気的、熱的接触がト侵入し
た物質により妨げられることがない。蓋亀を溝内に浸し
た際容器の内部に封入された空気は、排気口?を通して
抜き取られる。半導体素子10が庭坂母上に接触すると
、排気口7‘ま、例えばリベット8を用いて閉鎖される
。半導体素子1叫ぶ通例の通りト縁部に露出するpn接
合を保護するためのワニス亀富を備えることができる。
At this time, the force 2 is also filled, and the creepage distance of the insulating material 9 between the lid 1 and the bottom plate turtle increases accordingly. It is desirable to select the volume of the insulating material 9 so that the material 9 does not rise to the contact surface 6 when the wall portion 3 is eroded. The air sealed inside the container when the lid turtle is immersed in the groove is extracted through the exhaust port 7. When the semiconductor element 10 comes into contact with the Niwasaka motherboard, the air sealed inside the container is removed through the exhaust port 7. It is closed, for example using rivets 8. The semiconductor component 1 can be provided with a varnish to protect the pn junctions exposed at the edges as usual.

絶縁物質9の硬化に伴い、半導体装置は最終的に姿止さ
れる。
As the insulating material 9 hardens, the semiconductor device is finally removed.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本考案の−実施例に係る半導体装置の蓋ならび
にここに収容された半導体素子の縦断面図、第2図は底
板の縦断面図、第3図は完成した半導体装道の縦断面図
である。 富…・・・蓋、2……底部、3……壁部、4…・・・底
板「 5…・・・溝、9・・・・・・絶縁物質、10…
・・・半導体素子。 Fig.’ Fig.2 Fi9.3
FIG. 1 is a longitudinal sectional view of the lid of a semiconductor device according to an embodiment of the present invention and a semiconductor element housed therein, FIG. 2 is a longitudinal sectional view of the bottom plate, and FIG. 3 is a longitudinal sectional view of the completed semiconductor device. It is a front view. Wealth: Lid, 2: Bottom, 3: Wall, 4: Bottom plate 5: Groove, 9: Insulating material, 10:
...Semiconductor element. Fig. 'Fig. 2 Fi9.3

Claims (1)

【特許請求の範囲】[Claims] 1 金属製の底板と金属製の蓋からなる平形容器を備え
、前記底板と蓋とが絶縁物質で機械的に相互に結合され
そして前記容器内に半導体素子が封入されて前記底板お
よび蓋に押しつけられ、これらと熱的および電気的に接
触するものにおいて、蓋を底部および壁部を備えたつぼ
状体として形成し、半導体素子の一方の電極を底部に接
触させ、つぼ状体の壁部が入り込む溝を底板に設け、半
導体素子の他方の電極を溝で囲まれた底板の表面に接触
させ、そして壁部の一部のみが浸されるまで、しかも半
導体素子には触れないように絶縁性の物質で溝を充たし
たことを特徴とする半導体装置。
1. A flat container consisting of a metal bottom plate and a metal lid, the bottom plate and the lid are mechanically connected to each other with an insulating material, and a semiconductor element is sealed in the container and pressed against the bottom plate and the lid. In the case where the lid is formed as a pot-like body having a bottom and a wall, one electrode of the semiconductor element is brought into contact with the bottom, and the wall of the pot-like body is in contact with the bottom. A groove is provided in the bottom plate for entry, the other electrode of the semiconductor element is brought into contact with the surface of the bottom plate surrounded by the groove, and the insulation is heated until only a portion of the wall is immersed, but not in contact with the semiconductor element. A semiconductor device characterized in that a groove is filled with a substance.
JP9653877A 1976-08-13 1977-08-11 semiconductor equipment Expired JPS6013308B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19762636629 DE2636629A1 (en) 1976-08-13 1976-08-13 SEMICONDUCTOR COMPONENT WITH DISC-SHAPED HOUSING
DE2636629.0 1976-08-13

Publications (2)

Publication Number Publication Date
JPS5323274A JPS5323274A (en) 1978-03-03
JPS6013308B2 true JPS6013308B2 (en) 1985-04-06

Family

ID=5985435

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9653877A Expired JPS6013308B2 (en) 1976-08-13 1977-08-11 semiconductor equipment

Country Status (5)

Country Link
JP (1) JPS6013308B2 (en)
DE (1) DE2636629A1 (en)
FR (1) FR2361747A1 (en)
GB (1) GB1548109A (en)
IT (1) IT1085732B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4161746A (en) * 1978-03-28 1979-07-17 Westinghouse Electric Corp. Glass sealed diode
US5081327A (en) * 1990-03-28 1992-01-14 Cabot Corporation Sealing system for hermetic microchip packages
FR2660797A1 (en) * 1990-04-06 1991-10-11 Motorola Semiconducteurs IMPROVED ENCAPSULATING BOX FOR SEMICONDUCTOR DEVICE.
US5371386A (en) * 1992-04-28 1994-12-06 Mitsubishi Denki Kabushiki Kaisha Semiconductor device and method of assembling the same

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR74228E (en) * 1957-09-30 1960-11-07 Gen Motors Corp Advanced transistor
DE1564665C3 (en) * 1966-07-18 1975-10-30 Siemens Ag, 1000 Berlin Und 8000 Muenchen Semiconductor component and method for its manufacture
DE2014289A1 (en) * 1970-03-25 1971-10-14 Semikron Gleichrichterbau Disc-shaped semiconductor component and method for its manufacture

Also Published As

Publication number Publication date
JPS5323274A (en) 1978-03-03
IT1085732B (en) 1985-05-28
FR2361747A1 (en) 1978-03-10
DE2636629A1 (en) 1978-02-16
GB1548109A (en) 1979-07-04

Similar Documents

Publication Publication Date Title
US3817791A (en) Lithium iodine battery
KR930014852A (en) Method for manufacturing semiconductor integrated circuit device, molding apparatus and molding material used therein
JPS5825246A (en) Package for electronic device
JPS6013308B2 (en) semiconductor equipment
US4076908A (en) Pole bolt seal for storage batteries
GB1035219A (en) Electronic device package and method of making same
JPS5824464Y2 (en) Hybrid integrated circuit device
GB1201595A (en) Encapsulated semiconductor device
US3152293A (en) Sealed semiconductor device and mounting means therefor
US5013505A (en) Method of molding a casing on a rotary electric component
JPS624975Y2 (en)
JPS5632736A (en) Sealing method of hybrid integrated circuit device
JPS61145851A (en) Semiconductor module
JPS5931427A (en) Filling method of silicone resin in sensor part
JPS63110645A (en) Manufacture of semiconductor device
JPS5818288Y2 (en) semiconductor equipment
JPS607484Y2 (en) Resin molding equipment for electronic parts
JPS54162963A (en) Manufacture of resin-sealed semiconductor device
JPS6215977Y2 (en)
JPS5843201Y2 (en) Seal structure of parts case
JPS6316122Y2 (en)
JPS5275180A (en) Package for integrated circuits
JPS585348U (en) Resin-encapsulated semiconductor device
JPS56164543A (en) Manufacture of semiconductor device
US3136972A (en) Encapsulated resistor