JPS60132676A - Coating apparatus - Google Patents

Abstract

PURPOSE:To form a thin film with a uniform thickness onto a substrate, by reducing the amount of gas supplied from the external space part of a lid member to the space part between the substrate and the lid member toward the outer peripheral part of the lid member from the central part thereof. CONSTITUTION:The inner lid 14 in a lid body is constituted so that the interval of the region 14a in the vicinity of the central part thereof and the surface of a substrate 7 is set to a relatively large distance L1 and the interval of the region 14c in the vicinity of the peripheral member thereof and the surface of the substrate 7 is set to L2 forming relation of L1>L2 with respect to L1. Further, the intermediate part 14b between the region 14a in the vicinity of the central part being L1 in the distance from the surface of the substrate 7 and the region 14c in the vicinity of the peripheral part being L2 in the distance from the surface of the substrate 7 is formed of an oblique surface wherein the distance from the surface of the substrate 7 changes gradually and plural holes 16 are provided in the vicinity of the central part 14a in the inner lid 14 by drilling.

Description

DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a coating device capable of forming a film of uniform thickness on a rotating substrate.

(Prior art and problems) Substrates having a configuration in which a film of uniform thickness is formed on the surface may be used, for example, as master disks for various information recording media disks, or for optically forming predetermined patterns. Various types of substrates formed by recording means are known.

In order to prepare a substrate having a configuration in which a film of uniform thickness is formed on the surface as described above, the constituent materials of the film to be formed on the substrate are dissolved in a solvent. Thin film formation by the so-called spinner method, in which a substrate with a liquid layer attached to its surface is rotated at high speed to form a film of uniform thickness on the substrate, has been widely used. There is.

Now, as a master disk for an information recording medium disk, a configuration is used in which a film of a uniform thickness of a photosensitive polymer material is formed on the surface of a mirror-polished glass substrate. If the master disk of the information recording medium disk described above is a master disk of an optical information recording medium disk, the depth of the pits to be formed in the optical information recording medium disk should exhibit good uniformity. As such, the film made of the photosensitive polymer material to be formed on the glass substrate of the master disk of the optical information recording medium is thin, for example, 1100 angstroms, and moreover, it is highly uniform. It is required to be excellent in

Incidentally, as a coating apparatus for forming a film of uniform thickness on a rotating substrate, an apparatus having a configuration as shown in FIG. 1 has conventionally been used.

That is, in the longitudinal cross-sectional side view of FIG. 1 showing the conventional coating device, ■ is a container, 2 is an upper lid, and 3 is an inner lid.

4.5 is a mounting member for attaching the inner lid 3 to the upper lid 2; 6;
is a turntable, 7 is a glass substrate, 8 is a rotating shaft, M is a drive motor, and 9 is an air hole.

The glass substrate 7 on the turntable 6 is firmly attached to the turntable 6 by air sucked by the vacuum pump 11 through the air hole 9 and the tube 1O.

In the apparatus shown in the first figure, after removing the lid structure in which the upper lid 2 and the inner lid 3 are integrally constituted, the glass substrate 7 on the turntable 6 which is rotating at a low rotation speed is removed. A liquid in which a photosensitive polymer material is dissolved in a solvent is supplied to the upper surface, and then a lid structure in which the upper lid 2 and the inner lid 3 are integrally constructed is attached to the container 1, and the container is closed. 1
is brought into a sealed state, and the glass substrate 7 is rotated at a high speed of, for example, 300 rpm by the turntable 6.

When the glass substrate 7 rotates at high speed as described above, the liquid on the glass substrate 7 is thinly spread from the inner circumference to the outer circumference of the glass substrate 7 due to the centrifugal force, and a part of the liquid jumps out from the outer circumference of the glass substrate 7. It collides with container 1 and is reflected.

If the liquid splashed out from the outer periphery of the glass substrate 7 is reflected by the container 1 and sprinkled onto the glass substrate 7 again, the thickness of the film made of the photosensitive polymer material to be formed on the glass substrate 7 may be insufficient. However, in the coating apparatus shown in FIG. 1, the inner lid 3 is provided with a small gap of several millimeters, for example, from the upper surface of the glass substrate 7, so the above-mentioned cause may occur. - Therefore, there is no possibility that the thickness of the film made of the photosensitive polymer material to be formed on the glass substrate 7 becomes non-uniform.

In the coating apparatus having the configuration as shown in the first diagram, if the film of the photosensitive polymer material to be formed on the glass substrate is relatively thick, By setting the viscosity of the photosensitive polymer material to be used and the rotational speed 1 of the glass substrate as required, it is possible to form a film with an overall uniform thickness on the glass substrate. However, the film made of a photosensitive polymer material to be formed on a glass substrate is, for example, 110
If the material is relatively thin, such as about 0 angstroms, the viscosity of the photosensitive polymer material coated on the glass substrate and the rotation speed of the glass substrate will affect the peripheral area of the glass substrate. The thickness of the film made of the photosensitive polymer material in the nearby areas could be made relatively easily. Even if it is carried out, the thickness of the film made of the photosensitive polymer material in the part near the center of the glass substrate is smaller than the thickness of the film made of the photosensitive polymer material in the part near the peripheral part of the glass substrate. In the end, no matter how you set the above two conditions, the film made of the photosensitive polymer material formed on the glass substrate will have a uniform thickness throughout. The problem was that it could not be made into something.

In order to solve the above problems, the applicant company first deposits a layer of liquid on the surface of the substrate, in which the constituent materials of the film to be formed on the substrate are dissolved in a solvent, on the substrate at intervals. By making the structure of the lid member disposed apart from the substrate into a special form, the rate of evaporation of the solvent from the center part of the substrate during rotation of the substrate is made faster than the rate of evaporation from other parts. We proposed a coating device that can form a film of uniform thickness on a rotating substrate, and by implementing it, we achieved the expected results. It has been effective.

2 and 3 are longitudinal sectional side views of representative examples of coating devices already proposed by the applicant company, and in each of FIGS. Components corresponding to those of the coating device shown in FIG. 1 are given the same drawing symbols as those used in FIG.

Reference numerals 14 in FIGS. 2 and 3 each indicate an inner lid, and the inner lid 14 is fixed to the upper lid 2 by attachment members 4 and 5, thereby forming a lid structure. The upper lid 2 and the container 1 in the lid assembly are connected by a hinge 13, and the lid assembly can be opened and closed rotatably about the hinge 13 in the direction of arrow R in the figure. The opening/closing operation of the lid structure described above is performed by, for example, a wire 18 shown in each figure.

Further, reference numeral 12 in FIGS. 2 and 3 is a reflection plate that reflects liquid blown away by centrifugal force from the substrate 7 rotating at high speed, and the liquid that collides with this reflection plate 12 and is reflected is This prevents it from facing toward the gap between the lid 14 and the substrate 7.

In the lid structure shown in FIGS. 2 and 3, the inner lid 14 has a relatively large distance L1 between the region 14a near its center and the surface of the substrate 7, and The distance between the region 14c near the periphery and the surface of the substrate 7 is
Regarding the distance L1 described above, the distance L2 is set in the relationship of L1)L2, and further, as described above, the distance L2 is set as L2.
An intermediate portion 14b between a region 14a near the center where the distance from the surface of the substrate 7 is Ll and a region 14c near the periphery where the distance from the surface of the substrate 7 is L2 is the surface of the substrate 7. It is a sloped surface where the distance from the ground gradually changes.

Near the center of the inner lid 14 shown in FIG. 3 1
4a is provided with a hole 15, and in the configuration example shown in FIGS. 2 and 3, a region 14a near the center of the inner lid 14 is circular with a diameter D1. Further, in FIG. 2, the diameter of the substrate 7 is D2.

Area near the center of the inner lid 14], door diameter D1 of 4a
Assuming that the inner cover 14 is flat and non-porous like the inner cover shown in FIG. 1, the distance from the surface of the substrate 7 is L2. Approximately corresponds to the range in which a thin film is formed on the substrate 7 when the substrate 7 is rotated at a high speed and the thickness of the film is thinner than that of the outer peripheral portion where the film has a constant thickness. It may be determined as follows.

The distance L2 between the area 14c near the peripheral part of the inner lid 14 used in the component side device shown in FIGS. Even if the liquid collides with the reflective plate 12 and rebounds, it will not be reflected on the substrate 7.
In order to avoid going back to the top, for example, 5
It is set to a relatively small value such as mm.

Further, the distance L1 between the region 14a near the center of the inner lid 14 and the front surface of the substrate 7 is set larger than the distance L2 between the peripheral region 14c of the inner lid 14 and the surface of the substrate 7. However, there is no hole in the region 14a near the center of the inner lid 14 used in the component side device shown in the second figure, and the inner lid 14 used in the component side device shown in the third figure does not have a hole. Although the hole 15 is bored in the area 14a near the center of the lid 14, the hole 15 is not bored in the area 14a near the center in the component side device shown in FIGS. 2 and 3. The region 14a near the center of the inner lid 14 and the substrate 7 in the configuration-side device shown in the second figure in which the inner lid 14 in this state is used.
The distance L1 from the surface of the center part of the inner cover 14 of the configuration example device shown in the third figure is used, in which the inner cover 14 is used in which the hole 15 is bored in the region 14a near the center part. The distance L1 is set to be larger than the distance L1 between the nearby region 14a and the surface of the substrate 7.

In order to form a film of uniform thickness on the surface of the substrate 7 (glass substrate 7) using the configuration example apparatus shown in FIGS. 2 and 3, first, the upper lid 2 and the inner lid 14 are integrated. The lid structure connected to the container 1 is rotated by the hinge 13 to open the container 1, and the glass substrate 7 is connected to the turntable 6.

Next, on the glass substrate 7 connected to the turntable 6 which is being rotated at low speed by the drive motor M, a liquid made to a predetermined viscosity by diluting the photosensitive polymer material with thinner is placed on the glass substrate 7, which is connected to the turntable 6 which is being rotated at low speed by the driving motor M. The liquid is supplied onto the glass substrate while moving the nozzle in the radial direction of the glass substrate 7 from the nozzle that is not in use, thereby forming the coating layer of the liquid on the glass substrate 7.

Once the liquid coating layer has been formed on the surface of the glass substrate 7 as described above, the nozzle is retracted outside the container 1 and the lid structure is rotated on the hinge 13, and the container 1 is moved to the upper lid 2. is kept sealed. In this state, each part of the inner cover 14 fixed to the upper cover 2 by the mounting members 4 and 5 is spaced a predetermined distance Ll from the glass substrate 7.
, since it will be arranged in a state that shows L2,
The drive motor M is rotated at high speed (for example, 300 rpm) to rotate the glass substrate 7, which is integrally formed with the turntable 6, at high speed.

After rotating the glass substrate 7 at a high speed for about 1 minute, the rotation speed of the drive motor M is reduced, and after rotating the glass substrate 7 at a low speed for about several minutes with the lid structure open, the drive motor M is rotated at a low speed. to stop.

As described above, a thin film of a uniform thickness of the photosensitive polymer material is formed on the surface of the glass substrate 7, but for what reason does the previously proposed coating device The following explains how a film with a uniform thickness can be formed thereon.

As clarified in the explanation of the conventional apparatus shown in FIG. 1, when trying to form a thin film on the glass substrate 7 using the conventional apparatus shown in FIG. The thickness of the film near the center of the glass substrate 7 was smaller than the thickness of the film made of the photosensitive polymer material. During the high-speed rotation of the glass substrate 7, the solvent that was being used evaporates and becomes a gas.

By filling the narrow gap between the surface of the glass substrate 7 and the flat inner lid 3 described above, evaporation of the solvent is suppressed and the period in which the solvent is maintained in a liquid state is in the portion near the center of the glass substrate 7. It is considered that the thickness of the film becomes thinner in the portion near the center of the glass substrate 7 due to the action of centrifugal force that effectively acts during the period when the glass substrate 7 is kept in a liquid state.

However, in the previously proposed coating apparatus described above, the distance between the part near the periphery of the substrate and the surface of the substrate is small, and the distance between the part near the center of the board and the surface of the substrate is large. By arranging a lid member having a structural configuration, that is, an umbrella-shaped lid member, above a substrate to which a layer of liquid in which a constituent material of the film is dissolved in a solvent is attached, the glass Gasification of the solvent is not suppressed even in the area near the center of the substrate 7, and a film made of a polymeric material with a uniform thickness can be easily formed on the glass substrate. In order to form a film with a uniform thickness, the size Dl of the glass substrate 7, the viscosity of the liquid applied to the surface of the glass substrate 7, the number of rotations of the glass substrate 7, and the periphery of the umbrella-shaped lid member are required. The size Dl of the area near the center of the umbrella-shaped lid member and the area near the center of the umbrella-shaped lid member depend on the distance L2 between the area near the area or the peripheral area and the surface of the glass substrate 7, etc. (The distance L1 from the surface of the glass substrate 7 in the area should be set in a predetermined manner.)

In addition, a hole 15 is provided in the area near the center of the umbrella-shaped lid member.
If a hole is formed, gas will flow through the hole, and the solvent near the center of the glass substrate 7 will easily evaporate.
If the diameter of the holes described above is made appropriate, the thickness of the thin film formed on the glass substrate 7 can be made more uniform.

Then, in the previously proposed coating apparatus for forming a film of uniform thickness on a rotating substrate described with reference to FIGS. 2 and 3, it was implemented as a configuration as shown in FIG. However, Dl...120mm, D2...35
5mm, L1・=15mm, L2-5mm, hole 1
Diameter of No. 5... When carried out by closing 3 mm +, the thickness of the thin film applied to the area from 40 am to 120 mm in diameter on the substrate tends to be thicker at the outer periphery. However, as the requirements for the variation in coating film thickness became more stringent, such as 1100 angstroms ± 10 angstroms, The performance of the previously proposed coating equipment was insufficient, and improvements were sought.

(Means for Solving the Problems) The present invention involves rotating a substrate at high speed on which a layer of liquid in which constituent materials of a film to be formed on the substrate are dissolved in a solvent is adhered to the surface. In order to form a film with a uniform thickness on the top, use a flat lid member, or a portion of the substrate near the center of the substrate with a small distance from the surface of the substrate near the periphery of the substrate. A lid member having a configuration such that the distance from the surface of the film is large is disposed above the substrate to which a layer of liquid in which the constituent substances of the film are dissolved in a solvent is attached, and gas is supplied from the space outside the lid member to the space between the substrate and the lid member between the space between the substrate and the lid member, and the space outside the lid member. In the coating device in which the lid member is provided with a means for enabling the lid member to A hand hood that allows gas to be supplied from the space to the space between the substrate and the lid member, such as from the space outside the lid member to the space between the substrate and the lid member. Application that forms a film of uniform thickness on a rotating substrate using a lid member configured such that the amount of gas supplied decreases from the center to the outer periphery. It provides equipment.

(Example) Hereinafter, specific details of a coating apparatus for forming a film of uniform thickness on a rotating substrate according to the present invention will be described in detail with reference to the accompanying drawings.

FIG. 4 is a longitudinal sectional side view of an embodiment of the coating apparatus for forming a film of uniform thickness on a rotating substrate according to the present invention, and in FIG. Components corresponding to those of the coating device that forms a film of uniform thickness on a rotating substrate shown in FIG. 3 are designated by the drawing symbols used in FIGS. The same drawing symbols are attached.

In FIG. 4, reference numeral 14 is an inner lid, and the inner lid 14 is
is fixed to the upper lid 2 by attachment members 4 and 5 to form a lid structure. Upper lid 2 in the aforementioned lid structure
The container 1 and the container 1 are connected by a hinge 13, and the lid structure can be opened and closed by rotating around the hinge 13 in the direction of arrow R in the figure. The opening/closing operation of the lid structure described above is performed by, for example, the wire 18 shown in the figure.
It is carried out by

Further, reference numeral 12 in FIG. 4 is a reflection plate that reflects liquid blown away by centrifugal force from the substrate 7 rotating at high speed. This prevents it from facing in the direction of the gap with 7.

In the lid structure shown in FIG. 4, the inner lid 14 has a relatively large distance L1 between the region 14a near its center and the surface of the substrate 7, and The distance between the region 14c and the surface of the substrate 7 is set to L2 such that Ll > L2 with respect to the distance L1 described above, and furthermore, the distance from the surface of the substrate 7 is Ll as described above. In the intermediate portion 1/lb between the region 14a near the center and the region 14c near the periphery where the distance from the surface of the substrate 7 is L2, the distance from the surface of the substrate 7 gradually changes. The inner lid 14 has an inclined surface, and a plurality of holes i6, 16, .

Further, in the embodiment shown in FIG. 4, the region 14a near the center of the inner lid 14 is circular with a diameter D1, and the diameter of the substrate 7 is D2.

The diameter D1 of the region 14a near the center of the inner lid 14 is calculated by assuming that the inner lid 14 has a flat shape and no holes like the inner lid shown in FIG. When the inner lid is placed at a distance L2 from the surface of the substrate 7 and the substrate 7 is rotated at high speed, the thickness of the film formed on the substrate 7 is at the outer peripheral portion where the thickness is constant. It may be determined so as to approximately correspond to the range in which a thinner film is formed.

Inner lid 1 used in the embodiment shown in Figure 4
The distance L2 between the area 14c near the periphery in 4 and the surface of the substrate 7 is such that even if the liquid splashed out from the top surface of the substrate 7 due to centrifugal force collides with the reflection plate 12 and bounces back, the liquid does not bounce back onto the substrate 7. In order to prevent it from returning, it is set to a relatively small value, for example 5 mm.

Now, in the coating device of the present invention for forming a film of uniform thickness on a rotating substrate, a space between the substrate and the lid member and a space outside the lid member is provided. As a means for supplying gas from the space outside the lid member to the space between the substrate and the lid member, the gas can be supplied from the space outside the lid member to the space between the substrate and the lid member. The lid member is configured such that the gas supply to the space decreases from the center to the outer periphery of the lid member.

A thin film of a predetermined thickness is formed over a predetermined range on a substrate, and one implementation of the coating device for forming a film of a uniform thickness on a rotating substrate of the present invention is shown in FIG. In the example, the inner lid 14 used as a lid member in the lid structure is divided into a region 14a near the center where a plurality of through holes 16, 16... are bored, and a region 14a near the periphery.
It is assumed to be umbrella-shaped, consisting of c and intermediate portion 14b.
In carrying out the present invention, the inner cover 14 has a flat shape like the inner cover shown in FIG. The inner cover 14 in the installed state, or the umbrella-shaped inner cover 14 in the state in which the inner cover 14 in FIG. 4 is removed from the area 14c near its periphery may be used.

FIG. 5 shows a plurality of holes to be drilled in a region 14a near the center of the inner lid 14 of the coating device for forming a film of uniform thickness on the rotating substrate of the present invention shown in FIG. This is a plan view showing an example of the arrangement pattern of the through holes 16, 16... shown in the fifth figure.
According to the arrangement pattern of . An inner lid 14 having through holes with diameters of 1 and 2 mm formed at positions dividing the circumference into eight equal parts.
The above glass substrate 7 is covered with the above glass substrate 7 to which a liquid made by diluting a photosensitive polymer material with thinner to a predetermined viscosity is supplied. After rotating at 30 rpm for about 1 minute, reduce the rotation speed of the substrate 7, then rotate at low speed for several minutes with the lid structure open, and then stop the rotation to form a thin film on the glass substrate 7. As a result, a diameter of 120 mm was obtained from the 40 mm diameter portion of the glass substrate 7.
The thickness of the thin film up to the mm part was able to be 10 angstroms above 1100 angstroms (in this case, Ll was 15 mm and L2 was 5 mm).
).

(a) in FIGS. 6 and 7 and (a) in FIG.
Arrangement of a plurality of through holes 16, 16, . . . to be bored in a region 14a near the center of the inner lid 14 of the coating device for forming a film of uniform thickness on a rotating substrate according to the present invention. FIG. 7 is a plan view showing another example of the pattern, first, in the embodiment shown in the sixth figure, one pattern is formed in the area 14a near the center of the inner lid 14 having a constant thickness; While drilling the through hole 16a, the above-mentioned area 14a
A plurality of through holes 16b, 16b, etc. are formed on the circumference of the circle, each having a different radius from the center to the outer circumference.
16c, 16cm, 16d, 16d... are drilled.

In the embodiment shown in the sixth figure described above, in the region 14a near the center of the inner lid 14, there is one through hole 16a bored at the center of the region 14a, and from the center of the region 14a toward the outer periphery. The through holes 16b are to be drilled on circumferences with different radii.

16c and 16d, the cross-sectional area of the through hole 16a is A, and the through hole 16 is
The cross-sectional area of b is B, and the cross-sectional area of through hole 16c is C1 through hole 16d.
Let D be the cross-sectional area of each of the through holes 16a-16.
The number of through holes 16a is 1, the number of through holes 16b is Nb, the number of through holes 16c is NC, and the number of through holes 16d is
When the number of holes is Nd, each of the through holes 16a~
Regarding the area and number of pieces in 16d, the following relationship is satisfied: A>B-Nb>C-NC>D-Nd Therefore, also in the embodiment shown in the sixth figure, From the space outside the lid member provided between the space between the substrate 7 and the lid member (inner lid 14) and the space outside the lid member, the space between the substrate and the lid member is The means for supplying gas to the space is such that the amount of gas supplied from the space outside the lid member to the space between the substrate and the lid member is increased from the center of the lid member to the outer periphery of the lid member. It is assumed that the amount decreases as the value increases.

Next, in the embodiment shown in FIG. 7, the thickness of the inner lid 14 gradually increases from the center to the outer periphery, as shown in FIG. 7(b). As shown in FIG. 7(a), in a region 14a near the center, a plurality of through holes 1 with a cross-sectional area of A are formed at the center of the region 14a.
6e, 16a... are bored, and through holes 16f, 1.6 with a cross-sectional area of A are formed on the circumferences of different radii from the center of the region 14a toward the outer periphery.
f..., a through hole 16g with a cross-sectional area of A.

16g... are drilled in each.

In the embodiment shown in FIGS. 7(a) and 7(b), the cross-sectional area of each of the through holes 16a to 16g is the same, but increases from the center of the region 14a toward the outer periphery. The lengths of the through holes provided on the circumference with different radii are different, and the gas passing through the through holes is In the case of the embodiment shown in FIG. 7, as well as in the case of the embodiment shown in FIG. 14
) Supplying gas to the space between the substrate and the lid member from the space outside the lid member installed between the space between the substrate and the space outside the lid member. The means for straining the lid member is such that the amount of gas supplied from the outer space of the lid member to the space between the substrate and the lid member increases as it goes from the center of the lid member to the outer periphery. It is assumed that the amount of energy is reduced.

In the embodiment shown in FIGS. 8(a) and (b), 8±,
As shown in the cross-sectional view of FIG. 8(b), the inner lid 14 has the same thickness, but the substantial length of each of the through holes 16e to 16g is As in the case of the illustrated embodiment, pipes of different lengths are attached to each of the through holes 16e to 16g. In this figure 8 (a
In the embodiments shown in ) and (b), the above-described substrate 7
and the space between the substrate and the lid member, which is provided between the space outside the lid member and the space outside the lid member. The means for supplying gas to the substrate is such that the amount of gas supplied from the outer space of the lid member to the space between the substrate and the lid member goes from the center of the lid member to the outer periphery of the lid member. It is clear that the structure is configured to decrease accordingly.

In each of the embodiments described so far, the lid member provided between the space between the substrate 7 and the lid member (inner lid 14) and the space outside the lid member is As a means for supplying gas from the outer space to the space between the substrate and the lid member, a structure in which a plurality of through holes are provided at predetermined locations in the lid member is adopted. However, in carrying out the present invention, the above-described substrate 7 and lid member (
Gas is transferred from the space outside the lid member provided between the space between the inner lid 14) and the space outside the lid member to the space between the substrate and the lid member. Of course, an annular slit configured to have a predetermined cross-sectional area may be used as a means for supplying the water.

In order to form a film of uniform thickness on the surface of the substrate 7 (glass substrate 7) using the coating apparatus according to FIG. The container 1 is opened by rotating the lid structure integrally coupled with the hinge 13, and the glass substrate 7 is coupled to the turntable 6.

Next, on the glass substrate 7 connected to the turntable 6 which is being rotated at low speed by the drive motor M, a liquid made to a predetermined viscosity by diluting the photosensitive polymer material with thinner is placed on the glass substrate 7, which is connected to the turntable 6 which is being rotated at low speed by the driving motor M. The liquid is supplied onto the glass substrate while moving the nozzle in the radial direction of the glass substrate 7 from the nozzle that is not in use, thereby forming the coating layer of the liquid on the glass substrate 7.

Once the liquid coating layer has been formed on the surface of the glass substrate 7 as described above, the nozzle is retracted outside the container 1 and the lid structure is rotated on the hinge 13, and the container 1 is moved to the upper lid 2. is kept sealed. In this state, the drive motor M is rotated at high speed (for example, the glass substrate 7 is rotated for about 1 minute).
After rotating at a high speed, the rotation speed of the drive motor M is reduced, and the glass substrate 7 is rotated at a low speed for about several minutes with the lid structure opened, and then the drive motor M is stopped.

As described above, a thin film of a uniform thickness of photosensitive polymer material is formed on the surface of the glass substrate 7.
For example, DI-120m+n, D2・=355mm, r
-, 1-15mm, L2-5mm, diameter of hole 16 = 4
．． When implemented as 2n+m, the diameter on the substrate is 40
The thickness of the thin film applied to the area from ++u++ to 12h in diameter was 1100 angstroms±10 angstroms.

As described above, in the coating apparatus of the present invention, the glass substrate 7
” Second, the reason why a film with a uniform thickness is formed is as follows. That is, as clarified in the explanation of the previously proposed apparatus shown in Figure 3, in the previously proposed coating apparatus described above, the distance from the surface of the substrate near the periphery of the substrate is small, and the distance between the surface of the substrate and the center of the rough plate is small. A lid member having a configuration in which a portion close to the surface of the substrate is separated from the surface of the substrate is placed above the substrate to which a layer of liquid in which the constituent substances of the film are dissolved in a solvent is attached. As a result of this, gasification of the solvent is not suppressed even in a portion near the center of the glass substrate 7, and a film made of a polymeric material having a relatively uniform thickness can be easily formed on the glass substrate. It is possible to absorb water, and also,
When the hole 15 is bored in the area near the center of the umbrella-shaped lid member, gas flows through the hole and the glass substrate 7
Since the solvent near the center of the glass evaporates easily, by making the hole diameter appropriate, the thickness of the thin film formed on the glass substrate 7 could be made more uniform. However, in the above-mentioned coating apparatus for forming a film of uniform thickness on the rotating substrate 7 of the present invention, the substrate 7
and the space between the substrate and the lid member (inner lid 14) and the space outside the lid member provided between the space outside the lid member and the space outside the lid member. As a means for supplying gas to the substrate, the amount of gas supplied from the outer space of the lid member to the space between the substrate and the lid member is directed from the center of the lid member to the outer periphery. By using a gas that is configured to decrease accordingly, the amount of gas supplied from the space outside the lid member to the space between the substrate and the lid member can be made more appropriate. This allows the formation of a uniform thin film to be achieved.

(Effects) As is clear from the detailed explanation above, the coating device for forming a film of uniform thickness on a rotating substrate according to the present invention has the advantage that the constituent material of the film to be formed on the substrate is a solvent. In order to form a film of uniform thickness on the substrate by rotating the substrate with a layer of dissolved liquid on the surface at high speed, a flat lid member or a layer of liquid on the substrate is used. A cover member having a configuration in which the distance between the surface of the substrate in a portion near the periphery is small and the distance between the surface of the substrate in a portion near the center of the substrate is large is used when the constituent substances of the film are exposed to the solvent. A lid is disposed above the substrate to which a layer of dissolved liquid is attached, and a lid is provided between the space between the substrate and the lid member and the space outside the lid member. In a coating device in which the lid member is provided with a means for supplying gas to the space between the substrate and the lid member from the space outside the member, the space between the substrate and the lid member described above. As a means for supplying gas from the space outside the lid member provided between the substrate and the space outside the lid member to the space between the substrate and the lid member, The amount of gas supplied from the outer space of the lid member to the space between the substrate and the lid member is configured to decrease from the center to the outer periphery of the lid member. Since the coating device of the present invention is constructed using By making the supply amount more appropriate, it was possible to form a thin film with a uniform thickness over a wide range on the substrate, and the present invention successfully solved one problem that was previously proposed. 6

[Brief explanation of drawings]

FIG. 1 is a longitudinal sectional side view of an example configuration of a conventional coating device, FIGS. 2 and 3 are longitudinal sectional side views of different configuration examples of the already proposed device, and FIG. 4 is an embodiment of the present invention device. 5 to 8 are explanatory diagrams of through holes provided in the inner lid. 1... Container, 2... Top lid, 3, 14... Inner lid, 4
．． Death...Mounting member for attaching the inner lids 3, 14 to the upper lid 2, 6...Turntable, 7...Glass substrate, 8
...Rotating shaft, M...Drive motor, 9...Air hole, 1o...Pipe 1o, 11...Vacuum pump, 12...
・Reflector, 13... Hinge, 15... Hole, 16.16
a~16g...Through hole.

Claims (1)

[Claims] A film with a uniform thickness is formed on the S substrate by rotating the substrate with a layer of liquid on its surface, in which the constituent substances of the film to be formed on the substrate are dissolved in a solvent, at high speed. For this purpose, a flat lid member or a configuration in which a portion near the periphery of the substrate has a small distance from the surface of the substrate and a portion near the center of the substrate has a large distance from the surface of the substrate is used. A lid member having a structure is disposed above the substrate to which a layer of liquid in which a constituent material of the film is dissolved in a solvent is attached, and the space between the substrate and the lid member described above and the lid member are disposed above the substrate. In the coating device, the lid member is provided with means for supplying gas from the outer space of the lid member to the space between the substrate and the lid member. , from the space outside the lid member provided between the space between the substrate and the lid member and the space outside the lid member to the space between the substrate and the lid member. As a means for supplying gas to the lid member, the amount of gas supplied from the outer space of the lid member to the space between the substrate and the lid member is increased from the center to the outer periphery of the lid member. A coating device for forming a film of uniform thickness on a rotating substrate using a coating device configured to reduce the thickness