JPS60124815A - Attaching and detaching device for substrate holder of vacuum processing device - Google Patents

Abstract

PURPOSE:To dispense with various mechanisms to be used for adhesion and separation as well as to simplify the mounting and dismounting processes and the operation of the device by a method wherein the rotary driving device of a substrate, to be used to make uniform a vacuum processing, is utilized for mounting and dismounting of a substrate holder and a rotary support pole. CONSTITUTION:The rotation of a substrate holder 4a is stopped by inserting the pin 53 of a tray 5a into a notch 43, a rotary support pole 6 is moved forward to the position which is determined by the sensors L2 and S2 consisting of a lamp and a photosensor using a motor M1, and a pawl 61 is inserted in a pit 41. The rotary support pole 6 is rotated by the motor M2 utilizing sensors L4 and S4, the protrusion 610 of te pawl 61 is placed through the back side of the protrusion 410 of the pit 41, and the substrate holder 4a is fixed to the rotary support post 6. The rotary support pole 6 is moved to the position determined by the sensors L3 and S3 using the motor 1, and the fitting of the pin 53 and the notch 43 is released. A rotary driving is performed using the motor M2, and a desired vacuum processing is conducted on the substrate located on the substrate holder 4a.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a device for attaching and detaching a substrate holder and a rotating support within the processing chamber in a vacuum processing apparatus having a load lock chamber (preliminary exhaust chamber). purpose.

The present invention also includes: The purpose is to simplify this attachment/detachment device and make it robust and inexpensive.

Conventional vacuum processing equipment such as evaporation equipment and sputtering equipment mainly performs batch processing, which involves breaking the vacuum in the processing chamber each time processing is performed, attaching the substrate to be processed to a substrate holder, and fixing this to a rotating support. It had been taken. However, in batch processing, each time the vacuum is broken, impurity gases or water vapor in the atmosphere adhere to the evaporation source and the walls of the processing chamber, which adversely affects the exhaust characteristics and film quality, resulting in poor reproducibility and the production of many products of uniform quality. It was difficult to produce food.

For this reason, recently, as schematically shown in FIG. 1, a load lock chamber 2 is provided adjacent to the processing chamber 1, and a gate valve 3 is placed between nine compartments to fix a substrate (not shown). The holder 4 is first placed on a tray 5 and put into the load lock chamber 2, this chamber is preliminarily evacuated and put on standby, and during processing, the gate pulp 3 is opened and the tray is placed in the dotted line 5 of the processing chamber 1.
Move the substrate holder 4a to the position a, move the substrate holder 4a to a rotating support (not shown in FIG. 1, 6 in FIG. 2) in the processing chamber 1, and rotate the substrate holder 4a in a high-quality vacuum. I am doing some processing.

The load lock chamber has two chambers, one for pre-processing and one for post-processing (
Therefore, in Figure 1, another chamber is provided on the left side of processing chamber 1)
Efforts are also being made to speed up the process flow.

Now, the transfer of the substrate holder 4a to the rotation support 6 in the processing chamber 1 at this time will be explained briefly.

Simply place the board holder on the rotating support! It is also possible to simply place the board on the board, and some equipment uses that method, but simply placing the board on the board is insufficient to secure the board, so a method is used to prevent dust from adhering to the board by holding it vertically or facing downwards. becomes impossible. Ideally, the substrate holder is fixed to a rotating support.

Now, there are various conventional methods for this fixation (and a pre-treatment explanation is also required).However, even the method described here is unique in that it provides the following two means (A) and (B). We are doing so.

(A) Means for advancing (and retracting) the rotating column toward the substrate holder in the direction of the rotation axis.

e) Means for fixing (and detaching) the substrate holder from the rotating column.

These (A) and (B) each have a predetermined mechanism and its driving device attached, but the mechanism of (B) is particularly complex.

It requires careful operation and makes the device expensive.

The present invention aims to simplify this attachment/detachment and operation,
This was achieved successfully.

Attachment and detachment operations must be possible from outside the vacuum chamber. In addition, due to the necessity of processing such as reverse sputtering and bias sputtering, high voltage, high frequency lightning, or force may be applied to the substrate holder and thus the rotating support, so it is necessary to keep these in an insulated state and to minimize the exposed surface. Therefore, the attachment/detachment device must be designed to meet these requirements.

The inventor of the present application has noted that these requirements primarily require the simplification of the attachment/detachment device. It was also noted that in most cases in vacuum processing, it is necessary to rotate the substrate and hence the holder for uniformity of processing, and that a two-rotation means is indispensable to the apparatus. Then, the present invention has been achieved in which this rotating means is used for the attachment/detachment device.

Hereinafter, the present invention will be explained in detail by way of an example using FIG.

FIG. 1 used in the explanation above is a front view (schematic diagram) of the embodiment, FIG. 2 is a side sectional view (enlarged view) of the processing chamber 1, and FIG.
This figure and FIG. 4 are views of the Meda substrate holder 4a and the rotating support 6, viewed from the fixing surface.

In these figures, the trays 5, 5a have a U-shaped opening 54 in the center for accommodating the substrate holders 4, 4a, an inverted refraction 55 for suspension at the upper part, and a linear shape of the refraction 55. by the triangular groove 510.

It rides on each upper roller 51 inserted into the shaft at the tip of each rod 11 protruding from the wall 10 of the processing chamber 1, and can smoothly move between the processing chamber 1 and the load lock chamber 2.

Each lower roller 52 inserted into the shaft at the tip of each arm 12 protruding from the wall 10 supports the tray 5.5a from the side to prevent it from tilting.

Two pins 53 are installed on the top and bottom of the tray 5.5a, and the pins 53 can be fitted into two notches 43 provided in the J3 portion of the substrates 4, 4a. At this time, rotation of the substrate holder 48 is prevented.

The front surface of the rotating support 6 is disc-shaped and has four 5-shaped claws 61.
protrudes, and four irregularly shaped bits are provided on the rear surface of the other substrate holder 4a.

The rotation of the substrate holder 4a is prevented by a pin 53, and then
When the rotating support 6 is moved to the left (FIG. 2) and each claw 61 is inserted into each pit 41, the second rotation support 6 is rotated by the arrow 6A in FIG. 41 and fixes the substrate holder 4a to the rotating support 6 by frictional force. The opposite is true for both parties. After the rotating support 6 is rotated in the opposite direction of the arrow 6A, it is moved to the right to complete the process.

A cylindrical plate P for a sensor, a left/right thread G10 and a gear G20 for rotation are fixed to the frame. Ll and 81°L2 and 82
．． L3 and 83 are the pumps and photosensors of left/right position detectors that detect the position depending on whether the edge PE of the cylindrical plate P blocks light, and L4 and 84 are similar rotary position detectors that detect the position of the cylindrical plate P.
The light transmitted through the plurality of holes PH is utilized.

These detectors are advanced using an electrical device (not shown).
Rotating motor M2. Specifically, in the load lock chamber 2 shown in FIG. 1, the pinion G21 is initially in a state where the substrate holder 4 is locked to the tray 5 using the pin 53 and is on standby, but when the gate valve 3 is opened, the tray 5 is Upper roller 51. It is moved to the position indicated by the dotted line 5a in the processing chamber 2 using the lower rollers 52.

(The transport drive device is shown as 17 in the figure.) Then.

Inside the processing chamber 2, the rotating column 6 had retreated to its current position as shown in FIG. 2 determined by sensors L1 and 81 and was waiting.

It moves to the left by motor M1, advances to the position determined by sensors L2 and 82, and stops. At this time, the claw 61 enters into the pit 41.

Next, the motor M2 uses the sensors L4 and 84 to rotate the rotary column 6 by six directions indicated by the arrows in FIG. 3, and fixes the rotary column 6 to the substrate holder 4a. next.

The motor M1 moves the rotating column 6 to the left to the position determined by the sensors L3 and 83, and the pin 53 and the notch 43 are disengaged from each other. After that, the rotating column 6 is rotationally driven by the motor M2.
．． Desired vacuum processing is performed on the substrate on the substrate holder 4a.

The separation of the substrate holder 4a and the rotating support 6 after the completion of the vacuum processing follows the above-mentioned operation in reverse.

As seen in this embodiment, the present invention utilizes the substrate rotation drive device that ensures uniform vacuum processing for attaching and detaching the substrate holder and rotating support, which requires separate equipment in the past. Various mechanisms for removing solid M1n and their driving devices are completely unnecessary. This greatly simplifies this part of the device and makes it much easier to modify its design for application of high voltage or high frequency power. That T
The commercial value is high.

7- Note that the mechanism for attaching and detaching 7 is the claw 61 of the embodiment. The present invention is not limited to the pit 41, and the sensors and drive mechanisms are not limited to those in the embodiment. The present invention can take various embodiments while respecting its gist.

[Brief explanation of the drawing]

FIG. 1 is a schematic front view of an embodiment of the invention. FIG. 2 is an enlarged side view of the processing chamber. Figure 3 is a diagram of the substrate holder viewed from the fixed surface. Figure 4 is a diagram of the rotating support seen from the fixed surface. 1: Processing chamber, 2: Load lock chamber, 3: Gate valve, 4: Substrate holder, 5: Tray. 6: Rotating post, 41: Pisoto, 61: Claw. Patent applicant Meho 1 Anelva Co., Ltd. 9- 8-

Claims (1)

[Claims] In a second device for attaching a substrate holder and a rotating column in a processing chamber of a vacuum processing apparatus that uses a load-lock system, there is a mechanism for rotating the rotating column, and a mechanism for moving the rotating column forward and backward in the direction of the rotation axis toward the substrate holder. By a mechanism, relative movement of the substrate holder and the rotating column in the circumferential direction,
An attachment/detachment device for a substrate holder of a vacuum processing apparatus, characterized in that the attachment/detachment mechanism for a substrate holder of a vacuum processing apparatus is provided.