JPS60120359A - 光学マスク基板及びこれを使用する反射型光学マスクの製造方法 - Google Patents

光学マスク基板及びこれを使用する反射型光学マスクの製造方法

Info

Publication number
JPS60120359A
JPS60120359A JP58229482A JP22948283A JPS60120359A JP S60120359 A JPS60120359 A JP S60120359A JP 58229482 A JP58229482 A JP 58229482A JP 22948283 A JP22948283 A JP 22948283A JP S60120359 A JPS60120359 A JP S60120359A
Authority
JP
Japan
Prior art keywords
film
optical mask
thickness
mask substrate
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58229482A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0435060B2 (zh
Inventor
Takeshi Miura
武 三浦
Reiji Hashimoto
礼耳 橋本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Optical Co Ltd
Original Assignee
Tokyo Optical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Optical Co Ltd filed Critical Tokyo Optical Co Ltd
Priority to JP58229482A priority Critical patent/JPS60120359A/ja
Publication of JPS60120359A publication Critical patent/JPS60120359A/ja
Publication of JPH0435060B2 publication Critical patent/JPH0435060B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/88—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared by photographic processes for production of originals simulating relief

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP58229482A 1983-12-05 1983-12-05 光学マスク基板及びこれを使用する反射型光学マスクの製造方法 Granted JPS60120359A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58229482A JPS60120359A (ja) 1983-12-05 1983-12-05 光学マスク基板及びこれを使用する反射型光学マスクの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58229482A JPS60120359A (ja) 1983-12-05 1983-12-05 光学マスク基板及びこれを使用する反射型光学マスクの製造方法

Publications (2)

Publication Number Publication Date
JPS60120359A true JPS60120359A (ja) 1985-06-27
JPH0435060B2 JPH0435060B2 (zh) 1992-06-09

Family

ID=16892857

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58229482A Granted JPS60120359A (ja) 1983-12-05 1983-12-05 光学マスク基板及びこれを使用する反射型光学マスクの製造方法

Country Status (1)

Country Link
JP (1) JPS60120359A (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61228447A (ja) * 1985-04-02 1986-10-11 Nippon Kogaku Kk <Nikon> フオトリソグラフイ用反射型マスク

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5410729A (en) * 1977-06-27 1979-01-26 Toppan Printing Co Ltd Photomask
JPS5748761A (en) * 1980-09-09 1982-03-20 Canon Inc Transfer device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5410729A (en) * 1977-06-27 1979-01-26 Toppan Printing Co Ltd Photomask
JPS5748761A (en) * 1980-09-09 1982-03-20 Canon Inc Transfer device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61228447A (ja) * 1985-04-02 1986-10-11 Nippon Kogaku Kk <Nikon> フオトリソグラフイ用反射型マスク

Also Published As

Publication number Publication date
JPH0435060B2 (zh) 1992-06-09

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