JPS60115140A - ホロ−陰極放電型イオン源 - Google Patents

ホロ−陰極放電型イオン源

Info

Publication number
JPS60115140A
JPS60115140A JP58222133A JP22213383A JPS60115140A JP S60115140 A JPS60115140 A JP S60115140A JP 58222133 A JP58222133 A JP 58222133A JP 22213383 A JP22213383 A JP 22213383A JP S60115140 A JPS60115140 A JP S60115140A
Authority
JP
Japan
Prior art keywords
cathode
discharge
ion
ion source
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58222133A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0160888B2 (enrdf_load_stackoverflow
Inventor
Kazuo Takayama
一男 高山
Katsuhiko Sunago
砂子 克彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokai University
Ulvac Inc
Original Assignee
Tokai University
Ulvac Inc
Nihon Shinku Gijutsu KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokai University, Ulvac Inc, Nihon Shinku Gijutsu KK filed Critical Tokai University
Priority to JP58222133A priority Critical patent/JPS60115140A/ja
Publication of JPS60115140A publication Critical patent/JPS60115140A/ja
Publication of JPH0160888B2 publication Critical patent/JPH0160888B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/08Ion sources; Ion guns

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
JP58222133A 1983-11-28 1983-11-28 ホロ−陰極放電型イオン源 Granted JPS60115140A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58222133A JPS60115140A (ja) 1983-11-28 1983-11-28 ホロ−陰極放電型イオン源

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58222133A JPS60115140A (ja) 1983-11-28 1983-11-28 ホロ−陰極放電型イオン源

Publications (2)

Publication Number Publication Date
JPS60115140A true JPS60115140A (ja) 1985-06-21
JPH0160888B2 JPH0160888B2 (enrdf_load_stackoverflow) 1989-12-26

Family

ID=16777682

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58222133A Granted JPS60115140A (ja) 1983-11-28 1983-11-28 ホロ−陰極放電型イオン源

Country Status (1)

Country Link
JP (1) JPS60115140A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6273542A (ja) * 1985-09-27 1987-04-04 Tokai Univ ホロ−・カソ−ド型イオン源
CN107385416A (zh) * 2017-09-01 2017-11-24 常州比太科技有限公司 一种镀膜进气结构

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6273542A (ja) * 1985-09-27 1987-04-04 Tokai Univ ホロ−・カソ−ド型イオン源
CN107385416A (zh) * 2017-09-01 2017-11-24 常州比太科技有限公司 一种镀膜进气结构
CN107385416B (zh) * 2017-09-01 2023-11-03 常州比太科技有限公司 一种镀膜进气结构

Also Published As

Publication number Publication date
JPH0160888B2 (enrdf_load_stackoverflow) 1989-12-26

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