JPS60114597A - Method and device for vibration stirring type composite plating - Google Patents

Method and device for vibration stirring type composite plating

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Publication number
JPS60114597A
JPS60114597A JP22208183A JP22208183A JPS60114597A JP S60114597 A JPS60114597 A JP S60114597A JP 22208183 A JP22208183 A JP 22208183A JP 22208183 A JP22208183 A JP 22208183A JP S60114597 A JPS60114597 A JP S60114597A
Authority
JP
Japan
Prior art keywords
plating
plated
tank
materials
track
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22208183A
Other languages
Japanese (ja)
Other versions
JPS626757B2 (en
Inventor
Masayuki Otsuki
大槻 真之
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP22208183A priority Critical patent/JPS60114597A/en
Publication of JPS60114597A publication Critical patent/JPS60114597A/en
Publication of JPS626757B2 publication Critical patent/JPS626757B2/ja
Granted legal-status Critical Current

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Abstract

PURPOSE:To improve the finishing quality of composite plating and to automate operation by vibrating a plating cell to stir a plating liquid and oscillating and rotating materials to be plated tereby moving upward said materials. CONSTITUTION:A plating cell 1 having a rotary cylindrical shape is oscillated by a vibrator 8 to vibrate and stir a plating liquid and at the same time to place materials 3 to be plated gethering around the plateau-shaped base of the plating cell onto a spiral track 4, thereby moving the materials from the lower to upper part along the spiral direction. The materials 3 are rotated by the track 4 while said materials are subjected to the fine vibration until the materials are arrayed on the track 4 and ascend. The materials 3 are thus uniformly plated and the materials completed of the plating are transferred into a finishing cage 6 on the outside of the cell. If the plating is insufficient, the materials are returned into the cell by the operation of a gate 5 so as to be subjected to the plating again. The plating liquid is circulated between a preliminary vessel 2 and the vessel 1 and the components, temp., etc. thereof are controlled.

Description

【発明の詳細な説明】 本発明は、メッキ技術に関し、侍に、メッキ液が入れら
れたメッキ槽を振動式せて内部のメッキe、全撹拌する
とともに、このメッキ槽を振動させる力Vこよってメッ
キ液中の肢メッキj勿を微振動、上方移動及び回転させ
、これにより良好な共析状態で高能率に複合メッキを行
なうことのでさる振動攪拌式1痩合メッキ方法及び装置
fK関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to plating technology. Therefore, the present invention relates to a vibratory stirring type thinning plating method and apparatus fK, in which the plating plate in the plating solution is slightly vibrated, moved upward, and rotated, thereby performing composite plating with high efficiency in a good eutectoid state.

゛近時、工業稜術め様々な分野(例えば産業機械、航貨
宇宙1炭器)で従来の清水的メッキ原料では最早充足し
切れない程高度の機能性、すなわち耐食性、耐摩耗性、
潤滑性及び耐熱性が要求されるようVこなってUCいる
。仮aメッキ(分散メッキともいう。)は、そうした、
tも度の機目巨性全満足させるべく開発ざ!した技術で
あり、連泡の電気メツキ液あるいは化学メッキ液に不浴
訣の微粒子を入れて均−Vこ分散させ、被メッキ物の表
面に金属マトリックスととも吟該微粒子ケ共析させるも
ので、分散された微粒子シす、彼メッキ物の表面に吸着
している間Vこ次々と析出xr2 y4Vこよってメッ
キ皮膜内に埋め込まれ、共析ぴノとて釜属マトリックス
中で均一な分散相が形成される。このような複合メッキ
の具体例を挙げると、メッキの金属マトリックスとして
は、Ca、Ni rcr、Co +Sn*Znやこれら
の合金が用いられ、また分散される不溶性の微粒子とし
ては、要求される機能目的に応じて、耐食性の場合には
SiOx 、Ba5o4rTzOze耐摩耗性の場合に
l’i S i Cr A l z Oar B4 C
+ WC、T L C、更に潤滑性の場合にはMo S
t t BN、PTFE 、ナイロン等が採(〈される
゛Recently, in various fields of industrial technology (e.g. industrial machinery, aerospace, 1-coat equipment), conventional plating raw materials such as Shimizu are no longer able to satisfy the requirements for high functionality, such as corrosion resistance, wear resistance, etc.
V and UC are required to have lubricity and heat resistance. Temporary a plating (also called dispersion plating) is
Developed to satisfy all the needs of the world! This is a technology in which non-bathproof fine particles are added to an open-cell electroplating solution or chemical plating solution, uniformly dispersed in a V-V, and the fine particles are eutectoid with the metal matrix on the surface of the object to be plated. While the dispersed fine particles are adsorbed on the surface of the plated object, they are successively precipitated and embedded within the plating film, forming a uniform dispersed phase in the eutectoid matrix. is formed. To give a specific example of such composite plating, the metal matrix for plating is Ca, NircR, Co+Sn*Zn, or an alloy thereof, and the insoluble fine particles to be dispersed have the required functions. Depending on the purpose, SiOx, Ba5o4rTzOze for corrosion resistance, l'i S i Cr A l z Oar B4 C for wear resistance.
+ WC, TLC, and in the case of lubricity, MoS
t t BN, PTFE, nylon, etc. are used.

複合メッキ、時に粒子分散複合メッキにあっては、不溶
性の固体微粒子を大量にメッキ液中に麻加して被メッキ
物の表面に金属マトリックスと共析させ分散複合させよ
うとするのでめるから、その大前提としてメッキ液中に
粒子が均一に懸濁していることが不”J欠である。一般
的に、分散される固体微粒子は、その比重がメッキ液よ
シも大であるので、多くは重力によシ沈降してメッキ槽
の底に溜まってしまいからである。それ故、分散微粒子
をメッキ液中に均一に、かつ長時間懸濁に保りベく、メ
ッキ液を攪拌することが必要でめシ、このために、以下
に列挙するような種々のメッキ液攪拌方法がこれまでに
提案きれている。
In composite plating, sometimes particle dispersion composite plating, a large amount of insoluble solid particles are added to the plating solution and eutectoid with the metal matrix on the surface of the object to be plated to form a dispersed composite. As a major premise, it is essential that the particles are uniformly suspended in the plating solution.Generally, the solid particles to be dispersed have a higher specific gravity than the plating solution, so Most of the particles settle due to gravity and accumulate at the bottom of the plating tank.Therefore, to keep the dispersed particles uniformly suspended in the plating solution for a long time, the plating solution must be stirred. For this purpose, various plating solution stirring methods have been proposed so far as listed below.

■ プロベラ攪拌法: メッキ槽中Vこプロペラを設け
てこれを回転させメッキ液全攪拌する方法。
■ Provera stirring method: A method in which a V-shaped propeller is installed in the plating tank and rotated to stir the entire plating solution.

■ 液循環法: ボンダによってメッキ槽の「部からメ
ッキ液を吹き上げ、該メッキ槽の上部からメッキ液をオ
ーバーフローさせるか又は吸引全行なう方法。
■Liquid circulation method: A method in which the plating solution is blown up from the upper part of the plating tank using a bonder, and the plating solution is either overflowed from the top of the plating tank or completely suctioned.

■ 空気撹拌法二 メッキ槽中に空気を吹き込んでメッ
キ液に4j?拌する方法。
■ Air stirring method 2 Air is blown into the plating tank and the plating solution is mixed with 4j? How to stir.

■ 液/孕気混合法: メッキ液に空気を混合し−C(
互拌する方法。
■ Liquid/air mixing method: Mixing air with the plating solution and -C(
How to stir each other.

(り グレートバンパー法: 多数の穴が明けられた板
をメツ・V漕中Vこ水平に+tffiいて上下運動させ
、これらの穴から吹き上げるメッキ液のジェット噴流金
利用して分散を行なう方法。
Great bumper method: A method in which a plate with a large number of holes is moved horizontally in a metal V tank and moved up and down, and the jet of plating liquid blown up from these holes is used to perform dispersion.

■ アップ70−メッキ法: 貯蔵槽からメッキ液金導
いてメッキ槽の底部から上部t・こ流し込んで上部力1
らオーバーフローさせる方法。
■ Up 70-plating method: Plating liquid gold is introduced from the storage tank and poured into the upper part from the bottom of the plating tank, and the upper force is 1.
How to overflow.

これらの諸方法は、いずれもメッキ槽の中間部ないしは
上部で複合メッキを行なうようにするために、分散微粒
子を沈降させないようすこ攪拌を行なつGいる。しかし
ながら、メソキイ曹中における微粒子の分散状態は、該
微粒子の比重が犬さいので、どうしてもメッキ4・唐の
底部の方が高督度であシ、従って、メッキ槽の下部を利
用しないのは不合理でめる。また、メッキ液中に被メッ
キ物を水平に置いたままの場合、分散微粒子がF方に沈
降していく関係上、被メッキ物の上1iIIJには微粒
子が吸着されて金属マトリックスにより複ハされるもの
の、下側には微粒子が全く沈降、吸着せず、従って複合
がなされない。
In all of these methods, in order to perform composite plating in the middle or upper part of the plating tank, slight stirring is performed to prevent the dispersed particles from settling. However, the dispersion state of the fine particles in Mesoki Sodium is such that the specific gravity of the fine particles is low, so the bottom of the plating tank is inevitably higher in density, so it is inconvenient not to use the lower part of the plating tank. Be rational. In addition, if the object to be plated is left horizontally in the plating solution, the dispersed fine particles will settle in the F direction, so the fine particles will be adsorbed to the top of the object to be plated and will be compounded by the metal matrix. However, no fine particles settle or adsorb on the lower side, so no composite is formed.

次に、従来のメッキ技術を被メッキ物の搬送作業の観点
から分析すると、搬送方法としては、被メッキ換金所定
の吊シ下げ1般送治具に引っ掛けてメッキ槽に被メッキ
物ヲ浸す引掛方式や特に小物の被メッキ物を大量に一種
の籠に入れてメッキ槽に浸すバレル方式がめった。
Next, if we analyze the conventional plating technology from the perspective of transporting the object to be plated, we can see that the transport method is as follows. The barrel method, in which a large amount of small objects to be plated are placed in a kind of basket and immersed in a plating tank, was particularly popular.

しかしながら、引掛方式は、被メッキ物ケ個別に吊り下
げ治具に引っ掛けるので、人手を要し非能率的であり、
加えて、被メッキ物が小物である場合には不適である。
However, with the hooking method, each object to be plated is individually hooked onto a hanging jig, which requires manpower and is inefficient.
In addition, it is unsuitable when the object to be plated is a small item.

またバレル方式ば、+j4GかVこ小物の被メッキ物を
大量りこメッキするシこは適しているものの、被メッキ
物Vci易−や変形が生じ易く、また仮メッキ物の形状
寸法に1tjlJ約があり、更に、バレル中に一旦入っ
たメッキ1反を排出しなくてはなり/z l/−1,J
)で、メッキ液の排出に時+HJを要し、しかもかなシ
多htのメッキ液が槽外に持ち出される。
In addition, although the barrel method is suitable for large quantities of small objects to be plated, the objects to be plated are easily deformed and the shape and dimensions of the temporary plated objects are approximately 1tjlJ. Yes, and in addition, one roll of plating once inside the barrel must be discharged /z l/-1, J
), it takes +HJ to drain the plating solution, and moreover, a considerable amount of plating solution is taken out of the tank.

υ11工てバレル方式は、メッキのための荷電が難しく
、結局の処メッキ速度が遅い。
With the υ11 machine barrel method, charging for plating is difficult and the final plating speed is slow.

本発明は、上記した俵金メッキfc人施する上での問題
点及び敲メッキ物を搬送する上での同店点全統合的にj
9’l決するためになされ、進歩した複合メッキ方法及
び装置dff、提共r6もので、その目的は、湛汗メツ
ギの仕上品質金高めること、握はメッキ作業金自!11
b比すること、作業管理を厳格化すること等にある。
The present invention solves the above-mentioned problems in gilding bales by fc personnel and in transporting the plated products in an integrated manner.
The advanced composite plating method and equipment DFF and R6 were created to solve the problem, and the purpose is to improve the quality of the finish of the plating process, and to improve the plating process itself! 11
b) and stricter work management.

ζ、シC1このために本発明は、メッキf夜が入れられ
/こメッキ槽をイh勧助させて内部のメッキ液と攪(1
! J−るとともに、このメッキ1四全振動させる力に
よってメッキ液中の被メッキ物を微振動、上方移動及び
回転させつつ、メッキ槽の上部から壁周を伝って槽外し
こ排出するようにしたものである。
ζ, C1 For this reason, the present invention is designed to assist the plating tank by adding a plating tank and stirring the internal plating solution (1).
! At the same time, the force of this plating 14 vibration caused the object to be plated in the plating solution to be slightly vibrated, moved upward, and rotated, while being discharged from the top of the plating tank along the wall circumference and out of the tank. It is something.

以F1図面金診照して、本発明の実施例につき詳イ41
に、況明ノーる。
The details of the embodiments of the present invention are shown below with reference to the F1 drawings.
The situation is different.

図面は、本発明の一実施列金示す1Iat念的説明図で
ある。複合されるべき不溶性微祝子が分散ざルたメッキ
液は、メッキ槽l及び予備I¥12(7こ入れられてい
る。−f:9つうちメッキ1vJlは、有底円筒状ない
しは逆円錐台形等の回転体状金成しており、かつその底
部中央は、円罐台ないし円錐状に、中央部が浅く周辺部
が徐々に頑斜して深くなるように高原状とされている。
The drawing is a conceptual illustration showing one embodiment of the present invention. The plating solution in which the insoluble particles to be combined are dispersed is placed in the plating tank 1 and the reserve I ¥12 (7 pieces are placed in the plating tank. It is made of metal in the shape of a rotating body, and the center of the bottom is shaped like a cone or a cone, with the center being shallow and the periphery gradually becoming deeper and more plateau-like.

従って、メッキ液中に投入された被メッキ物3は、メッ
キ液中を自動落下した後高原状に盛υ上げられた底部に
到り、その後徐々に傾斜面上を落下して底部周辺に溜ま
る。
Therefore, the object to be plated 3 placed in the plating solution automatically falls through the plating solution, reaches the raised bottom in the form of a plateau, and then gradually falls on the slope and accumulates around the bottom. .

また、メッキ槽1の内周壁部には、底部塾ら上gISに
向けてラセン状のトラック4が設けらi+−ている。こ
のトラック4は、後、3ピするメッキ槽1の振動につれ
て被メッキ物3が上方移動する通路で必り、右回9又は
左回pのラセン状通路として徐々にメッキ槽lの上部内
周壁に巻き上がるようtこ形成されている。なお、図示
の実施例では、メッキ槽lにトラック4を付設すること
としたが、該メッキ槽l自体をトラック4の形状に作成
−することとしCもよい。
Further, a helical track 4 is provided on the inner circumferential wall of the plating tank 1 from the bottom toward the upper gIS. This track 4 is a path in which the object 3 to be plated moves upward as the plating tank 1 vibrates 3 times later, and gradually forms a helical path with a right turn 9 or a left turn p on the upper inner circumferential wall of the plating tank 1. It is shaped so that it rolls up. In the illustrated embodiment, the track 4 is attached to the plating tank 1, but the plating tank 1 itself may be formed in the shape of the track 4 (C).

、トラック4 J)中角(メツキイ夜中でもa外でもよ
い。)にゲート5が設けられている。このゲート5tよ
、トラック4上金1戊ム1zから北部4C昇ってきたO
lメッキ吻3 k e 1つままメッキ槽l外し′c進
行させて該(’!tメツメッ3を仕上9 +;臣6にツ
ノト出するポジションと、阪メッキ゛吻3の進行r妨H
して該敲メッキ1>/J 3 k +’4びメッキqX
h l・υメッキ液中tC戻すポジジョンとに癲I工り
月!?”T fjしCりる。すlゎら該ゲート5&よ、
代打メッキが完了し/こと認めらiLる揚Bに。りよう
な量定し・よ、メッキ条件を(応じて別途に行なわlL
6. ) kこは該f波メッキ1勿3をトラック4上V
こぞのまま進行σ古、そうでなし逼嚇什には被メッギ霞
:3金メッキ敢中VC戻す関門で必って、例えば1枚の
1ノ旧■il能なグレートから成り、符号7で示ノーゲ
ート制却手段tCj:ってポジ7ヨンが17Jシ替られ
ゐ。
, Track 4 J) A gate 5 is provided at the middle corner (it can be done at night or outside A). This gate 5t, it's coming up north 4C from track 4 Kamikane 1 Borumu 1z.
l Plating proboscis 3 ke Remove the plating tank l while it is still in progress and proceed ('!t Finish the plating 3 9 +; Position where the horn is exposed to the retainer 6 and prevent the progress of the Saka plating proboscis 3.
Then, the plating 1>/J 3 k + '4 plating qX
I worked on the position to return tC in the h l/υ plating solution! ? "T fj and C ril. Slwa et al. That gate 5 & yo.
Pinch hitter plating was completed/and it was recognized that it was decided by IL Ruage B. Determine the amount and determine the plating conditions (separately as required).
6. ) This is the f-wave plating 1 and 3 on track 4.
The progress is progressing as it is, and if you are threatening to do so, you will be exposed to Meggi haze: 3 gold-plated cards must be used at the gate to return to VC. No-gate control means tCj: Position 7 has been changed to 17J.

メッキ槽l・υF力Kvよ、プ辰動子8(磁石で・もよ
lth、、 )及び販倣動子8に+1Iltば、励磁し
て振動全発生・xIIO:る倣1・・υ’ilI、諒回
−’/r 9から成る〃111手段が設けられている。
If the plating tank l・υF force Kv is +1 Ilt to the pupil mover 8 (with a magnet, . . . ) and the sales copying mover 8, it will be excited and a total vibration will be generated. 111 means consisting of ilI, rhyme-'/r 9 are provided.

この加振手段の振動子8は、メッキ液の入ったメッキ槽
1’を右回り又は左回り方向に振動させ、これすこよっ
てメッキ液t J&拌して、比重の大きい微粒子を分散
させ、沈降を極力防止するとともに、最゛ド位のトラッ
ク4近傍VC集まった被メッキ物3全順次トラック4上
に載せ、該被メッキ物3に微振動及びラセン状のトラッ
ク4に従う回転を与えつつ、該トラック4上を下部から
上部に向けて上方移動させる。該〃口振手段による振動
数や伽幅等の諸元は振動Ia源回路941こよって調節
可能とする。
The vibrator 8 of this vibration means vibrates the plating tank 1' containing the plating solution clockwise or counterclockwise, thereby stirring the plating solution, dispersing fine particles with a large specific gravity, and causing them to settle. The object to be plated 3 gathered near the track 4 at the highest position is placed on the track 4 sequentially, and the object 3 is subjected to slight vibration and rotation according to the helical track 4. Move upward on track 4 from the bottom to the top. The specifications such as the frequency and width of the vibration caused by the vibration means can be adjusted by the vibration Ia source circuit 941.

メッキ用電源の■極lOv′i、メッキ#Ilの中央上
部に設けられている。また、ei411は、適宜数に分
岐されて、トラック4上の破メッキ物3に随時接触する
ようにされている。こlLは、メッギ用心圧が降下して
通電量がバラバラにlシメッギ膜厚が不均一になるのを
防止するためであり、出来る限シ均等に4イしてバラツ
キのないメッキ臆厚を実現しようとするのでのる。
Pole 1Ov'i of the plating power supply is provided at the upper center of plating #Il. Further, the ei 411 is branched into an appropriate number so as to contact the broken plating object 3 on the track 4 at any time. This is to prevent the plating thickness from becoming uneven due to a drop in the plating pressure and the amount of current being applied, and by making the plating as even as possible to achieve uniform plating thickness. I'm going to try it, so I'm going to try it.

メッキ槽lとは別途に設けられた予υHf、漕2 VJ
、、該メッキ槽lとの間Vこメッキ液を循環できる(a
造とされている。ナなわら、送出配管12の中途には送
出ポンプ13が設けられ、また、戻し配管工4はサイフ
オンの原理でメッキ槽lからメッキ族を戻すようにしC
いる。なお、予#槽2には攪拌用のファン15及びモー
タ16が設けられて、常時メッキ液全均−にしCいる。
Pre-υHf and tank 2 VJ are provided separately from plating tank 1.
,, the plating solution can be circulated between the plating tank l (a
It is said to be constructed. However, a delivery pump 13 is provided in the middle of the delivery pipe 12, and a return plumber 4 returns the plating group from the plating tank l using the siphon principle.
There is. The pre-tank 2 is provided with a stirring fan 15 and a motor 16 to constantly uniformize the plating solution.

また、メッキ液の温度を調節するため、ヒーターないし
は冷却器から成る調温手段17が並設されている。この
ような予備1費2を別設した理由は、メッキ槽lが〃口
振手段によって振!ffbされることに鑑み、振動され
るメッキ槽lにはi片時必要最少限のメッキ液のみと入
れCおき、このメッキ槽lに、成分(省属1トリックス
及び不溶性微粒子)が定常・U埋きれ、かつ、温度等も
コントロールさiL7ヒメツキ液を予備槽2から循環さ
せて、良好な陵「メッキ品質を得ようとするのCりる。
Further, in order to adjust the temperature of the plating solution, a temperature control means 17 consisting of a heater or a cooler is arranged in parallel. The reason why such a reserve 1 and 2 is separately provided is that the plating tank 1 is shaken by the mouth shaking means. ffb, the vibrating plating tank l is filled with only the minimum amount of plating solution required at one time, and the components (trix and insoluble particulates) are kept in the plating tank l at a steady state. In order to achieve good plating quality, the plating solution is circulated from the preliminary tank 2, and the temperature and other factors are also controlled.

次に、上記実施例の作用金運べると、メッキ槽lに結合
された振動子8等の加振+段により、第一8円的にメッ
キ液が振動+jt拌される。これに従うて、不溶性微粒
子が均一に分散されて良好な忠濁状態七区つ。また、〃
旧設手段がメッキ1曹lを振巾すさせることによシ、扁
原状のメッキfgl底部とド降して底部周辺に集まった
被メッキ物3は、ラセン状のトラック4に載シ、ラセン
の巻き方向(この巻き方向と振動子8による振動方向と
は同き全開じくする。)に旧ってメッキ槽lの下部から
上部に上方移動する。この上方4i8!Ji/Iの際、
波メッキ物3は同時に微振動を受けるとともに、ラセン
状のトラック4によって回転される。これ故、めだかも
被メツキ物3Qζ形状の方向性が全くなりのと同じこと
になシ、i?EAf+マトリックス及び複合されるべき
不溶性微粒子が一つ一つの被メッキ物3の全面に万遍な
く行き渡る。従って、どの一つの被メッキ物3をとって
も複合メッキの「のシ具叶jが極めて良い。また、被メ
ッキ′吻3もメッキ1反もともに振ydJ攪拌及び回転
や上方移動t?のイ11対運動t−常時行なってbるの
で、通電時間金経でも彼メッキ物3の近傍のg濃度が薄
くなることがなり。
Next, when the operation of the above embodiment is carried out, the plating solution is agitated in a first 8-circular manner by the vibration stage of the vibrator 8 or the like connected to the plating bath l. According to this, the insoluble fine particles are uniformly dispersed and a good turbid state is achieved. Also,〃
By shaking the plating 1 liter in the old means, the material to be plated 3 that fell onto the bottom of the flat plated fgl and gathered around the bottom was placed on a spiral track 4 and (This winding direction and the direction of vibration by the vibrator 8 should be the same and fully open.) The plating tank l moves upward from the bottom to the top. This upper 4i8! When Ji/I
The corrugated object 3 is simultaneously subjected to slight vibrations and rotated by the helical track 4. Therefore, the directionality of the 3Qζ shape of the plated object is exactly the same as that of the medaka, i? The EAf+ matrix and the insoluble fine particles to be combined are evenly distributed over the entire surface of each object 3 to be plated. Therefore, no matter which object 3 to be plated is taken, the composite plating performance is extremely good.In addition, the plating object 3 and the plating object 3 can be shaken, rotated, and moved upward. Since the countermovement is constantly performed, the concentration of g near the plated object 3 becomes thinner even during the energization time.

言い換えると、常にメッキ液流速をもって代イノつでい
くのと同じことになり、これによりメッキ用のJu1屯
量を多くして、メッキ作業を高速化すること力;できる
In other words, it is the same as always changing the flow rate of the plating solution, thereby increasing the Ju1 volume for plating and speeding up the plating work.

岐メッキ*3&よ、トンツク4上に整列された状態で上
方移動するので、比較的該一度の閾いメッキ槽l下部か
ら上部までを万遍なく通過する。その際rc%変形やW
t受けることもなく、ただ単にメッキ槽lに破メッキ物
3を移すだけで、該被メッキ物3の搬送が全く簡略化さ
れる。
Since the cross plating *3 & yo moves upward while being aligned on the tank 4, it passes relatively evenly from the lower part to the upper part of the threshold plating tank 1 at one time. At that time, rc% deformation and W
By simply transferring the broken plated object 3 to the plating bath 1 without having to receive the plating object 3, transportation of the object 3 to be plated is completely simplified.

整列状態Cゲート4に到った被メッキ物3は、メッキが
完了したと認められた場合にはそのまま進イテして槽外
の仕上りl516に移され、また、未だメッキ1′「業
が光子していない場片には、丹び槽中Vこ戻されて、1
1びメッキされる。
The objects 3 to be plated that have reached the C gate 4 in the aligned state are transferred directly to the finisher 1516 outside the tank when it is recognized that the plating has been completed. If you have not done so, you will be returned to the tank, and 1
1 plated.

予備槽2は、13t[ピしたように〃旧設手段の負担全
最少tこしてメッキ槽1の伝動t−g易にするとともに
、常に最適にコントロールされた(成分、温度、均一1
生等)メッキ液全メッキ備lに循環させる。
The preliminary tank 2 has a capacity of 13 tons [as mentioned above], which minimizes the load on the old installed means, facilitates the transmission of the plating tank 1, and always maintains optimal control (components, temperature, uniformity, etc.).
(raw, etc.) plating solution is circulated throughout the entire plating equipment.

以上述べたように、本発明に係る振動攪拌式複合メッキ
方法及び装置によれば、まず被片メッキ・実施上の効果
として、メッキ液が7腔に倣動攪拌されCいるので、不
溶性微粒子の分数状態がツリー化され、また、メッキ液
が常に菌猿しているので、メッキの条件が良好でめる。
As described above, according to the vibratory agitation type composite plating method and apparatus according to the present invention, first of all, as an effect in plating the work piece, the plating solution is stirred by the 7 cavities, so that the insoluble particulates are removed. Since the fractional state is tree-formed and the plating solution is always in a state of fungus, the conditions for plating are good.

更に、被メッキ物も微振動、上方移動、回転しているの
で、メッキの付着具倉が万壜なく、良好な仕上品質を実
現できるとともに、通I−区童を多くして、メッキ速度
を速めることができる。一方、被メッキ物の搬送を主体
とした作業能率の観点からしても、複合メッキ作業を吊
9下は治具やバレルなしで自動化することができ、また
、荷に小、吻の破メッキ物を大赦にメッキするのに適し
ており、更に、刀0振手段の伽動敢や振I陥、メッキ易
区圧やゲートの市り御VCよシ、作業g理を厳格に行な
って高品質の握aメッキ全実現することができる。
Furthermore, since the object to be plated is subject to slight vibrations, upward movement, and rotation, there is no adhesion of the plating material, and good finishing quality can be achieved. It can be sped up. On the other hand, from the viewpoint of work efficiency, mainly transporting the objects to be plated, composite plating work can be automated without any jigs or barrels, and it is also possible to automate complex plating work without the need for jigs or barrels. It is suitable for plating objects with great precision, and it is also suitable for plating objects with great precision, and it can also be used to improve the quality of the work by strictly performing work procedures such as ga-do-gan, shi-i-kei, plating pressure, gate market control, etc. Quality grip A plating can be fully realized.

なお、以上の説明VCβっては、専ら複ばメッキについ
て説明したが、本元+J−i方法及び装置は普通のイ気
メッキやIt屏脱脂にも適用でさる。また、無電解メッ
キや有機溶剤脱脂、史には、底面処理における脱脂、酸
洗い、中和、水洗<?の前処J1Lや、水洗、クロメー
ト処理、色付、中和等々の後処理にも応用でさる。
Note that although the above explanation of VCβ has been made exclusively for multi-layer plating, the original+Ji method and apparatus can also be applied to ordinary steam plating and IT screen degreasing. In addition, electroless plating, organic solvent degreasing, and history include degreasing, pickling, neutralization, and water washing during bottom surface treatment. It can also be applied to pretreatment J1L and post-treatments such as water washing, chromate treatment, coloring, and neutralization.

【図面の簡単な説明】[Brief explanation of the drawing]

図面は、本J61.IIjの一実施例を示す概念的説明
図図で、りる。 1 〜 メッキ1°d 2 〜 予備槽 :3 〜 vl、メッキ物 4 〜 トラック 5 〜 ゲート 7 〜 ゲート制御1111手段 8 〜 イ辰・l+I+ 子 9 〜 振動電源回路 1l−e1砥 12〜 送出配σ 13〜 送出ボンダ 14〜 戻し配a 15〜 ファン 17〜 調温手段
The drawings are from book J61. This is a conceptual explanatory diagram showing one embodiment of IIj. 1 ~ Plating 1°d 2 ~ Preliminary tank: 3 ~ vl, plated product 4 ~ Track 5 ~ Gate 7 ~ Gate control 1111 means 8 ~ I/l+I+ child 9 ~ Vibration power supply circuit 1l-e1 12 ~ Delivery distribution σ 13~ Delivery bonder 14~ Return distribution a 15~ Fan 17~ Temperature control means

Claims (1)

【特許請求の範囲】 1、 メッキ液゛が入れられたメッキ槽を振動さtて該
メッキ液を1.i2拌しつつメッキを行なう飯# +j
t拌式複式複合メッキ方 法、 回転体状のメッキ槽の底部中央を高原状に盛り上
げるとともに、内周壁部の底部から上部に向け−〔ラセ
ン状のトラックを設け、メッキ41t−振動させる力に
よって被メッキ物を該トラックに載せて上方向eζ移動
させつつ、振動、回転させ、メッキを行なう荷fF請求
の範囲第1項記載の振動償拌氏碩金メッキ方法。 3、 メッキC夜が入れられたメッキ(藷と、該メッキ
1バ全体を振動させてメッキ液をJ、址拌させる加振手
段とを有する振動攪拌式複合メッキ装置。 4、 回・献体状のメッキ槽の底部中央が高原状に盛り
上げらj−Lるとともに、ビ]周壁部の底部からJ:部
に回けてラセン状のトラックが設e1られた特許請求の
範囲第3項記載の振動攪拌式接合メッキ装置。 5、 被メツキ*t−メッキ槽外に排出するポジション
と、被メッキ*’i−再びメッキ槽中に戻すポジション
とに切替cIT能なゲートがトラックに設けられた特許
請求の範囲第4項記載の振動攪拌式複合メッキ装置。 6、 メッキ用1を極のe極が適宜数に分岐されて、ト
ラック上の被メッキ物に随時接触するようになされた特
tr+請求の範囲第4項記載の振動攪拌式課金メッキ装
置。 7、 メッキ槽とは別途に、該メッキ槽との間にメッキ
液を循環できる予備槽が設けられた特許請求の範囲第4
項、ピ載のikR励遣拌式複きメッキ装置。
[Claims] 1. The plating bath containing the plating solution is vibrated to remove the plating solution. i2 Rice to be plated while stirring # +j
t-stirring double-type composite plating method, the center of the bottom of a rotary plating tank is raised in the shape of a plateau, and a helical track is provided from the bottom to the top of the inner circumferential wall, and the plating 41t is covered by the vibrating force. 2. A vibratory agitation gold plating method according to claim 1, wherein the plated material is placed on said truck and moved in an upward direction eζ while being vibrated and rotated to perform plating. 3. A vibrating stirring type composite plating device that includes a plating device containing a plating solution and a vibrating means that vibrates the entire plating solution to stir the plating solution. 4. Claim 3, wherein the center of the bottom of the plating tank is raised in the shape of a plateau, and a helical track is provided extending from the bottom of the peripheral wall part to part J:. Vibration stirring type bonding plating equipment. 5. A patent in which the truck is equipped with a gate that can switch between the position where the plated material is discharged to the outside of the plating tank and the position where the material to be plated is returned to the plating tank. A vibration agitation type composite plating apparatus according to claim 4. 6. The e-pole of the plating pole 1 is branched into an appropriate number so as to be in contact with the object to be plated on the track at any time. 7. The vibration agitation charge plating apparatus according to claim 4.7. Claim 4, further comprising a preliminary tank in which a plating solution can be circulated between the plating tank and the plating tank.
ikR excitation type double plating equipment installed in PI.
JP22208183A 1983-11-28 1983-11-28 Method and device for vibration stirring type composite plating Granted JPS60114597A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22208183A JPS60114597A (en) 1983-11-28 1983-11-28 Method and device for vibration stirring type composite plating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22208183A JPS60114597A (en) 1983-11-28 1983-11-28 Method and device for vibration stirring type composite plating

Publications (2)

Publication Number Publication Date
JPS60114597A true JPS60114597A (en) 1985-06-21
JPS626757B2 JPS626757B2 (en) 1987-02-13

Family

ID=16776825

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22208183A Granted JPS60114597A (en) 1983-11-28 1983-11-28 Method and device for vibration stirring type composite plating

Country Status (1)

Country Link
JP (1) JPS60114597A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06116798A (en) * 1992-10-02 1994-04-26 Matsushita Electric Works Ltd Continuous plating system
JPH06116795A (en) * 1992-10-02 1994-04-26 Matsushita Electric Works Ltd Continuous plating device
JPH06287799A (en) * 1993-04-01 1994-10-11 Nippon Techno Kk Electrodepositing device
US5693144A (en) * 1990-03-19 1997-12-02 3D Systems, Inc. Vibrationally enhanced stereolithographic recoating
JP2011174157A (en) * 2010-02-25 2011-09-08 Tdk Corp Plating device, plating method, and method for producing chip type electronic component

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55119197A (en) * 1979-03-02 1980-09-12 Tipton Mfg Corp Vibrating plating device with plating liquid circulating device
JPS5665979U (en) * 1979-10-22 1981-06-02
JPS58100698A (en) * 1981-12-10 1983-06-15 Bunya Goto Plating device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55119197A (en) * 1979-03-02 1980-09-12 Tipton Mfg Corp Vibrating plating device with plating liquid circulating device
JPS5665979U (en) * 1979-10-22 1981-06-02
JPS58100698A (en) * 1981-12-10 1983-06-15 Bunya Goto Plating device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5693144A (en) * 1990-03-19 1997-12-02 3D Systems, Inc. Vibrationally enhanced stereolithographic recoating
JPH06116798A (en) * 1992-10-02 1994-04-26 Matsushita Electric Works Ltd Continuous plating system
JPH06116795A (en) * 1992-10-02 1994-04-26 Matsushita Electric Works Ltd Continuous plating device
JPH06287799A (en) * 1993-04-01 1994-10-11 Nippon Techno Kk Electrodepositing device
JP2011174157A (en) * 2010-02-25 2011-09-08 Tdk Corp Plating device, plating method, and method for producing chip type electronic component

Also Published As

Publication number Publication date
JPS626757B2 (en) 1987-02-13

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