JPS60111245A - マスクの製造方法 - Google Patents

マスクの製造方法

Info

Publication number
JPS60111245A
JPS60111245A JP58219273A JP21927383A JPS60111245A JP S60111245 A JPS60111245 A JP S60111245A JP 58219273 A JP58219273 A JP 58219273A JP 21927383 A JP21927383 A JP 21927383A JP S60111245 A JPS60111245 A JP S60111245A
Authority
JP
Japan
Prior art keywords
mask
pattern
light
shielding layer
individual
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58219273A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6319853B2 (enrdf_load_stackoverflow
Inventor
Susumu Takeuchi
進 武内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Priority to JP58219273A priority Critical patent/JPS60111245A/ja
Publication of JPS60111245A publication Critical patent/JPS60111245A/ja
Publication of JPS6319853B2 publication Critical patent/JPS6319853B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/76—Patterning of masks by imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/44—Testing or measuring features, e.g. grid patterns, focus monitors, sawtooth scales or notched scales

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP58219273A 1983-11-21 1983-11-21 マスクの製造方法 Granted JPS60111245A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58219273A JPS60111245A (ja) 1983-11-21 1983-11-21 マスクの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58219273A JPS60111245A (ja) 1983-11-21 1983-11-21 マスクの製造方法

Publications (2)

Publication Number Publication Date
JPS60111245A true JPS60111245A (ja) 1985-06-17
JPS6319853B2 JPS6319853B2 (enrdf_load_stackoverflow) 1988-04-25

Family

ID=16732937

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58219273A Granted JPS60111245A (ja) 1983-11-21 1983-11-21 マスクの製造方法

Country Status (1)

Country Link
JP (1) JPS60111245A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0250182A (ja) * 1988-05-30 1990-02-20 Canon Inc 現像装置

Also Published As

Publication number Publication date
JPS6319853B2 (enrdf_load_stackoverflow) 1988-04-25

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