JPS60103349A - Cleaning device for substrate - Google Patents

Abstract

PURPOSE:To remove effectively foreign matter sticking to a glass substrate and to improve the capacity of a stage for cleaning said substrate by providing means for coating a cleaning liquid on the substrate to be cleaned, removing the foreign matter sticking thereto and washing the remaining matter, etc. CONSTITUTION:A glass substrate 5 is vertically held from a housing part 1 and is positioned above a brush cleaning tank 2 along a route 6. A washing means 7 which ejects pure water to the substrate 5, a means 8 for coating a cleaning liquid which ejects ammonia cleaning liquid and a rotary brush 11 are respectively segmented by plates 9, 10 for preventing scattering in a cleaning tank 2. An alcohol liquid is ejected from the ejecting part 13 of a rinse tank 3 and the substrate 5 is dried by freon vapor in a vapor tank 4. The foreign matter sticking to the substrate 5 is thus thoroughly removed by moving vertically the substrate in the tank 2. The substrate 5 is transferred into the tank 3 and the tank 4 to eliminate the remaining cleaning liquid, by which the efficiency in the cleaning stage is improved and the thoroughly cleaned substrate 5 is obtd.

Description

DETAILED DESCRIPTION OF THE INVENTION (Technical Field of the Invention) The present invention relates to an apparatus for cleaning contaminated substrates, and in particular, the present invention relates to an apparatus for cleaning contaminated substrates, and particularly for cleaning foreign matter (microscopic particles) attached to glass substrates such as reticles and photomasks used in semiconductor manufacturing. This relates to cleaning equipment that removes dirt, stains, and oil.

(Background of the Invention) Conventionally, methods for cleaning glass substrates such as reticles and photomasks include hand washing with a sponge, cleaning with a brush, or cleaning with an ultrasonic solvent bath. Among these methods, cleaning using a rotating brush is the most effective cleaning method and is suitable for automation. However, even if a rotating brush is used to remove foreign matter attached to the surface of the glass substrate, the final (Objective of the Invention) The present invention solves the above-mentioned drawbacks, and has the disadvantage that a sufficient cleaning effect cannot be obtained depending on other cleaning steps until a glass substrate is dried. It is an object of the present invention to provide a cleaning device that effectively removes foreign matter and does not reduce the performance of the cleaning process until a dry glass substrate is obtained.

(Summary of the Invention) The present invention provides a conveying means for holding a substrate such as a reticle or a photomask and transporting the substrate into and out of a cleaning tank, and a cleaning liquid (ammonia aqueous solution) provided in the cleaning tank. There is a cleaning solution application means that statically sprays a cleaning solution (or pure water), and a foreign matter removal means (rotary) that rubs the surface of the substrate moistened with the cleaning solution to remove attached foreign matter (dirt, dust, or oil). The technical point is to provide a cleaning device (brush) and a water washing means (pure water spouting section) for washing away the cleaning liquid or foreign matter remaining on the substrate after the foreign matter removal means removes the foreign matter.

(Embodiment) FIG. 1 is an overall schematic diagram of an automatic cleaning device to which an embodiment of the present invention is applied.

The glass substrate 5 is stored in the storage part 1, and the brush cleaning tank 2 according to the embodiment of the present invention is arranged at the farthest position from the storage part 1, and the brush cleaning tank 2 according to the embodiment of the present invention is located next to it and is sandwiched between the storage parts 1 and Ii&. , a rinse tank 3 that washes the glass substrate 5 using alcohol
Further, a steam drying tank 4 for drying the glass substrate 5 using Freon steam is arranged between the rinsing tank 3 and the storage part IK. The storage section 1, the brush cleaning tank 2, the rinsing tank 3, and the steam drying tank 4 (hereinafter simply referred to as steam 14) are arranged along a linear transport path 6 for the glass substrate 5. Five glass substrates to be cleaned stored in a storage part 1 are vertically held and positioned above a brush cleaning tank 2 following a path 6, jumping over a steam tank 4 and a rinsing tank 3. Inside the brush cleaning tank 2, from top to bottom, there are a pure water spouting section (washing means) 7 that jets pure water onto the glass substrate 5, and a cleaning fluid spouting section (cleaning fluid application means) that spouts a cleaning fluid such as ammonia aqueous solution. ) 8 and a brush (foreign matter removing means) 11 that rotates so as to rub the surface of the glass substrate 50 are separated by scattering prevention plates 9 and ]0, respectively. Moreover, the bottom part 12 of the brush cleaning tank 2 is shaped like a cone to improve the collection efficiency of waste liquid.

Inside the rinsing tank 3, a PA spouting section 13 is provided for spouting iPA to replace pure water with ileprovir alcohol solution (hereinafter referred to as IPA), etc. Rinse with IPA. Moreover, the bottom part 14 of this rinse tank 3 is also formed in a male shape to increase the efficiency of collecting the drained liquid. A Freon liquid 16 is supplied to the bottom of the steam tank 4 from a supply line 18 to predetermined eyelids at a time, and heated by a heater 19 . Freon vapor fills the tank 4 due to the breakage, and the glass substrate 5 is vapor-dried.

The Freon liquid condensed and dripped by the glass substrate 5 is
Since the purity is low and it is dirty, it is collected in a saucer 17a to prevent it from mixing with the Freon liquid 16, and then passed through the recovery line 17b.
will be collected through. A cooling pipe 15 is provided around the upper part of the steam tank 4 to prevent freon vapor from flowing out of the tank.

FIG. 2 is an enlarged perspective view of the brush cleaning tank 2. FIG.

The end face portions of the glass substrate 5 are held by the arms 20 from both sides, and the glass substrate 5 is conveyed vertically in the y direction and the Z direction parallel to the surface of the glass substrate 5.

The upper part of this brush cleaning tank 2 consists of a glass substrate 5 and an arm 2.
An opening 21 large enough for 0 to move forward and backward is provided and sealed. This structure is effective in preventing dust from entering the tank 2 and also in preventing mist (splash) of various liquids inside from exiting to the outside. Now, the pure water spouting section 7 is connected to the glass substrate 5 that enters downward from the opening 21.
Baigua a, 7 b arranged in parallel on both sides of 0,
This pipe 73.7b is composed of injection nozzles 22.23 and 24.25 provided at two locations, respectively.

Pure water at a constant pressure is supplied to the pipes 7a and 7b, and the spray nozzles 22 to 25 use the pressure to spray the pure water into a fan-shaped liquid film. The nozzles 22 to 25 eject pure water so that it spreads in a fan shape in the lateral direction of the surface of the glass substrate 5 (in the y direction in the figure), and also ejects the pure water so as not to spread in the vertical direction of the surface of the glass substrate 50. It has a structure that makes it possible to do so. Therefore, the arrangement of these nozzles 22 to 25 will be explained in detail with reference to FIG. 3. FIG. 3(a) shows pipes 7a, 7
FIG. 3(b) is a view showing the arrangement of the glass substrate 5 and the glass substrate 5 as seen from above the tank 2, and FIG. 3(b) is a view as seen from the side. As shown in FIG. 3(a), in order to spray pure water q1 from nozzle/l/22 and pure water Aq2 from nozzle 23 all over the width direction of glass substrate 5, a fan-shaped The opening angle θ1 and the interval between the nozzles 22, 23 are determined. Similarly, regarding the nozzle 24.25,
Pure water A (13 and Aq4) are sprayed out while spreading in the width direction without exception. On the other hand, as shown in Fig. 3(b), each pure water A
Since l to Aq4 do not spread in the vertical direction of the glass substrate 5, they form a liquid film. However, when pure water Aql and Aq2 are sprayed onto the same surface of the glass substrate 5, the nozzles 22 and 23 are placed in the pipe 7a so that the fan-shaped liquid films do not overlap each other on the glass substrate 50 surface. The angle is slightly different. This is to prevent splashes from the dog h1 from being generated when pure water A, ql and Aq2 overlap and collide with each other. Regarding the pure waters Aq3 and Aq4, the angles of the nozzles 24 and 25 are slightly shifted from the pipe 7b so that the fan-shaped liquid films do not overlap each other. Further, the nozzles 22 to 25 are provided in the pipes 7a and 7b so that the pure waters AqI to Aq4 are not sprayed perpendicularly to the surface of the glass substrate 5, but are sprayed downward at a certain angle. This strengthens the power to wash away foreign matter that is weakly attached to the glass substrate 5, and when the glass substrate 5 is not present, pure water Aql and Aq3 (
This is also to prevent Aq2 and Aq4) from colliding and causing splashes of pure water. For this reason, pure water Aq, 1
It is desirable that the angle formed by the surfaces of the fan-shaped liquid films of and Aq 3 (Aq 2 and Aq 4) be an acute angle, for example, 5° to 85°.
° is good. Now, returning to the explanation of Fig. 2, the pipes 7a, 7
Below b, anti-scattering plates 9a and 9b are provided facing each other and slanted downward toward the center of the tank 2. The lower ends of the scattering prevention plates 9a and 9b are spaced apart from each other by an appropriate distance so that the glass substrate 5 and the arm 20 can pass through each other. These anti-scattering plates 9a and 9b are used for the nozzles 22-2.
This prevents the pure water from 4, or the pure water that has been sprayed onto the - group glass substrate 5 and bounced off, from turning into droplets and bouncing back upwards. The angle formed by the surfaces of these anti-scattering plates 9a and 9b is based on the relationship between pure water Aql and A, q3 (
Aq2 and Aq4. ) and the jetting pressure of pure water, but if the angle is about 206 to 160 degrees, the effect of preventing scattering can be obtained.

Now, when the glass substrate 5 passes between the anti-scattering plates 9a and 9b and further moves toward the bottom, it reaches the cleaning liquid spouting section 8. The cleaning liquid spouting section 8 is a nozzle 8a located parallel to the glass substrate 5, similar to the pure water spouting section 7.

8b, and injection nozzles 26, 27, 28, 29 provided in each of the pipes 8a, 8b. The arrangement of these pipes 8a, 8b and nozzles 26 to 29 is similar to that of the pure water spouting section 7 described above.

A pressurized cleaning liquid, such as an ammonia aqueous solution, is supplied to the nozzles 8a and 8b, and the ammonia aqueous solution is sprayed onto both sides of the glass substrate 5 in a fan shape from the nozzles 26 to 29. In this case, the ammonia aqueous solution does not necessarily have to be in the form of a liquid film. Below this nokube ga, 8b, similar to the scattering prevention plates 9a, 9b, there are scattering prevention plates 10a, 10.
b is provided so as to be inclined downward toward the center of the tank 4. Similar to the scattering prevention plates 9a and 9b, the function of the scattering prevention plates IQa and lob is to prevent the ammonia aqueous solution from the nozzles 27 to 29 from turning into droplets and scattering upward; It also serves to prevent droplets from the rotating brush 11 arranged below from flying upward.

The rotating brush 11 includes a cylindrical brush 11a having a rotation axis O7 arranged parallel to the surface of the glass substrate 50, and a cylindrical plug 11b having a rotation axis 02. The brush 11. In a and llb, the distance 35 between the rotation axes 01 and 02 is determined so that when the glass substrate 5 passes through the gap between the anti-scattering plates 10a and 10b and goes downward, the glass substrate 5 is sandwiched therebetween. . And brush lla,
The bristles of llb are made of nylon material, for example, and each rotation axis O5
, 0, and extends in the radial direction.

The brush 11a rotates clockwise around the rotation axis 01 as shown by the arrow 50a in FIG.
As shown by 0b, it rotates counterclockwise around the rotation axis 02. That is, the glass substrate 5 sandwiched between the brushes 11a and 11b is rubbed so as to be pushed toward the bottom 12 of the tank 4 (downward) by the rotation of the brushes 11a+11b. Therefore, foreign matter (dust, stains, etc.) attached to both surfaces of the glass substrate 50 is rubbed off toward the bottom +<++ t 2 by the bristles of the brushes ita and tib. The axial length of the cylindrical brush lla, 1111 is such that it contacts as widely as possible in the width direction of the glass substrate 5 and does not touch the arms 20 that hold both end surfaces of the glass substrate 5. stipulated in This is brush lla,
111) is extremely effective in preventing hair abrasion. The meshing part of the brushes ita and iib and the pure water spouting part 7
The distance from the position where the pure water from the glass substrate hits the glass substrate is determined to be larger than at least the vertical width (height) of the glass substrate.

Now, the bottom part 12 of the brush cleaning tank 4 is formed in the shape of a cone, and this is because it efficiently collects the waste liquid of pure water or aqueous ammonia solution sprayed onto the glass substrate 5, and the bottom part 12 of the brush cleaning tank 4 is shaped like a cone. This is because the water is discharged from the top portion through the pipe 32.

The angle of this cone is preferably 90° to 175° in terms of the apex angle. Of course, the smaller the angle, the better the recovery efficiency of the drained liquid will be, but this will conversely increase the size of the tank, so it is best to set it in consideration of the size of the tank.

In addition, as mentioned above, when an ammonia aqueous solution is used as a cleaning solution, it gives off a strong odor, so an exhaust vibrator 30 is connected to the side wall of the tank 4 near the cleaning fluid spouting part 8 to remove the ammonia gas filling the tank 4. The structure is such that the water is discharged to the illustrated purification device 31.

In addition, in FIG. 2, the brush cleaning tank 4 is configured to be separable into an upper part and a lower part 11119μ with a joint 34 through a backing as a boundary, and a pure water spouting part 7 and a cleaning liquid spouting part 8. The anti-scattering provision 9.10 is provided on the upper side and is fixed to the entire device, and the lower side where the brushes 11a, llb and pipe 32 are provided is removed downward from the upper side. This is to facilitate the replacement of brushes lla and llb. On the lower side there are brushes 11a, 1
A motor for individually rotating the lb is provided integrally as shown in FIG. FIG. 4 is a plan view showing only the side part of the brush 11a.
Only the bellet drive mechanism 41a that transmits the signal to +O is shown. As for the brush llb, a motor 401) and a belt drive mechanism 41b are also integrally provided on the lower side of the tank 4.

Note that the bearing 42a that supports the rotating shaft O3 on the lower side wall of the tank 4 is backed for waterproofing. Further, a flexible vibrator (hose) 33 is connected to the tip of the pipe 32 so that the lower part can be removed without any trouble.

FIG. 5 is a circuit block diagram of a control system that controls the drive of the transport arm 20 and the drive of the brush cleaning tank 4. The entire apparatus is centrally controlled by a microcomputer (hereinafter referred to as CPIJ) 60. (1'Various commands from the LI60 are sent to the interface circuit (hereinafter referred to as lto') 61
is sent to each drive unit. The drive j1ij circuit 62 is
A command from the CPU 60 drives the magnetic valve 63 which switches whether or not to supply pressurized pure water to the pipes 7a and 7b.

The drive circuit 64 moves the pipe 8a,
The electromagnetic valve 65 that switches between supplying pressurized cleaning o (ammonia water bath liquid) to 8b and supplying it or not is driven. The drive circuit 66 receives instructions from the CPU 30 to drive the brushes lla and 11b.
The motors 40a and 40h that rotate the motors 40a and 40h are individually driven.

1 financial department (L: J-Ding, ZAC) including power sources such as motors
(referred to as T) 67 moves the arm 20 up and down 'frb (moves in the Z direction 4'1,
1) Stir. Its movement is also commanded by CPU f50. Similarly, the drive unit including the power source (hereinafter referred to as YA
C'[' and I...rb) 68 is CP tJ 60 to 0411 go K, Te, r-mu 20 in the Y direction, that is, glass: 1. ? Move it in the direction that the surface of the board 5 is cured. Il' in the Y direction! -The amount of movement is also CPU 60
commanded by. By holding the glass substrate 5 vertically and transporting it in a direction parallel to the surface of C1, as shown in Part B, it is possible to reduce the adhesion of microscopic foreign particles floating in the atmosphere to the surface of the glass substrate 5. can get.

Next is the actual implementation I! The cleaning operation by 11j will be explained based on the flowchart of FIG.

When the cleaning process is started, the Ci' U 60 outputs a command to the ZACT 67.68 to take out the glass substrate 5 from the storage section 1 using the steno knob 00.

Then, the CPU 60 outputs a command to the YNCT 68 to move the arm 20 in the y direction from above the storage section 1 to above the brush cleaning tank 4 so that the glass substrate 5 is positioned at the position shown in FIG. do. Next, the CPU 60 issues a command (ZACT6) to lower the vertical center position of the glass substrate 5 from position a to position ci as shown in FIG.
Output to 7.

Next, in step 101, the CPU 60 determines whether pure water rinsing (cleaning) by the pure water spouting section 7 has been performed N1 times. The number of times N of this pure water rinsing is
This is the number of times the robot has traveled back and forth from position C to position F in the figure, and is a value that includes zero. Since pure water rinsing has not yet been performed here, the CPU 60 performs step 102.
Then, the solenoid valve 63 is opened and pure water is spouted from the nozzles 22-25. At this time, pure water is sprayed onto the upper end of the glass substrate 5, and the CPU 60 moves the glass substrate 5 from position C to position b-!
! A command to move at a predetermined speed is output to the ZACT68. Then, when the glass substrate 5 comes to position B, pure water is sprayed onto the lower end of the glass substrate 5, so that the CPU
60 outputs a command to ZACT 68 to lower it again at position CO. As a result, one round trip of the glass substrate 5 is completed, and the CPU 60 executes step 101 again.

As described above, from the position C of the glass substrate 5 (T fRb
While the reciprocation at -1 is being carried out, pure water is continuously ejected to moisten both surfaces of the glass substrate 50, and in some cases, weakly attached foreign matter is washed away by the pure water ejection pressure.

Now, when the glass substrate 5 stops at position C and the pure water rinsing is completed, the CPU 60 outputs a command to close the solenoid valve 63, opens the solenoid valve 65, and pours the ammonia aqueous solution into the nozzle 2.
A command to eject is output from 6 to 29. and CPU
60, in step 103, the cleaning liquid spouting part 8 and the rotating brush 1 are connected.
1 is performed N2 times (N is a value other than zero). Since brushing has not yet been performed here, the CPU 60 moves the glass substrate 5 to the position shown in FIG. The IC outputs a command to descend at position et to ZA and CT68, and motor 4Q;
+, a command to rotate 4ob is output to the drive circuit 66, and brushing in step 104 is started. In this step 104, the CPU 60 outputs a command to the 7AC'l"68 to perform a reciprocating motion in which the glass substrate 5 moves up from the position e to the position ct and then descends again at the position 1Ret, and the ammonia aqueous solution on both sides of the glass substrate 5 is When the glass substrate 5 reaches position e, the glass substrate 5
The upper end is brushed by being sandwiched between the two brushes lla, 111), and when the glass substrate 5 is raised from position e at a predetermined speed and reaches position d, the vertical center position of the glass substrate 5 is are two brushes 11a, l
It's tucked into my lb and it's a bra.

Synced. Furthermore, while the glass substrate 5 is raised to position C, both surfaces of the glass substrate 5 are wetted by spraying an ammonia aqueous solution, and the glass substrate 5 is lowered again toward position Re, and both surfaces are brushed. . Note that when the glass substrate 5 rises to position C, brushing is not performed and the brushes 11a and 11b simply rotate idly. Moreover, a large amount of ammonia aqueous solution is scattered on the scattering prevention plate 10a.
.

From between the brushes 10b and 111), the liquid is dripped onto the meshing part between the brushes lla and 111). For this reason, a large amount of droplets that would normally fall on the brush 1
It is generated by the rotation of 1 a and 1 l b and jumps upward in the tank. However, in Honjitsu Martyrs 11, brush lla
The direction of rotation of
0b, so the shatterproof plate ioa
,: There are very few droplets splashing upward from the gap between the tabs, and the brush 11a.

At the position where 11 and b are more than half a turn from the engaging part, all the droplets of ammonia solution that have left the bristles of the brush due to centrifugal force collide with the lower surface of the scattering prevention plates 10a and 10b, so that they are scattered above the tank 4. There is no.

In this way, the glass substrate 5 moves from position e to position C for 1 time.
After the round trip, the CPU 60 determines in step 103 whether the round trip has been made N2 times. When brushing has been executed N2 times, the CPU 60 proceeds to the next step 105.
Determine whether or not the customer has brushed with pure water N3 times (however, N3 is a value of zero or more).
, if not executed, the process advances to step 106.

When the glass substrate 5 descends to f3'L19e, the upper part of the arm 20 also expands into the tank 4 from the open L1 portion 21. For this reason, the brushes 1.1a and llb are rotating, and the ammonia aqueous solution nozzles 26 to 29
Due to the fact that the injection pressure from
Splashes of ammonia aqueous solution may adhere to the top of the tank. If a worker following the brush washing tank 2, for example, a drying process in the steam tank 4, is carried out with droplets of 5 volumes of ammonia water attached to the arm 20, the freon vapor in the steam tank 4 will be affected. It reduces the drying effect. Therefore, at the end of steps 103 and 104, the glass substrate 5 is at the position: le
At this time, the CrtJ60 outputs a command to open the electric current %lfi'63, and injects pure water from the nozzles 22 to 25. At this time, the rotation of the brushes lla and llb, the spraying of the ammonia aqueous solution, and the spraying of pure water are performed at the same time, but the pure water is mainly sprayed onto the upper part of the arm 20 to remove the adhering droplets of the ammonia aqueous solution. Wash away.

Also in steps 105 and 106, the glass substrate 5
is reciprocated up and down between the N8 rotation device e and the position C. Note that if the injection of the ammonia aqueous solution is stopped when executing steps 105 and 106, the effect of cleaning the droplets of the ammonia bath solution adhering to the arm 20 will be further improved. When the cleaning with water is completed, the CPU 60 selects the brushes 11 a and 1 l.
A command to stop the rotation of b is output to the drive circuit 66, and a command to close the solenoid valve 65 and stop the injection of the ammonia aqueous solution is output to the drive circuit 64. However, this command is output when the glass substrate 5 rises to position C, and thereafter the glass substrate 5 does not return to position e.

Next, the CPU 5o performs pure water rinsing in steps 107 and 108. This is carried out in exactly the same manner as the previous steps 101 and 102, and the ammonia aqueous solution remaining on the glass substrate 5 and the lower part (holding part) of the arm 20 is washed away. At this time as well, move the glass substrate 5 between positions C and b N4 times (only L7
N4 is a value other than zero) Up and down TV! The aqueous ammonia solution on the surface of the glass substrate 5 is sufficiently replaced with pure water while washing the objects weakly attached to the surface of the glass substrate 50 without being washed away. .

As described above, when steps 107 and 108 are completed, the CPU 60 stops the jetting of pure water and outputs a command to Z to Ci' 67 for the glass substrate 5 to exit from the opening 21 of the tank 4. do. When the glass substrate 5 is positioned as shown in FIG.
41 moves the glass substrate 5 by a predetermined amount of Fpr in the y direction.
The first command is output to the YACT 68, and the next cleaning process in the rinse tank 3, that is, steps 109 and 110 are started. Here too, the C'P U 60 outputs a command to the ZACT 67 to cause the glass substrate 5 to reciprocate downward in the rinsing tank 3 at -L. In this rinsing tank 3, from the JPA spouting part 13
[PA75! Spray it on both sides of the 111 lath substrate 5 in the form of a fan-shaped liquid film. Glass substrate 5 is applied N6 times (
However, N is a value other than zero) - Move down and the glass substrate 5
When the thorny surface of is sufficiently replaced with alcohol, CPU60
Take the next step 1 while the alcohol is dry and strong.
A drying process using the steam tank 4 is performed in steps 11 to 114.

First, the CPU 60 outputs a command to the YACT 68 to position the glass substrate 5 on the steam 1114, and
0 in the y direction. Thereafter, the glass substrate 5 is lowered to the lower part of the steam tank 4, that is, to a position filled with Freon vapor, and is held still at that position for a time T until the temperature of the glass substrate 5 becomes equal to the temperature of the Freon vapor.

(Steps 111 and 112) And after time T1 has elapsed,
The CPU 60 outputs a command to the ZACT 67 to raise the glass substrate 5 to the height of the cooling pipe 15 of the steam tank 4 .

As the glass substrate 5 rises, the Freon vapor clinging to the glass substrate 5 either descends or is drawn toward the cooling pipe 15 and condenses.

During the time T4 during which the clinging Freon vapor is separated from the glass substrate 5, the CPU 60
is allowed to settle at the height of the cooling pipe 15. (Step 113.
114) Since the glass substrate 5 is dried through the above steps, C
The PU 30 executes step 115, carries out the glass substrate 5 from the steam tank 4, and immediately stores it in the adjacent storage section 1. This completes the cleaning process for the first and first wheels of the glass substrate 5.

By the way, as in this embodiment, the brush 11a.

11b, the brush itself may become contaminated due to foreign matter on the glass substrate 5 adhering to the bristles of the brush, or due to drying after the cleaning liquid adheres to the brush.

Therefore, when the book is on its side, brushes 11 a, 111)
It has a built-in sequence that performs self-cleaning. FIG. 7 is a flow chart 1 for explaining an example of the sequence.

In FIG. 7, steps from unloading in step 120 to cleaning in step 121 are the same as step 100 and steps 101 to 114 in FIG. 6, respectively. Next, when step 122 of storing the glass substrate 5 in the storage part 1 is executed, in steps 123 and 124, the brush cleaning tank 2
The inner brushes 11a and llb are rotated idly and pure water is sprayed from the pure water spouting section 7. At this time, the pure water from the pure water spouting part 7 is once sprayed onto the scattering prevention plates 9a, 9b, and then flows from the gap between the two prevention plates 9a, 9b to the gap between the lower scattering prevention plates 10a, 10b. Brush through, lla, ll
Fall to b. At the end of step 121, since the brushes are in the wet state, foreign matter and cleaning liquid attached to the bristles of the brush 11 are washed away with pure water. In this case, the amount of pure water used and brush lia for ib work
, the time T determined experimentally from the rotational speed of llb, etc.
only executed. After that, the CPU 60 performs step 125.
Then, it is determined whether or not the glass substrate 5 has been completely stored in the storage section 1, and a series of cleaning steps including self-cleaning of the brush 11 is completed. In this way, one glass substrate 5
If self-cleaning is performed each time the glass substrate 5 is cleaned with the brush, the glass substrate 5 will always be rubbed by the clean brush, so even if a fairly dirty glass substrate is cleaned and a not-so-contaminated glass substrate is cleaned, This has the effect that foreign matter removed from the previous glass substrate does not re-adhere to the subsequent glass substrate, and all glass substrates are uniformly cleaned. Incidentally, as long as this self-cleaning failure occurs when the glass substrate 5 is not carried into the brush cleaning tank 2, the same effect can be obtained no matter where in the flowchart of FIG. 6 the glass substrate 5 is placed.

Also, during self-cleaning, the brush 11a.

11b rotating emotion 0. ．． If you move the interval 35 of brushes 11a and 11b to make them a little narrower so that the tips of the bristles of brushes 11a and 1lb overlap (bite into) a little, and then rub it again, the self-cleaning will be done. The effect will be even better. Furthermore, during self-cleaning, an ammonia aqueous solution is applied from the cleaning liquid spouting part 8 at 1T4. Take out brush 1
1 cleaning may be performed, and then cleaning with pure water may be performed. Further, in this case, if a configuration is adopted in which a cleaning agent more effective for cleaning the brush 11 is spouted instead of the ammonia aqueous solution, the cleaning effect will be further improved.

Although the present invention has been described in detail above, various modifications can be made in addition to this embodiment. Although two nozzles are provided on one side of the glass substrate 5 in the pure water spouting section 7 in the brush cleaning tank 2, any number of nozzles may be provided. However, when installing multiple nozzles, the angle of the jetting direction of the liquid film is shown in Figure 3 (b) so that the fan-shaped pure water film sprayed from each nozzle does not interfere with each other. It is more effective to shift it up and down little by little as shown above in terms of preventing the generation of droplets. In addition, in Fig. 3, two nozzles are connected to pipe 7a (7a).
Although it is assumed that the device is installed at a slightly different angle compared to b), even if the device is installed at exactly the same angle, the jetting angle of the pure water film can be slightly changed in the vertical direction. This is possible by sealing one end of the vibrator 7a (7b) as in the embodiment and supplying pressurized pure water from the other end. This allows the jetting angle of the nozzle to be the same both above and below. Even so, there is a slight difference in the jetting pressure of pure water between a nozzle near the pure water supply side and a nozzle far from the supply side, and the jetting angle naturally becomes slightly different in the vertical direction. Next, the same effect can be obtained by using the brush 11 as a so-called cup-shaped brush with bristles extending in a direction substantially parallel to the rotation axis. In this case, the extension line of the rotational axis of the cup-shaped brush is perpendicular to the surface of the glass substrate, or intersects at a certain angle other than 90 degrees, so that it is brushed against the glass substrate so that both sides of the glass substrate are brushed at the same time. arranged symmetrically. Furthermore, whether it is a cylindrical brush as in the above embodiment or a cup-shaped brush, it is preferable that the bristles of the brush be arranged so that they interlock when there is no glass substrate, but this is not always the case. This is not necessary, and the same effect can be obtained by arranging the bristles at intervals narrower than the thickness of the glass substrate so that the tips of the bristles do not come into contact with each other.

In addition, as the cleaning liquid used during brushing, an ammonia aqueous solution is suitable in order to prevent electrostatic damage caused by charging the reticle or photomask, and to prevent foreign matter from re-adhering due to charging, but carbonated water may also be used. , and as a means of removing foreign matter, if the foreign matter is removed by rubbing,
A sponge or the like may also be used.

In addition, in the above embodiment, the cleaning solution was an aqueous solution composed of special components, but when cleaning a glass substrate that is relatively uncontaminated, a sufficient cleaning effect can be obtained even if brushing is performed using only pure water. It will be done. In this case, the cleaning liquid spouting part 8 becomes unnecessary, and the apparatus can be simplified. However, in this case as well, the distance between the height position where the pure water from the nozzles 22 to 25 of the pure water spouting part 7 hits the glass substrate and the position of the engaging part of the brush 11 (the part in contact with the glass substrate) is as follows.
It is determined to be about 1 to 3 times the vertical width of the glass substrate. This is to prevent splashes of pure water generated by the rotation of the brush 11 from adhering to the glass substrate as much as possible. At this time, cleaning in the brush cleaning tank 4 includes a step of brushing by spraying pure water (cleaning liquid), and a process of brushing the glass substrate by spraying it with pure water (cleaning liquid). Only two steps are required, including the rinsing step, and the cleaning time is shortened.

Although not shown in the above embodiment, the brush cleaning tank 4
The horizontal steps on the inner wall of the tank 4 are all tapered so that when various liquids fall, they do not splash into the upper part of the tank 4. A high-pressure gas jet nozzle is further provided above the pure water spouting section 4, and the high-pressure gas is sprayed onto the substrate that has been rinsed with pure water to blow off the adhered droplets.
A dry substrate may be obtained immediately.

(Effects of the Invention) As described above, according to the present invention, foreign matter adhering to a substrate is removed by rubbing it with a cleaning liquid, and then the cleaning liquid,
Alternatively, since the remaining foreign matter is washed with water, there is an effect that the cleaning liquid does not remain and does not have any adverse effects on other processes.

In addition, the substrate transport means (arm 20) is also washed with water at the same time, so that the cleaning liquid does not adhere to the transport means and cause dirt, and the overall cleanliness of the apparatus is maintained at a high level.

Furthermore, as in the example, the substrate is carried in and carried out in a direction parallel to its surface, so the amount of air that the substrate receives is small, and foreign matter floating in the atmosphere will re-adhere to the substrate after washing with water. There is also the advantage that there are fewer possibilities.

[Brief explanation of the drawing]

FIG. 1 is a schematic configuration diagram of an automatic cleaning device according to an embodiment of the present invention, FIG. 2 is a perspective view showing the structure of a brush cleaning tank, and FIG. FIG. 3(b) is a side view of the state shown in FIG. 3(a) when viewed from the side, and FIG. 4 is a plan view showing the structure of the lower part of the brush cleaning tank. FIG. 7 is a flowchart explaining the self-cleaning process of the brush [Explanation of symbols of main parts] 1...Storage section 2...Brush cleaning tank 3...・Rinse tank, 4... Steam drying tank, 5... Glass substrate 7...
・Pure water spouting part, 8...Cleaning liquid spouting part 11...Rotating brush Figure 1, Figure 3 (θ), Figure 3 (1)) Figure 1, illustration 0-103349 (10); tq diagram

Claims (1)

[Claims] a conveying means for holding a substrate to be cleaned and carrying the substrate into and out of a cleaning tank; a cleaning liquid application means provided in the cleaning tank and applying a cleaning liquid to the substrate; a substrate wetted with the cleaning liquid; a foreign matter removing means for removing attached foreign matter by rubbing the surface of the foreign matter; after the foreign matter removal means has finished removing the foreign matter;
A substrate cleaning apparatus comprising: a water washing means for washing away the cleaning liquid or foreign matter remaining on the substrate.