JPS5997458U - Ion electron beam irradiation device - Google Patents
Ion electron beam irradiation deviceInfo
- Publication number
- JPS5997458U JPS5997458U JP19135182U JP19135182U JPS5997458U JP S5997458 U JPS5997458 U JP S5997458U JP 19135182 U JP19135182 U JP 19135182U JP 19135182 U JP19135182 U JP 19135182U JP S5997458 U JPS5997458 U JP S5997458U
- Authority
- JP
- Japan
- Prior art keywords
- beam irradiation
- electron beam
- ion
- irradiation device
- ion electron
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Analysing Materials By The Use Of Radiation (AREA)
- Sampling And Sample Adjustment (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第１図イおよび口は従来のイオン電子線照射装置のイオ
ンビーム照射系と電子線照射系との配置を、示す２つの
異なる配置例、第２図はシャドウ効果を説明する図、第
３図は本考案によるイオン電子線照射装置の一実施例の
概略構成図、第４図イーおよび口は本考案によるイオン
電子線照射装置のイオンビームの異なる集束態様を示す
図、第５図は本考案によるイオン電子線照射装置の他の
実施、例の概略構成図である。 ゛、。
１・・・イオンビーム照射系、２・・・電子線照射系、
３・・・アナライザ、５・・・電子銃、６・・・集束し
゛ンズ、７・・・対物レンズ絞り、８・・・走査コイル
、９・・・対物レンズ、１０・・・イオン照射系、１０
ａ・・・フィラメント、１０ｂ・・・アノード、１０Ｃ
・・・遮蔽箱、１０ｄ・・・電極、１０・ｅ・・・フォ
ーカス電極、１１・・・イオン銃、１２・・・偏向器。
第３図
第４図Figures 1 and 2 show two different arrangement examples of the arrangement of the ion beam irradiation system and electron beam irradiation system in a conventional ion and electron beam irradiation device, Figure 2 is a diagram explaining the shadow effect, and Figure 3 4 is a schematic configuration diagram of an embodiment of the ion electron beam irradiation device according to the present invention, FIG. FIG. 2 is a schematic configuration diagram of another implementation example of the ion electron beam irradiation device according to .゛、. 1... Ion beam irradiation system, 2... Electron beam irradiation system,
3... Analyzer, 5... Electron gun, 6... Focusing lens, 7... Objective lens aperture, 8... Scanning coil, 9... Objective lens, 10... Ion irradiation system , 10
a... Filament, 10b... Anode, 10C
... Shielding box, 10d... Electrode, 10, e... Focus electrode, 11... Ion gun, 12... Deflector. Figure 3 Figure 4
Claims (1)
子線照射源からの電子線の照射軸の少なくとも一部と同
軸で前記試料ｉこイオンビームを照射するイオンビーム
照射源とを備えたことを特徴とするイオン電子線照射装
置。an ion beam irradiation source that irradiates the sample surface with an electron beam; and an ion beam irradiation source that irradiates the sample i with an ion beam coaxially with at least a part of the electron beam irradiation axis from the electron beam irradiation source. An ion electron beam irradiation device characterized by:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19135182U JPS5997458U (en) | 1982-12-20 | 1982-12-20 | Ion electron beam irradiation device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19135182U JPS5997458U (en) | 1982-12-20 | 1982-12-20 | Ion electron beam irradiation device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5997458U true JPS5997458U (en) | 1984-07-02 |
| JPH0429439Y2 JPH0429439Y2 (en) | 1992-07-16 |
Family
ID=30412081
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19135182U Granted JPS5997458U (en) | 1982-12-20 | 1982-12-20 | Ion electron beam irradiation device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5997458U (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS515315A (en) * | 1974-07-04 | 1976-01-17 | Hiroshi Arima | Rensetsutairuno seizohoho |
| JPS52104290A (en) * | 1976-02-27 | 1977-09-01 | Shimadzu Corp | Composite analysis unit |
| JPS54117059U (en) * | 1978-02-03 | 1979-08-16 |
-
1982
- 1982-12-20 JP JP19135182U patent/JPS5997458U/en active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS515315A (en) * | 1974-07-04 | 1976-01-17 | Hiroshi Arima | Rensetsutairuno seizohoho |
| JPS52104290A (en) * | 1976-02-27 | 1977-09-01 | Shimadzu Corp | Composite analysis unit |
| JPS54117059U (en) * | 1978-02-03 | 1979-08-16 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0429439Y2 (en) | 1992-07-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS5871545A (en) | Variable forming beam electron optical system | |
| JPS58110956U (en) | Charged particle irradiation device | |
| JPS5997458U (en) | Ion electron beam irradiation device | |
| JPS6065967U (en) | scanning electron microscope | |
| JPS5971563U (en) | secondary electron detector | |
| JPS6037163U (en) | scanning electron microscope | |
| JPS58174857U (en) | Stereo scanning electron microscope | |
| JPS59125058U (en) | Secondary electron detection device in charged particle beam device | |
| JPS5957849U (en) | Sample exchange equipment for electron microscopes, etc. | |
| JPS59262U (en) | scanning electron microscope | |
| JPS60138253U (en) | electron beam equipment | |
| JPS59150155U (en) | scanning electron microscope | |
| JPS5894251U (en) | Charged particle beam application equipment | |
| JPS59177164U (en) | Scanning backscattered electron diffraction microscope device | |
| JPS59165658U (en) | scanning electron microscope | |
| JPS5917554U (en) | Ion irradiation device | |
| JPS6075954U (en) | electronic microscope | |
| JPS6130956U (en) | Electron beam irradiation device for reflection electron diffraction | |
| JPS5945849U (en) | ion implanter | |
| JPS63131060U (en) | ||
| JPS6339853U (en) | ||
| JPS5917556U (en) | Electron beam equipment equipped with an optical microscope | |
| JPS59139947U (en) | Charged particle beam application equipment | |
| JPS59152656U (en) | electronic microscope | |
| JPS5810368U (en) | electronic microscope |