JPS5990846A - 感放射線材料 - Google Patents

感放射線材料

Info

Publication number
JPS5990846A
JPS5990846A JP20073582A JP20073582A JPS5990846A JP S5990846 A JPS5990846 A JP S5990846A JP 20073582 A JP20073582 A JP 20073582A JP 20073582 A JP20073582 A JP 20073582A JP S5990846 A JPS5990846 A JP S5990846A
Authority
JP
Japan
Prior art keywords
group
radiation
film
sensitivity
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP20073582A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0377985B2 (oth
Inventor
Yuji Shin
新　祐治
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP20073582A priority Critical patent/JPS5990846A/ja
Publication of JPS5990846A publication Critical patent/JPS5990846A/ja
Publication of JPH0377985B2 publication Critical patent/JPH0377985B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
JP20073582A 1982-11-16 1982-11-16 感放射線材料 Granted JPS5990846A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20073582A JPS5990846A (ja) 1982-11-16 1982-11-16 感放射線材料

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20073582A JPS5990846A (ja) 1982-11-16 1982-11-16 感放射線材料

Publications (2)

Publication Number Publication Date
JPS5990846A true JPS5990846A (ja) 1984-05-25
JPH0377985B2 JPH0377985B2 (oth) 1991-12-12

Family

ID=16429302

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20073582A Granted JPS5990846A (ja) 1982-11-16 1982-11-16 感放射線材料

Country Status (1)

Country Link
JP (1) JPS5990846A (oth)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63115838A (ja) * 1986-11-04 1988-05-20 Toyobo Co Ltd 新規な重合性ハロゲン化合物
WO1997018179A1 (en) * 1995-11-14 1997-05-22 Massachusetts Institute Of Technology Replacement solvents for use in chemical synthesis
JP2009167430A (ja) * 2009-05-07 2009-07-30 Nippon Steel Chem Co Ltd 芳香族オリゴマ―とその製造方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56165141A (en) * 1980-05-26 1981-12-18 Univ Tohoku Resist material composition for working integrated circuit
JPS5842040A (ja) * 1981-08-28 1983-03-11 ヘキスト・アクチエンゲゼルシヤフト 放射線重合可能な混合物及び該混合物から製造された光重合可能な複写材料
JPS6260691A (ja) * 1985-09-11 1987-03-17 Ricoh Co Ltd 転写型感熱記録媒体

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56165141A (en) * 1980-05-26 1981-12-18 Univ Tohoku Resist material composition for working integrated circuit
JPS5842040A (ja) * 1981-08-28 1983-03-11 ヘキスト・アクチエンゲゼルシヤフト 放射線重合可能な混合物及び該混合物から製造された光重合可能な複写材料
JPS6260691A (ja) * 1985-09-11 1987-03-17 Ricoh Co Ltd 転写型感熱記録媒体

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63115838A (ja) * 1986-11-04 1988-05-20 Toyobo Co Ltd 新規な重合性ハロゲン化合物
WO1997018179A1 (en) * 1995-11-14 1997-05-22 Massachusetts Institute Of Technology Replacement solvents for use in chemical synthesis
US6231783B1 (en) 1995-11-14 2001-05-15 Massachusetts Institute Of Technology Replacement solvents for use in chemical synthesis
JP2009167430A (ja) * 2009-05-07 2009-07-30 Nippon Steel Chem Co Ltd 芳香族オリゴマ―とその製造方法

Also Published As

Publication number Publication date
JPH0377985B2 (oth) 1991-12-12

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