JPS5990216A - Winding type thin-film magnetic head and its manufacture - Google Patents

Winding type thin-film magnetic head and its manufacture

Info

Publication number
JPS5990216A
JPS5990216A JP19781082A JP19781082A JPS5990216A JP S5990216 A JPS5990216 A JP S5990216A JP 19781082 A JP19781082 A JP 19781082A JP 19781082 A JP19781082 A JP 19781082A JP S5990216 A JPS5990216 A JP S5990216A
Authority
JP
Japan
Prior art keywords
magnetic
thin film
winding
magnetic thin
pole piece
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP19781082A
Other languages
Japanese (ja)
Other versions
JPH0232686B2 (en
Inventor
Kazuhiro Saito
斎藤 和宏
Kazuo Oki
大木 和雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eneos Corp
Original Assignee
Nippon Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Mining Co Ltd filed Critical Nippon Mining Co Ltd
Priority to JP19781082A priority Critical patent/JPS5990216A/en
Publication of JPS5990216A publication Critical patent/JPS5990216A/en
Publication of JPH0232686B2 publication Critical patent/JPH0232686B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3176Structure of heads comprising at least in the transducing gap regions two magnetic thin films disposed respectively at both sides of the gaps
    • G11B5/3179Structure of heads comprising at least in the transducing gap regions two magnetic thin films disposed respectively at both sides of the gaps the films being mainly disposed in parallel planes
    • G11B5/3186Structure of heads comprising at least in the transducing gap regions two magnetic thin films disposed respectively at both sides of the gaps the films being mainly disposed in parallel planes parallel to the gap plane, e.g. "vertical head structure"
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/17Construction or disposition of windings
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3103Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3109Details
    • G11B5/3116Shaping of layers, poles or gaps for improving the form of the electrical signal transduced, e.g. for shielding, contour effect, equalizing, side flux fringing, cross talk reduction between heads or between heads and information tracks

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Magnetic Heads (AREA)

Abstract

PURPOSE:To obtain a thin-film head which has an improved reproduction output, etc., by providing a groove for winding to at least either of a couple of nonmagnetic substrates, forming a magnetic thin film which increases in width from a pole piece part to a winding part, and beveling the edge of the magnetic film and the edge of the groove part. CONSTITUTION:A hollow part 11 and the groove 10 for the winding are formed in at least either of nonmagnetic substrates 2 and 2', i.e. substrate 2 and magnetic thin films 4 and 4' are formed on the opposite surfaces of the substrates 2 and 2' so that the width W increases from pole piece parts 13 and 13' to the winding part and the width W' of the winding part is >=5 times as large as the width W of the pole piece part 13. Further, the edge 4a of the film 4 of the winding part and the edge 10b of the groove 10 are beveled; the winding 8 contacts with the wall of the groove 10 and the film 4, the inductance of the winding 8 is minimized, and the generation of a noise at the edge parts is prevented. Thus, the winding 8 is turned many times easily to obtain the head which has the improved reproduction output and superior wear resistance, mechanical strength, high frequency characteristics, etc.

Description

【発明の詳細な説明】 本発明は磁性薄膜を用いた磁気記録再生装置用薄膜磁気
ヘツドに関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a thin film magnetic head for a magnetic recording/reproducing device using a magnetic thin film.

従来、薄膜磁気ヘツドとしては種々のタイプのものが提
案されており、その一つに集積型ヘツドと呼ばれるもの
がある。該集積型ヘツドは周知の集積回路製造技術、即
ち、薄膜形成技術とフオトリソグラフイー等のパターニ
ング技術を利用して製造される薄膜磁気ヘツドであつて
、 (1)小型化、狭トラツク化及び多トラツク化が容易で
ある。
Conventionally, various types of thin film magnetic heads have been proposed, one of which is called an integrated type head. The integrated head is a thin film magnetic head manufactured using well-known integrated circuit manufacturing technology, that is, thin film forming technology and patterning technology such as photolithography, and has the following features: Easy to track.

(2)特性の均一性、量産性に富む。(2) Uniformity of characteristics and ease of mass production.

(3)高速スイツチング特性を持ち、少なくとも60M
Hz迄の使用が可能である。
(3) Has high-speed switching characteristics, at least 60M
Usable up to Hz.

(4)多トラツク構成にした場合に隣接する磁芯(コア
)間の磁気的結合によるクロストークが少ない。
(4) In the case of a multi-track configuration, there is less crosstalk due to magnetic coupling between adjacent magnetic cores.

等々の長所を有している。一方、このような集積型の薄
膜磁気ヘツドは、その構成要素である磁芯に対応する磁
性体層、コイルに対応する導体層、及びギヤツブ部スペ
ーサ等を蒸着、電着及びマスキング工程といつた種々の
複雑1な工程を利用して形成することを必要とするとい
う欠点があつた。
It has the following advantages. On the other hand, such an integrated thin-film magnetic head requires a process of vapor deposition, electrodeposition, and masking to form its components, such as a magnetic layer corresponding to the magnetic core, a conductor layer corresponding to the coil, and a gear part spacer. It has the disadvantage that it requires the use of various complicated processes.

特に、巻線形成、即ち、導体層の形成は磁性体層の上下
で切れ目なく行なう必要があり且つ導体層以外との絶縁
を保持する必要があり、コイル巻数を増加するのが極め
て困難であつた。コイル巻数の増大は製造工程を極めて
困難ものとし、歩留りを著しく低下せしめる一因となつ
た。従つて、薄膜磁気ヘツドの製造工程を簡素化するべ
くコイル巻数を減らすと記録電流を大きくしなければな
らず、各導体層間及び導体層と導体層以外の部分との間
の絶縁を保持することが困難となる。このように記録電
流の増大には限界があるために再生出力は当然に小さい
ものとなり、読み出し回路に昇圧トランスを設けること
が必要となり、磁気記録再生装置の小型化、軽量化、低
廉化にとつては好ましいことではない。
In particular, the winding formation, that is, the formation of the conductor layer, must be performed seamlessly above and below the magnetic layer, and it is necessary to maintain insulation from other layers than the conductor layer, making it extremely difficult to increase the number of coil turns. Ta. The increase in the number of turns of the coil makes the manufacturing process extremely difficult and is one of the causes of a significant decrease in yield. Therefore, if the number of coil turns is reduced in order to simplify the manufacturing process of a thin-film magnetic head, the recording current must be increased, and it is necessary to maintain insulation between each conductor layer and between a conductor layer and a portion other than the conductor layer. becomes difficult. Since there is a limit to the increase in recording current, the playback output naturally becomes small, and it becomes necessary to provide a step-up transformer in the readout circuit, which leads to miniaturization, weight reduction, and cost reduction of magnetic recording and playback devices. That's not a good thing.

上記の如き、集積型ヘツドと呼ばれる薄膜磁気ヘツドの
磁気回路としてのコイルの効率は通常のバルクヘツド型
のコイルの1/10程度しかない。
As mentioned above, the efficiency of the coil as a magnetic circuit in a thin film magnetic head called an integrated head is only about 1/10 that of a normal bulkhead type coil.

斯る集積型ヘツドの欠点を解決するべく、特開昭56−
19514号には第1図に図示されるように、1対の非
磁性基板2、2′と、該基板上の対向する面上に設けら
れた磁性薄膜4、4′と、該二つの磁性薄膜を突き合せ
て形成される作動空隙部を埋める非磁性スペーサ膜6と
を有し、磁性薄膜4をバルクヘツドと同様の連続する導
線8で囲むようにしてコイル巻線を構成した、所謂巻線
型薄膜磁気ヘツド1aが提案された、斯る巻線型薄膜磁
気ヘツドは従来の集積型磁気ヘツドの長所を有すると共
に、集積型磁気ヘツドの一つの欠点であつたコイル巻数
の増大を容易とし、ひいては磁気ヘツドの記録磁界及び
出生出力の大幅な改善を可能とした。
In order to solve the drawbacks of such an integrated head, Japanese Patent Application Laid-Open No. 1986-
No. 19514, as shown in FIG. This is a so-called wire-wound type thin film magnetism, which has a non-magnetic spacer film 6 that fills the operating gap formed by butting the thin films together, and the coil winding is constructed by surrounding the magnetic thin film 4 with a continuous conducting wire 8 similar to a bulkhead. The wire-wound thin film magnetic head of which head 1a was proposed has the advantages of conventional integrated magnetic heads, and also makes it easier to increase the number of coil turns, which was one of the disadvantages of integrated magnetic heads. This enabled significant improvements in recording magnetic field and output.

本発明は上記巻線型薄膜磁気ヘツドの改良に関するもの
である。巻線3型薄膜磁気ヘツドは、本来3次元的であ
るコイルを薄膜という2次元で構成しようとした集積型
薄膜磁気ヘツドの欠点を解決するべく、磁性体コア部は
薄膜で形成し、巻線は従来のバルクヘツドと同様の連続
した導線により行なうように構成するものであるが、従
来の巻線型薄膜磁気ヘツドにおいては巻線自体のインダ
クタンスを極力低減せしめる点において不十分であつた
。又、狭トラツク化に応じて磁気ヘツドを構成した場合
に磁気ヘツドの機械的強度及び耐摩耗性の点において不
十分なものであつた。
The present invention relates to an improvement of the above-mentioned wire-wound thin film magnetic head. The wire-wound 3-type thin film magnetic head solves the drawbacks of the integrated thin film magnetic head, which attempts to construct the originally three-dimensional coil with a two-dimensional thin film.The magnetic core is made of a thin film, and the winding This is constructed using a continuous conductive wire similar to the conventional bulkhead, but the conventional wire-wound thin film magnetic head has been insufficient in reducing the inductance of the winding itself as much as possible. Furthermore, when a magnetic head is configured to accommodate narrower tracks, the mechanical strength and abrasion resistance of the magnetic head are insufficient.

従つて、本発明の主たる目的は、集積型薄膜磁気ヘツド
の長所を保持し且つ巻線自体のインダクタンスを極力低
減せしめた巻線型薄膜磁気ヘツドを提供することである
。更に詳しく言えば、本発明の目的は巻線の効率が良く
、もし従来の薄膜磁気ヘツドと同じ値のインダクタンス
に抑えた場合にもコイル巻数を増して再生出力を向上す
ることができ、特に薄膜磁気ヘツドの最大の利点である
高周波特性の良さを保持することのできる巻線型薄膜磁
気ヘツドを提供することである。
Accordingly, a principal object of the present invention is to provide a wire-wound thin film magnetic head that retains the advantages of an integrated thin film magnetic head while minimizing the inductance of the winding itself. More specifically, the purpose of the present invention is to improve the efficiency of the winding, so that even if the inductance is kept to the same value as a conventional thin film magnetic head, the number of coil turns can be increased to improve the reproduction output. An object of the present invention is to provide a wire-wound thin film magnetic head that can maintain good high frequency characteristics, which is the greatest advantage of magnetic heads.

本発明の他の目的は磁性薄膜(磁性体層)に飽和磁化の
高い金属強磁性体を用いることにより高保磁力の記録媒
体にも記録することのできる巻線型薄膜磁気ヘツドを提
供することである。
Another object of the present invention is to provide a wire-wound thin film magnetic head that can record even on recording media with high coercive force by using a metal ferromagnetic material with high saturation magnetization for the magnetic thin film (magnetic layer). .

本発明の目的は十分な機械的強度及び耐摩耗性を有し、
狭トラツク用ヘツドとしても好適に使用することのでき
る巻線型薄膜磁気ヘツドを提供することである。
The purpose of the present invention is to have sufficient mechanical strength and wear resistance,
It is an object of the present invention to provide a wire-wound thin film magnetic head which can be suitably used as a head for narrow tracks.

本発明の更に他の目的は上記諸々の特徴を有した巻線型
薄膜磁気ヘツドを極めて迅速に、正確に、容易に月つ大
量に製造することのできる巻線型薄膜磁気ヘツドの製造
方法を提供することである。
Still another object of the present invention is to provide a method for manufacturing a wire-wound thin film magnetic head that can extremely quickly, accurately, and easily manufacture wire-wound thin film magnetic heads in large quantities on a monthly basis. That's true.

次に、本発明に係る巻線型薄膜磁気ヘツドを図面に例示
した実施態様に則して詳しく説明する。
Next, the wire-wound thin film magnetic head according to the present invention will be described in detail with reference to embodiments illustrated in the drawings.

本発明に係る巻線型薄膜磁気ヘツド1は、第2図及び第
3図を参照すると理解されるように、対向配置された1
対の非磁性基板2、2′を有する。
The wire-wound thin film magnetic head 1 according to the present invention has two magnetic heads arranged opposite to each other, as understood with reference to FIGS. 2 and 3.
It has a pair of non-magnetic substrates 2, 2'.

該基板2、2′の対向する面上には磁性体層、即ち、磁
性薄膜4、4′が形成され、該磁性薄膜4、4′が密接
するように両基板2、2′は突き合わせて一体に結合さ
れている。基板2、2′の中の少なくとも一方の基板に
は、本実施態様では基板2には溝10、10aが形成さ
れているため、両磁性薄膜4、4′の接合部に空所11
が形成される。
Magnetic layers, that is, magnetic thin films 4, 4' are formed on opposing surfaces of the substrates 2, 2', and the substrates 2, 2' are butted against each other so that the magnetic thin films 4, 4' are in close contact with each other. are combined together. In this embodiment, grooves 10 and 10a are formed in at least one of the substrates 2 and 2', so that a space 11 is formed at the junction of both magnetic thin films 4 and 4'.
is formed.

又、該薄膜磁気ヘツド1が磁気テープの如き記録媒体(
図示せず)に接触する作動面、つまり摺動面12には、
記録再生時に記録媒体との磁束のやりとりを行なうポー
ルピース部13、13′があり、その幅は所定の記録ト
ラツク幅に一致している。両磁性薄膜4、4′の間には
、所定のギヤツプを形成せしめるためのスペーサ膜6が
介設されている。更に、基板2の溝10、10aには該
基板2上の磁性薄膜4を囲むようにして巻線8が巻回さ
れる。
Further, the thin film magnetic head 1 is connected to a recording medium such as a magnetic tape (
The operating surface (not shown), that is, the sliding surface 12, has a
There are pole piece portions 13, 13' for exchanging magnetic flux with the recording medium during recording and reproduction, the width of which corresponds to the predetermined recording track width. A spacer film 6 is interposed between the two magnetic thin films 4, 4' to form a predetermined gap. Furthermore, a winding 8 is wound in the grooves 10 and 10a of the substrate 2 so as to surround the magnetic thin film 4 on the substrate 2.

本発明においては、磁性薄膜4、4′は基板2、2′の
面上に一定幅にて形成されておらず、巻線8が施された
巻線部、即ち、空所11又は溝10a領域から摺動面1
2、つまりポールピース部13、13′へとその幅(W
)が漸次減少するように(磁性薄膜の最大幅W′からポ
ールピース部の幅wへと減少して)構成される。第3図
及び第4図を参照して更に詳しく説明すれば、磁性薄膜
4、4′は次の式を満足するように形成される。
In the present invention, the magnetic thin films 4, 4' are not formed with a constant width on the surfaces of the substrates 2, 2', but are formed in the winding portion where the winding 8 is applied, that is, the void 11 or the groove 10a. From area to sliding surface 1
2, that is, the width (W
) is configured to gradually decrease (from the maximum width W' of the magnetic thin film to the width W of the pole piece portion). To explain in more detail with reference to FIGS. 3 and 4, the magnetic thin films 4, 4' are formed to satisfy the following equation.

g/w<G/W(好ましくはW′≧5w)w:薄膜ヘツ
ドのポールピース部に於る両磁性薄膜の幅 g:薄膜ヘツドのポールピース部に於る両磁性薄膜間の
ギヤツプ W:薄膜ヘツドのポールピース部後方から巻線部に至る
部分(巻線部をも含む)に於る両磁性薄膜の幅 G:前記磁性膜幅(W)の位置に於る両磁性薄膜間のギ
ヤツプ 更に、好ましい一実施例を具体的数値にて示せば次の通
りである。
g/w<G/W (preferably W'≧5w) w: Width of both magnetic thin films at the pole piece part of the thin film head g: Gap W between both magnetic thin films at the pole piece part of the thin film head: Width G of both magnetic thin films in the portion from the rear of the pole piece part of the thin film head to the winding part (including the winding part): Gap between both magnetic thin films at the position of the magnetic film width (W) Further, a preferred embodiment is shown below using specific numerical values.

g=0.2〜0.4μm w=5〜20μm G′(Gの最大値)=0.1〜0.2mmW′(Wの最
大値)=0.1〜0.2mmL=10〜50μm ここで、寸法(L)は、ポールピース部13、13′の
幅(w)で一様に形成された磁性薄膜部分の長さを示す
ものであつて、磁気薄膜ヘツド先端部の摩耗代を提供す
る。
g = 0.2 to 0.4 μm w = 5 to 20 μm G' (maximum value of G) = 0.1 to 0.2 mm W' (maximum value of W) = 0.1 to 0.2 mm L = 10 to 50 μm Here The dimension (L) indicates the length of the magnetic thin film portion uniformly formed with the width (w) of the pole piece portions 13, 13', and provides a wear allowance for the tip of the magnetic thin film head. do.

本発明に係る薄膜磁気ヘツドは上述のように磁性薄膜の
幅をポールピース部から巻線部にかけて膜幅を増大させ
るために記録時の巻線への電流供給を低減できるという
作用効果を有すると共に、磁気ヘツドのリアーギヤツプ
部、即ち、巻線部からヘツドの後端部14に至る領域の
磁性薄膜の幅が広いために該リアーギヤツプ部の磁気抵
抗を極めて低く抑えることができヘツド効率を向上する
ことができる。
As described above, the thin film magnetic head according to the present invention has the effect that the width of the magnetic thin film is increased from the pole piece part to the winding part, so that the current supply to the winding wire during recording can be reduced. Since the width of the magnetic thin film in the rear gap portion of the magnetic head, that is, the region from the winding portion to the rear end portion 14 of the head is wide, the magnetic resistance of the rear gap portion can be suppressed to an extremely low level, thereby improving head efficiency. I can do it.

又、本発明のヘツド1は、巻線部及び該巻線部よりヘツ
ド後端部14へと至る領域の磁性薄膜の幅Wは記録トラ
ツクの幅、即ち、ポールピース部12の磁性薄膜の幅w
より広く構成されるために、例えば20μm以下という
狭トラツクヘツドに使用された場合にも巻線を容易にし
且つヘツドの機械的強度も十分大きく維持することがで
きるという利点を有する。
Further, in the head 1 of the present invention, the width W of the magnetic thin film in the winding portion and the region extending from the winding portion to the rear end portion 14 of the head is equal to the width of the recording track, that is, the width of the magnetic thin film of the pole piece portion 12. lol
Due to its wider configuration, it has the advantage that even when used in a narrow track head of, for example, 20 μm or less, winding can be facilitated and the mechanical strength of the head can be maintained sufficiently high.

更に、磁性薄膜4、4′の膜厚tは例えば3μm以上の
或る値にて一様に形成されるが、ポールピース部12か
らヘツド後端部14に向つて漸次増大するように、例え
ばポールピース部では3μm、リアーギヤツプ部では1
0μmとなるように構成することもできる。このような
構成によると磁気抵抗がポールピース部12に集中し易
くなり、ヘツド効率を増大することができる。
Furthermore, the film thickness t of the magnetic thin films 4, 4' is uniformly formed to a certain value, for example, 3 μm or more, but it is formed so that it gradually increases from the pole piece part 12 toward the rear end part 14 of the head, for example. 3μm in the pole piece part, 1μm in the rear gap part
It can also be configured to have a thickness of 0 μm. With such a configuration, magnetic resistance tends to concentrate on the pole piece portion 12, and head efficiency can be increased.

又、本発明に係る薄膜磁気ヘツドにおいては、巻線部に
おいて巻線8が十分に磁性薄膜4に密着し且つ巻数当り
の導線長さを小さくするために巻線8が折れ曲がる磁性
薄膜4、及び好ましくは基板2の溝10の角部4a及び
10bには面取り加工が施される。斯る面取り加工によ
り巻線自体のインダクタンスを最小限に抑えることがで
き、又インダクタンスを或る値に設定した場合には従来
の薄膜磁気ヘツドに比較しコイルの巻数を増して、再生
出力を向上することができ、特に良好な高周波特性を維
持することができる。又、巻線部の磁性薄膜4の鋭利な
エツジ部を面取り加工によりなくすことにより、高周波
動作時にノイズ源となる該エツジ部に生じる微少磁区構
造の発生をなくするか又はその発生をし難くすることが
できる。
Further, in the thin film magnetic head according to the present invention, the magnetic thin film 4 has the winding wire 8 bent in order to sufficiently adhere to the magnetic thin film 4 in the winding portion and reduce the length of the conducting wire per number of turns; Preferably, the corners 4a and 10b of the groove 10 of the substrate 2 are chamfered. This chamfering process allows the inductance of the winding itself to be minimized, and when the inductance is set to a certain value, the number of turns in the coil can be increased compared to conventional thin film magnetic heads, improving the reproduction output. In particular, good high frequency characteristics can be maintained. In addition, by chamfering the sharp edges of the magnetic thin film 4 in the winding section, the generation of a minute magnetic domain structure at the edge, which becomes a noise source during high frequency operation, is eliminated or made difficult to occur. be able to.

面取り加工の程度は所望に応じ任意に選ぶことができる
が、導線の直径をdとすると、(1/2d)R又は(1
/2d)Cにて行なうのが好適である。
The degree of chamfering can be selected as desired, but if the diameter of the conductor is d, then (1/2d)R or (1
/2d) It is preferable to carry out at C.

上記説明において、ポールピース部13、13′は摺動
面12の幅の大略中央部に位置するものとして説明した
が、第5図及び第6図に図示されるように、所望に応じ
摺動面12の一方側に片寄らせて構成することも可能で
ある。
In the above description, the pole piece parts 13 and 13' were explained as being located approximately at the center of the width of the sliding surface 12, but as shown in FIGS. It is also possible to configure it so that it is offset to one side of the surface 12.

次に、本発明に係る巻線型薄膜磁気ヘツドの製造方法に
ついて説明する。
Next, a method of manufacturing a wire-wound thin film magnetic head according to the present invention will be explained.

第7図は本発明に係る薄膜磁気ヘツドの製造方法の一実
施例を示す。(a)工程において、1対の非磁性基板2
及び2′が提供される。基板2には溝10aが形成され
る。該溝10aの両側壁10′a、10″aの中、少な
くとも将来ポールピース部を形成する端部に隣接した方
の側壁、本実施例においては側壁10′aは端部に向つ
て傾斜した傾斜側壁とされる。該基板2、2′は非磁性
体物質、例えばセラミツク又はガラスにて作製される。
FIG. 7 shows an embodiment of the method for manufacturing a thin film magnetic head according to the present invention. (a) In the step, a pair of non-magnetic substrates 2
and 2' are provided. A groove 10a is formed in the substrate 2. Among both side walls 10'a and 10''a of the groove 10a, at least the side wall adjacent to the end that will form the pole piece portion in the future, in this embodiment, the side wall 10'a is inclined toward the end. The substrates 2, 2' are made of a non-magnetic material, for example ceramic or glass.

(b)工程にて、該基板2、2′には蒸着、電着又はス
パツタリング等によつて磁性薄膜4、4′が全面に形成
される。磁性薄膜の材料としては例えばパーマロイ、F
e−Si−Ai合金(センダスト)、Co基アモルフア
ス等の金属強磁性体が好適である。(c)工程において
基板2に形成された溝10aの傾斜側壁10′a上に設
けられた磁性薄膜部に該傾斜部を補完するような態様で
ガラス、銀ろう又は樹脂等から成る接着剤5が配設され
る。
In step (b), magnetic thin films 4, 4' are formed on the entire surface of the substrates 2, 2' by vapor deposition, electrodeposition, sputtering, or the like. Examples of magnetic thin film materials include permalloy and F.
Metal ferromagnetic materials such as e-Si-Ai alloy (Sendust) and Co-based amorphous are suitable. (c) Adhesive 5 made of glass, silver solder, resin, etc. is applied to the magnetic thin film portion provided on the sloped side wall 10'a of the groove 10a formed in the substrate 2 in the step in a manner that complements the sloped portion. will be placed.

該接着剤5は磁気ヘツドのポールピース部から巻線部に
至る領域を補強する働きをもなす。次で基板2及び2′
上の磁性薄膜4、4′及び接着剤5の面は均一な平面を
提供するべく研摩される。次に、(d)工程において、
磁性薄膜4又は4′の中の一方の磁性薄膜の、本実施態
様では溝付基板2に設けられた磁性薄膜4のポールピー
ス部となるべき部分に、非磁性のスペーサ膜6が蒸着、
電着又はスパツタリング等によつて形成される。該スペ
ーサ膜の材料としてはアルミナ等が好適である。
The adhesive 5 also serves to reinforce the area from the pole piece to the winding of the magnetic head. Next, substrates 2 and 2'
The surfaces of the upper magnetic films 4, 4' and adhesive 5 are polished to provide a uniform plane. Next, in step (d),
A non-magnetic spacer film 6 is deposited on a portion of one of the magnetic thin films 4 or 4', which in this embodiment is to become a pole piece portion of the magnetic thin film 4 provided on the grooved substrate 2.
It is formed by electrodeposition, sputtering, etc. Alumina or the like is suitable as the material for the spacer film.

(e)工程において、基板2、2′は磁性薄膜4、4′
が対面するようにして突き合わせられ、そして周知の接
着剤、例えばガラス、銀ろう又は樹脂等を用いて一体的
に接合される。接合されて形成されたヘツドブロツク1
Aは(f)工程にて、ポールピース部となるべき面、つ
まり摺動面を横切つて、つまり磁性薄膜4、4′に対し
直交する方向に溝20が等間隔にて形成される。第8図
を参照するとより明確に理解されるように、各溝20の
形状は各隣接する溝20によつて磁性薄膜4及び4′の
ポールピース部となる部分に幅w、長さLの磁性薄膜を
形成するようなものとされる。又溝20の最先端部の深
さT′は、第7図(c)に図示される接着剤配設深さT
と同じか又はわずかに小さくされる。このようにして形
成された各溝20には次で非磁性体の例えばガラス、銀
ろう又は樹脂のような保護材22が充填される。保護材
が充填されたヘツドブロツク1Aは、次工程(f)にて
該ポールピース部となる保護材充填部が研摩され、テー
プの如き記録媒体と接触する摺動面12が創成される。
In the step (e), the substrates 2, 2' are coated with magnetic thin films 4, 4'.
are butted together so as to face each other, and are integrally joined using a well-known adhesive such as glass, silver solder, or resin. Head block 1 formed by joining
In step (f), grooves 20 are formed at equal intervals across the surface to become the pole piece portion, that is, the sliding surface, that is, in the direction perpendicular to the magnetic thin films 4, 4'. As can be more clearly understood with reference to FIG. 8, the shape of each groove 20 has a width W and a length L in the portion that becomes the pole piece portion of the magnetic thin films 4 and 4' by each adjacent groove 20. It is said to form a magnetic thin film. The depth T' of the leading edge of the groove 20 is equal to the adhesive placement depth T shown in FIG. 7(c).
be the same as or slightly smaller. Each groove 20 thus formed is then filled with a protective material 22 made of a non-magnetic material, such as glass, silver solder, or resin. In the next step (f), the protective material-filled portion of the head block 1A filled with the protective material, which becomes the pole piece portion, is polished to create a sliding surface 12 that comes into contact with a recording medium such as a tape.

次で、摺動面側より磁性薄膜4、4′に平行に巻線用の
溝10を穿設し、その後各溝20の中心位置を通る切断
線A−A′に沿つてスライスされ、幅(W′)の磁気ヘ
ツドチツプが切り出される。このようにして作製された
磁気ヘツドチツプは、(h)工程にて巻線が施される部
分の各鋭角縁部の面取り加工(4a、10b)が行なわ
れる。次で、斯る磁気ヘツドチツプには、周知の方法で
基板2に設けもられた溝10の中に磁性膜4を囲むよう
にして巻線が施され、第2図に図示するような巻線型薄
膜磁気ヘツド1が作製される。巻線として使用される導
線の直径は0.01〜0.1mmが好適である。
Next, grooves 10 for winding are bored parallel to the magnetic thin films 4, 4' from the sliding surface side, and then sliced along the cutting line A-A' passing through the center position of each groove 20. A magnetic head chip (W') is cut out. In the step (h) of the magnetic head chip thus produced, each acute edge of the portion where the winding is to be applied is chamfered (4a, 10b). Next, such a magnetic head chip is wound with a wire so as to surround the magnetic film 4 in the groove 10 provided in the substrate 2 by a well-known method, and a wire-wound thin film magnetic film as shown in FIG. 2 is formed. Head 1 is produced. The diameter of the conducting wire used as the winding wire is preferably 0.01 to 0.1 mm.

上記製造方法においては、磁性薄膜4をポールピース部
12から巻線部の方へと漸次増大する形状とするために
、ヘツドブロツク1Aを形成した後、前記式w/g9<
W/Gを満足するような概略半円状の溝20を穿設する
ことによつて行なつたが他の方法にても可能である。例
えば第9図に図示するように、基板2、2′に磁性薄膜
4、4′がパターニング技術を用いて所定の形状、即ち
、磁性薄膜4、4′をポールピース部12から巻線部の
方へと漸次増大する、前記式w/g<W/Gを満足する
形状にて形成せしめ、空隙部2a及び2′aには例えば
ガラス、銀ろう又は樹脂のような充填材を充填するよう
に構成することもできる。その後、磁性薄膜4、4′の
いずれか一方の磁性薄膜のポールピース部12に相当す
る部分にスペーサ膜を設け、次で両基板2、2′を磁性
薄膜4、4′が対面するようにして突き合わせ、ガラス
、銀ろう又は樹脂のような接着剤を用いて一体的に接合
し、直ちに摺動面を研摩加工によつて創成し、引き続き
前記実施態様と同様に磁気ヘツドチツプを切り出し、薄
膜磁気ヘツドを作製することができる。
In the above manufacturing method, in order to form the magnetic thin film 4 into a shape that gradually increases from the pole piece part 12 toward the winding part, after forming the head block 1A, the above formula w/g9<
Although this was done by drilling a roughly semicircular groove 20 that satisfies W/G, other methods are also possible. For example, as shown in FIG. 9, the magnetic thin films 4, 4' are formed on the substrates 2, 2' into a predetermined shape using patterning technology, that is, the magnetic thin films 4, 4' are formed from the pole piece part 12 to the winding part. The voids 2a and 2'a are filled with a filler such as glass, silver solder, or resin. It can also be configured as After that, a spacer film is provided on the portion corresponding to the pole piece part 12 of one of the magnetic thin films 4, 4', and then both substrates 2, 2' are arranged so that the magnetic thin films 4, 4' face each other. They are butted together and integrally joined using an adhesive such as glass, silver solder, or resin, and a sliding surface is immediately created by polishing.Subsequently, a magnetic head chip is cut out in the same manner as in the previous embodiment, and a thin film magnetic Heads can be made.

上記説明においては、基板2にのみ溝10が設けられ、
そして巻線が施されたが、第10図に図示されるように
、他方の基板2′にも溝10′を形成し、巻線を施すこ
とができる。
In the above description, the groove 10 is provided only in the substrate 2,
Then, winding was applied, but as shown in FIG. 10, grooves 10' can also be formed in the other substrate 2', and winding can be applied.

東に、第11図に図示されるように、基板2′も基板2
と同じ形状に形成し、両溝部10及び10′に巻線を施
すことができる。第10図及び第11図に例示される薄
膜磁気ヘツドも前記した製造方法によつて同様に製造し
得ることが理解されるであろう。
To the east, as shown in FIG.
The grooves 10 and 10' can be formed to have the same shape and windings can be applied to both grooves 10 and 10'. It will be understood that the thin film magnetic head illustrated in FIGS. 10 and 11 can be similarly manufactured by the manufacturing method described above.

更に又、本発明に係る磁気ヘツドは第12図〜第14図
のように溝10及び10′は磁性薄膜4、4′に対し直
交するように形成することも可能である。更には、第1
5図及び第16図に示すように溝10、10′の代わり
に、切欠き10″を形成し摺動面12が細くなつた、所
謂凸形ヘツドに形成することもできる。
Furthermore, in the magnetic head according to the present invention, the grooves 10 and 10' can be formed so as to be perpendicular to the magnetic thin films 4 and 4', as shown in FIGS. 12 to 14. Furthermore, the first
As shown in FIGS. 5 and 16, instead of the grooves 10, 10', a so-called convex head may be formed in which a notch 10'' is formed and the sliding surface 12 becomes narrower.

本発明は以上の如くに構成されるために、巻線効率を向
上せしめ、再生出力を増大し得るという効果を達成する
ことができる。更に又、本発明に係る薄膜磁気ヘツドは
狭トラツク用ヘツドとして使用することができ、しかも
機械的強度及びポールピース部の耐摩耗性を大幅に改善
することができる。
Since the present invention is configured as described above, it is possible to achieve the effects of improving winding efficiency and increasing reproduction output. Furthermore, the thin film magnetic head according to the present invention can be used as a narrow track head, and the mechanical strength and wear resistance of the pole piece portion can be greatly improved.

又、本発明に係る製造方法に従えば、巻線型薄膜磁気ヘ
ツドを大量に且つ迅速に製造することができる。
Further, according to the manufacturing method according to the present invention, wire-wound thin film magnetic heads can be manufactured in large quantities and quickly.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来の巻線型薄膜磁気ヘツドの斜視図である。 第2図は本発明に係る巻線型薄膜磁気ヘツドの斜視図で
ある。 第3図は第2図の薄膜磁気ヘツドの分解斜視図で、ギヤ
ツプスペーサ膜及び巻線は省略されている。 第4図は第2図の薄膜磁気ヘツドの部分詳細縦断面図で
ある。 第5図は本発明に係る巻線型薄膜磁気ヘツドの他の実施
態様を示す斜視図である。 第6図は第5図の薄膜磁気ヘツドの分解斜視図で、ギヤ
ツプスペーサ膜及び巻線は省略されている。 第7図(a)〜(h)は本発明に係る巻線型薄膜磁気ヘ
ツドの製造工程を示す斜視図である。 第8図は第7図(f)の線VIII〜VIIIに沿つて
取つた断面詳細図である。 第9図は本発明に係る巻線型薄膜磁気ヘツドの他の態様
の製造方法を説明する斜視図である。 第10図から第16図は本発明に係る巻線型薄膜磁気ヘ
ツドの他の実施態様を示す斜視図である。 1:巻線型薄膜磁気ヘツド 2、2′:非磁性基板 4、4′:磁性薄膜 4a、10b:面取り部 6:ギヤツプスペーサ膜 8、8′:巻線 10、10′、10a:溝 10″:切欠き 12:摺動面 13、13′:ポールピース部 代理人の氏名  倉 内 基 弘 同       倉 橋   暎 手 続 袖 tl、i  −r’:C方式)昭和58年
 3ノ]241」 特i’i’l庁投官 若 杉 和 天 殿事件の表示 
 昭和57年  特願第 197810号発明の名称 
 巻線型薄膜6・、よ気ヘツド及びその製造方法補正を
する省 事件との関係          特許出願人名称 1
」本鉱業林式会社 代理人 電話273−6436布 間                        
           −住 所          
 同     」−氏 名  (7563)  弁理士
 倉  橋    暎(・2.蕪、ヲ浦正命令通知のに
1付  昭和58年2月22日−“−補iHモ吐−り1
曽加→=本発明−0数−−r\袖市の対象 ■正の内容  別紙の通り (−)「図面」を次のように補正する。 先に提出した第7図(d)〜(g)及び(h)に関し、
添附した図面の写しに未配するJ:うに図面番号「第7
図」を記載する。 11
FIG. 1 is a perspective view of a conventional wire-wound thin film magnetic head. FIG. 2 is a perspective view of a wire-wound thin film magnetic head according to the present invention. FIG. 3 is an exploded perspective view of the thin film magnetic head of FIG. 2, with the gear spacer film and windings omitted. FIG. 4 is a partially detailed vertical sectional view of the thin film magnetic head of FIG. 2. FIG. FIG. 5 is a perspective view showing another embodiment of the wire-wound thin film magnetic head according to the present invention. FIG. 6 is an exploded perspective view of the thin film magnetic head of FIG. 5, with the gear spacer film and windings omitted. FIGS. 7(a) to 7(h) are perspective views showing the manufacturing process of the wire-wound thin film magnetic head according to the present invention. FIG. 8 is a detailed cross-sectional view taken along line VIII-VIII of FIG. 7(f). FIG. 9 is a perspective view illustrating another embodiment of the manufacturing method of the wire-wound thin film magnetic head according to the present invention. 10 to 16 are perspective views showing other embodiments of the wire-wound thin film magnetic head according to the present invention. 1: Wire-wound thin film magnetic head 2, 2': Non-magnetic substrate 4, 4': Magnetic thin film 4a, 10b: Chamfered portion 6: Gear spacer film 8, 8': Winding 10, 10', 10a: Groove 10'': Notch 12: Sliding surface 13, 13': Name of pole piece department representative Motoi Kurauchi Hirodo Kurahashi Akite Tsuzuki Sleeve tl, i -r': C method) 1981 3 no] 241" Special i Display of 'i'l agency official Wakasugi Kazuten incident
1981 Patent Application No. 197810 Name of the invention
Wire-wound thin film 6. Relation to the Ministry's case for amending the air head and its manufacturing method Name of patent applicant 1
”Hon Mining Forestry Company Agent Telephone: 273-6436 Funoma
-Address
” - Name (7563) Patent attorney Akira Kurahashi (・2. Notification of Kabu, Ouramasa's order 1 attached February 22, 1988 - Supplementary iH Motori 1
Soka→=The present invention-0 number--r\Object of Sodeichi ■Correct content As shown in the attached sheet (-) "Drawing" is corrected as follows. Regarding Figures 7(d) to (g) and (h) submitted earlier,
J: Sea urchin drawing number “7th
Describe the figure. 11

Claims (1)

【特許請求の範囲】 1)対向配置された1対の非磁性基板と、該各基板の対
向する面上に設けられた磁性薄膜と、該両磁件薄膜を突
き合せて形成されるポールピース部のギヤツプを埋める
非磁性のスペーサ膜と、前記基板の中の少なくとも一方
の基板に形成された溝部にて該基板上の磁性薄膜を囲む
ようにして巻回された巻線とを具備し、前記磁性薄膜は
ポールピース部から巻線部の方向へとその幅が増大する
ように形成されたことを特徴とする巻線型薄膜磁気ヘツ
ド。 2)巻線部の磁薄膜のエツジ部に面取り加工を施して成
る!特許請求の範囲第1項記載の巻線型薄膜磁気ヘツド
。 3)基板の溝部のエツジ部に面取り加工を施して成る特
許請求の範囲第2項記載の巻線型薄膜磁気ヘツド。 4)磁性薄膜の巻線部の幅(W′)はポールピース型の
幅(w)の5倍以上である特許請求の範囲第1項記載の
巻線型薄膜磁気ヘツド。 5)磁性薄膜のポールビース部の幅(w)、ポールピー
ス部後方から巻線部に至る部分(巻線部をも含む)に於
る磁性薄膜の幅(W)、両磁性薄膜間のポールピース部
の空隙大きさ(g)及び前記磁性薄膜幅(W)の位置に
於る両磁性薄膜間の巻線部の空隙大きさ(G)の間には
、 g/w<G/W の関係が成立つように構成されて成る特許請求の範囲第
4項記載の巻線型薄膜磁気ヘツド。 6)磁性薄膜の厚みは一定である特許請求の範囲第1頂
記載の巻線型薄膜磁気ヘツド。 7)磁性薄膜の厚みはポールピース部から巻線部の方向
へと漸次増大するように形成されて成る特許請求の範囲
第1項記載の巻線型薄膜磁気ヘツド。 8)少なくとも一方には溝部を有し、該溝部ポールピー
ス部形成端に隣接した方の壁部はポールピース部形成端
に向つて傾斜するようにした1対の非磁性基板を提供す
る工程;前記各基板の対向する面上に磁性薄膜を形成す
る工程;前記溝部の傾斜壁上に設けられた磁性薄膜部の
傾斜部を補完するように該傾斜部に接着剤を充填する工
程;前記各基板上の磁性薄膜面を平らにするべく研摩す
る工程;少なくとも一方の磁性薄膜のポールピース部に
相当する部分に非磁性のギヤツプスペーサ膜を形成する
工程;前記両基板を磁性薄膜が対面するようにして突き
合せそして一体に接合しヘツドブロツクを形成する工程
;前記ヘツドブロツクのポールピース部に、磁性薄膜に
直交する方向に横断する溝を穿設する工程;前記溝に非
磁性の保護材を充填する工程;前記ヘツドブロツクのポ
ールピース部を含む摺動面を所定形状に研摩する工程;
前記ヘツドブロツクを所定幅にスライスし、ヘツドチチ
ツプを切り出す工程;及び前記ヘツドチツプの巻線部に
該基板上の磁性薄膜を囲むようにして導線を巻回する工
程を具備することを特徴とする巻線型薄膜磁気ヘツドの
製造方法。 9)個々のへツドチツプを切り出すに先立つて、ヘツド
ブロツクの少なくとも溝部を有した基板には該溝部と協
働して巻線部を形成するために磁性薄膜に沿つて溝又は
切欠きが形成され、又個々に切り出された各ヘツドチツ
プの巻線部の鋭角縁部は巻線を施すに先立つて面取り加
工を行なうようにした特許請求の範囲第8項記載の巻線
型薄膜磁気ヘツドの製造方法。 10)少なくとも一方には溝部を有した1対の非磁性基
板を提供する工程;前記各基板の対向する面上に磁性薄
膜を所定形状にて形成する工程;前記各基板面上の磁性
薄膜のない空隙部を非磁性充填材にて充填する工程;少
なくとも一方の磁性薄膜のポールピース部に相当する部
分に非磁性のギヤツプスペーサ膜を形成する工程;前記
両基板を磁性薄膜が対面するようにして突き合せそして
一体に接合しヘツドブロツクを形成する工程;前記ヘツ
ドブロツクのポールピース部を含む摺動面を所定形状に
研摩する工程;前記ヘツドブロツクを所定幅にスライス
し、ヘツドチツプを切り出す工程;及び前記ヘツドチツ
プの基板溝部に該基板上の磁性薄膜を囲むようにして導
線を巻回する工程を具備することを特徴とする巻線型薄
膜磁気ヘツドの製造方法。 11)個々のヘツドチツプを切り出すに先立つて、ヘツ
ドブロツクの少なくとも溝部を有した基板には該溝部と
協働して巻線部を形成するために磁性薄膜に沿つて溝又
は切欠きが形成され、又個々に切り出された各ヘツドチ
ツプの巻線部の鋭角縁部は巻線を施すに先立つて面取り
加工を行なうようにした特許請求の範囲第10項記載の
巻線型薄膜磁気ヘツドの製造方法。
[Claims] 1) A pole piece formed by a pair of non-magnetic substrates facing each other, magnetic thin films provided on opposing surfaces of each substrate, and abutment of both magnetic thin films. a non-magnetic spacer film that fills a gap between the two substrates, and a winding wound around a magnetic thin film on the substrate in a groove formed in at least one of the substrates; 1. A wire-wound thin film magnetic head, characterized in that the thin film is formed so that its width increases from the pole piece portion toward the winding portion. 2) The edges of the magnetic thin film in the winding section are chamfered! A wire-wound thin film magnetic head according to claim 1. 3) A wire-wound thin film magnetic head according to claim 2, wherein the edge of the groove of the substrate is chamfered. 4) The wire-wound thin film magnetic head according to claim 1, wherein the width (W') of the winding portion of the magnetic thin film is five times or more the width (w) of the pole piece type. 5) Width (w) of the pole bead part of the magnetic thin film, width (W) of the magnetic thin film from the rear of the pole piece part to the winding part (including the winding part), and the pole between both magnetic thin films. Between the gap size (g) in the piece part and the gap size (G) in the winding part between both magnetic thin films at the position of the magnetic thin film width (W), g/w<G/W. 5. A wire-wound thin film magnetic head according to claim 4, which is configured such that a relationship is established. 6) A wire-wound thin film magnetic head according to claim 1, wherein the thickness of the magnetic thin film is constant. 7) The wire-wound thin film magnetic head according to claim 1, wherein the thickness of the magnetic thin film is formed so as to gradually increase from the pole piece portion toward the winding portion. 8) Providing a pair of non-magnetic substrates each having a groove on at least one of the substrates, the wall portion of the groove adjacent to the pole piece forming end being inclined toward the pole piece forming end; forming a magnetic thin film on opposing surfaces of each of the substrates; filling the sloped portion of the magnetic thin film portion provided on the sloped wall of the groove portion with an adhesive so as to complement the sloped portion; A step of polishing the surface of the magnetic thin film on the substrate to make it flat; a step of forming a non-magnetic gear spacer film on a portion corresponding to the pole piece portion of at least one of the magnetic thin films; a step of forming the two substrates so that the magnetic thin films face each other; a step of butting and joining them together to form a headblock; a step of drilling a groove across the pole piece portion of the headblock in a direction perpendicular to the magnetic thin film; a step of filling the groove with a non-magnetic protective material. a step of polishing the sliding surface of the headblock, including the pole piece portion, into a predetermined shape;
A wire-wound thin film magnetic head comprising the steps of: slicing the head block to a predetermined width to cut out a head chip; and winding a conductive wire around the winding portion of the head chip so as to surround a magnetic thin film on the substrate. manufacturing method. 9) Prior to cutting out the individual head chips, grooves or notches are formed along the magnetic thin film in at least the grooved substrate of the headblock in order to cooperate with the grooves to form the windings; 9. The method of manufacturing a wire-wound thin film magnetic head according to claim 8, wherein the acute edge of the winding portion of each individually cut out head chip is chamfered prior to winding. 10) Providing a pair of non-magnetic substrates each having a groove on at least one of the substrates; forming a magnetic thin film in a predetermined shape on opposing surfaces of each substrate; forming a magnetic thin film on each substrate surface; A step of filling an empty gap with a non-magnetic filler; a step of forming a non-magnetic gear spacer film in a portion corresponding to the pole piece portion of at least one of the magnetic thin films; a step of forming the two substrates so that the magnetic thin films face each other; a step of butting and joining together to form a headblock; a step of polishing the sliding surface of the headblock including the pole piece portion into a predetermined shape; a step of slicing the headblock to a predetermined width and cutting out a head chip; and a step of cutting out the head chip. 1. A method of manufacturing a wire-wound thin film magnetic head, comprising the step of winding a conductive wire in a substrate groove so as to surround a magnetic thin film on the substrate. 11) Prior to cutting out individual head chips, grooves or notches are formed along the magnetic thin film in at least the grooved substrate of the headblock in order to cooperate with the grooves to form the windings, and 11. The method of manufacturing a wire-wound thin film magnetic head according to claim 10, wherein the acute edge of the winding portion of each individually cut out head chip is chamfered prior to winding.
JP19781082A 1982-11-12 1982-11-12 Winding type thin-film magnetic head and its manufacture Granted JPS5990216A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19781082A JPS5990216A (en) 1982-11-12 1982-11-12 Winding type thin-film magnetic head and its manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19781082A JPS5990216A (en) 1982-11-12 1982-11-12 Winding type thin-film magnetic head and its manufacture

Publications (2)

Publication Number Publication Date
JPS5990216A true JPS5990216A (en) 1984-05-24
JPH0232686B2 JPH0232686B2 (en) 1990-07-23

Family

ID=16380719

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19781082A Granted JPS5990216A (en) 1982-11-12 1982-11-12 Winding type thin-film magnetic head and its manufacture

Country Status (1)

Country Link
JP (1) JPS5990216A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61292211A (en) * 1985-06-19 1986-12-23 Hitachi Ltd Magnetic head

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03116588U (en) * 1990-03-09 1991-12-03

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4929119A (en) * 1972-07-08 1974-03-15
JPS55101126A (en) * 1979-01-23 1980-08-01 Victor Co Of Japan Ltd Magnetic recording and reproducing element
JPS5619514A (en) * 1979-07-26 1981-02-24 Hitachi Ltd Thin film magnetic head
JPS5674810A (en) * 1979-11-20 1981-06-20 Matsushita Electric Ind Co Ltd Magnetic head

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4929119A (en) * 1972-07-08 1974-03-15
JPS55101126A (en) * 1979-01-23 1980-08-01 Victor Co Of Japan Ltd Magnetic recording and reproducing element
JPS5619514A (en) * 1979-07-26 1981-02-24 Hitachi Ltd Thin film magnetic head
JPS5674810A (en) * 1979-11-20 1981-06-20 Matsushita Electric Ind Co Ltd Magnetic head

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61292211A (en) * 1985-06-19 1986-12-23 Hitachi Ltd Magnetic head

Also Published As

Publication number Publication date
JPH0232686B2 (en) 1990-07-23

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