JPS5952420A - Thin-film magnetic head - Google Patents

Thin-film magnetic head

Info

Publication number
JPS5952420A
JPS5952420A JP16096582A JP16096582A JPS5952420A JP S5952420 A JPS5952420 A JP S5952420A JP 16096582 A JP16096582 A JP 16096582A JP 16096582 A JP16096582 A JP 16096582A JP S5952420 A JPS5952420 A JP S5952420A
Authority
JP
Japan
Prior art keywords
magnetic
thin film
magnetic layer
layer
nonmagnetic substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16096582A
Other languages
Japanese (ja)
Inventor
Hideo Zama
座間 秀夫
Mitsuo Abe
阿部 光雄
Kanji Kawano
寛治 川野
Katsuo Konishi
小西 捷雄
Norio Goto
典雄 後藤
Mitsuharu Tamura
光治 田村
Hiroaki Ono
裕明 小野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP16096582A priority Critical patent/JPS5952420A/en
Publication of JPS5952420A publication Critical patent/JPS5952420A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3109Details
    • G11B5/313Disposition of layers
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3103Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Magnetic Heads (AREA)

Abstract

PURPOSE:To obtain a highly reliable thin film magnetic head which makes an excellent tape touch and has proper stress in a magnetic layer by using a glass thin film as the adhesive layer between a nonmagnetic substrate and the magnetic layer and adhering the nonmagnetic substrate and magnetic layer together tightly. CONSTITUTION:The thin film magnetic head consists of the laminate of the nonmagnetic substrate 1', magnetic layer 2, and nonmagnetic substrate 1, and a head gap 4 having specific width in the thickness direction of the magnetic layer 2 is formed. The magnetic layer 2 is formed on the nonmagnetic substrate 1 by sputtering and adhered to the nonmagnetic substrate 1' by using the glass thin film 3 with low melting point as an adhesive. The glass thin film 3 has excellent coupling with the nonmagnetic substrate 1' and magnetic layer 3, and causes no trouble to a run of a tape even when contacting the tape; and the film thickness is specified in its manufacture process to generate specific stress in the magnetic layer 3, obtaining specific magnetic characteristics.

Description

【発明の詳細な説明】 〔発明の利用分野〕 2つの非磁性基板間に磁性層を有し、該磁性層の厚み方
向に所定のへッドギャノプが形成されてなる薄膜磁気ヘ
ッド、特に、該非磁性基板と該磁性層との接着に関する
[Detailed Description of the Invention] [Field of Application of the Invention] A thin-film magnetic head having a magnetic layer between two non-magnetic substrates and a predetermined head gap formed in the thickness direction of the magnetic layer, particularly a thin-film magnetic head that has a magnetic layer between two non-magnetic substrates, and a predetermined head gap formed in the thickness direction of the magnetic layer. This invention relates to adhesion between a substrate and the magnetic layer.

〔従来技術〕[Prior art]

従来、ビデオテープレコーダなどに用いられる磁気ヘッ
ドとして、薄膜磁気ヘッドが開発されており、トランク
幅を充分に狭くすることができるようにして記録密度の
向上を可能にしている。
Conventionally, thin-film magnetic heads have been developed as magnetic heads used in video tape recorders and the like, and the trunk width can be made sufficiently narrow, thereby making it possible to improve the recording density.

かかる薄膜磁気ヘッドは、磁性ノ脅とこれを保誇する非
磁性基板とからなり、該非磁性基板の一方にスパッタリ
ングなどにより該磁性層が形成され、該磁性層の表面に
該非磁性基板の他方を接着し、磁性層を非磁性基板によ
りサンドインチ状に挾んで構成されている。そして、ヘ
ッドギャップは、磁性層の厚み方向に所定ギャフプ長で
形成されておシ、アジマス角に応じてヘットキャップの
傾きを定めることができる。
Such a thin film magnetic head consists of a magnetic layer and a non-magnetic substrate that maintains the magnetic property.The magnetic layer is formed on one side of the non-magnetic substrate by sputtering or the like, and the other side of the non-magnetic substrate is formed on the surface of the magnetic layer. The magnetic layer is sandwiched between non-magnetic substrates in the form of a sandwich. The head gap is formed with a predetermined gap length in the thickness direction of the magnetic layer, and the inclination of the head cap can be determined according to the azimuth angle.

ところで、このような薄膜磁気ヘッドにおいては、従来
、非磁性基板と磁性層との接着を、適当は樹脂でもって
行なっていた。このように、接着材として樹脂を用いる
′ととは、接着強度の点で信頼性に乏しく、まだ、薄膜
磁気ヘッドのテープとの接触面に樹脂層が露出している
ことになるから、薄膜磁気ヘッドのテープに対する、い
わゆるテープタッチに著しく悪影響を及ぼし、テープの
円滑な走行を阻害するとともに、テープの走行による樹
脂層の摩耗が生ずることになる0 壕だ、磁性層は応力により大きく磁気特性が変化し、こ
の変化を小さくするためには、接着層を極力薄くする方
が好ましいが、このことは、接着強度の信頼性をさらに
低下させることになるO 〔発明の目的〕 本発明の目的は、上記従来技術の欠点を除き、非磁性基
板と磁性層とが強固に接着しており、テープタッチが良
好で該磁性層に適度な応力が存在する信頼性の高い薄膜
磁気ヘッドを提供するにある。
By the way, in such a thin film magnetic head, the nonmagnetic substrate and the magnetic layer have conventionally been bonded together using a resin. In this way, using resin as an adhesive is not reliable in terms of adhesive strength, and the resin layer is still exposed on the contact surface of the thin-film magnetic head with the tape. This has a significant negative effect on the so-called tape touch of the magnetic head to the tape, impeding the smooth running of the tape, and causing abrasion of the resin layer due to the running of the tape. In order to reduce this change, it is preferable to make the adhesive layer as thin as possible, but this further reduces the reliability of the adhesive strength. The present invention provides a highly reliable thin film magnetic head in which a nonmagnetic substrate and a magnetic layer are firmly bonded, a tape touch is good, and an appropriate stress is present in the magnetic layer, eliminating the drawbacks of the above-mentioned conventional technology. It is in.

〔発明の概、−停〕[Summary of the invention, -stop]

この目的を達成するために、本発明は、非磁性基板と磁
性層との接着層をガラス薄膜とした点を特徴とする。
In order to achieve this object, the present invention is characterized in that the adhesive layer between the nonmagnetic substrate and the magnetic layer is a glass thin film.

〔発明の実施例〕[Embodiments of the invention]

以下、本発明の実施例を図面について説明する。 Embodiments of the present invention will be described below with reference to the drawings.

第11ヌ1は本発明による薄膜磁気ヘッドの一実施例を
示す正面図であって、1.1′は非磁性基板、2は磁性
層、3はガラス薄膜、4はヘッドギャップである。
No. 11 1 is a front view showing an embodiment of the thin film magnetic head according to the present invention, in which 1.1' is a nonmagnetic substrate, 2 is a magnetic layer, 3 is a glass thin film, and 4 is a head gap.

同図において、薄膜磁気ヘッドは、非磁性基板1′、磁
性層2、非磁性基板1の積層体として構成され、磁性層
2の厚み方向に所定の幅のヘッドギャップ4が形成され
ている。磁性層2は、非磁性基板1にスパッタリングな
どで形成されたものであシ、まだ、非磁性基板1′とは
、低融点のガラス薄膜3を接着材として接着されている
In the figure, the thin film magnetic head is constructed as a laminate of a nonmagnetic substrate 1', a magnetic layer 2, and a nonmagnetic substrate 1, and a head gap 4 of a predetermined width is formed in the thickness direction of the magnetic layer 2. The magnetic layer 2 is formed on the nonmagnetic substrate 1 by sputtering or the like, and is still bonded to the nonmagnetic substrate 1' using a thin glass film 3 having a low melting point as an adhesive.

ガラス薄膜3は、非磁性基板1/1磁性層3の夫々との
結合性が良好であり、テープ図示せずと接触しても該テ
ープの走行には格別支障を生じせしめない上に、製造工
程において、膜厚を任Aに制御することができるから、
該膜厚を所定の値に設定することにより、磁性層3に所
定の応力を生じさせて所定の磁気特性を生じさせている
The glass thin film 3 has good bonding properties with each of the non-magnetic substrates 1 and 1 magnetic layer 3, and even if it comes into contact with a tape (not shown), it does not particularly hinder the running of the tape. Because the film thickness can be controlled arbitrarily in the process,
By setting the film thickness to a predetermined value, a predetermined stress is generated in the magnetic layer 3 to produce predetermined magnetic characteristics.

第2図(A)ないしくH)は第1図の薄1ixi磁気ヘ
ッドの製造方法の一具体例を示す工程図であって、第1
図に対応する部分には同一符号をつけている0 まず、たとえば、Mn0−Ni0系などの非磁性基板1
を用意しく第2図(A))、その表面に、たとえば、セ
ンダスト薄膜でなる磁性層2を形成する(第2図(B)
)。−具体例としては、DC4極のスパッタリング装置
に用い、膜厚が約10μmのセンダスト薄膜を形成した
2(A) to 2(H) are process diagrams showing a specific example of a method for manufacturing the thin 1ixi magnetic head of FIG.
Parts corresponding to the figures are given the same reference numerals. First, for example, a non-magnetic substrate such as Mn0-Ni0 system 1
2(A)), and on its surface, a magnetic layer 2 made of, for example, a Sendust thin film is formed (FIG. 2(B)).
). - As a specific example, a sendust thin film having a thickness of about 10 μm was formed using a DC 4-pole sputtering device.

次に、磁性層2の表面に、スパッタリングにヨシ、膜厚
が約0.3μmのガラス薄膜3を形成しく第2図(C)
)、同時に、他の非磁性基板11の表面にも、同様に、
膜厚が約0.3μmのガラス薄膜3を形成した(第2図
(D))。ここでは、ガラス薄膜5は、コーニンy社t
7)P b系の低融点ガラスである≠1417ガラスを
材料として用い、該ガラスをターゲフトとして、RFス
パッタ1)ング装置により、IW/cm2のパワーを投
入して形成した。
Next, on the surface of the magnetic layer 2, a thin glass film 3 having a thickness of about 0.3 μm is formed by sputtering.
), and at the same time, similarly on the surface of the other non-magnetic substrate 11.
A glass thin film 3 having a thickness of about 0.3 μm was formed (FIG. 2(D)). Here, the glass thin film 5 is manufactured by Konin Y Co., Ltd.
7) Using ≠1417 glass, which is a P b -based low melting point glass, as a material, the glass was used as a target, and a power of IW/cm 2 was applied using an RF sputtering device.

両者はガラス薄膜3が重なるように突き合わされ(第2
図(E))、非磁性基板1.1′に所定の圧力を加えな
がら620ocで10分間保持し、センダストコア材を
形成した(第2図(F))。そして、このセンダストコ
ア材を、磁性層3に対して交わる方向に、すなわち、磁
性層3の厚み方向に切断し、夫々の切断面を鏡面ラップ
し、まだ、図示しないが、巻線窓を形成した後、夫々の
切断面に非磁性ギャップスペーサ4′を約0 、121
1mの厚さで形成しく第2図(G) ) 、Lかる後、
上記切断面を突き合わせて接着ボンデインブレ、ヘレド
ギャップ4を形成して第1図の薄膜磁気ヘッドを得た(
第2図(H))。
Both are butted against each other so that the glass thin film 3 overlaps (second
The non-magnetic substrate 1.1' was held at 620 oc for 10 minutes while applying a predetermined pressure to form a sendust core material (Fig. 2 (F)). Then, this sendust core material is cut in the direction crossing the magnetic layer 3, that is, in the thickness direction of the magnetic layer 3, and each cut surface is lapped to a mirror finish to form a winding window (not shown yet). After that, a non-magnetic gap spacer 4' is placed on each cut surface at approximately 0 and 121 mm.
After forming it to a thickness of 1 m (see Figure 2 (G)),
The above-mentioned cut surfaces were butted together to form an adhesive bond bond and a Hered gap 4 to obtain the thin film magnetic head shown in Fig. 1 (
Figure 2 (H)).

かかる製造方法から明らかなように、トラック幅が約1
0μmの極めて狭い薄膜磁気ヘッドを得ることができ、
ガラス薄膜3の膜厚はスパッタリング時間に応じて任意
に設定可能である。
As is clear from this manufacturing method, the track width is approximately 1
It is possible to obtain an extremely narrow thin film magnetic head of 0 μm,
The thickness of the glass thin film 3 can be arbitrarily set depending on the sputtering time.

なお、ヘッドギャップ4は、アジマス角に応じてセンダ
ストコア材の・切断方向を設定することにより(第2図
(G))、所定のアジマス角を有するように設定するこ
とができる。
The head gap 4 can be set to have a predetermined azimuth angle by setting the cutting direction of the sendust core material according to the azimuth angle (FIG. 2(G)).

第3図は本発明による薄膜磁気ヘッドのit!2の実施
例を示す正面図であって、2..22は磁性薄膜、5は
層間膜であり、第1図に対応する部分には同一符号をつ
けている。
FIG. 3 shows the it! of a thin film magnetic head according to the present invention. 2 is a front view showing Example 2; FIG. .. 22 is a magnetic thin film, 5 is an interlayer film, and parts corresponding to those in FIG. 1 are given the same reference numerals.

この実施例は、磁性層2を多局化し、ヘッドギャップの
トラック幅を広幅化した薄膜磁気へ・ラドである。磁性
層2は、磁性薄膜21、層間膜5および磁径薄膜22の
多層構造をなしている。層間膜5は、磁性層に生ずる渦
電流を除去するだめのものであり、非磁性の絶縁材が好
ましい。ヘッドギャップ4のトラック幅は、層間膜を介
して磁性膜を順次形成することによシ、任意の幅とする
ことができる。
This embodiment is a thin film magnetic disk in which the magnetic layer 2 is multi-centered and the track width of the head gap is widened. The magnetic layer 2 has a multilayer structure including a magnetic thin film 21, an interlayer film 5, and a magnetic diameter thin film 22. The interlayer film 5 serves to remove eddy currents generated in the magnetic layer, and is preferably made of a nonmagnetic insulating material. The track width of the head gap 4 can be made arbitrary by sequentially forming magnetic films via interlayer films.

この実施例は、磁性層2以外は第1図の実施例と同様の
構成を有し、機能の点について同様である。
This embodiment has the same structure as the embodiment shown in FIG. 1 except for the magnetic layer 2, and is also similar in function.

第4図(A)ないしく(ン)は第3図の薄膜磁気ヘッド
の製造方法の一具体例を示す工程図であって、第3図に
対応する部分については同一符号をつけている。
4(A) to 4(N) are process diagrams showing a specific example of a method for manufacturing the thin film magnetic head of FIG. 3, and parts corresponding to those in FIG. 3 are given the same reference numerals.

ここでは、ヘッドギャップのトラック幅が約20μmで
ある薄膜磁気ヘッドの場合について説明する。
Here, the case of a thin film magnetic head in which the track width of the head gap is approximately 20 μm will be described.

第4図(A)、(B)の工程は、磁性膜21が厚さ約1
0μmに形成される以外、第2図(A)、(B)の工程
と同様である。
In the steps of FIGS. 4(A) and 4(B), the magnetic film 21 has a thickness of approximately 1 mm.
The steps are the same as those in FIGS. 2(A) and 2(B) except that the thickness is 0 μm.

次に、磁性膜21の表面に、RFスパッタリング装置に
より、5iOzをスパッタリングして膜厚的80OAの
非磁性絶縁膜を形成し、これを層間膜5とする(第4図
(C))。層間膜50表面に、磁性膜21の場合と同様
に、センダストをスパッタリングして約1(1μmの厚
さの磁性膜22を形成しく第4図(D))、その上に、
第2図(C)“の工程と同様に1前記+ 1417のp
b系低融点ガラスの薄膜3を約0.25μmの厚さに形
成す゛る(第4図(E))。
Next, on the surface of the magnetic film 21, a non-magnetic insulating film having a thickness of 80 OA is formed by sputtering 5 iOz using an RF sputtering device, and this is used as the interlayer film 5 (FIG. 4(C)). On the surface of the interlayer film 50, as in the case of the magnetic film 21, sendust is sputtered to form a magnetic film 22 with a thickness of about 1 μm (FIG. 4(D)), and on top of that,
Similarly to the process in FIG.
A thin film 3 of low melting point b glass is formed to a thickness of about 0.25 μm (FIG. 4(E)).

次いで、第2図(D)と同様の工程で非磁性基板1′に
形成されたガラス薄膜3と磁性膜22上のガラス薄膜3
とを突き合わせ(第4図(F))、加圧、加熱すること
により、センダストコア材・が得られる(第4図(G)
)。これ以降の工程は、第2図(G)、(H)の工程と
同様であって、2層の磁性膜2122からなる磁性層2
を有し、ヘッドギャップ4のトラック幅が約2071m
の薄膜磁気ヘッド第3図が得られる。
Next, the glass thin film 3 formed on the non-magnetic substrate 1' and the glass thin film 3 on the magnetic film 22 are formed in the same process as shown in FIG. 2(D).
By butting them together (Fig. 4 (F)), applying pressure and heating, sendust core material (Fig. 4 (G)) is obtained.
). The subsequent steps are the same as those shown in FIGS.
The track width of head gap 4 is approximately 2071 m.
A thin film magnetic head shown in FIG. 3 is obtained.

かかる製造方法から明らかなように、第4図。As is clear from this manufacturing method, FIG.

(B)、(D)の工程における磁性膜の膜厚、第42図
(C)、(D)の工程の繰り返しによる磁性膜の積層数
により、任意のトラック幅のへラドギャップを形成する
ことができる。
A Helad gap of an arbitrary track width can be formed by changing the thickness of the magnetic film in the steps (B) and (D) and the number of layers of magnetic films by repeating the steps in FIG. 42 (C) and (D). I can do it.

なお、以上の実施例では、接着材としてpb系の低融点
ガラスを用いだが、これに限ることなく、任意の適当な
低融点ガラスを用いることができることは明らかであり
、また、上記の製造方法において、接着される磁性層、
非磁性基板双方にガラス薄膜を形成したが、いずれが一
方のみにガラス薄膜を形成するようにしても同様の効果
が得られる。
In the above examples, PB-based low melting point glass was used as the adhesive, but it is clear that any suitable low melting point glass can be used without being limited to this, and the above manufacturing method can also be used. a magnetic layer to be bonded;
Although the glass thin film was formed on both nonmagnetic substrates, the same effect can be obtained even if the glass thin film is formed on only one of the substrates.

〔発明の効果〕〔Effect of the invention〕

以上説明したように、本発明によれば、非磁゛性基板と
磁性層とを、ガラス薄膜でもって接着゛するようにした
ものであるから、両者の接゛着性が向上し、テープタッ
チも改善され、さらに、前記ガラス薄膜の膜厚は任意に
設定可能であることから、前記磁性層は応力が適度に設
定され゛て良好な磁気特性が得られ、上記従来技術の欠
点を除いて優れた機能の薄膜磁気ヘッドを棲供すること
ができる。
As explained above, according to the present invention, the non-magnetic substrate and the magnetic layer are bonded together using a glass thin film, so that the adhesion between the two is improved and tape touch is achieved. Furthermore, since the thickness of the glass thin film can be set arbitrarily, the stress of the magnetic layer can be set appropriately and good magnetic properties can be obtained, eliminating the drawbacks of the above-mentioned conventional technology. A thin film magnetic head with excellent functionality can be provided.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明による薄膜磁気ヘッドの一実施例を示す
正面図、第2図(A)ないしくH)は。 第1図の薄膜磁気ヘッドの製造方法の−具体例を示す工
程図、第3図は本発明による薄膜IB気ヘッドの他の実
施例を示す正面図、第4図(A)々いしくG)は第3図
の薄膜磁気ヘッドの製造方法の一具体例を示す工程図で
ある。 1.1′・・・・・非磁性基板、 2・・・・・・磁性層、 2.22・・・・・・磁性膜、 3・・・・・・ガラス薄膜、 4・・・・・・ヘットキャップ、 5・・・・・・層間膜、 代理人弁理士 薄 1)利 庁1.J−オ2図 才4図 第1頁の続き 0発 明 者 小野桁間 横浜市戸塚区吉田町292番地株 式会社日立製作所家電研究所内
FIG. 1 is a front view showing an embodiment of a thin film magnetic head according to the present invention, and FIGS. 2(A) to 2(H) are views. FIG. 1 is a process diagram showing a specific example of a method for manufacturing a thin film magnetic head, FIG. 3 is a front view showing another embodiment of a thin film IB magnetic head according to the present invention, and FIG. ) is a process diagram showing a specific example of a method for manufacturing the thin film magnetic head shown in FIG. 3. 1.1'...Nonmagnetic substrate, 2...Magnetic layer, 2.22...Magnetic film, 3...Glass thin film, 4... ...head cap, 5...interlayer membrane, agent patent attorney Usui 1) Li Office 1. Continued from page 1 of J-O2 Figure 4 Figure 1 0 Inventor: Hitachi, Ltd. Home Appliance Research Laboratory, 292 Yoshida-cho, Totsuka-ku, Yokohama, Onogama

Claims (1)

【特許請求の範囲】 (1)  第・1、第2の非磁性基板間に磁性層を有し
該磁性層の厚み方向に所定のヘッドギャップが形成され
てなる薄膜磁気ヘッドにおいて、前記磁性層は前記第1
の非磁性基板上に形成されており、前記磁性層と前記第
2の非磁性基板とがガラス薄膜を接着材として接着され
ていることを特徴とする薄膜磁気ヘッド。 (2、特許請求の範囲第(1)項に赴いて、前記磁性層
は、単層の磁性薄膜であることを特徴とする薄膜磁気ヘ
ッド。 (3)特許請求の範囲第(1)項において、前記磁性層
は、磁性薄膜と層1141膜とが交互に積層され、該磁
性薄膜間に該層間膜が介在せる多層構造をなすことを特
徴とする薄膜磁気ヘットも
[Scope of Claims] (1) A thin film magnetic head comprising a magnetic layer between first and second non-magnetic substrates and a predetermined head gap formed in the thickness direction of the magnetic layer, wherein the magnetic layer is the first
1. A thin film magnetic head formed on a non-magnetic substrate, wherein the magnetic layer and the second non-magnetic substrate are bonded together using a glass thin film as an adhesive. (2) In claim (1), the magnetic layer is a thin film magnetic head that is a single-layer magnetic thin film. (3) In claim (1), the magnetic layer is a single-layer magnetic thin film. , a thin film magnetic head characterized in that the magnetic layer has a multilayer structure in which magnetic thin films and layer 1141 films are alternately laminated, and the interlayer film is interposed between the magnetic thin films.
JP16096582A 1982-09-17 1982-09-17 Thin-film magnetic head Pending JPS5952420A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16096582A JPS5952420A (en) 1982-09-17 1982-09-17 Thin-film magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16096582A JPS5952420A (en) 1982-09-17 1982-09-17 Thin-film magnetic head

Publications (1)

Publication Number Publication Date
JPS5952420A true JPS5952420A (en) 1984-03-27

Family

ID=15725997

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16096582A Pending JPS5952420A (en) 1982-09-17 1982-09-17 Thin-film magnetic head

Country Status (1)

Country Link
JP (1) JPS5952420A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56107325A (en) * 1980-01-31 1981-08-26 Fujitsu Ltd Manufacture for magnetic recording head

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56107325A (en) * 1980-01-31 1981-08-26 Fujitsu Ltd Manufacture for magnetic recording head

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