JPS5949514A - Annular illumination device - Google Patents
Annular illumination deviceInfo
- Publication number
- JPS5949514A JPS5949514A JP16004682A JP16004682A JPS5949514A JP S5949514 A JPS5949514 A JP S5949514A JP 16004682 A JP16004682 A JP 16004682A JP 16004682 A JP16004682 A JP 16004682A JP S5949514 A JPS5949514 A JP S5949514A
- Authority
- JP
- Japan
- Prior art keywords
- luminous flux
- annular
- illumination
- light source
- transmitted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/06—Means for illuminating specimens
- G02B21/08—Condensers
- G02B21/10—Condensers affording dark-field illumination
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Microscoopes, Condenser (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は、位相差顕微鏡、暗視野顕微鏡等における環状
照明装置に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an annular illumination device for a phase contrast microscope, a dark field microscope, etc.
従来位相差顕微鏡、暗視野顕微鏡等においては、光源か
らの光を集光レンズで集めて光源像を形成し、この光源
像の位置に環状開口を有する輪帯状開口絞シを配置する
ことによシ、この開口絞シを通過した環状光束を照明光
として用いるようにした環状照明装置が知られている。Conventional phase-contrast microscopes, dark-field microscopes, etc. collect light from a light source using a condensing lens to form a light source image, and place an annular aperture diaphragm with an annular aperture at the position of this light source image. An annular illumination device is known in which an annular light beam passing through the aperture diaphragm is used as illumination light.
このように構成された照明装置は、光源からの光の僅か
な部分のみが輪帯状開口絞シを通過し得るために、照明
効率が悪く、照野が暗くなってしまう。特に観察光学系
の解像限界に近い物体の像はコントラストが充分でなく
、このような物体の観察は透過率の低いフィルターを使
用することが望ましいが、そのために照野はさらに暗く
なってしまい、写真撮影の場合の露光時間が長くなシ、
不便であった。また、ICパターン精密縮写光学系の場
合にはウェファ上の露光時間が長くなってしまい、作業
効率が低下してしまう。In a lighting device configured in this manner, only a small portion of the light from the light source can pass through the annular aperture diaphragm, resulting in poor lighting efficiency and a dark illuminated field. In particular, images of objects near the resolution limit of the observation optical system do not have sufficient contrast, and it is desirable to use a filter with low transmittance when observing such objects, but this makes the illumination field even darker. , the exposure time for photography is long,
It was inconvenient. Further, in the case of an IC pattern precision reduction optical system, the exposure time on the wafer becomes long, resulting in a decrease in work efficiency.
本発明は、以上の点に鑑み、充分な明るさをもつ環状照
明装置を提供せんとするものであって、以下図面に示し
た実施例によりこれを説明すれば、第1図は透過結像系
の場合を示しておシ、1はレー □ザー管等の光源
ミ 2は光源1からの光−束を円筒状光束に変換するビ
ームエクスパンダ−13はレーザー光のコヒーレンスを
減少せしめるだめのマツトガラスで、メツシュを消すた
めに公知の如く光軸に対して垂直方向に微少振動が与え
られる。4は図面において左側の端部が一つの円形端面
4aを有していて且つ右側の端部が輪帯状または対にな
った弧状の射出端面4bを有する光ファイバー、5は光
ファイバー4の射出端面4bからのほぼ平行光束である
環状のレーザー光束を輪帯状開口絞り6の近傍に集光さ
せる輪帯状集光レンズ、7はコンデンサーレンズ、8は
照明すべき物体面、9は対物レンズ、10は輪帯状フィ
ルターである。In view of the above points, the present invention aims to provide an annular illumination device with sufficient brightness.This will be explained below with reference to embodiments shown in the drawings. 1 is a light source such as a laser tube, 2 is a beam expander that converts the light beam from the light source 1 into a cylindrical light beam, and 13 is a beam expander that reduces the coherence of the laser beam. In order to erase the mesh with matte glass, a minute vibration is applied in a direction perpendicular to the optical axis, as is known in the art. Reference numeral 4 denotes an optical fiber whose left end has one circular end surface 4a in the drawing, and whose right end has an annular or paired arc-shaped exit end surface 4b; 5 indicates an exit end surface 4b of the optical fiber 4; 7 is a condenser lens; 8 is an object surface to be illuminated; 9 is an objective lens; It's a filter.
第1図による本発明実施例は以上のように構成されてい
るから、光源lからのレーザー光束はビームエクスパン
ダ−2によシはぼ平行な円筒状光束に変換されて、マツ
トガラス3を透過することにより少しインコヒーレント
にされて、スペックルパターンの発生が防止され結像性
能が改善される。Since the embodiment of the present invention shown in FIG. This makes it slightly incoherent, preventing the generation of speckle patterns and improving imaging performance.
−マツトガラス3を透過した円筒状光束は、光ファイバ
ー4の円形端面4aから入射して輪帯状または対になっ
た弧状の射出端面4bから射出することにより、環状光
束に変換され、輪帯状集光レンズ5によって輪帯状開口
絞り6の近傍に集光する。- The cylindrical light beam transmitted through the matte glass 3 enters the circular end surface 4a of the optical fiber 4 and exits from the annular or paired arc-shaped exit end surface 4b, thereby converting it into an annular light beam, which is converted into an annular condensing lens. 5, the light is focused near the annular aperture stop 6.
該開口絞シを通過した光束はコンデンサーレンズ7によ
シ物体面8を均一にムラなく照明する。尚、物体面8を
通過し対物レンズ9に入射した光束は一旦結像しこの結
を位置に配設された輪帯状フィルター10によシ遮断さ
れ、照明光束が観察系に入射しないようにしである。The light beam passing through the aperture diaphragm illuminates the object surface 8 uniformly and evenly through the condenser lens 7. Note that the light beam passing through the object plane 8 and entering the objective lens 9 forms an image, and this image is blocked by the annular filter 10 disposed at a certain position to prevent the illumination light beam from entering the observation system. be.
第2図は落射結像系特にICパターン精密縮写光学系の
場合を示しておシ、第1図と同じ部材には同一の符号を
付してその説明は省略する。11はマスクパターンのマ
スター12を光量ロスなしに均一に照明すると共に輪帯
状開口絞!1l16を輪帯状フィルター13上に結像せ
しめる視野レンズ、14はコンデンサーレンズとしても
作用する精密高’M 像縮写レンズで、マスター12を
マスクパターンを形成すべきシリコンウェファ15上に
結像せしめる。FIG. 2 shows a case of an epi-reflection imaging system, particularly an IC pattern precision reduction optical system, and the same members as in FIG. 11 uniformly illuminates the master 12 of the mask pattern without loss of light quantity, and also has an annular aperture diaphragm! A field lens 14 images the master 12 onto the annular filter 13, and 14 is a precision high-M image reduction lens which also functions as a condenser lens, and images the master 12 onto the silicon wafer 15 on which a mask pattern is to be formed.
本実施例は以上のように構成されているから、光源1か
らの光は、第1図と同様にビームエクスパンダー2.マ
ツトガラス3.光フアイバ−4I輪帯状集光レンズ5及
び輪帯状開口絞り6を介して、さらに視野レンズ11に
より効率良く而も均一に照明する。従ってマスター12
は精密高解像縮写レンズ14によシリコンウェファ15
上に結像され、照明光束は輪帯状フィルター13により
遮断され、シリコンウェファ15には達しない。Since this embodiment is configured as described above, the light from the light source 1 is transmitted to the beam expander 2 as in FIG. Matte glass 3. Illumination is efficiently and uniformly carried out through the optical fiber 4I annular condenser lens 5 and annular aperture diaphragm 6, and further by the field lens 11. Therefore master 12
The silicon wafer 15 is connected to the precision high-resolution reduction lens 14.
The illumination light beam is imaged onto the silicon wafer 15 and is blocked by the annular filter 13 so as not to reach the silicon wafer 15 .
ここで精密高解像縮写レンズ14がコンデンサーレンズ
としても作用することもあって、シリコンウェファ15
上には非常に明るい像が結像される。Here, since the precision high-resolution reduction lens 14 also acts as a condenser lens, the silicon wafer 15
A very bright image is formed above.
第3図乃至第5図は、第2図の光ファイバー4の代シに
使用され得る光学系であって、第3図は一対の同心的に
配設された円錐面鏡から成る光学系21であり、第4図
は同様に配設されたアフォーカル球面鏡から成る光学系
22であり、第5図は一対の同心的に配設されたアフォ
ーカル非球面鏡から成る光学系23で小鏡23a及び大
鏡23bの両方または一方がプレス成型非球面である。3 to 5 show optical systems that can be used in place of the optical fiber 4 in FIG. 2, and FIG. 3 shows an optical system 21 consisting of a pair of concentrically arranged conical mirrors. 4 shows an optical system 22 consisting of similarly arranged afocal spherical mirrors, and Fig. 5 shows an optical system 23 consisting of a pair of concentrically arranged afocal aspherical mirrors, with small mirrors 23a and Both or one of the large mirrors 23b is a press-molded aspherical surface.
何れの場合もマツトガラス3を透過した円筒状光束が環
状光束に変換せしめられる。In either case, the cylindrical light beam transmitted through the matte glass 3 is converted into an annular light beam.
第6図はレーザー管等の光源及びビームエクスパンダを
複数組輪帯状に等角度間隔に配置しさらに一つの大きな
マツトガラス3′を備えた輪帯状光源で、第2図の光源
1.ビームエクスパンダ−2゜マツトガラス3.光ファ
イバー4の代りに使用され得、よシ明るい照野が得られ
る。FIG. 6 shows an annular light source in which a plurality of light sources such as laser tubes and beam expanders are arranged at equal angular intervals in an annular shape, and one large matte glass 3' is provided. Beam expander - 2° matte glass 3. It can be used in place of the optical fiber 4 and provides a brighter illumination field.
第7図は非球面輪帯集光光学系24で、小鏡24a及び
大鏡24bの両方または一方がプレス成型トーリック面
鏡であり、第2図の光ファイバー4及び輪帯状集光レン
ズ5の代りに使用され得る。FIG. 7 shows an aspheric annular condensing optical system 24, in which both or one of the small mirror 24a and the large mirror 24b is a press-molded toric surface mirror, instead of the optical fiber 4 and the annular condensing lens 5 in FIG. can be used for.
即ち、マツトガラス3を透過した円筒状光束が輪帯状開
口絞シロに集光する環状光束に変換せしめられる。That is, the cylindrical light beam transmitted through the matte glass 3 is converted into an annular light beam condensed at the annular aperture diaphragm.
尚、第4図、第5図及び第7図の場合には斜線部分の光
束がロスになるが、これは全光量の25係以下であり実
用上差し支えない。まだ、第3図乃至第7図の各光学系
は第1図の実施例に適用し得ることは言うまでもない。In the cases of FIGS. 4, 5, and 7, the light flux in the shaded area is lost, but this is less than 25 times the total light amount and does not pose a problem in practice. It goes without saying that each of the optical systems shown in FIGS. 3 to 7 can be applied to the embodiment shown in FIG.
以上述べたように本発明によれば、光源からの光束を環
状光束に変換せしめる光学部材を使用することにより、
光源からの光の大部分を環状光束に変換して輪帯状開口
絞りに入射させて照明光として利用し得るようにしだか
ら、輪帯状開口絞りで遮断される光束が非常に減少し、
従って照明効率が著しく向上し、高輝度の光源を使用し
ていることからさらに照野が明るくなシ、写真撮影の際
の露光時間が短縮され、特にICパターン精密縮写光学
系に本発明による環状照明装置を適用した場合、非常に
好ましい結果が得られる等の効果がある。As described above, according to the present invention, by using an optical member that converts the luminous flux from the light source into an annular luminous flux,
Since most of the light from the light source is converted into an annular luminous flux and made incident on the annular aperture diaphragm so that it can be used as illumination light, the luminous flux blocked by the annular aperture diaphragm is greatly reduced.
Therefore, the illumination efficiency is significantly improved, the illumination field is brighter because a high-intensity light source is used, and the exposure time during photography is shortened. When a lighting device is applied, very favorable results can be obtained.
尚、以上の説明では、光源としてレーザー管を用いてい
るが、これに限らず、超高圧水銀灯、キセノンアークラ
ンプ、キセノンフラッンユ等の高輝度放電管または高輝
度ヨウ素ランプ等を使用することも好ましいが、他の光
源を使用することも可能である。この場合、マツトガラ
ス3,3′は省略される。また第2図の実施例の場合光
フアイバ−4自体によりレーザー光が成る程度インコヒ
ーレントになるので、マツトガラス3が不要となること
もある。さらに、アルゴンレーザー(5145A、48
80λ)を使用する場合、1乃至10Wという高い出力
が得られるため、第6図のように複数個のレーザー管を
使用しなくてもよいが、ヘリウム−ネオンレーザ−(6
328大)を使用することも可能で、この場合1乃至2
00mWの出力が得られる。In the above explanation, a laser tube is used as the light source, but the light source is not limited to this, and high-intensity discharge tubes such as ultra-high-pressure mercury lamps, xenon arc lamps, xenon flanilles, or high-intensity iodine lamps may also be used. Although preferred, other light sources can also be used. In this case, the matte glasses 3, 3' are omitted. Further, in the embodiment shown in FIG. 2, the optical fiber 4 itself makes the laser beam incoherent to the extent that it becomes incoherent, so the matte glass 3 may be unnecessary. Furthermore, argon laser (5145A, 48
When using a helium-neon laser (80λ), a high output of 1 to 10W can be obtained, so there is no need to use multiple laser tubes as shown in Figure 6.
328 large) can also be used, in this case 1 to 2
An output of 00mW can be obtained.
第1図は本発明による環状照明装置の第一の実施例の光
学系を示す構成図、第2図は第二の実施例を示す第1図
と同様の図、第3図乃至第7図は環状光束を生せしめる
だめの他の実施形態を示す図である。
1°−11L、 2・・・・ビームエキスパンター、
3・・・・マツトガラス、4・・・・光ファイバー、5
・・・・輪帯状集光レンズ、6・・・・輪帯状開口絞り
、7・山コンデンサーレンズ、8・・・・物体面、9・
中対物レンズ、】0113・・・・輪帯状フィルター、
11・・・・視野レンズ、12・・・・マスター、14
・・・・精密高解像m写しンズ、15・・・・シリコン
ウェファ、21.22.23・・・・アフォーカル光学
系、24・・・・非球面輪帯集光光学系。
:#3図
21
3b
16図
オアー図
4bFIG. 1 is a block diagram showing the optical system of the first embodiment of the annular illumination device according to the present invention, FIG. 2 is a diagram similar to FIG. 1 showing the second embodiment, and FIGS. 3 to 7 FIG. 2 is a diagram showing another embodiment of a reservoir that generates an annular light beam. 1°-11L, 2...beam expander,
3...Matte glass, 4...Optical fiber, 5
... Annular condensing lens, 6... Annular aperture diaphragm, 7. Mountain condenser lens, 8. Object surface, 9.
Middle objective lens, ]0113... annular filter,
11... Field lens, 12... Master, 14
...Precise high-resolution m-reflection lens, 15...Silicon wafer, 21.22.23...Afocal optical system, 24...Aspheric annular focusing optical system. :#3 Figure 21 3b Figure 16 Orr Figure 4b
Claims (1)
光学部材と、該円筒状光束を環状光束に変換し集光せし
める第二の光学部材と、環状光束の集光位置の近傍に配
設され前記環状光束に対応した輪帯状開口を有する開口
絞シとを含んでいることを特徴とする、環状照明装置。a light source, a first optical member that converts the luminous flux from the light source into a cylindrical luminous flux, a second optical member that converts the cylindrical luminous flux into an annular luminous flux and focuses the annular luminous flux; An annular illumination device comprising: an aperture diaphragm disposed and having an annular aperture corresponding to the annular luminous flux.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16004682A JPS5949514A (en) | 1982-09-14 | 1982-09-14 | Annular illumination device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16004682A JPS5949514A (en) | 1982-09-14 | 1982-09-14 | Annular illumination device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5949514A true JPS5949514A (en) | 1984-03-22 |
Family
ID=15706747
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16004682A Pending JPS5949514A (en) | 1982-09-14 | 1982-09-14 | Annular illumination device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5949514A (en) |
Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6191662A (en) * | 1984-10-11 | 1986-05-09 | Nippon Telegr & Teleph Corp <Ntt> | Projecting and exposing device |
JPH03257349A (en) * | 1990-03-07 | 1991-11-15 | Res Dev Corp Of Japan | Laser dark-field oblique ray microscopic apparatus and motion measuring method |
EP0535218A1 (en) * | 1991-04-19 | 1993-04-07 | Edge Scientific Instrument Company L.L.C. | Illumination system and method for a high definition light microscope |
US5323208A (en) * | 1992-03-09 | 1994-06-21 | Hitachi, Ltd. | Projection exposure apparatus |
US6377336B1 (en) | 1991-09-11 | 2002-04-23 | Nikon Corporation | Projection exposure apparatus |
US6665050B2 (en) | 1990-11-15 | 2003-12-16 | Nikon Corporation | Projection exposure methods using difracted light with increased intensity portions spaced from the optical axis |
US6710855B2 (en) | 1990-11-15 | 2004-03-23 | Nikon Corporation | Projection exposure apparatus and method |
JP2005004088A (en) * | 2003-06-13 | 2005-01-06 | Nikon Corp | Phase-contrast microscope |
US6885433B2 (en) | 1990-11-15 | 2005-04-26 | Nikon Corporation | Projection exposure apparatus and method |
US6897942B2 (en) | 1990-11-15 | 2005-05-24 | Nikon Corporation | Projection exposure apparatus and method |
US6967710B2 (en) | 1990-11-15 | 2005-11-22 | Nikon Corporation | Projection exposure apparatus and method |
US7277155B2 (en) | 1991-03-05 | 2007-10-02 | Renesas Technology Corp. | Exposure apparatus and method |
US7656504B1 (en) | 1990-08-21 | 2010-02-02 | Nikon Corporation | Projection exposure apparatus with luminous flux distribution |
JP2022178968A (en) * | 2021-05-21 | 2022-12-02 | パナソニックIpマネジメント株式会社 | phase contrast microscope |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4321353Y1 (en) * | 1965-09-18 | 1968-09-07 | ||
JPS52110647A (en) * | 1976-03-13 | 1977-09-16 | Le I Tochinoi Mehaniki I Opuch | Coherent light illuminator |
-
1982
- 1982-09-14 JP JP16004682A patent/JPS5949514A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4321353Y1 (en) * | 1965-09-18 | 1968-09-07 | ||
JPS52110647A (en) * | 1976-03-13 | 1977-09-16 | Le I Tochinoi Mehaniki I Opuch | Coherent light illuminator |
Cited By (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0682598B2 (en) * | 1984-10-11 | 1994-10-19 | 日本電信電話株式会社 | Projection exposure device |
JPS6191662A (en) * | 1984-10-11 | 1986-05-09 | Nippon Telegr & Teleph Corp <Ntt> | Projecting and exposing device |
JPH03257349A (en) * | 1990-03-07 | 1991-11-15 | Res Dev Corp Of Japan | Laser dark-field oblique ray microscopic apparatus and motion measuring method |
US7656504B1 (en) | 1990-08-21 | 2010-02-02 | Nikon Corporation | Projection exposure apparatus with luminous flux distribution |
US6967710B2 (en) | 1990-11-15 | 2005-11-22 | Nikon Corporation | Projection exposure apparatus and method |
US6885433B2 (en) | 1990-11-15 | 2005-04-26 | Nikon Corporation | Projection exposure apparatus and method |
US6897942B2 (en) | 1990-11-15 | 2005-05-24 | Nikon Corporation | Projection exposure apparatus and method |
US6710855B2 (en) | 1990-11-15 | 2004-03-23 | Nikon Corporation | Projection exposure apparatus and method |
US6665050B2 (en) | 1990-11-15 | 2003-12-16 | Nikon Corporation | Projection exposure methods using difracted light with increased intensity portions spaced from the optical axis |
US6704092B2 (en) | 1990-11-15 | 2004-03-09 | Nikon Corporation | Projection exposure method and apparatus that produces an intensity distribution on a plane substantially conjugate to a projection optical system pupil plane |
US7604925B2 (en) | 1991-03-05 | 2009-10-20 | Renesas Technology Corporation | Exposure apparatus and method |
US7277155B2 (en) | 1991-03-05 | 2007-10-02 | Renesas Technology Corp. | Exposure apparatus and method |
US7598020B2 (en) | 1991-03-05 | 2009-10-06 | Renesas Technology Corporation | Exposure apparatus and method |
EP0535218A4 (en) * | 1991-04-19 | 1995-10-18 | ||
EP0535218A1 (en) * | 1991-04-19 | 1993-04-07 | Edge Scientific Instrument Company L.L.C. | Illumination system and method for a high definition light microscope |
US6864959B2 (en) | 1991-09-11 | 2005-03-08 | Nikon Corporation | Projection exposure apparatus |
US6710854B2 (en) | 1991-09-11 | 2004-03-23 | Nikon Corporation | Projection exposure apparatus |
US6392740B1 (en) | 1991-09-11 | 2002-05-21 | Nikon Corporation | Projection exposure apparatus |
US6377336B1 (en) | 1991-09-11 | 2002-04-23 | Nikon Corporation | Projection exposure apparatus |
US5323208A (en) * | 1992-03-09 | 1994-06-21 | Hitachi, Ltd. | Projection exposure apparatus |
JP2005004088A (en) * | 2003-06-13 | 2005-01-06 | Nikon Corp | Phase-contrast microscope |
JP2022178968A (en) * | 2021-05-21 | 2022-12-02 | パナソニックIpマネジメント株式会社 | phase contrast microscope |
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