JPS5946100B2 - semiconductor equipment - Google Patents

semiconductor equipment

Info

Publication number
JPS5946100B2
JPS5946100B2 JP8903876A JP8903876A JPS5946100B2 JP S5946100 B2 JPS5946100 B2 JP S5946100B2 JP 8903876 A JP8903876 A JP 8903876A JP 8903876 A JP8903876 A JP 8903876A JP S5946100 B2 JPS5946100 B2 JP S5946100B2
Authority
JP
Japan
Prior art keywords
resin
lead wire
semiconductor device
lead wires
solderability
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP8903876A
Other languages
Japanese (ja)
Other versions
JPS5315067A (en
Inventor
晴香 待鳥
光一 手島
敏明 宮崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP8903876A priority Critical patent/JPS5946100B2/en
Publication of JPS5315067A publication Critical patent/JPS5315067A/en
Publication of JPS5946100B2 publication Critical patent/JPS5946100B2/en
Expired legal-status Critical Current

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  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Description

【発明の詳細な説明】 本発明はリード線を改善した半導体装置に関する。[Detailed description of the invention] The present invention relates to a semiconductor device with improved lead wires.

近年、ダイオード型およびトランジスタ型半導体装置は
それぞれ改良されつつあるが本発明は特にリード線に着
目してなされたもので、リード線の強度、延性、はんだ
付け性、樹脂との接合性を向上せしめた好ましい半導体
装置を提供する。
In recent years, diode-type and transistor-type semiconductor devices have been each improved, but the present invention was made with a particular focus on lead wires, and improves the strength, ductility, solderability, and bondability of lead wires with resin. A preferable semiconductor device is provided.

従来、半導体装置のリード線としては強度とくク返し曲
げ性の優れた純Niあるいは50Ni−Fe合金でなる
ものが主に用いられていた。しかしながらこのリード線
ははんだ付け性が好ましくない為、最近は銅を主体とす
るリード線が用いられてきている。銅を主体とするリー
ド線は、はんだ付け性が良く、導電性に良好な為、好ま
しいのであるが、半導体素子を樹脂でモールドする半導
体装置に用いた場合には次のような難、勧(あつた。
Conventionally, lead wires for semiconductor devices have mainly been made of pure Ni or 50Ni--Fe alloys, which have excellent strength and bendability. However, since this lead wire has poor solderability, recently lead wires mainly made of copper have been used. Lead wires made mainly of copper are preferable because they have good solderability and good conductivity, but when used in semiconductor devices in which semiconductor elements are molded with resin, they have the following difficulties and recommendations: It was hot.

すなわち一般の銅合金は熱伝導が大きい。In other words, common copper alloys have high thermal conductivity.

したがつて樹脂でモールドした半導体装置を所定の個所
にはんだ付けする際、はんだ浴の熱がリード線を伝わり
易く、モールド部分の樹脂温度が過度に上昇する。その
為樹脂の接合力が弱くなるのと、リード線の膨張、収縮
とが相俟つてリード線に外カカ功口わつた場合リード線
がぐらつき以後の工程の支障となる。したがつて本発明
の目的は、銅を主体とするリード線の強度、くわ返しま
げ性、はんだ付け性を損なうことなく、特に樹脂との接
合性を改善した優れた半導体装置を提供することである
Therefore, when a resin-molded semiconductor device is soldered to a predetermined location, the heat of the solder bath is likely to be transmitted through the lead wires, causing the resin temperature in the molded portion to rise excessively. Therefore, the bonding force of the resin becomes weak, and the expansion and contraction of the lead wire combine to cause the lead wire to become loose, causing the lead wire to wobble and hinder subsequent processes. Therefore, an object of the present invention is to provide an excellent semiconductor device in which the bondability with resin is particularly improved without impairing the strength, bendability, and solderability of lead wires mainly made of copper. be.

本発明に係る半導体装置は、リード線を重量%でNi5
〜20%、好ましくは8〜15%、Fe5〜30%、好
ましくは15〜20%残余を実質的にCuでなる合金で
形成したことを特徴とする。
In the semiconductor device according to the present invention, the lead wire is made of Ni5 by weight%.
It is characterized in that it is formed of an alloy consisting essentially of Cu in an amount of 20% to 20%, preferably 8 to 15%, and 5 to 30% Fe, preferably 15 to 20% with the remainder being Cu.

各成分の限定理由を述べると、Ni及びFeは、強度を
向上させるものであるが、多量に含有すると、・・シダ
付性を劣化させ、また少ないと、熱伝導度が大きくなる
ため、上記範囲が望ましい。以下本発明実施例について
説明する。表1に示す成分組成のインゴットを溶製レ
900〜1000℃にて熱間加工後、冷間加工で0.4
55−φの線材とし、500〜700℃で焼鈍し、試料
とした。これらの試料のステイフネス、くD返しまげ性
及び電気伝導度を表2に示す。また試料を樹脂に埋め込
んだ後はんだ付けを行ない、はんだ付け性と、樹脂との
接合状態を調べた。その結果を表3に示す。くり返しま
げ性は、450gr荷重をかけ0.5Rで9『まげをく
り返し行ない破断するまでの回数を示し、またはんだ付
性、樹脂との接合性は夫々100本の試料の不良数で示
す。
To explain the reason for limiting each component, Ni and Fe improve strength, but if they are contained in a large amount, they deteriorate the fernability, and if they are contained in a small amount, the thermal conductivity increases. Range is preferred. Examples of the present invention will be described below. An ingot with the composition shown in Table 1 was melted.
0.4 after hot working at 900-1000℃ and then cold working
A wire rod of 55-φ was annealed at 500 to 700°C and used as a sample. Table 2 shows the stiffness, D bendability, and electrical conductivity of these samples. In addition, after embedding the sample in resin, soldering was performed to examine solderability and the state of bonding with the resin. The results are shown in Table 3. Repetitive bendability is expressed as the number of times until breakage occurs after 9" bending is repeated under a load of 450g at 0.5R, and solderability and bondability with resin are each expressed as the number of defects in 100 samples.

ここではんだ付け性の良否は、得られたリード線試料を
約230℃の40Pb−Snはんだに約5秒間浸し、は
んだのはがれがみられるものを不良とした。
Here, to determine the quality of solderability, the obtained lead wire sample was immersed in 40Pb-Sn solder at about 230° C. for about 5 seconds, and those with peeling of the solder were judged as defective.

また樹脂との接合性の良否はエポキシ樹脂にリード線試
料の一端を約5朋埋め込み、他端を上記条件ではんだ付
けした後、リード線試料を角度約90に曲げ更に水平に
約90゜回して、りード線試料が樹脂と離れ回転するも
のを不良とした。表3から明らかなように本発明装置の
特徴であるリード線は、はんだ付け性及び樹脂との接合
性に卦いて不良のものが全くなくこの点で従来のものと
著しく異なシ、極めて優れたものである。また表2によ
れば本発明に係るリード線はステイフネスで示される強
度、くり返しまげ回数で示される延性とも好ましいもの
であり1導電率も、50Ni−Fe合金と同等で実用上
充分なものである。このようなリード線で形成されたト
ランジスタ型半導体装置を実際に各種用途に使用したと
ころ、はんだ付けで取付けた際も極めて堅牢で優れたも
のであつた。更に本発明装置に係るリード線は磁性体な
のではんだ付け工程に}いて作業性がよく好ましいもの
であつた。
In addition, to check the bondability with the resin, embed one end of the lead wire sample in the epoxy resin for about 5 mm, solder the other end under the above conditions, bend the lead wire sample at an angle of about 90 degrees, and then turn it horizontally about 90 degrees. Therefore, samples where the lead wire sample separated from the resin and rotated were considered defective. As is clear from Table 3, the lead wire, which is a feature of the device of the present invention, has no defects in terms of solderability and bondability with resin, and is significantly different from conventional lead wires in this respect. It is something. Furthermore, according to Table 2, the lead wire according to the present invention has favorable strength as indicated by stiffness and ductility as indicated by the number of repeated bending, and conductivity is also sufficient for practical use as it is equivalent to that of 50Ni-Fe alloy. . When a transistor-type semiconductor device formed using such lead wires was actually used for various purposes, it was found to be extremely robust and excellent even when attached by soldering. Furthermore, since the lead wire according to the device of the present invention is a magnetic material, it is preferable because it has good workability in the soldering process.

以上述べたように本発明半導体装置は改良されたリード
線で形成された優れたものであり工業上の価値は高い。
As described above, the semiconductor device of the present invention is an excellent device formed using improved lead wires, and has high industrial value.

Claims (1)

【特許請求の範囲】 1 重量%でNi5〜20%、Fe5〜30%、残余を
実質的にCuでなる合金にてリード部を形成したことを
特徴とする半導体装置。 2 Niが8〜15%である特許請求の範囲第1項に記
載の半導体装置。 3 Feが15〜20%である特許請求の範囲第1項に
記載の半導体装置。
[Scope of Claims] A semiconductor device characterized in that a lead portion is formed of an alloy consisting of 5 to 20% Ni, 5 to 30% Fe, and the remainder substantially Cu at 1% by weight. 2. The semiconductor device according to claim 1, wherein Ni is 8 to 15%. The semiconductor device according to claim 1, wherein 3 Fe is 15 to 20%.
JP8903876A 1976-07-28 1976-07-28 semiconductor equipment Expired JPS5946100B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8903876A JPS5946100B2 (en) 1976-07-28 1976-07-28 semiconductor equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8903876A JPS5946100B2 (en) 1976-07-28 1976-07-28 semiconductor equipment

Publications (2)

Publication Number Publication Date
JPS5315067A JPS5315067A (en) 1978-02-10
JPS5946100B2 true JPS5946100B2 (en) 1984-11-10

Family

ID=13959711

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8903876A Expired JPS5946100B2 (en) 1976-07-28 1976-07-28 semiconductor equipment

Country Status (1)

Country Link
JP (1) JPS5946100B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4441118A (en) * 1983-01-13 1984-04-03 Olin Corporation Composite copper nickel alloys with improved solderability shelf life
JP4667977B2 (en) * 2005-06-27 2011-04-13 Dowaメタニクス株式会社 Copper alloy material for sleeve, manufacturing method thereof and sleeve

Also Published As

Publication number Publication date
JPS5315067A (en) 1978-02-10

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