JPS5945990A - Method for growing single crystal - Google Patents

Method for growing single crystal

Info

Publication number
JPS5945990A
JPS5945990A JP15720482A JP15720482A JPS5945990A JP S5945990 A JPS5945990 A JP S5945990A JP 15720482 A JP15720482 A JP 15720482A JP 15720482 A JP15720482 A JP 15720482A JP S5945990 A JPS5945990 A JP S5945990A
Authority
JP
Japan
Prior art keywords
crystal
single crystal
pipe
seed crystal
shaft
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15720482A
Other languages
Japanese (ja)
Inventor
Iwao Sasaki
巌 佐々木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP15720482A priority Critical patent/JPS5945990A/en
Publication of JPS5945990A publication Critical patent/JPS5945990A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/32Seed holders, e.g. chucks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

PURPOSE:To manufacture a high-quality single crystal, in high efficiency, by using a seed crystal fitted in a specific pipe in the growth of a single crystal using the Czochralski method, thereby facilitating the seeding and the growth of the neck part of the single crystal. CONSTITUTION:The pipe 17 for holding the seed crystal 18 is made of a material having higher melting point than the temperature of the molten crystal component 19 and inert to the molten liquid 19. The pulling shaft 15 is bonded to the cylindrical chuck 11 with the pin 14, and the pipe 17 fitted with the seed crystal 18 is attached to the chuck 11 with the pin 16. The lower end of the pipe 17 is made lower than the lower end 18' of the seed crystal by about 10mm.. The shaft 15 is lowered until the lower end 18' of the seed crystal is brought into contact with the surface of the molten liquid 19 to effect the seeding, and the shaft is pulled up at a definite speed to grow the neck part 20' of the single crystal in the pipe 17. The pulling motion is continued while decreasing the temperature of the molten liquid 19 gradually to enlarge the diameter of the single crystal and form the shoulder part. When the diameter of the shoulder reaches the desired level, the temperature of the molten liquid is maintained to the state to start the growth of the body part of the single crystal.

Description

【発明の詳細な説明】 (a)  発明の技術分野 本発明は単結晶の育成方法、特にチョクラルスキー結晶
の負部育成方法に関する。
DETAILED DESCRIPTION OF THE INVENTION (a) Technical Field of the Invention The present invention relates to a method for growing a single crystal, and particularly to a method for growing a negative part of a Czochralski crystal.

(b)  技術の背景 単結晶を引上げ育成する主な方法には、多結晶体を一端
から11μ次溶融し種結晶の一端に単結晶を肯成さぜる
浮融帯法と、結晶成分融液に浸した種結晶の所定面に単
結晶を育成させるチョクラルスキー法とがおり、LiT
aO5等の酸化物単結晶は広くチョクラルスキー法で育
成している。
(b) Background of the technology The main methods for pulling and growing single crystals include the floating zone method, in which a polycrystal is melted to the 11μ order from one end and a single crystal is formed at one end of the seed crystal, and the crystal component fusion method. There is a Czochralski method in which a single crystal is grown on a predetermined surface of a seed crystal immersed in a liquid, and LiT
Oxide single crystals such as aO5 are widely grown by the Czochralski method.

(e)  従来技術と問題点 第1図はチョクラルスキー法による酸化物単結晶育成装
置の模式図で必シ、装置1はイリジウムにてなる坩堝2
を収容したセラミックス管3と、坩堝2にス′」向しセ
ラミック管3の外側に巻装した加熱用高周波コイル4と
、回動及び上下動可能な結晶引上Qy軸5と、軸5の上
端部に装着した重量センサ6と、軸5の下端部に装着し
たチャック7を其えている。
(e) Prior art and problems Figure 1 is a schematic diagram of an oxide single crystal growth apparatus using the Czochralski method.
A heating high-frequency coil 4 that faces crucible 2 and is wound around the outside of ceramic tube 3, a crystal pulling Qy axis 5 that can rotate and move up and down, and It includes a weight sensor 6 attached to the upper end and a chuck 7 attached to the lower end of the shaft 5.

かかる装置1において、高周波コイル4に所定の高周波
’tJl″流を流17、j)i堝2内の結晶材料を溶解
して融液8とし、チャック7に上端部を固着した俸状極
結晶9の下端部を融液8の表面に浸し、融液8を結晶育
成温度に制御し回転さ−Ifながら適癌な速度で軸5を
引上げると、種結晶9に単結晶10が得られる。その際
、M全センサ6はイイ結晶9の下剋1面が融液8の表面
に接触(通称;矧付け)し、に1;液8の表面張力が伺
加されfci’m結晶9及び軸5虻含む重量の変化を検
知するとともに、軸5の引上は速度及び融液8の温度を
制御するため育成過程にある単結晶lOの重量を検知す
るだめのものである。
In such an apparatus 1, a predetermined high-frequency 'tJl'' current is passed 17 through the high-frequency coil 4, and j) the crystal material in the i-pit 2 is melted to form a melt 8, and the upper end is fixed to the chuck 7 to form a cylindrical polar crystal. The lower end of 9 is immersed in the surface of melt 8, the melt 8 is controlled to the crystal growth temperature, and the shaft 5 is pulled up at an appropriate speed while being rotated -If, a single crystal 10 is obtained in the seed crystal 9. At that time, the M total sensor 6 detects that the lower surface of the good crystal 9 comes into contact with the surface of the melt 8 (commonly known as "grabbing"), and the surface tension of the liquid 8 is applied to the surface of the fci'm crystal 9. In addition to detecting changes in the weight of the shaft 5 and shaft 5, the pulling speed of the shaft 5 and the temperature of the melt 8 are controlled to detect the weight of the single crystal 1O in the growing process.

そして欠陥が少ない茜品質の単結晶を育成、特に棹結M
、9と単結晶10との溶九・面に)b生する転位が、大
径部to’に連続して形成されないように首部10“を
育成させている。
And we grow madder quality single crystals with few defects, especially in the case of sapphire M.
.

しかt/、前記袖付は及び首部10“の育成工程は重量
センサ6の検知する重量変化が微小であシ、作業者の紅
験的判断に的存しなければならない欠瑯があった。
However, in the process of growing the sleeves and the neck 10'', the weight change detected by the weight sensor 6 was minute, and there was a drawback that the operator's empirical judgment had to be correct.

(d)  発明の目的 本発明の目的は、上記欠点を除去した単結晶の育成方法
を提供することである。
(d) Object of the invention The object of the invention is to provide a method for growing single crystals that eliminates the above-mentioned drawbacks.

(c)発明の構成 上記目的は、融液に対し安定な材料にてなり棒状釉イ^
・晶の断1h1とeはは同じ形状の内側断面を有するパ
イプを、結晶rJ成面よりも適宜量だけ突出させて該f
ffl粘晶l粘着し、該T−]JJIX、面に溶渚する
η1結晶は該パイプの内側に首部を育成したのぢ)k 
fJ及(f)  発明の実り&例 以下、本巧j−明方法の一実施例に係わる第2図と第3
[zlについて説明する。
(c) Structure of the invention
・Crystal cross sections 1h1 and e are made by protruding a pipe having the same inner cross section by an appropriate amount beyond the crystal rJ surface.
The ffl viscous crystall adheres to the T-]JJIX, and the η1 crystal that melts on the surface has grown a neck inside the pipe.
fJ and (f) Fruits of the Invention & Examples Below, Figures 2 and 3 are related to an embodiment of the present invention method.
[Zl will be explained.

第2図は部z2、晶育成装置のチャックに種結晶を固着
し一部を破断した側面図、第3図イと口は該独ム1.晶
に単結晶を自戒させる主な過程を説明するだめの[11
である。
Figure 2 shows part z2, a partially cutaway side view of a seed crystal fixed to the chuck of the crystal growth device, and Figure 3 shows part 1. [11
It is.

Ei: 2 t=1において、前出のチャック7に相当
する円筒形チャック11は中心透孔をW tffiする
1対の透孔12と13が穿設され、透孔12にひ入着し
たビン14は前出の軸5に相当する軸15とチャック1
1をム・1合し、透孔13に嵌着しだビン16はパイプ
17の嵌挿された種結晶18をチャック11に結合する
。ただし、ら結晶18の単結晶溶尤面18′よりも適宜
量(例えば10■)だり下方へ突出するパイプ17は、
融液(泥3図の19)温度よりも融点Th、1度が為〈
融液と反応しない材料、例えば融液す11堝と同じイリ
ジウム等にてなり、横断面の内側形状は種結晶18の横
断面と#■注同じになっている。
Ei: 2 At t=1, a cylindrical chuck 11 corresponding to the chuck 7 described above has a pair of through holes 12 and 13 with a central through hole W tffi, and a bottle inserted into the through hole 12 is 14 is a shaft 15 corresponding to the aforementioned shaft 5 and a chuck 1
The pin 16 is fitted into the through hole 13 and the seed crystal 18 into which the pipe 17 is fitted is connected to the chuck 11. However, the pipe 17 that protrudes an appropriate amount (for example, 10 cm) or downward from the single crystal melt surface 18' of the crystal 18,
The melting point Th is 1 degree higher than the melt (19 in Figure 3) temperature.
It is made of a material that does not react with the melt, such as iridium, which is the same as the melt tank 11, and the inner shape of the cross section is the same as the cross section of the seed crystal 18.

介して種結晶18の固着させた結晶引上げ軸15を降下
さ七、矧結晶下面18′が融液19の表面に接するよう
にしたのち、軸15を79i定の単結晶育成速度で上方
へ引上げる。その際単結晶首部r」、パイプ17の内壁
に遮ぎられ該内壁よシ広がることなく有成芒れる。
The crystal pulling shaft 15 with the seed crystal 18 fixed thereon is lowered so that the lower surface 18' of the crystal is in contact with the surface of the melt 19, and then the shaft 15 is pulled upward at a constant single crystal growth rate of 79i. increase. At this time, the single crystal neck r'' is blocked by the inner wall of the pipe 17 and can be formed without spreading beyond the inner wall.

第3図口は単結晶を育成させる第2工程であシ、種結晶
18の下面18′を下方へ延長させた如き単結晶首部2
0′を育成したのち、(単結晶18の引上げを継続させ
ながら除々に融液199温度を下げると、単結晶20は
図示の如く横へ次第に広がシ、トムがりが所定値(例え
ば直径が約75順)になったとき、*’i!液19液温
9を維持するようにすると胴体部が育成される。
The opening in FIG. 3 is the second step of growing a single crystal, and the single crystal neck 2 is formed by extending the lower surface 18' of the seed crystal 18 downward.
After growing 0' (while continuing to pull the single crystal 18, the temperature of the melt 199 is gradually lowered, the single crystal 20 gradually spreads laterally as shown in the figure, and the tom reaches a predetermined value (for example, the diameter When the temperature reaches about 75), *'i! If you maintain the liquid temperature 9 of 19, the torso will grow.

(g)発明の詳細 な説明した如く本発明によれば、種結晶から単結晶を成
長させる種付は時条件が経和し、かつ、少なくとも種結
晶下面から突出するパイプの長さを有する単結晶首部が
形成されるため、熟練者に依ることカ<、チョクラルス
キー法で単結晶の育成を可能とした効果は極めて大きい
(g) As described in detail, according to the present invention, the seeding for growing a single crystal from a seed crystal is performed under suitable timing conditions, and the single crystal has at least a length of pipe protruding from the lower surface of the seed crystal. Since a crystal neck is formed, the Czochralski method is extremely effective in making it possible to grow a single crystal without relying on an expert.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はチョクラルスキー法による酸化物単結晶育成装
置の模式図、給2図は本発明の一実施例に係わシチャッ
クに種結晶を固着した一部を破断した側面図、第3図は
第2図に示した種結晶に単結晶を育成させる主な過程を
説明するための図である。 図中において、1はチョクラルスキー法によシ単結晶育
成装置、2は坩堝、3はセラミックス管、5.15は結
晶引上げ軸、7.11はチャック、8゜19は結晶融液
、9.18は種結晶、10.20は単結晶、10’r、
j学結晶大径部、10”、20′は単軸晶酊部、17は
イリジウムパイプ、18′は椋結晶18の下面を示す0
Fig. 1 is a schematic diagram of an oxide single crystal growth apparatus using the Czochralski method, Fig. 2 is a partially cutaway side view of a seed crystal fixed to a shichak according to an embodiment of the present invention, and Fig. 3 2 is a diagram for explaining the main process of growing a single crystal using the seed crystal shown in FIG. 2. FIG. In the figure, 1 is a single crystal growth device using the Czochralski method, 2 is a crucible, 3 is a ceramic tube, 5.15 is a crystal pulling shaft, 7.11 is a chuck, 8°19 is a crystal melt, 9 .18 is a seed crystal, 10.20 is a single crystal, 10'r,
The large diameter part of the crystal, 10'', 20' is the uniaxial crystal part, 17 is the iridium pipe, and 18' is the lower surface of the crystal 18.

Claims (1)

【特許請求の範囲】[Claims] 融液に浸lまた種結晶から単結晶を育成させるに際し、
少なくとも融液温度よりも融点が高く融液と反応しない
性質を具えた材料にてなり棒状棹結晶の断面とほぼ同じ
形状の内側断面を有するパイプを、結晶育成面よシも適
宜量だけ突出させて該させてなることを特徴とする単結
晶の育成方法。
When growing a single crystal from a seed crystal by immersing it in a melt,
A pipe made of a material that has a melting point higher than the melt temperature and does not react with the melt, and has an inner cross section that is approximately the same shape as the cross section of the rod-shaped rod crystal, is made to protrude by an appropriate amount from the crystal growth surface. A method for growing a single crystal, characterized in that the method comprises:
JP15720482A 1982-09-07 1982-09-07 Method for growing single crystal Pending JPS5945990A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15720482A JPS5945990A (en) 1982-09-07 1982-09-07 Method for growing single crystal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15720482A JPS5945990A (en) 1982-09-07 1982-09-07 Method for growing single crystal

Publications (1)

Publication Number Publication Date
JPS5945990A true JPS5945990A (en) 1984-03-15

Family

ID=15644475

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15720482A Pending JPS5945990A (en) 1982-09-07 1982-09-07 Method for growing single crystal

Country Status (1)

Country Link
JP (1) JPS5945990A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111139520A (en) * 2018-11-05 2020-05-12 上海新昇半导体科技有限公司 Seeding method by Czochralski method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111139520A (en) * 2018-11-05 2020-05-12 上海新昇半导体科技有限公司 Seeding method by Czochralski method

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