JPS5943730Y2 - ポジ型ホトレジスト現像装置 - Google Patents

ポジ型ホトレジスト現像装置

Info

Publication number
JPS5943730Y2
JPS5943730Y2 JP1979048890U JP4889079U JPS5943730Y2 JP S5943730 Y2 JPS5943730 Y2 JP S5943730Y2 JP 1979048890 U JP1979048890 U JP 1979048890U JP 4889079 U JP4889079 U JP 4889079U JP S5943730 Y2 JPS5943730 Y2 JP S5943730Y2
Authority
JP
Japan
Prior art keywords
developer
positive photoresist
wafer
endless conveyor
development equipment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1979048890U
Other languages
English (en)
Japanese (ja)
Other versions
JPS55149947U (Direct
Inventor
晃 横田
久 中根
潤司 沓沢
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP1979048890U priority Critical patent/JPS5943730Y2/ja
Publication of JPS55149947U publication Critical patent/JPS55149947U/ja
Application granted granted Critical
Publication of JPS5943730Y2 publication Critical patent/JPS5943730Y2/ja
Expired legal-status Critical Current

Links

JP1979048890U 1979-04-14 1979-04-14 ポジ型ホトレジスト現像装置 Expired JPS5943730Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1979048890U JPS5943730Y2 (ja) 1979-04-14 1979-04-14 ポジ型ホトレジスト現像装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1979048890U JPS5943730Y2 (ja) 1979-04-14 1979-04-14 ポジ型ホトレジスト現像装置

Publications (2)

Publication Number Publication Date
JPS55149947U JPS55149947U (Direct) 1980-10-29
JPS5943730Y2 true JPS5943730Y2 (ja) 1984-12-26

Family

ID=28933455

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1979048890U Expired JPS5943730Y2 (ja) 1979-04-14 1979-04-14 ポジ型ホトレジスト現像装置

Country Status (1)

Country Link
JP (1) JPS5943730Y2 (Direct)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60156562U (ja) * 1984-03-27 1985-10-18 日本合成化学工業株式会社 フオトレジスト基板の処理装置

Also Published As

Publication number Publication date
JPS55149947U (Direct) 1980-10-29

Similar Documents

Publication Publication Date Title
IT1058124B (it) Procedimento ed apparecchio per la spruzzatura di un liquido sulle pareti interne di recipienti in particolare recipienti di reattori per processi chimici
DE3571101D1 (en) Vlsi chemical reactor
BE782944A (fr) Dispositif opto-electronique pour la mesure et la regulation dela concentration de solutions
US2945760A (en) Photographic processing method
JPS5943730Y2 (ja) ポジ型ホトレジスト現像装置
JPS5243487A (en) Method and apparatus for artial feeding of liquid sample
US3330196A (en) Apparatus for treating sheet materials with a liquid
JPS52146451A (en) Dipping apparatus
GB1249084A (en) Method for determining exposure of a base material through an overlying coating
JPS55124232A (en) Application method of substrate treatment solution and the device therefor
JPS569742A (en) Developing method of photosensitive resin
JPH0517700B2 (Direct)
US3411424A (en) Cylindrical carrier for photographic sheet materials
JPH02213120A (ja) レジストパターンの形成方法
JPS5550625A (en) Surface treatment of thin plate
JPS522275A (en) Device of forming semiconductor substrates
USRE13815E (en) Apparatus fob developing photographs
JPS52122479A (en) Etching solution of silicon
JPH0251158A (ja) 現像装置
JPS5315775A (en) Production of mos type semiconductor device
JPS5890638A (ja) 液体供給装置及びそれを利用した画像処理装置
Mogerley The effects of agitation in positive photoresist image quality when using a bubble development system
JPS5732445A (en) Developing method for photoresist
JPS5329720A (en) Developing device for diazo photo-sensitive paper
JPS63310117A (ja) 半導体製造用現像装置