JPS5937729U - Electron beam exposure equipment - Google Patents

Electron beam exposure equipment

Info

Publication number
JPS5937729U
JPS5937729U JP13190282U JP13190282U JPS5937729U JP S5937729 U JPS5937729 U JP S5937729U JP 13190282 U JP13190282 U JP 13190282U JP 13190282 U JP13190282 U JP 13190282U JP S5937729 U JPS5937729 U JP S5937729U
Authority
JP
Japan
Prior art keywords
electron beam
beam exposure
exposure equipment
holder
stage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13190282U
Other languages
Japanese (ja)
Other versions
JPH0412675Y2 (en
Inventor
賢次 杉島
Original Assignee
富士通株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 富士通株式会社 filed Critical 富士通株式会社
Priority to JP13190282U priority Critical patent/JPS5937729U/en
Publication of JPS5937729U publication Critical patent/JPS5937729U/en
Application granted granted Critical
Publication of JPH0412675Y2 publication Critical patent/JPH0412675Y2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は電子ビーム露光装置を示す構成図、第２図は従
来例であるＸＹステージ上に搭載したホルダーを示す断
面図、第３図の４９０図は従来のホルダー位置決めを説
明するための図、第４図の４９０図はＺ軸方向への位置
決めクランプ構造を示す断面図、第５図のイ１ロ、へ図
は本考案の一実施例であるホルダーをＸＹステージに固
定スる固定構造を示す断面図、イ図は静止位置、口図は
動作位置、へ図は一部拡大図である。図中１１・・・・
・・ホルダー、１２・・・・・・ばね、１３・・・・・
・操作桿１．１４・・・・・・固定部。Fig. 1 is a configuration diagram showing an electron beam exposure apparatus, Fig. 2 is a sectional view showing a conventional example of a holder mounted on an XY stage, and Fig. 490 in Fig. 3 is a diagram for explaining conventional holder positioning. , Figure 490 in Figure 4 is a cross-sectional view showing the positioning clamp structure in the Z-axis direction, Figures 1-1 and 2-3 in Figure 5 are an embodiment of the present invention, which is a fixing structure for fixing the holder to the XY stage. The figure A is a rest position, the front figure is an operating position, and the figure F is a partially enlarged view. 11 in the diagram...
...Holder, 12...Spring, 13...
・Operation stick 1.14...Fixed part.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 電子ビームを照射して試料上に所望のパターンを描画す
茗電子ビーム露光装置であって、該装置のＸＹステージ
にばねで支持される複数の操作桿を設け、該操作桿は前
記試料を載置するホルダーを一定方向に押圧して該ホル
ダーが該ＸＹステージに固定されてなることを特徴とす
る電子ビーム露光装置。　　　−This is an electron beam exposure device that irradiates an electron beam to draw a desired pattern on a sample, and the XY stage of the device is provided with a plurality of operation rods supported by springs, and the operation rods are used to place the sample. An electron beam exposure apparatus characterized in that the holder is fixed to the XY stage by pressing the holder in a certain direction. −
JP13190282U 1982-08-31 1982-08-31 Electron beam exposure equipment Granted JPS5937729U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13190282U JPS5937729U (en) 1982-08-31 1982-08-31 Electron beam exposure equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13190282U JPS5937729U (en) 1982-08-31 1982-08-31 Electron beam exposure equipment

Publications (2)

Publication Number Publication Date
JPS5937729U true JPS5937729U (en) 1984-03-09
JPH0412675Y2 JPH0412675Y2 (en) 1992-03-26

Family

ID=30298051

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13190282U Granted JPS5937729U (en) 1982-08-31 1982-08-31 Electron beam exposure equipment

Country Status (1)

Country Link
JP (1) JPS5937729U (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5785229A (en) * 1980-11-17 1982-05-27 Toshiba Corp Casette holding device for electron beam exposure

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5785229A (en) * 1980-11-17 1982-05-27 Toshiba Corp Casette holding device for electron beam exposure

Also Published As

Publication number Publication date
JPH0412675Y2 (en) 1992-03-26

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