JPS5931150U - Wiring piping duct for electron beam lithography equipment - Google Patents

Wiring piping duct for electron beam lithography equipment

Info

Publication number
JPS5931150U
JPS5931150U JP12681482U JP12681482U JPS5931150U JP S5931150 U JPS5931150 U JP S5931150U JP 12681482 U JP12681482 U JP 12681482U JP 12681482 U JP12681482 U JP 12681482U JP S5931150 U JPS5931150 U JP S5931150U
Authority
JP
Japan
Prior art keywords
electron beam
beam lithography
duct
lithography equipment
piping duct
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12681482U
Other languages
Japanese (ja)
Inventor
沼賀 拓興
Original Assignee
東芝機械株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 東芝機械株式会社 filed Critical 東芝機械株式会社
Priority to JP12681482U priority Critical patent/JPS5931150U/en
Publication of JPS5931150U publication Critical patent/JPS5931150U/en
Pending legal-status Critical Current

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  • Electron Beam Exposure (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図および第2図は本考案の一実施例を示し第1図は
細面図、第2図は上面図、第3図は本考案の他の実施例
における側面図である。 2.3・・・・・・配線、6・・・・・・架台、14・
・・・・・定盤。
1 and 2 show one embodiment of the present invention; FIG. 1 is a detailed view, FIG. 2 is a top view, and FIG. 3 is a side view of another embodiment of the present invention. 2.3... Wiring, 6... Frame, 14.
...Surface plate.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 電子ビーム鏡筒と試料室等を載置した定盤や同定盤をエ
アヤクッションを介して支持する架台の一部をダクト状
に構成し、前記ダクト状内へ配線および或いは配管を配
置したことを特徴とする電子ビーム描画装置の配線配管
ダクト。
A part of the pedestal that supports the surface plate and identification plate on which the electron beam column and sample chamber are mounted via an air cushion is configured in the shape of a duct, and wiring and/or piping is arranged inside the duct shape. A wiring piping duct for an electron beam drawing device featuring:
JP12681482U 1982-08-21 1982-08-21 Wiring piping duct for electron beam lithography equipment Pending JPS5931150U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12681482U JPS5931150U (en) 1982-08-21 1982-08-21 Wiring piping duct for electron beam lithography equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12681482U JPS5931150U (en) 1982-08-21 1982-08-21 Wiring piping duct for electron beam lithography equipment

Publications (1)

Publication Number Publication Date
JPS5931150U true JPS5931150U (en) 1984-02-27

Family

ID=30288224

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12681482U Pending JPS5931150U (en) 1982-08-21 1982-08-21 Wiring piping duct for electron beam lithography equipment

Country Status (1)

Country Link
JP (1) JPS5931150U (en)

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