JPS5933266B2 - Method and device for determining P-type and N-type semiconductors - Google Patents

Method and device for determining P-type and N-type semiconductors

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Publication number
JPS5933266B2
JPS5933266B2 JP15138878A JP15138878A JPS5933266B2 JP S5933266 B2 JPS5933266 B2 JP S5933266B2 JP 15138878 A JP15138878 A JP 15138878A JP 15138878 A JP15138878 A JP 15138878A JP S5933266 B2 JPS5933266 B2 JP S5933266B2
Authority
JP
Japan
Prior art keywords
needle
type
electrodes
semiconductor
contact
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP15138878A
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Japanese (ja)
Other versions
JPS5577149A (en
Inventor
良一 高橋
佑吉 堀岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Metal Corp
Original Assignee
Mitsubishi Metal Corp
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Filing date
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Application filed by Mitsubishi Metal Corp filed Critical Mitsubishi Metal Corp
Priority to JP15138878A priority Critical patent/JPS5933266B2/en
Publication of JPS5577149A publication Critical patent/JPS5577149A/en
Publication of JPS5933266B2 publication Critical patent/JPS5933266B2/en
Expired legal-status Critical Current

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Description

【発明の詳細な説明】 本発明は半導体のP型、N型を判別する方法及びその装
置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method and apparatus for determining whether a semiconductor is P-type or N-type.

周知の如く、半導体のP型、N型を判別することは、半
導体の研究あるいは製造において、その特性及び品質を
評価する上で最も基本的なことである。
As is well known, determining whether a semiconductor is P-type or N-type is the most fundamental step in evaluating the characteristics and quality of semiconductors in research or manufacturing.

従来半導体のP型、N型を判別する方法に半導体のホー
ル効果を利用する方法が知られている。この方法によれ
ば被判別試料の半導体を超音波加工により第1図に示す
ような形状に切りだし、そして電極1、2間に電流Ix
を流す一方、この電流Ixの流れる方向と直角な方向に
磁界H2を加えて、電流Ixの流れる方向と磁界H2が
加えられる方向と直角な方向に発生するホール電圧Vy
を電極3、4間に設けた電位差計により測定し、このホ
ール電圧Vyの極性から半導体5のP型、N型を判別し
ている。この方法は、半導体の伝導度も同時に測定でき
る反面、半導体を第1図に示すように加工しなければな
らず手間を要し、例えば半導体の製造工程で行なうには
余りにも非能率的である。そこで、第2図に示すような
方法が知られている。
2. Description of the Related Art Conventionally, a method is known in which the Hall effect of a semiconductor is used to determine whether a semiconductor is P-type or N-type. According to this method, a semiconductor to be determined is cut into the shape shown in FIG. 1 by ultrasonic processing, and a current Ix is applied between electrodes 1 and 2.
While applying a magnetic field H2 in a direction perpendicular to the direction in which the current Ix flows, a Hall voltage Vy is generated in a direction perpendicular to the direction in which the current Ix flows and the direction in which the magnetic field H2 is applied.
is measured by a potentiometer provided between the electrodes 3 and 4, and the P type or N type of the semiconductor 5 is determined from the polarity of this Hall voltage Vy. Although this method can measure the conductivity of a semiconductor at the same time, it is time-consuming because the semiconductor must be processed as shown in Figure 1, and is too inefficient to be used in the semiconductor manufacturing process, for example. . Therefore, a method as shown in FIG. 2 is known.

すなわち、被判別試料の半導体6表面に2本の電極7、
8を接触させて、一方の電極Tを加熱し、該電極Tが接
触した半導体6の表面箇所内部に発生したドナー電荷や
アクセプタ電荷に起因すJ る電流の流れる方向を電流
計9で読み取つて半導体6のP型、N型を判別する。こ
の方法は使用する装置が簡単で手軽に行なえ、しかも第
1図に示す場合のように半導体を超音波加工しなくても
済み、便利である。反面、電極を加熱するのに時間j
がかかり能率的でなく、また半導体の表面状態によつて
P型、N型を判別するのが困難となる場合があり、信頼
性に乏しい欠点を有している。本発明は上記事情に鑑み
てなされたもので、その目的とするところは、判別作業
の能率が向上し、しかも信頼性のある半導体のP型、N
型の判別方法及びその方法を実施するための装置を提供
する点にある。すなわち、本発明は、被判別試料の半導
体表面に3本の針状電極を接触させて、これら針状電極
のうち2本の針状電極間に電流を流す一方、3本の針状
電極が接触した半導体表面箇所に光パルスを照射して、
電流を流している3本中2本の針状電極のいずれかの1
本と、他の電流を流していない1本の針状電極との間か
ら発生するパルス信号の極性により半導体のP型、N型
を判別することを特徴とする方法及び被判別体の半導体
表面に接触させる3本の針状電極と、これら針状電極の
うち2本の針状電極間に電流を供給する定電流電源と、
3本の針状電極が接触した半導体表面箇所に光パルスを
照射する光パルス発生装置と、電流を流している3本の
うち2本の針状電極のうちいずれか一方の針状電極と他
の電流を流していない1本の針状電極との間から発生す
るパルス信号の極性を検出する検出器とを具備してなる
ことを特徴とする装置に係わる。以下本発明を説明する
That is, two electrodes 7,
8 and heats one electrode T, and uses an ammeter 9 to read the direction in which current flows due to donor charges and acceptor charges generated inside the surface area of the semiconductor 6 that the electrode T contacts. Distinguish whether the semiconductor 6 is P type or N type. This method is convenient because it uses a simple device and can be carried out easily, and it does not require ultrasonic processing of the semiconductor as in the case shown in FIG. On the other hand, it takes time j to heat the electrode
This method is time consuming and inefficient, and it may be difficult to distinguish between P type and N type depending on the surface condition of the semiconductor, resulting in poor reliability. The present invention has been made in view of the above-mentioned circumstances, and its purpose is to improve the efficiency of discrimination work and to provide reliable P-type and N-type semiconductors.
The object of the present invention is to provide a type discrimination method and an apparatus for carrying out the method. That is, in the present invention, three needle-like electrodes are brought into contact with the semiconductor surface of a sample to be determined, and a current is passed between two of these needle-like electrodes, while the three needle-like electrodes are A light pulse is irradiated onto the contacting semiconductor surface,
One of two needle-shaped electrodes out of three that are passing current
A method characterized by determining whether a semiconductor is P-type or N-type based on the polarity of a pulse signal generated between a book and a needle-shaped electrode through which no other current is flowing, and the semiconductor surface of the object to be determined. three needle-like electrodes brought into contact with the needle-like electrodes; a constant current power source that supplies current between two of these needle-like electrodes;
A light pulse generator that irradiates a light pulse to a semiconductor surface area where three needle-like electrodes are in contact, one of two of the three needle-like electrodes through which current is flowing, and the other needle-like electrodes. The present invention relates to a device characterized in that it is equipped with a detector that detects the polarity of a pulse signal generated between the present invention and one needle-like electrode through which no current is flowing. The present invention will be explained below.

第3図中10,11,12は針状電極、13は被判別試
料の半導体、14は定電流電源、15は光パルス発生器
、16は検出器、17は選択スィツチ、18,19,2
0は各電極のリード線、17aは選択メィツチ17のa
接点、17bは選択スイツチ17のb接点である。
In FIG. 3, 10, 11, and 12 are needle-shaped electrodes, 13 is a semiconductor of a sample to be determined, 14 is a constant current power source, 15 is a light pulse generator, 16 is a detector, 17 is a selection switch, 18, 19, 2
0 is the lead wire of each electrode, 17a is a of the selection match 17
The contact 17b is the b contact of the selection switch 17.

ここで針状電極10,11,12は先端が尖鋭になつて
いて、径が0.5mmφ程度で、タングステンカーバイ
ドやタングステン等から形成されて卦り、そして被判別
試料の半導体13表面上に接触するようになつている。
Here, the needle electrodes 10, 11, and 12 have sharp tips, a diameter of about 0.5 mm, and are made of tungsten carbide, tungsten, etc., and are in contact with the surface of the semiconductor 13 of the sample to be determined. I'm starting to do that.

この3本の針状電極10,11,12の配列の順番は任
意で良く、また3本の針状電極は必ずしも一直線に配列
しなくとも良い。
The three needle electrodes 10, 11, 12 may be arranged in any order, and the three needle electrodes do not necessarily have to be arranged in a straight line.

ここで本発明を説明するにあたり、第3図を代表例とし
て以後第3図に従つて説明する。
In explaining the present invention, FIG. 3 will be used as a representative example, and the following explanation will be made with reference to FIG.

第3図に於いて、各針状電極10,11,12間の間隔
は1m11乃至100mm程度に設定され、一直線上に
並べられている。
In FIG. 3, the spacing between the needle electrodes 10, 11, and 12 is set to about 1 m11 to 100 mm, and they are arranged in a straight line.

また65t本程度の接触圧で半導体13表面上に接触す
るようになつている。また、定電流電源14は短絡電流
値が1mA乃至100mA程度で、前記針状電極10,
11,12のうち両端に位置する針状電極10,12が
接触されていて、該針状電極10,12間に10mA程
度の直流電流を流すようになつている。な卦この定電流
電源14は、出力インピーダンスが高いものであればよ
く厳密な意味での定電流電源である必要はない。また、
光パルス発生器15は、発光源としてクセノンランプや
レーザダイオード等が使用されて卦り、針状電極10,
11,12が接触した半導体13表面箇所に光パルスを
照射するようになつている。
Further, it is designed to come into contact with the surface of the semiconductor 13 with a contact pressure of about 65 tons. Further, the constant current power supply 14 has a short circuit current value of about 1 mA to 100 mA, and the needle electrode 10,
The needle-like electrodes 10 and 12 located at both ends of the needle-like electrodes 11 and 12 are in contact with each other, and a direct current of about 10 mA is passed between the needle-like electrodes 10 and 12. Note that the constant current power supply 14 does not need to be a constant current power supply in the strict sense as long as it has a high output impedance. Also,
The optical pulse generator 15 uses a xenon lamp, a laser diode, etc. as a light emitting source, and has needle electrodes 10,
A light pulse is irradiated onto the surface of the semiconductor 13 where the semiconductor devices 11 and 12 are in contact.

また、検出器16は最高垂直感度が5mv/Div以上
で周波数特性が10MHz以上のオシロスコープから構
成されていて、前記針状電極11に設けたリード線18
が接続され、また前記針状電極10,12VCそれぞれ
設けたリード線19,20が選択スイツチ17を介して
接続されて}り、光パルス発生器15から半導体13表
面に光パルスが照射されたとき針状電極10と11間あ
るいは針状電極12と11間から出力されるパルス信号
を測定するようになつている。
Further, the detector 16 is composed of an oscilloscope with a maximum vertical sensitivity of 5 mv/Div or more and a frequency characteristic of 10 MHz or more.
are connected, and the lead wires 19 and 20 provided respectively to the needle electrodes 10 and 12VC are connected via the selection switch 17, and a light pulse is irradiated from the light pulse generator 15 to the surface of the semiconductor 13. A pulse signal output from between needle-like electrodes 10 and 11 or between needle-like electrodes 12 and 11 is measured.

また、選択スイツチ17は通常のスナツプスィッチから
構成されていて、そのスイツチ接点17aと17bが前
記リード線19,20の端部と接続するようになつてい
る。
Further, the selection switch 17 is constituted by an ordinary snap switch, and the switch contacts 17a and 17b are connected to the ends of the lead wires 19 and 20.

次に上記装置を使用して半導体のP型、N型を判別する
方法について説明する。
Next, a method for determining whether a semiconductor is P-type or N-type using the above-mentioned apparatus will be described.

まず、半導体13にあらかじめ判別されているN型(も
しくはP型)の半導体試料を針状電極10,11,12
に一定の接触圧で接触させる。
First, an N-type (or P-type) semiconductor sample, which has been determined in advance as a semiconductor 13, is placed on the needle electrodes 10, 11, 12.
with a constant contact pressure.

次いで定電流電源14から両端に位置する針状電極10
,12間に10mA程度の直流電流を流す一方、光パル
ス発生器15から針状電極10,11,12が接触した
半導体13の表面箇所に光パルスを照射する。このとき
選択スイツチ17のスィツチ接点は17a(もしくは1
7b)のほうに倒して、電極10と11間(もしくは電
極11と12間)から発生するパルス信号を検出器16
で観測するようにして卦く。すると検出器16には第4
図二のような正パルスか、第4図ハのような負パルスが
観測される。そしてN型(もしくはP型)での出力パル
スの正、負を調査する。仮りVC.N型で出力パルスが
正パルスとしよう、そうするとP型では負パルスで観測
される。したがつて検出器16でパルスの信号の正、負
を観測することにより半導体13のP型、N型を判別す
ることができる。ここで、被判別試料の半導体13とし
ては、その表面状態がダイヤモンドカツタ一により切断
されたままの状態(スライス面)のものと、アルカリ性
物質を含む研摩材で機械的及び化学的に研摩された状態
(ミラー面)のものと、エツチング液で化学的に研摩さ
れた状態(エツチング面)のものと、アルミナ等の研摩
材で機械的に研摩された状態(ラツプ面)のもの等があ
る。
Next, the needle electrodes 10 located at both ends are connected to the constant current power source 14.
, 12, and a light pulse is irradiated from the light pulse generator 15 to the surface portion of the semiconductor 13 that is in contact with the needle electrodes 10, 11, 12. At this time, the switch contact of the selection switch 17 is 17a (or 1
7b), and the pulse signal generated between electrodes 10 and 11 (or between electrodes 11 and 12) is detected by detector 16.
Make a trigram by observing it. Then, the fourth
Either a positive pulse as shown in Figure 2 or a negative pulse as shown in Figure 4C is observed. Then, check whether the output pulse is positive or negative in the N type (or P type). Temporary VC. Let's assume that the output pulse is a positive pulse in the N type, then it will be observed as a negative pulse in the P type. Therefore, by observing the positive and negative pulse signals with the detector 16, it is possible to determine whether the semiconductor 13 is P type or N type. Here, the semiconductor 13 of the sample to be determined is one whose surface condition is as it was cut with a diamond cutter (sliced surface), and one whose surface condition is as it is (sliced surface), and one whose surface condition is as it is (sliced surface), and one whose surface condition is as it is (slice surface) There are some types (mirror surface), those that have been chemically polished with an etching solution (etched surface), and those that have been mechanically polished with an abrasive such as alumina (lap surface).

本発明はこれらの表面状態(スライス面、ミラー面、エ
ツチング面、ラツプ面等)がどんなときでも測定できる
長所を有している。
The present invention has the advantage that these surface conditions (slice surface, mirror surface, etched surface, lap surface, etc.) can be measured at any time.

次に本発明に於けるP型、N型の測定原理を簡単に説明
する。
Next, the principle of measuring P type and N type in the present invention will be briefly explained.

光パルスが照射されていない状態にあつては針状電極1
0と12間に流れる直流電流の波形は第4図イに示すよ
うに直線状になつている。
When the light pulse is not irradiated, the needle electrode 1
The waveform of the DC current flowing between 0 and 12 is linear as shown in FIG. 4A.

そこで同図口に示すような波形の光パルスを針状電極1
0,11,12が接触した箇所に照射すると光パルスが
照射されている時間だけ針状電極11付近の表面層に、
P型ならばアクセブタによる電荷が励起され、N型なら
ば電子による電荷が励起される。ここでP型のアクセブ
タの電荷はプラス電荷であるから半導体13から針状電
極11に向つて流れようとする起電力が発生する。N型
の場合の電子の電荷はマイナスであるから針状電極11
から半導体13に向つて流れようとする起電力が発生す
る。したがつて、P型の出力パルスとN型の出力パルス
は極性が逆になり、P型とN型の判別ができる。以上説
明したように本発明の方法によれば、3本の針状電極を
使用し、2本の針状電極間に電流を流す一方、針状電極
10,11,12が接触した半導体表面箇所に光パルス
を照射して、2本の電流を流した針状電極のうち、いず
れか一方と残りの針状電極との間から発生するパルス信
号からP型、N型を判別するから、従来の如く電極が加
熱されるまで待つ必要がなく判別作業の能率が格段と向
上し、また被判別試料の半導体表面状態によつて左右さ
れず、信頼性の高い判別を行うことができる。
Therefore, a light pulse with a waveform as shown in the opening of the same figure is applied to the needle electrode 1.
When irradiating the area where 0, 11, and 12 are in contact, the surface layer near the needle electrode 11 is exposed to the light pulse for the duration of the irradiation.
If it is a P type, charges due to acceptors are excited, and if it is an N type, charges due to electrons are excited. Here, since the charge of the P-type acceptor is a positive charge, an electromotive force that tends to flow from the semiconductor 13 toward the needle electrode 11 is generated. Since the charge of electrons in the case of N type is negative, the needle-like electrode 11
An electromotive force is generated that tends to flow from the semiconductor 13 toward the semiconductor 13. Therefore, the polarities of the P-type output pulse and the N-type output pulse are reversed, and it is possible to distinguish between the P-type and the N-type. As explained above, according to the method of the present invention, three needle-like electrodes are used, and while a current is passed between the two needle-like electrodes, the points on the semiconductor surface that are in contact with the needle-like electrodes 10, 11, and 12 are Conventional method It is not necessary to wait until the electrodes are heated as in the case of the present invention, and the efficiency of the discrimination work is greatly improved, and highly reliable discrimination can be performed without being influenced by the semiconductor surface condition of the sample to be discriminated.

また本発明の装置によれば、被判別試料の半導体表面に
接触させる3本の針状電極と、これら針状電極のうち2
本の針状電極間に電流を供給する定電流電源と、3本の
針状電極が接触した半導体表面箇所に光パルスを照射す
る光パルス発生装置と、2本の電流を流した針状電極の
うちいずれか一方の針状電極と、他の針状電極との間か
ら発生するパルス信号の極性を検知する検出器とを具備
してなるから、半導体のP型、N型の判別を迅速にしか
も正確に行なうことができ、しかも針状電極を1本追加
し、他の装置を設けることにより比抵抗測定、ライフタ
イム測定等も行なうことができる等の効果を奏する。
Further, according to the apparatus of the present invention, three needle-shaped electrodes are brought into contact with the semiconductor surface of the sample to be discriminated, and two of these needle-shaped electrodes are
A constant current power supply that supplies current between the needle-like electrodes, a light pulse generator that irradiates light pulses to the semiconductor surface area where the three needle-like electrodes are in contact, and two needle-like electrodes that carry current. Since it is equipped with a detector that detects the polarity of the pulse signal generated between one of the needle-like electrodes and the other needle-like electrode, it is possible to quickly distinguish between P-type and N-type semiconductors. Moreover, it can be carried out accurately, and by adding one needle electrode and providing other devices, it is possible to perform specific resistance measurement, lifetime measurement, etc.

さらに針状電極の測定する際の移動間隔を少なくすれば
半導体の微少部分のP型、N型を調べることもできる。
Furthermore, by reducing the movement interval during measurement of the needle-shaped electrode, it is possible to investigate the P-type and N-type in minute portions of the semiconductor.

以下実施例及び比較例を示し、本発明を更に具体的に説
明する。
EXAMPLES The present invention will be explained in more detail below with reference to Examples and Comparative Examples.

被判別試料の半導体としてシリコン単結晶を用いた場合
について説明する。
A case will be described in which a silicon single crystal is used as the semiconductor of the sample to be determined.

まず、シリコン単結晶の表面を(アルミナ)を含む研摩
材で機械的及び化学的に研摩してミラー面にした試料(
黒1)と、硝酸:酢酸:フッ酸=6:3:1の割合のエ
ツチング液で化学的に研摩してエツチング面にした試料
(黒2)と、メツシユ1200のアルミナからなる研摩
材で機械的に研摩してラツプ面にした試料(黒3)と、
ダイヤモンドカツタ一で切断してスライス面にした試料
C蚤4)を用意した。
First, the surface of a silicon single crystal was mechanically and chemically polished with an abrasive containing (alumina) to create a mirror surface (
Black 1), a sample (black 2) whose etched surface was chemically polished with an etching solution with a ratio of nitric acid: acetic acid: hydrofluoric acid = 6:3:1, and an abrasive material made of mesh 1200 alumina. A sample (black 3) that was polished to a lap surface,
Sample C flea 4) was prepared by cutting with a diamond cutter into a sliced surface.

) また、針状電極として、タングステンカーバイト
を使用した。
) Also, tungsten carbide was used as the needle electrode.

こごで針の径は0.5詣φ、各針状電極間の間隔は1m
m1接触圧は200tであつた。また、定電流電源とし
て短絡電流値が(5〜10mA)のものを使用した。ま
た光パルス発生装置; として、クセノンランプを発光
源にしたものを使用した。また、検出器として最高垂直
感度が5mv/Divで周波数特性が20MHzのオシ
ロスコープを使用した。
The diameter of the needle is 0.5 mm, and the distance between each needle electrode is 1 m.
The m1 contact pressure was 200t. In addition, a constant current power source with a short circuit current value of (5 to 10 mA) was used. In addition, a light pulse generator using a xenon lamp as a light source was used. Further, as a detector, an oscilloscope with a maximum vertical sensitivity of 5 mv/Div and a frequency characteristic of 20 MHz was used.

そして定電流電源から両端の針状電9極間に10mAの
電流を流す一方針状電極10,11,12が接触した試
料の表面箇所に光パルスを照射して発生するパルス信号
をオシロスコープで観測して、各試料につきP型、N型
の判別を行ない下記の表に示す結果を得た。な卦従来法
・(2本の針状電極を用い、その一方の電極を加熱して
行なう方法)により上記各試料につきP型、N型の判別
も行なつて(比較例)その結果を下記の表に併記した。
Then, a current of 10 mA is passed from a constant current power supply between nine needle electrodes at both ends. A light pulse is irradiated onto the surface of the sample where the single needle electrodes 10, 11, and 12 are in contact, and the generated pulse signal is observed using an oscilloscope. The P-type and N-type were determined for each sample, and the results shown in the table below were obtained. P-type and N-type were also determined for each of the above samples using the conventional method (method using two needle electrodes and heating one of the electrodes) (comparative example), and the results are shown below. It is also listed in the table.

表から明らかなように本発明による方法は、半導体の表
面状態によつて左右されず常に正確な判別を行なうこと
ができる。
As is clear from the table, the method according to the present invention is not affected by the surface condition of the semiconductor and can always perform accurate discrimination.

な卦上記実施例は、シリコン単結晶について行なつた場
合を示したが、ゲルマニウム単結晶についても同様の結
果が得られている。
Although the above example shows the case where silicon single crystals were used, similar results were obtained with germanium single crystals.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図、第2図は従来法を説明するための概略図、第3
図は本発明の一実施例を示した概略図、第4図のイ乃至
二は波形を示す図で、第4図イは針状電極10,12間
に流す電波の波形図、同図印1光パルスの波形図、同図
ハはP型の場合のパルス信号の波形図、同図二はN型の
場合のパルス信号の波形図である。 10,11,12・・・・・・針状電極、13・・・・
・・半導体、14・・・・・・定電流電源、15・・・
・・・光パルス発生装置、16・・・・・・検出器、1
7・・・・・・選択スイツチ、17a・・・・・・17
のa接点、17b・・・・・・17のb接点、18,1
9,20・・・・・・リード線。
Figures 1 and 2 are schematic diagrams for explaining the conventional method, and Figure 3 is a schematic diagram for explaining the conventional method.
The figure is a schematic diagram showing an embodiment of the present invention. Figures A to 2 in Figure 4 are diagrams showing waveforms, and Figure 4A is a waveform diagram of radio waves flowing between the needle electrodes 10 and 12. 1 is a waveform diagram of one optical pulse, C is a waveform diagram of a pulse signal in case of P type, and Figure 2 is a waveform diagram of a pulse signal in case of N type. 10, 11, 12...acicular electrode, 13...
...Semiconductor, 14... Constant current power supply, 15...
...Light pulse generator, 16...Detector, 1
7...Selection switch, 17a...17
A contact, 17b...B contact of 17, 18,1
9,20...Lead wire.

Claims (1)

【特許請求の範囲】 1 半導体のP型、N型を判別する方法において、被判
別試料の半導体表面に3本の針状電極を接触させて、こ
のうち2本の針状電極間に電流を流す一方、3本の針状
電極と接触している半導体表面箇所に光パルスを照射し
て、2本の針状電極のうちいずれか一方の針状電極と、
他の電流を流していない1本の針状電極との間から発生
するパルス信号の極性によりP型かN型かを判別するこ
とを特徴とする半導体のP型、N型の判別方法。 2 被判別試料の半導体表面に接触させる3本の針状電
極と、このうち2本の針状電極間に電流を供給する定電
流電源と、3本の針状電極が接触した半導体表面箇所に
光パルスを照射する光パルス発生装置と、3本中電流を
流す2本の針状電極のうちいずれか一方の針状電極と、
他の電流を流していない1本の針状電極との間から発生
するパルス信号の極性を検知する検出器とを具備してな
ることを特徴とする半導体のP型、N型の判別装置。
[Claims] 1. In a method for distinguishing between P-type and N-type semiconductors, three needle-shaped electrodes are brought into contact with the semiconductor surface of a sample to be discriminated, and a current is applied between two of these needle-shaped electrodes. While the flow is flowing, a light pulse is irradiated to the part of the semiconductor surface that is in contact with the three needle-like electrodes, so that one of the two needle-like electrodes,
A method for determining whether a semiconductor is P-type or N-type, the method comprising determining whether the semiconductor is P-type or N-type based on the polarity of a pulse signal generated between it and one needle-like electrode through which no current is flowing. 2. Three needle-like electrodes that are brought into contact with the semiconductor surface of the sample to be determined, a constant current power source that supplies current between two of these needle-like electrodes, and a point on the semiconductor surface that the three needle-like electrodes have contacted. A light pulse generator that irradiates light pulses, one of the two needle-like electrodes that conducts current among the three needle-like electrodes,
1. A device for discriminating P-type and N-type semiconductors, comprising a detector for detecting the polarity of a pulse signal generated between one needle-like electrode through which no current flows.
JP15138878A 1978-12-07 1978-12-07 Method and device for determining P-type and N-type semiconductors Expired JPS5933266B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15138878A JPS5933266B2 (en) 1978-12-07 1978-12-07 Method and device for determining P-type and N-type semiconductors

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15138878A JPS5933266B2 (en) 1978-12-07 1978-12-07 Method and device for determining P-type and N-type semiconductors

Publications (2)

Publication Number Publication Date
JPS5577149A JPS5577149A (en) 1980-06-10
JPS5933266B2 true JPS5933266B2 (en) 1984-08-14

Family

ID=15517484

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15138878A Expired JPS5933266B2 (en) 1978-12-07 1978-12-07 Method and device for determining P-type and N-type semiconductors

Country Status (1)

Country Link
JP (1) JPS5933266B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6446944A (en) * 1987-07-22 1989-02-21 Nippon Denzai Kogyo Kenkyusho Noncontact device for discriminating semiconductor polality
US9250014B2 (en) * 2011-08-25 2016-02-02 Mitsubishi Materials Techno Corporation Vacuum storage method and device for crystalline material

Also Published As

Publication number Publication date
JPS5577149A (en) 1980-06-10

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