JPS5932916B2 - How to manufacture circuit boards - Google Patents

How to manufacture circuit boards

Info

Publication number
JPS5932916B2
JPS5932916B2 JP7012576A JP7012576A JPS5932916B2 JP S5932916 B2 JPS5932916 B2 JP S5932916B2 JP 7012576 A JP7012576 A JP 7012576A JP 7012576 A JP7012576 A JP 7012576A JP S5932916 B2 JPS5932916 B2 JP S5932916B2
Authority
JP
Japan
Prior art keywords
copper plating
iron
metal plate
plating film
epoxy resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP7012576A
Other languages
Japanese (ja)
Other versions
JPS52153160A (en
Inventor
高雄 佐藤
源次 森崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Hitachi Ltd
NEC Corp
Nippon Telegraph and Telephone Corp
Oki Electric Industry Co Ltd
Original Assignee
Fujitsu Ltd
Hitachi Ltd
Nippon Telegraph and Telephone Corp
Oki Electric Industry Co Ltd
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd, Hitachi Ltd, Nippon Telegraph and Telephone Corp, Oki Electric Industry Co Ltd, Nippon Electric Co Ltd filed Critical Fujitsu Ltd
Priority to JP7012576A priority Critical patent/JPS5932916B2/en
Publication of JPS52153160A publication Critical patent/JPS52153160A/en
Publication of JPS5932916B2 publication Critical patent/JPS5932916B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
  • Insulated Metal Substrates For Printed Circuits (AREA)

Description

【発明の詳細な説明】 本発明は接地回路を有する金属芯入り回路基板の製造方
法に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method of manufacturing a metal core circuit board having a ground circuit.

鉄、アルミなどの金属芯入り回路基板は、熱放散性、熱
伝導性がすぐれているため電子工業において、、例えば
高出力トランジスター等の発熱電子部品の搭載用に使用
されている。
Circuit boards with metal cores such as iron and aluminum have excellent heat dissipation and thermal conductivity, and are therefore used in the electronics industry for mounting heat-generating electronic components such as high-output transistors.

金属芯材料としては鉄、アルミニウムが一般的であり、
例えば鉄芯入り回路基板に接地回路を設ける方法として
は、鉄芯および鉄芯表面の電気絶縁層を貫通する孔を設
け、該孔壁の鉄壁上に化学銅メッキを施し、さらに電気
銅メッキで化学銅メッキ膜を補強することが行なわれて
いた。
Iron and aluminum are commonly used as metal core materials.
For example, a method for providing a grounding circuit on a circuit board with an iron core is to provide a hole that penetrates the iron core and the electrical insulation layer on the surface of the iron core, apply chemical copper plating on the iron wall of the hole wall, and then electrolytic copper plating. Chemical copper plating films have been reinforced.

しかし電子部品接地リードを半田付けによつて該孔壁に
接合する際、半田付けの高熱により、しぱしば該鉄孔壁
上の化学銅メッキ膜が鉄壁上から剥離することが観察さ
れていた。これは鉄と化学銅メッキ膜の密着力が十分で
なかつたためにおこるものである。また鉄壁上に直接化
学銅メッキ膜を形成する際、化学銅メッキ液中に鉄イオ
ンが溶解し、化学銅メッキ液を汚染して、化学銅メッキ
液の分解を早める等の欠点がおきていた。本発明の目的
は従来の接地回路を有する鉄芯入り回路基板を製造する
方法における上記の欠点を除去し安定した接地接続を有
する金属芯入り回路基板の製造方法を提供することにあ
る。
However, when an electronic component ground lead is joined to the wall of the hole by soldering, it has been observed that the chemical copper plating film on the wall of the iron hole often peels off from the iron wall due to the high heat of soldering. . This occurs because the adhesion between the iron and the chemical copper plating film is not sufficient. In addition, when forming a chemical copper plating film directly on an iron wall, iron ions dissolve in the chemical copper plating solution, contaminating the chemical copper plating solution, and hastening the decomposition of the chemical copper plating solution. . SUMMARY OF THE INVENTION An object of the present invention is to eliminate the above-mentioned drawbacks of the conventional method of manufacturing a circuit board with a metal core having a ground circuit, and to provide a method of manufacturing a circuit board with a metal core having a stable ground connection.

すなわち、本発明においては絶縁性樹脂で表面が被覆さ
れた金属板からなる配線基板に設けられた少くとも金属
板表面に達する開口において表面の絶縁性樹脂および開
口内における金属面を予め硫酸とクローム酸との混合液
で化学的に表面粗化した後、開口内の金属面上に置換銅
メッキ膜を形成し、さらに化学銅メッキおよび電気銅メ
ッキにより置換銅メッキ膜を補強し、この開口部で形成
される他の導電回路を同時に形成することを特徴とする
That is, in the present invention, in an opening that reaches at least the surface of the metal plate provided in a wiring board made of a metal plate whose surface is coated with an insulating resin, the insulating resin on the surface and the metal surface inside the opening are pretreated with sulfuric acid and chromium. After chemically roughening the surface with a mixed solution with acid, a displacement copper plating film is formed on the metal surface within the opening, and the displacement copper plating film is further reinforced by chemical copper plating and electrolytic copper plating. It is characterized in that another conductive circuit is formed at the same time.

本発明は化学銅メッキを行う前に予め置換銅メッキ膜が
金属面上に形成されているため次工程の化学銅メッキに
おいて化学銅メッキ液を汚染する心配がないo本発明に
使用する置換銅メッキ液の好ましい組成例を第1表に示
した0この組成液によれば特に密着性のすぐれた置換銅
メツキ膜が得られ接地回路の電気的接続、信頼性を著し
く向上することができる0ここで湿潤剤としては陰イオ
ン弗化炭化水素化合物のものを有効に用いうる。
In the present invention, since a displacement copper plating film is formed on the metal surface in advance before performing chemical copper plating, there is no risk of contaminating the chemical copper plating solution in the next step of chemical copper plating. o The displacement copper used in the present invention Preferred composition examples of the plating solution are shown in Table 1. With this composition, a substituted copper plating film with particularly excellent adhesion can be obtained, and the electrical connection and reliability of the ground circuit can be significantly improved. Here, as the wetting agent, an anionic fluorinated hydrocarbon compound can be effectively used.

以下本発明の実施例を図面にもとづいて詳細に説明する
〇鉄板1の所望の位置にドリルまたはパンチングによつ
て貫通孔2および3を形成する(第1図a)次いで鉄板
の表面および貫通孔2および3の孔壁にエポキシ樹脂層
4を形成する0電気絶縁性樹脂としては、エポキシ樹脂
の他にアクリル樹脂、塩化ビニール樹脂、ABS樹脂等
を用いることができる。
Embodiments of the present invention will be described below in detail based on the drawings.Through holes 2 and 3 are formed at desired positions of the iron plate 1 by drilling or punching (Fig. 1a).Then, the surface of the iron plate and the through holes are formed. As the electrically insulating resin for forming the epoxy resin layer 4 on the walls of holes 2 and 3, acrylic resin, vinyl chloride resin, ABS resin, etc. can be used in addition to epoxy resin.

また前記樹脂層の形成法としては、電着塗装法、流動床
浸漬法、静電流動床浸漬法等を用いることができる。こ
こでは流動床浸漬法を用いエポキシ樹脂層を形成した0
すなわち鉄板1を温度200℃で約10分間加熱し、た
だちにエポキシ樹脂粉末流動床浸漬槽(図示省略)に約
2秒間浸漬し、エポキシ樹脂層4を鉄板1の表面および
貫通孔2および3の孔壁に厚さ約200ミクロン形成し
た0(第1図b)次いで温度200℃で約10分間加熱
しエポキシ樹脂層4を完全に熱硬化させた。次に貫通孔
3における鉄板1の孔壁部のエポキシ樹脂層をドリルに
より除去した(第1図c)。この場合ドリルで貫通孔3
のエポキシ樹脂層4を除去する方法と同様の効果が得ら
れる次の方法を用いてもよい。すなわち予めエポキシ樹
脂層を形成する前に金属ピン、シリコン樹脂ピンあるい
は木製ピン等を穴栓として貫通孔3に挿入しておき、貫
通孔3へのエポキシ樹脂の浸入を遮へいし、エポキシ樹
脂層形成後、該遮へいピンを除去することにより同様に
得られる0次いで液温70℃の硫酸とクロム酸との混合
液に約15分間浸漬してエポキシ樹脂層4の表面および
貫通孔の鉄壁を化学的に表面を粗化した。次に第1表に
示した置換銅メツキ液に約10分間浸漬して約1ミクロ
ンの置換銅メツキ膜5を貫通孔3の鉄壁上に形成した(
第1図d)。次いで塩化スズ、塩酸等からなる化学メツ
キ用触媒液に約5分間浸漬し、水洗後化学銅メツキ液に
浸漬して約5ミクロンの化学銅メツキ膜6を貫通孔2お
よび3の孔壁およびエポキシ樹脂層表面に形成した(第
1図e)。次にメツキレジスト被膜7を化学銅メツキ膜
6上に選択的に形成する(第1図f)。次いでピロリン
酸電気銅メツキにより電気銅メツキ膜8を約30ミクロ
ン付着させ化学銅メツキ膜6を補強する(第1図g)。
次にメツキレジスト被膜7を塩化メチレン溶液で溶解除
去した後、塩化第ヒ鉄化学蝕刻液によりピロリン酸電気
銅メツキ膜非被覆部分の化学銅メツキ膜を除去し接地回
路9を有する鉄芯入り回路基板を製造した(第1図h)
。このように製造した回路基板を温度230℃で約30
分間熱処理したころ接地回路9における鉄壁と銅メツキ
膜の密着性の劣化は認められず、接地回路は高電気的接
続信頼性を有することが実証された。このように本発明
による回路基板は高信頼性を有し、本発明の実用的価値
は著しく大きい0なお上述した実施例では金属板を含む
貫通孔において本発明を適用した場合について示したが
本発明においては必ずしも貫通孔である必要はないもの
で金属板が樹脂被覆から露出しているのみの場合の接地
接続の形成にも本発明は適用できるものであるO
Further, as a method for forming the resin layer, an electrodeposition coating method, a fluidized bed dipping method, an electrostatic fluidized bed dipping method, etc. can be used. Here, an epoxy resin layer was formed using the fluidized bed dipping method.
That is, the iron plate 1 is heated at a temperature of 200° C. for about 10 minutes, and immediately immersed in an epoxy resin powder fluidized bed dipping bath (not shown) for about 2 seconds, and the epoxy resin layer 4 is coated on the surface of the iron plate 1 and through holes 2 and 3. The epoxy resin layer 4 was formed on the wall to a thickness of about 200 microns (FIG. 1b) and then heated at 200 DEG C. for about 10 minutes to completely heat cure the epoxy resin layer 4. Next, the epoxy resin layer on the wall of the iron plate 1 in the through hole 3 was removed using a drill (FIG. 1c). In this case, drill through hole 3.
You may use the following method which can obtain the same effect as the method of removing the epoxy resin layer 4 described above. That is, before forming the epoxy resin layer, a metal pin, silicone resin pin, wooden pin, etc. is inserted into the through hole 3 as a hole plug to block the epoxy resin from entering the through hole 3, and the epoxy resin layer is formed. After that, the surface of the epoxy resin layer 4 and the iron wall of the through hole are chemically immersed in a mixed solution of sulfuric acid and chromic acid at a temperature of 70° C. for about 15 minutes. The surface was roughened. Next, a displacement copper plating film 5 of approximately 1 micron was formed on the iron wall of the through hole 3 by immersion in the displacement copper plating solution shown in Table 1 for about 10 minutes (
Figure 1 d). Next, the chemical copper plating film 6 of approximately 5 microns was immersed in a chemical plating catalyst solution consisting of tin chloride, hydrochloric acid, etc. for about 5 minutes, washed with water, and then immersed in a chemical copper plating solution. It was formed on the surface of the resin layer (Fig. 1e). Next, a plating resist film 7 is selectively formed on the chemical copper plating film 6 (FIG. 1f). Next, an electrolytic copper plating film 8 of about 30 microns is deposited using pyrophosphate electrolytic copper plating to reinforce the chemical copper plating film 6 (FIG. 1g).
Next, after dissolving and removing the plating resist film 7 with a methylene chloride solution, the chemical copper plating film on the parts not covered with the pyrophosphate electrolytic copper plating film is removed using a ferrous chloride chemical etching solution, and the iron cored circuit having the grounding circuit 9 is removed. The substrate was manufactured (Figure 1h)
. The circuit board manufactured in this way was heated at a temperature of 230°C for about 30 minutes.
No deterioration in the adhesion between the iron wall and the copper plating film in the roller ground circuit 9 was observed after the heat treatment for 1 minute, demonstrating that the ground circuit had high electrical connection reliability. As described above, the circuit board according to the present invention has high reliability, and the practical value of the present invention is extremely large.Although the above-mentioned embodiment shows the case where the present invention is applied to a through hole containing a metal plate, the present invention The present invention does not necessarily have to be a through hole, and the present invention can also be applied to forming a ground connection when the metal plate is only exposed from the resin coating.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図a−hは本発明における接地回路を有する鉄芯入
り回路基板の製造方法を説明するための主要工程におけ
る基板要部の断面図を示す〇図中の符号、1・・・・・
・鉄芯、2,3・・・・・・貫通孔、4・・・・・・エ
ポキシ樹脂層、5・・・・・・置換銅メツキ膜、6・・
・・・・化学銅メツキ膜、7・・・・・・メツキレジス
ト被膜、8・・・・・・電気銅メツキ膜、9・・・・・
・接地回路。
Figures 1a to 1h are cross-sectional views of the main parts of the board in the main steps for explaining the method of manufacturing a circuit board with an iron core having a grounding circuit according to the present invention.
・Iron core, 2, 3...through hole, 4...epoxy resin layer, 5...substituted copper plating film, 6...
... Chemical copper plating film, 7 ... Plating resist film, 8 ... Electrolytic copper plating film, 9 ...
・Grounding circuit.

Claims (1)

【特許請求の範囲】[Claims] 1 金属板を絶縁性樹脂で被覆してなる配線板において
前記樹脂被覆の所定部に少くとも金属板表面に達する開
口を設ける工程と、前記樹脂層の所定部の表面および前
記開口内に露出している前記金属板面を化学的に粗化す
る工程と、前記開口内で露出せる金属板面に置換銅メッ
キする工程とを含むことを特徴とする回路基板の製造方
法。
1. In a wiring board formed by coating a metal plate with an insulating resin, a step of providing an opening reaching at least the surface of the metal plate in a predetermined part of the resin coating, and a step of providing an opening reaching at least the surface of the metal plate in a predetermined part of the resin coating, A method for manufacturing a circuit board, comprising the steps of chemically roughening the surface of the metal plate exposed within the opening, and plating displacement copper on the surface of the metal plate exposed within the opening.
JP7012576A 1976-06-15 1976-06-15 How to manufacture circuit boards Expired JPS5932916B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7012576A JPS5932916B2 (en) 1976-06-15 1976-06-15 How to manufacture circuit boards

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7012576A JPS5932916B2 (en) 1976-06-15 1976-06-15 How to manufacture circuit boards

Publications (2)

Publication Number Publication Date
JPS52153160A JPS52153160A (en) 1977-12-20
JPS5932916B2 true JPS5932916B2 (en) 1984-08-11

Family

ID=13422506

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7012576A Expired JPS5932916B2 (en) 1976-06-15 1976-06-15 How to manufacture circuit boards

Country Status (1)

Country Link
JP (1) JPS5932916B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01160043A (en) * 1987-12-16 1989-06-22 Ibiden Co Ltd Substrate for loading electronic part and manufacture thereof

Also Published As

Publication number Publication date
JPS52153160A (en) 1977-12-20

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