JPS5927527A - 位置合せ用パタ−ン検出装置 - Google Patents

位置合せ用パタ−ン検出装置

Info

Publication number
JPS5927527A
JPS5927527A JP57136368A JP13636882A JPS5927527A JP S5927527 A JPS5927527 A JP S5927527A JP 57136368 A JP57136368 A JP 57136368A JP 13636882 A JP13636882 A JP 13636882A JP S5927527 A JPS5927527 A JP S5927527A
Authority
JP
Japan
Prior art keywords
detection
midpoint
center
alignment pattern
calculating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57136368A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0231855B2 (enrdf_load_stackoverflow
Inventor
Masami Nagashima
永島　雅美
Toshio Fukazawa
深沢　俊夫
Michio Tsunoda
道雄 角田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NSK Ltd
Original Assignee
NSK Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NSK Ltd filed Critical NSK Ltd
Priority to JP57136368A priority Critical patent/JPS5927527A/ja
Publication of JPS5927527A publication Critical patent/JPS5927527A/ja
Publication of JPH0231855B2 publication Critical patent/JPH0231855B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP57136368A 1982-08-06 1982-08-06 位置合せ用パタ−ン検出装置 Granted JPS5927527A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57136368A JPS5927527A (ja) 1982-08-06 1982-08-06 位置合せ用パタ−ン検出装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57136368A JPS5927527A (ja) 1982-08-06 1982-08-06 位置合せ用パタ−ン検出装置

Publications (2)

Publication Number Publication Date
JPS5927527A true JPS5927527A (ja) 1984-02-14
JPH0231855B2 JPH0231855B2 (enrdf_load_stackoverflow) 1990-07-17

Family

ID=15173528

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57136368A Granted JPS5927527A (ja) 1982-08-06 1982-08-06 位置合せ用パタ−ン検出装置

Country Status (1)

Country Link
JP (1) JPS5927527A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01207604A (ja) * 1988-02-15 1989-08-21 Canon Inc マーク位置検出方法及びそれが適用される装置
JPH07320998A (ja) * 1992-03-17 1995-12-08 Hitachi Ltd 段差パターン検出方法とその装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01207604A (ja) * 1988-02-15 1989-08-21 Canon Inc マーク位置検出方法及びそれが適用される装置
JPH07320998A (ja) * 1992-03-17 1995-12-08 Hitachi Ltd 段差パターン検出方法とその装置

Also Published As

Publication number Publication date
JPH0231855B2 (enrdf_load_stackoverflow) 1990-07-17

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