JPS59232845A - Manufacture of metallic foil lined metallic substrate - Google Patents

Manufacture of metallic foil lined metallic substrate

Info

Publication number
JPS59232845A
JPS59232845A JP10740383A JP10740383A JPS59232845A JP S59232845 A JPS59232845 A JP S59232845A JP 10740383 A JP10740383 A JP 10740383A JP 10740383 A JP10740383 A JP 10740383A JP S59232845 A JPS59232845 A JP S59232845A
Authority
JP
Japan
Prior art keywords
metal
foil
substrate
covered
metal foil
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10740383A
Other languages
Japanese (ja)
Other versions
JPH0216696B2 (en
Inventor
和男 加藤
辰夫 中野
新一郎 浅井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Denka Co Ltd
Original Assignee
Denki Kagaku Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Denki Kagaku Kogyo KK filed Critical Denki Kagaku Kogyo KK
Priority to JP10740383A priority Critical patent/JPS59232845A/en
Publication of JPS59232845A publication Critical patent/JPS59232845A/en
Publication of JPH0216696B2 publication Critical patent/JPH0216696B2/ja
Granted legal-status Critical Current

Links

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 本発明は、熱放散性に丁ぐれ定金属箔張り金属基板の製
法に関fるものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing a metal foil-covered metal substrate with uniform heat dissipation properties.

従来711)らフェノール樹脂・紙系銅張績層板やエポ
キシ樹脂・ガラスクロス系@張積層板等の樹脂系銅張積
層板の製造は、Bステージ迄半硬化したプレ7’ IJ
グと銅箔とを多数取ね合せ、これを多投プレスに挿入し
て、加熱加圧し、樹脂を硬化させて行っていた。この方
法の利点は、1度に多数の積層基板の製造が出来る点に
あるが、欠点は、■ 予備操作、昇温等の時間が長(1
3−73sること、■ 基板の加熱むらを少なくするた
めの昇温、冷却等の工程管理が難しいこと、 ■ 設備投資が多大となること であった。
Conventionally, the production of resin-based copper-clad laminates such as phenolic resin/paper-based copper-clad laminates and epoxy resin/glass cloth-based @clad laminates has been carried out using pre-7' IJ semi-cured to the B stage.
This was done by assembling a large number of copper foils and inserting them into a multi-throw press, heating and pressurizing them to harden the resin. The advantage of this method is that a large number of laminated substrates can be manufactured at one time, but the disadvantages are: ■ Long time required for preliminary operations, temperature rise, etc.
3-73 seconds; (1) It was difficult to control the process such as heating and cooling to reduce uneven heating of the substrate; (2) It required a large investment in equipment.

ところで、パワートランジスタやパワーIC等の発熱の
大きい半導体素子を搭載するハイブリッドIC用基板と
して、近年、熱伝導性と電気絶縁性を備えたアルミニウ
ムベース銅張基板が出現し、一部の用途では、独占的に
使用されるに至っている。これらのアルミニウム基板は
、接着剤を塗布した銅箔を、アルミニウム基板に多段プ
レスで熱圧着する7111)、もしくは、Bステージ状
に半硬化したデレデリグをアルミニウム基板の上に静置
し、次に銅箔を1−4いて多段プレスで熱圧着fろ方法
により製造されている。しかしながら、アルミニウム基
板と銅箔の間に存在する絶縁性の接着層の厚さが、前述
の樹脂系銅張積層板の場合の−〜−1050 と薄いために、プレス時に脱ガスを完全に行なうことが
大変雉しく、気心が残存することがあるため、銅箔の接
着強度信頼性および耐電圧信頼性に雑煮があっ1こ。
By the way, in recent years, aluminum-based copper-clad substrates with thermal conductivity and electrical insulation properties have appeared as substrates for hybrid ICs on which semiconductor elements that generate a lot of heat, such as power transistors and power ICs, are mounted. It has come to be used exclusively. These aluminum substrates can be made by hot-compressing copper foil coated with adhesive onto an aluminum substrate using a multi-stage press (7111), or by placing semi-cured Derederig in a B-stage shape on the aluminum substrate, and then bonding the copper foil to the aluminum substrate. It is manufactured by a thermocompression bonding method using 1-4 foils in a multi-stage press. However, since the thickness of the insulating adhesive layer existing between the aluminum substrate and the copper foil is as thin as -1050 mm in the case of the resin-based copper clad laminate described above, it is difficult to completely degas during pressing. Since the process is extremely volatile and air bubbles may remain, the reliability of the adhesive strength and withstand voltage of the copper foil may be affected.

本発明者らは、このような操作的に大変難しく、また設
備投資の多大となる多段プレスを用いない金属箔張り金
属基板の製法につ1ハて鋭意検討した結果、多段プレス
よりも簡単な操作で、かつ接着強度信頼性のある金属箔
張り金属基板の製法を発明するに至った。
The inventors of the present invention have conducted extensive research into a method for producing metal foil-covered metal substrates that does not use a multi-stage press, which is extremely difficult to operate and requires a large amount of capital investment. We have invented a method for manufacturing metal foil-clad metal substrates that is easy to operate and has reliable adhesive strength.

すなわち、本発明は、金属板に絶縁層、金属箔を順次積
層−g′る金属箔張り金属基板の製法において、少なく
とも一下面上に硬化度合の腎なる少なくとも2層力・ら
なろ絶縁ノーを設けた金属板に、ラミネータを用いて加
圧下で、前記絶縁層のヒ面を加熱溶融させると同時に、
金属箔を張り合せて仮接着させる金属箔張り金属基板の
接着工程及び該金属箔張り金属基板を更に加熱して、硬
化させる工程からなることを特徴と′1−る。
That is, the present invention provides a method for manufacturing a metal foil-covered metal board in which an insulating layer and a metal foil are sequentially laminated on a metal plate, and at least two layers of hardening and hardening are applied on at least one lower surface. At the same time, heating and melting the surface of the insulating layer on the provided metal plate under pressure using a laminator,
The present invention is characterized by comprising the steps of adhering the metal foil-covered metal substrate by pasting and temporarily bonding the metal foil together, and further heating and curing the metal foil-covered metal substrate.

以下図面により本発明の詳細な説明する。The present invention will be explained in detail below with reference to the drawings.

第1図は、本発明のラミネート装置の概略断面図であり
、第2図は、金属箔張り金属基板を挿入した概略断面図
である。第1図は、本発明に用いることのできる典型的
なラミネーターであり、符号1及び6は、ラミネートす
る材料を移送時に支持¥る台(支持台)である。2.3
.4及び5は、ロールであり、該ロール2.3.4及び
5は、油圧等で圧力かっ・けられる構造になっている。
FIG. 1 is a schematic sectional view of a laminating apparatus of the present invention, and FIG. 2 is a schematic sectional view of a laminating apparatus in which a metal foil-covered metal substrate is inserted. FIG. 1 shows a typical laminator that can be used in the present invention, and reference numerals 1 and 6 indicate stands (support stands) for supporting materials to be laminated during transport. 2.3
.. 4 and 5 are rolls, and the rolls 2, 3, 4 and 5 have a structure in which pressure can be applied using hydraulic pressure or the like.

ロールの中で少なくともロール2には、ヒーターが入っ
ており、その表面は、シリコンゴムの様な耐熱性ゴムか
ら成っており、ラミネート時の脱ガスを容易にしている
。ロール3.4及び5は、ロール2とまったく同じ仕様
であっても、rいが、金属製ロールでも可能である。
Among the rolls, at least roll 2 contains a heater, and its surface is made of heat-resistant rubber such as silicone rubber to facilitate degassing during lamination. Rolls 3.4 and 5 can have exactly the same specifications as roll 2, but they can also be metal rolls.

金属箔張り金属基板(以下基板という)の製造に際して
は、まず絶縁層8を金属基板9上に形成し、その−ヒに
金属箔7を静置し、fJ1図のラミネータに通す。その
結果、第2図に示すように、絶縁層8の表面層は、ロー
ル2のヒーターによる熱で溶融すると共にロール2と3
の圧力で金属箔7に矢印の方向へ悦ガスを伴ないながら
、次々と圧着される。基板は、更にロール4と5で再加
圧上加熱もしくは冷却され仮接着される。この仮接着さ
れた基板は、更に加熱して後硬化させる。この後硬化に
は、通常の送風乾燥機や遠赤外乾燥1幾等が用いられろ
が、加熱プレスする方法でもo]能である。
When manufacturing a metal foil-covered metal substrate (hereinafter referred to as a substrate), an insulating layer 8 is first formed on a metal substrate 9, a metal foil 7 is placed on the insulating layer 8, and then passed through a laminator as shown in Fig. fJ1. As a result, as shown in FIG. 2, the surface layer of the insulating layer 8 is melted by the heat generated by the heater of the roll 2, and
The metal foils 7 are crimped one after another in the direction of the arrow with the pressure of . The substrates are further pressed again by rolls 4 and 5 and heated or cooled to temporarily bond them. This temporarily bonded substrate is further heated and post-cured. For this post-curing, an ordinary blow dryer or far-infrared drying method may be used, but hot pressing may also be used.

本発明の金属基板としては、アルミニウムおよびその合
金、鉄、鉄−ニソケル舒金、ステンレス、等が用いられ
るが、アルマイト処理したアルミニウム板でも何ら支障
はない。
As the metal substrate of the present invention, aluminum and its alloys, iron, iron-nisokel cladding, stainless steel, etc. are used, but an aluminum plate treated with alumite may be used without any problem.

次に金属箔としては、銅箔、アルミニウム箔、アルミニ
ウム箔と銅箔とをクラッドし定箔、銅箔に異種の金属を
メッキした箔等が使用できる。金属箔の厚みは、5μ〜
200μが適当であえ)。
Next, as the metal foil, copper foil, aluminum foil, fixed foil made by cladding aluminum foil and copper foil, foil in which copper foil is plated with different metals, etc. can be used. The thickness of the metal foil is 5μ~
200μ is appropriate).

本発明にJ:石基板製造に用いる金属箔は、枚葉状、ロ
ール状のいづれでも良く特に、後者の場合は、連続製造
がり能である。
In the present invention: J: The metal foil used for manufacturing the stone substrate may be either sheet-shaped or rolled, and in particular, in the latter case, continuous production is possible.

次に、本発明に用いる金属基板−上の絶縁層は、加熱に
より溶融1−るBステ〜ゾ状の70リゾレグやフィラー
人りエポキシ樹脂等が良く、少なくとも2度に分けて塗
布′1−る方が、耐電圧の点り・ら好ましい。更にこの
絶縁層は、硬化度合の異なることが、耐電圧の点から好
ましい。
Next, the insulating layer on the metal substrate used in the present invention is preferably made of 70 resoleg or filler-filled epoxy resin, which is melted by heating and applied in at least two steps. It is preferable in terms of withstand voltage. Furthermore, it is preferable that the insulating layers have different degrees of hardening from the viewpoint of withstand voltage.

又、本発明のラミネートの条件としては、絶ポぷ層の溶
解、尋仮接着の状態によっても異なるが、ロール感度は
、50〜200 ℃、ロール速度0.5〜10m/分、
ロール圧着力は、1−10 kg/CTL2の範囲が好
ましく、この範囲以外では、金属基板への金属箔の仮接
着の状、軛及び生産性が低下する。
In addition, the laminating conditions of the present invention vary depending on the dissolution of the absolute pop layer and the state of temporary adhesion, but the roll sensitivity is 50 to 200 °C, the roll speed is 0.5 to 10 m/min,
The roll pressure force is preferably in the range of 1-10 kg/CTL2; outside this range, the temporary adhesion of the metal foil to the metal substrate, yoke, and productivity will deteriorate.

又、その後の金属箔り長り金属基板の後硬化については
、一般に乾燥器中で、2D’C〜200 ’C!、で温
度との関係により24時間から1o分まで、絶縁層硬化
剤の状態により硬化時間を選択する必要がある。
Further, for the subsequent post-curing of the metal foil and the long metal substrate, generally in a dryer at 2D'C to 200'C! , it is necessary to select the curing time from 24 hours to 10 minutes depending on the temperature and the condition of the insulating layer curing agent.

以下、実施例により史に本発明を説明する。Hereinafter, the present invention will be explained in detail by way of examples.

実施例1 i、5+imのアルミニウム版上に硬化剤を含んだフィ
ラー人りエポキシ樹脂を、スフ0レーガンで約40μの
厚さになる様に塗装した。次いでこれをアルミニウム板
」−で80°C190分で硬化させ、次に同様にして更
に40μの・館縁層を塗布した。
Example 1 A filler-filled epoxy resin containing a curing agent was coated onto an i, 5+im aluminum plate to a thickness of about 40 μm using a spray gun. This was then cured with an aluminum plate at 80 DEG C. for 190 minutes, and then an additional 40 .mu.m thick edge layer was applied in the same manner.

この絶縁層付きアルミニウム基反を80°C160分硬
化させ、第1図に示す構造乞イイするロール直径15C
TLのラミネーターで65μの枚葉状の廼11沼1をラ
ミイ’−−1−L1こ。ロール2と3は、150°Cに
加熱してあり、ロール4と5は加熱してない条件である
。アルミニウム板送りスピードは1.07n/分であり
、ロール2と4には、2 kg / an2の圧力が7
:l)けられている。
This aluminum substrate with an insulating layer was cured at 80°C for 160 minutes, and a roll diameter of 15C was obtained to obtain the structure shown in Figure 1.
Using a TL laminator, laminate a 65μ sheet-shaped sheet of 11 layers. Rolls 2 and 3 were heated to 150°C, and rolls 4 and 5 were not heated. The aluminum plate feeding speed is 1.07 n/min, and a pressure of 2 kg/an2 is applied to rolls 2 and 4 at 7
:l) Being kicked.

次に、この操作で出来上つ1こ銅箔張りアルミニウム基
(反は送1戦乾燥機で140°C16時間後硬化さぜk
。得ら旧51こ銅箔張りアルミニウム基板の剥離強度は
、2.0kg/Cmであり、半田バス600℃、60分
の浸漬テストにおいても4+ll1l 、名のふ(れは
、みられなり・つ1こ。この−?処理後の鋼箔張りアル
ミニウム基板は、(tiit ’市川を1jll定し、
fこところ2KV以上であつム−8 実施例2 実施例1と同様にアルミニウムイル上に2つの異なる硬
化度合を有するフィラー人りエポキシ樹脂絶縁層を形成
し更にその上に60μの絶’1vfi層を形成し、80
°Cl2O分硬化後、第1図の2.3.4.5の1−べ
てのロールを100°′Cに加熱し1こ状態で基板送り
スピード1.5〃L/分で枚葉状35μ′1lil /
i13をラミネートした。ただしロール4及び5を通加
した基板は、冷風により冷却され10分以内に室温にな
った。
Next, after this operation, one piece of copper foil-covered aluminum plate (the sheet is cured in a dryer at 140°C for 16 hours).
. The peel strength of the copper foil-covered aluminum board was 2.0 kg/Cm, and even in the solder bath 600°C, 60-minute immersion test, the peel strength was 4+ll1l. This steel foil-covered aluminum substrate after this treatment is as follows:
Example 2 Similar to Example 1, a filler-filled epoxy resin insulating layer with two different degrees of hardening was formed on the aluminum foil, and a 60μ absolute 1VFI layer was further applied thereon. form, 80
After curing by °Cl2O, heat all the rolls in 2.3.4.5 in Figure 1 to 100°'C, and in the single state, feed the substrate at a speed of 1.5 L/min to form a sheet of 35 μm. '1lil/
i13 was laminated. However, the substrates to which rolls 4 and 5 were applied were cooled by cold air and reached room temperature within 10 minutes.

この操作で出来上った銅箔張りアルミニウム基板を夷り
布例1と同じ条件で後イザ化し1こ。得られた銅箔張り
アルミニウム基板の剥;捕強度は、2.2kg/ cr
rtで・あり、実施例1と同じく、30口°C160分
の半田バス浸漬テストにおいても鋼箔のふ(れは生じな
かった。この熱処理後の銅箔張りアルミニウム基板は、
耐電圧を…Ill定しfこところ6Iぐ■以上であっに
0 実施例ろ 実施例2と同じ、異った硬化度合を有り−ろ6)(至)
の・ら成る絶ギぷ層を塗布し1こ60α五角のアルミニ
ウム板を、実施例2と同じラミイ、−ター条件で、ロー
ル状65μ劃11j箔を用いてラミネートした。冷却は
、実施例2と同様に行い、袷箔ン切断後、実施例1と同
じ条件で後硬化し1こ。得られた鋼箔張りアルミニウム
基板の剥離強度は、1.9kg/cmであり、600℃
、60分の半田パス浸漬テストにおいても銅箔のふくれ
は生じなかつ1こ。この、IIJ?処理後の鋼箔張りア
ルミニウム基板は、耐電圧をd1]1定し1こところ、
3KV以」二て゛あった。
The copper foil-covered aluminum substrate produced by this operation was subjected to post-aging under the same conditions as Example 1. The peeling strength of the resulting copper foil-covered aluminum substrate was 2.2 kg/cr.
rt, and as in Example 1, no bulging of the steel foil occurred in the solder bath immersion test at 30 °C for 160 minutes. After this heat treatment, the copper foil-covered aluminum substrate
The withstand voltage was determined as follows: 6 I × 0 or higher Example 2 Same as Example 2, but with different degrees of hardening 6) (To)
An aluminum plate having a pentagonal size of 60α was coated with a coating layer consisting of the following, and laminated with a roll of 65μ 11J foil under the same lamination and tar conditions as in Example 2. Cooling was carried out in the same manner as in Example 2, and after cutting the lining, post-curing was carried out under the same conditions as in Example 1. The peel strength of the obtained steel foil-clad aluminum substrate was 1.9 kg/cm, and the peel strength was 600°C.
Even in a 60-minute solder pass immersion test, no blistering of the copper foil occurred. This IIJ? After the treatment, the steel foil-clad aluminum substrate has a withstand voltage of d1]1,
There were two cases over 3KV.

比較例1 実施例1と同じ絶イぷ締付アルミニウム板上に35μ4
11す箔を01次し、 1000に加熱したフ0レス機
にはさみ、加圧下60分放置し1こ後、温度を150°
Cに上げ2時間加熱して銅張基板を製造した。銅箔張り
アルミニウム基板の剥離強度を測定し1こところ、太マ
it+分は、2− Okg/ cm $)ツh=が部分
的に1.4に!17’/(rllを示す場合がル)す、
鋼箔と絶縁層の間に気泡が混入している可能性があった
。この銅箔張りアルミニウム基板を300°C,30分
の半田パス浸漬テストに力・け定ところ、数分で部分的
な銅箔のふ(れがみもれ、最終的には直径5c+nの銅
箔ふくれが認められ1こ。更に熱処理を行なわない鋼箔
張りアルミニウム基板は、11iI電圧を測定し1こと
ころQ、5KV以下て゛あった。
Comparative Example 1 35μ4 was placed on the same fastened aluminum plate as in Example 1.
The 11-piece foil was heated to 150°, placed in a foilless machine heated to 1000°C, left under pressure for 60 minutes, and then heated to 150°.
C. and heated for 2 hours to produce a copper-clad substrate. When we measured the peel strength of a copper foil-covered aluminum board, we found that the thickness was 2-Okg/cm $) and partially 1.4! 17'/(when indicating rll),
There was a possibility that air bubbles were mixed in between the steel foil and the insulating layer. This copper foil-covered aluminum board was subjected to a solder pass immersion test at 300°C for 30 minutes. Foil blistering was observed.The steel foil-covered aluminum substrate, which was not subjected to heat treatment, was measured for 11iI voltage and found to be less than 5KV.

比較例2 実施例1と同様の操作により80μの絶縁層を1.5+
im仮j$のアルミニウム板上に塗装した。この絶縁層
付アルミニウム基板を80℃、60分硬化させ、実施例
1と同じラミネート条件、および硬化条件で操作を行ブ
よい、ろ51L41til箔張りアルミニウム基板を製
造1−だ。得られ1こケ同消張りアルミニウム基板の剥
離強度は1−9 k!/ / craであり、半田バス
300°C160分の浸漬において部分的にふくれが生
じた。この熱処理後の鋼箔張りアルミニウム基板は、耐
電圧を測定したところ1.OK V以下であった。熱処
理前の該基板をエツチングし、銅箔を除去したところ、
部分的に絶+t+=に欠陥があつた。
Comparative Example 2 An 80μ insulating layer was made into a 1.5+ layer by the same operation as in Example 1.
It was painted on a temporary aluminum plate. This aluminum substrate with an insulating layer was cured at 80° C. for 60 minutes, and the same lamination and curing conditions as in Example 1 were used to produce a foil-covered aluminum substrate. The peel strength of the obtained same flattened aluminum substrate is 1-9K! / / cra, and some blistering occurred when immersed in a solder bath at 300°C for 160 minutes. After this heat treatment, the steel foil-clad aluminum substrate had a dielectric strength of 1. It was below OK V. When the substrate before heat treatment was etched and the copper foil was removed,
There were some defects in the absolute +t+=.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、本発明のラミネート装置の概略l断面図、第
2図は、金属箔張り金属基板を挿入した概略断面図を示
す。 符号 1.6・・・支持台、2,3.4.5・・・ロール7・
・・金属箔、8・・絶縁層、9・・・金属基板特許出願
人 電気化学工業株式会社 第1図 第2図
FIG. 1 is a schematic cross-sectional view of the laminating apparatus of the present invention, and FIG. 2 is a schematic cross-sectional view in which a metal foil-covered metal substrate is inserted. Code 1.6...Support stand, 2,3.4.5...Roll 7.
...Metal foil, 8...Insulating layer, 9...Metal substrate Patent applicant Denki Kagaku Kogyo Co., Ltd. Figure 1 Figure 2

Claims (1)

【特許請求の範囲】 金属板に絶縁層、金属箔?順次積層する金属箔張り金属
基板の製法において、 1)少な(とも−主面上に硬化度合の異なる少な(とも
2層D)もなる絶縁層乞設けた金属板に、ラミネータ乞
用いて加圧下で、前記絶縁層の上面を加熱溶融させると
同時に、金属箔?張り合せて仮接着させる金属箔張り金
属基板の接着工程及び 2)該金属箔張り金属基板をさらに加熱して後硬化させ
る工程 からなること乞特徴とする金属箔張り金属基板の製法。
[Claims] Insulating layer and metal foil on metal plate? In the method of manufacturing a metal foil-covered metal substrate that is sequentially laminated, 1) A metal plate having a small number of insulating layers (both two layers D) with different degrees of hardening on the main surface is laminated under pressure using a laminator. At the same time, the upper surface of the insulating layer is heated and melted, and at the same time, the metal foil is laminated and temporarily bonded to the metal foil-covered metal substrate, and 2) the metal foil-covered metal substrate is further heated to post-cure. A unique method for manufacturing metal foil-covered metal substrates.
JP10740383A 1983-06-15 1983-06-15 Manufacture of metallic foil lined metallic substrate Granted JPS59232845A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10740383A JPS59232845A (en) 1983-06-15 1983-06-15 Manufacture of metallic foil lined metallic substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10740383A JPS59232845A (en) 1983-06-15 1983-06-15 Manufacture of metallic foil lined metallic substrate

Publications (2)

Publication Number Publication Date
JPS59232845A true JPS59232845A (en) 1984-12-27
JPH0216696B2 JPH0216696B2 (en) 1990-04-18

Family

ID=14458258

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10740383A Granted JPS59232845A (en) 1983-06-15 1983-06-15 Manufacture of metallic foil lined metallic substrate

Country Status (1)

Country Link
JP (1) JPS59232845A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1088072A (en) * 1996-09-11 1998-04-07 Toyo Seimitsu Kogyo Kk Sheet for temporarily holding thin metal piece for facilitating automatic supply and its production
JP2017515699A (en) * 2014-03-24 2017-06-15 エムジーアイ デジタル テクノロジー Method and system for gold plating

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59167248A (en) * 1983-03-14 1984-09-20 松下電器産業株式会社 Method of forming metal laminate

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59167248A (en) * 1983-03-14 1984-09-20 松下電器産業株式会社 Method of forming metal laminate

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1088072A (en) * 1996-09-11 1998-04-07 Toyo Seimitsu Kogyo Kk Sheet for temporarily holding thin metal piece for facilitating automatic supply and its production
JP2017515699A (en) * 2014-03-24 2017-06-15 エムジーアイ デジタル テクノロジー Method and system for gold plating

Also Published As

Publication number Publication date
JPH0216696B2 (en) 1990-04-18

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