JPS59222433A - Production of tertiary alcohol derivative - Google Patents
Production of tertiary alcohol derivativeInfo
- Publication number
- JPS59222433A JPS59222433A JP58095042A JP9504283A JPS59222433A JP S59222433 A JPS59222433 A JP S59222433A JP 58095042 A JP58095042 A JP 58095042A JP 9504283 A JP9504283 A JP 9504283A JP S59222433 A JPS59222433 A JP S59222433A
- Authority
- JP
- Japan
- Prior art keywords
- reaction
- triphenylmethyl
- carboxylic acid
- alcohol
- tertiary alcohol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 150000003509 tertiary alcohols Chemical class 0.000 title claims abstract description 16
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims abstract description 15
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims abstract description 14
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims abstract description 10
- 150000004820 halides Chemical class 0.000 claims abstract description 5
- -1 tetrafluorosilane Chemical class 0.000 abstract description 10
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 abstract description 6
- 125000002221 trityl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C([*])(C1=C(C(=C(C(=C1[H])[H])[H])[H])[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 abstract description 6
- 150000002430 hydrocarbons Chemical group 0.000 abstract description 4
- 150000001875 compounds Chemical class 0.000 abstract description 3
- 125000005843 halogen group Chemical group 0.000 abstract description 3
- 229930195733 hydrocarbon Natural products 0.000 abstract description 3
- 125000006239 protecting group Chemical group 0.000 abstract description 3
- 239000002841 Lewis acid Substances 0.000 abstract description 2
- 150000007517 lewis acids Chemical class 0.000 abstract description 2
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 abstract description 2
- 239000004215 Carbon black (E152) Substances 0.000 abstract 2
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 125000001183 hydrocarbyl group Chemical group 0.000 abstract 1
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 40
- 238000006243 chemical reaction Methods 0.000 description 32
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 14
- 239000003054 catalyst Substances 0.000 description 13
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 11
- 239000000243 solution Substances 0.000 description 10
- SOOHMJJPRAGGSQ-UHFFFAOYSA-N [fluoro(diphenyl)methyl]benzene Chemical compound C=1C=CC=CC=1C(C=1C=CC=CC=1)(F)C1=CC=CC=C1 SOOHMJJPRAGGSQ-UHFFFAOYSA-N 0.000 description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 229910052799 carbon Inorganic materials 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 150000001298 alcohols Chemical class 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- 238000006297 dehydration reaction Methods 0.000 description 4
- 239000011541 reaction mixture Substances 0.000 description 4
- PGQNYIRJCLTTOJ-UHFFFAOYSA-N trimethylsilyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)O[Si](C)(C)C PGQNYIRJCLTTOJ-UHFFFAOYSA-N 0.000 description 4
- PTVDYMGQGCNETM-UHFFFAOYSA-N trityl 2-methylprop-2-enoate Chemical compound C=1C=CC=CC=1C(C=1C=CC=CC=1)(OC(=O)C(=C)C)C1=CC=CC=C1 PTVDYMGQGCNETM-UHFFFAOYSA-N 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- NZHXEWZGTQSYJM-UHFFFAOYSA-N [bromo(diphenyl)methyl]benzene Chemical compound C=1C=CC=CC=1C(C=1C=CC=CC=1)(Br)C1=CC=CC=C1 NZHXEWZGTQSYJM-UHFFFAOYSA-N 0.000 description 3
- 125000005103 alkyl silyl group Chemical group 0.000 description 3
- 150000001735 carboxylic acids Chemical class 0.000 description 3
- 239000012230 colorless oil Substances 0.000 description 3
- 230000032050 esterification Effects 0.000 description 3
- 238000005886 esterification reaction Methods 0.000 description 3
- 238000006266 etherification reaction Methods 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- 150000001721 carbon Chemical group 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 125000004430 oxygen atom Chemical group O* 0.000 description 2
- 150000002989 phenols Chemical class 0.000 description 2
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 150000003333 secondary alcohols Chemical class 0.000 description 2
- 238000007086 side reaction Methods 0.000 description 2
- 238000004809 thin layer chromatography Methods 0.000 description 2
- JBWKIWSBJXDJDT-UHFFFAOYSA-N triphenylmethyl chloride Chemical compound C=1C=CC=CC=1C(C=1C=CC=CC=1)(Cl)C1=CC=CC=C1 JBWKIWSBJXDJDT-UHFFFAOYSA-N 0.000 description 2
- CSIFGMFVGDBOQC-UHFFFAOYSA-N 3-iminobutanenitrile Chemical compound CC(=N)CC#N CSIFGMFVGDBOQC-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- 102100026194 C-type lectin domain family 2 member B Human genes 0.000 description 1
- 101150041968 CDC13 gene Proteins 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 1
- 101000912618 Homo sapiens C-type lectin domain family 2 member B Proteins 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 1
- WEVYAHXRMPXWCK-FIBGUPNXSA-N acetonitrile-d3 Chemical compound [2H]C([2H])([2H])C#N WEVYAHXRMPXWCK-FIBGUPNXSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 125000004423 acyloxy group Chemical group 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000012267 brine Substances 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical group [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 150000001734 carboxylic acid salts Chemical class 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000006704 dehydrohalogenation reaction Methods 0.000 description 1
- 125000004663 dialkyl amino group Chemical group 0.000 description 1
- ZTHNOZQGTXKVNZ-UHFFFAOYSA-L dichloroaluminum Chemical compound Cl[Al]Cl ZTHNOZQGTXKVNZ-UHFFFAOYSA-L 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000003337 fertilizer Substances 0.000 description 1
- 239000010436 fluorite Substances 0.000 description 1
- CTIKAHQFRQTTAY-UHFFFAOYSA-N fluoro(trimethyl)silane Chemical compound C[Si](C)(C)F CTIKAHQFRQTTAY-UHFFFAOYSA-N 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 239000011968 lewis acid catalyst Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 125000004971 nitroalkyl group Chemical group 0.000 description 1
- LYGJENNIWJXYER-UHFFFAOYSA-N nitromethane Chemical compound C[N+]([O-])=O LYGJENNIWJXYER-UHFFFAOYSA-N 0.000 description 1
- 239000012454 non-polar solvent Substances 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000012074 organic phase Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 239000008055 phosphate buffer solution Substances 0.000 description 1
- 239000002367 phosphate rock Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 235000003270 potassium fluoride Nutrition 0.000 description 1
- 239000011698 potassium fluoride Substances 0.000 description 1
- 150000003138 primary alcohols Chemical class 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- DCKVNWZUADLDEH-UHFFFAOYSA-N sec-butyl acetate Chemical group CCC(C)OC(C)=O DCKVNWZUADLDEH-UHFFFAOYSA-N 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 239000013076 target substance Substances 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- OJAJJFGMKAZGRZ-UHFFFAOYSA-N trimethyl(phenoxy)silane Chemical compound C[Si](C)(C)OC1=CC=CC=C1 OJAJJFGMKAZGRZ-UHFFFAOYSA-N 0.000 description 1
- FTVLMFQEYACZNP-UHFFFAOYSA-N trimethylsilyl trifluoromethanesulfonate Chemical compound C[Si](C)(C)OS(=O)(=O)C(F)(F)F FTVLMFQEYACZNP-UHFFFAOYSA-N 0.000 description 1
- LZTRCELOJRDYMQ-UHFFFAOYSA-N triphenylmethanol Chemical compound C=1C=CC=CC=1C(C=1C=CC=CC=1)(O)C1=CC=CC=C1 LZTRCELOJRDYMQ-UHFFFAOYSA-N 0.000 description 1
- IWTBESTVUWMZEH-UHFFFAOYSA-N trityl benzoate Chemical compound C=1C=CC=CC=1C(=O)OC(C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 IWTBESTVUWMZEH-UHFFFAOYSA-N 0.000 description 1
- 239000002912 waste gas Substances 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/55—Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups
Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
この発明は、カルボン酸、アルコール又はフェノールの
三級アルコール誘導体を得る新規反応に関するものであ
る。DETAILED DESCRIPTION OF THE INVENTION (Industrial Field of Application) This invention relates to a novel reaction for obtaining tertiary alcohol derivatives of carboxylic acids, alcohols or phenols.
更に具体的には、カルボン酸、アルコール又はフェノー
ルの酸素原子上に三級炭素を導入して、カルボン酸のト
リフェニルメチルエステル、カルボン酸の三級ブチルエ
ステル、アルコール又ハフエノールのトリフェニルメチ
ルエーテルなどを得る三級アルコール誘導体の製法に関
するものである。More specifically, a tertiary carbon is introduced onto the oxygen atom of carboxylic acid, alcohol or phenol to produce triphenyl methyl ester of carboxylic acid, tertiary butyl ester of carboxylic acid, triphenyl methyl ether of alcohol or haphenol, etc. This invention relates to a method for producing a tertiary alcohol derivative.
トリフェニルメチル基は、温和な条件下で容易に除゛去
できる点および誘導体の結晶性が良い点など保護基とし
てすぐれた性質を有しており、カルボン酸、アルコール
又はフェノールにこのような基を導入するエステル化、
エーテル化反応は有機合成化学の分野において有用であ
る。三級アルコール誘導体はそれ自体も有用であり、例
えばメタクリル酸トリフェニルメチルは光学分割能力を
もつポリマーをつくるためのモノマーとして用いられる
。Triphenylmethyl group has excellent properties as a protective group, such as being easily removed under mild conditions and having good crystallinity of derivatives, and is suitable for carboxylic acids, alcohols, or phenols. esterification, which introduces
Etherification reactions are useful in the field of synthetic organic chemistry. Tertiary alcohol derivatives are also useful in their own right, such as triphenylmethyl methacrylate, which is used as a monomer to create polymers with optical resolution capabilities.
(従来技術)
カルボン酸、アルコール又はフェノールのアルコール誘
導体をつくる反応はエステル化又はエーテル化反応とし
て知られており、導入される基が一級炭素又は二級炭素
で結合する基の場合は、−級アルコール又は二級アルコ
ールを用いた脱水反応により遂行可能である。(Prior art) The reaction to produce carboxylic acids, alcohols, or alcohol derivatives of phenol is known as esterification or etherification reaction, and in the case of the group to be introduced is a group bonded at a primary carbon or secondary carbon, - This can be accomplished by a dehydration reaction using alcohol or secondary alcohol.
一方、三級アルコールによるエステル化、エーテル化は
一級、二級の場合と異なり、脱水反応はきわめて困難で
ある。特にカルボン酸のトリフェニルメチルエステルの
場合、逆反応である加水分解反応が速かに進行すること
が知られておシ、脱水反応によるトリフェニルメチル化
は一般に不可能である。従って従来トリフェニルメチル
エステルは臭化トリフェニルメチルとカルボン酸塩トラ
非極性溶媒中で反応させる方法にょシおこなわれてきた
。特に、重合しゃすいアクリル酸エステルなど、副反応
を起しゃすい場合は、高価な銀塩を用いて反応をおこな
う必要があった。On the other hand, esterification and etherification using tertiary alcohols are different from those using primary and secondary alcohols, and dehydration reactions are extremely difficult. Particularly in the case of triphenylmethyl ester of carboxylic acid, it is known that the hydrolysis reaction, which is the reverse reaction, proceeds rapidly, and triphenylmethylation by dehydration reaction is generally impossible. Therefore, the conventional method has been to react triphenylmethyl ester with triphenylmethyl bromide and a carboxylic acid salt in a nonpolar solvent. In particular, in cases where side reactions are likely to occur, such as polymerizable acrylic esters, it is necessary to carry out the reaction using expensive silver salts.
例えばメタクリル酸トリフェニルメチルは、通(目しT
rはトリフェニルメチル基を表わす。)このように蟲量
の銀を用いたり、脱ハロゲン化水素剤として塩基を用い
たシする従来の方法はいろいろ問題があり、保護基とし
てのすぐれた性質にもかかわらずトリフェニルメチル化
反応は広範囲に利用されてはいなかった。For example, triphenylmethyl methacrylate is
r represents a triphenylmethyl group. ) Conventional methods that use small amounts of silver or bases as dehydrohalogenation agents have various problems, and despite their excellent properties as protecting groups, the triphenylmethylation reaction is difficult. It was not widely used.
本発明者は先にトリアルキルシリル化されたトリフェニ
ルメチル化剤によりカルボン酸、アルコール又はフェノ
ールの0−tlアルキルシリル誘導体との間で脱ヘキサ
アルキルジシロキサン反応をおこなわせることにより、
脱水反応では困難だったo−トリフェニルメチル化を容
易におこなえることを見出している。この反応はトリフ
ェニルメチル化に限らず、t−ブチル化など、三級アル
コール誘導体をつくる反応に一般に応用することができ
る・(斎伺BB’i”7−13o’l+ソ)(発明の目
的)
本発明は、上記の先行技術をふまえて、銀塩を用いずに
、更に実現しやすい三級アルコール誘導体の製法を提供
するものである。本発明の代表例ではフッ化トリフェニ
ルメチルを用いるが、この出発物の製造に用いられるフ
ン化水素は、現在最も広く用いられているフッ素資源で
あるホタル石の硫酸分解により容易に得られる。また触
媒に用いられる5IF4は、リン鉱石からリン酸肥料を
製造する過程における廃ガス中に含まれる未利用資源で
ある。このように本発明は将来発展が期待される7ノ素
化学の一環をになうものである。The present inventor carried out a dehexaalkyldisiloxane reaction with a 0-tl alkylsilyl derivative of a carboxylic acid, alcohol, or phenol using a triphenylmethylating agent that was previously trialkylsilylated.
It has been discovered that o-triphenylmethylation, which is difficult to perform with dehydration reactions, can be easily carried out. This reaction is not limited to triphenylmethylation, but can be generally applied to reactions that produce tertiary alcohol derivatives, such as t-butylation. ) Based on the above-mentioned prior art, the present invention provides a method for producing tertiary alcohol derivatives that is easier to realize without using silver salts.A representative example of the present invention uses triphenylmethyl fluoride. However, the hydrogen fluoride used in the production of this starting material is easily obtained by the sulfuric acid decomposition of fluorite, which is currently the most widely used fluorine resource.Furthermore, 5IF4 used in the catalyst is produced from phosphate rock. It is an unused resource contained in waste gas during the process of manufacturing fertilizers.In this way, the present invention is a part of 7 elemental chemistry, which is expected to develop in the future.
(発明の構成)
本発明は(1) トリフェニルメチル化などの反応をお
こなう基質として、カルボン酸、アルコール又はフェノ
ールを、O−) I)アルキルシリル誘導体の形で用い
、(2)これを三級アルコールに対応するハロゲン化物
と反応させて(3〕基質に対応する三級アルコール誘導
体を得る製法である。ここで三級アルコール誘導体とは
3つの異なる炭素原子と結合した炭素原子が酸素原子と
結合した化合物yoc2、(但しZは炭素原子で結合す
る基でありYはカルボン酸、アルコール又はフェノール
をYOHと表わしたときの残基を表わす)を意味する。(Structure of the Invention) The present invention provides (1) using a carboxylic acid, alcohol, or phenol in the form of an O-)I) alkylsilyl derivative as a substrate for a reaction such as triphenylmethylation, and (2) using this as a substrate for a reaction such as triphenylmethylation. (3) This is a manufacturing method to obtain a tertiary alcohol derivative corresponding to the substrate by reacting the tertiary alcohol with a halide corresponding to the substrate.A tertiary alcohol derivative is one in which a carbon atom bonded to three different carbon atoms is bonded to an oxygen atom. It means a bonded compound yoc2, (where Z is a group bonded through a carbon atom, and Y represents a residue when carboxylic acid, alcohol, or phenol is expressed as YOH).
本発明の反応を一般式で表わせば式(2)のようである
。The reaction of the present invention can be expressed as a general formula as shown in formula (2).
YOS i Rs 十Zs CX−+YOCZs +R
s S I X (2)こ\でYはカルボン酸
、アルコール、又ハフエノールをYOHと表わしたとき
の残基、即ちアシル、アルキル、アリール、アルケニル
、などの基を意味する。カルボン酸、アルコール、フェ
ノールは、多価のものであってもよい。Rはアルキル基
、フェニル基、ベンジル基などの炭化水素基で、アルキ
ル基としては、メチル、エチル、ブチルなどの低級アル
キル基が例示される。YOS i Rs 10Zs CX-+YOCZs +R
s S I The carboxylic acid, alcohol, and phenol may be polyvalent. R is a hydrocarbon group such as an alkyl group, a phenyl group, or a benzyl group, and examples of the alkyl group include lower alkyl groups such as methyl, ethyl, and butyl.
2はアリール、アラルキル、アルキル、シクロアルキル
などの炭化水素基であり、本発明の反応条件下で不活性
なアルコキシ、アシロキシ、ハロ、ジアルキルアミノな
どの置換基があってもよく、また3個のZは同じもので
も異なるものでもよい。2 is a hydrocarbon group such as aryl, aralkyl, alkyl, or cycloalkyl, and may have a substituent such as alkoxy, acyloxy, halo, or dialkylamino that is inactive under the reaction conditions of the present invention; Z may be the same or different.
Zを選ぶことにより、トリフェニルメチル、t−ブチル
、p−メトキシフェニルジフェニルメチル、1.1−ビ
ス(p−メトキシフェニル)ベンジル、ナフチルジフェ
ニルメチルなど種々の三級炭素をもつ基の導入に本発明
を適用できる。Xはハロゲン原子であシ、特にフッ素、
臭素又は塩素である。By selecting Z, it is possible to introduce groups with various tertiary carbons such as triphenylmethyl, t-butyl, p-methoxyphenyldiphenylmethyl, 1,1-bis(p-methoxyphenyl)benzyl, and naphthyldiphenylmethyl. The invention can be applied. X is a halogen atom, especially fluorine,
Bromine or chlorine.
従ってZ、CXは三級アルコールZ、(C)Hに対応す
るハロゲン化物である。Therefore, Z and CX are halides corresponding to the tertiary alcohol Z and (C)H.
本発明は必要に応じ、テトラフルオロシラン又はその他
のルイス酸触媒の存在下に反応をおこなうが、とれにつ
いては項を改めて説明する。In the present invention, if necessary, the reaction is carried out in the presence of tetrafluorosilane or other Lewis acid catalyst, but the reaction will be explained in a separate section.
(原料)
前項(1)に示したカルボン酸、アルコール31tフエ
ノールのO−)!Jアルキルシリル誘導体 、YO8i
R=は、本発明者万ぐ先行技術で用いたものと本質的に
同じであり、カルボン酸等YOHのトリアルキルシリル
化によって得られる。(Raw materials) Carboxylic acid shown in the previous section (1), alcohol 31t phenol O-)! J alkylsilyl derivative, YO8i
R= is essentially the same as that used in the prior art described by the inventor Mangu, and is obtained by trialkylsilylation of YOH such as carboxylic acid.
Z、CXは、反応式(1)に示した銀塩法で用いられた
塩化トリフェニルメチルの如き塩化物を用いることもで
きるが、YO8iR3と反応させる点に特徴をもつ本発
明において、反応の選択性の面でフッ化物に劣る( Z
、COHが副生する)。選択性の面では臭化物も良好で
あるが、臭化トリフェニルメチルはアセトニトリルへの
溶解性が低いので、実用的にはフッ化物が最もすぐれて
いる。For Z and CX, a chloride such as triphenylmethyl chloride used in the silver salt method shown in reaction formula (1) can be used, but in the present invention, which is characterized in that it is reacted with YO8iR3, the reaction Inferior to fluoride in terms of selectivity (Z
, COH is produced as a by-product). Bromide is also good in terms of selectivity, but fluoride is practically the best because triphenylmethyl bromide has low solubility in acetonitrile.
(反応条件)
反応は普通、不活性有機溶媒中でおこなう。溶媒として
代表的なものはアセトニトリルである。(Reaction conditions) The reaction is usually carried out in an inert organic solvent. A typical solvent is acetonitrile.
その他n−ペンタン、n−ヘキサン等のパラフィン系炭
化水素、塩化メチレン、クロロホルム、1゜2−ジクロ
ルエタン等のハロゲン化炭化水素、ベンゼン、トルエン
等の芳香族炭化水素、又はニトロメタン等のニトロアル
カンなどが例示される。Others include paraffinic hydrocarbons such as n-pentane and n-hexane, halogenated hydrocarbons such as methylene chloride, chloroform, and 1゜2-dichloroethane, aromatic hydrocarbons such as benzene and toluene, and nitroalkanes such as nitromethane. Illustrated.
Z、 CX として塩化物や臭化物を用いた場合は、
反応を無触媒で進行させることもできる。しかし、フッ
化物を用いた場合は無触媒で、速やかに反応させること
ができないので、触媒を用いる。When using chloride or bromide as Z, CX,
The reaction can also proceed without a catalyst. However, when a fluoride is used, a catalyst is used since the reaction cannot be carried out quickly without a catalyst.
触媒として代表的なものはテトラフルオロシランSiF
、である。その他のルイス酸、例えばトリメチルシリル
トリフラート(CHs )s 5iO8O= CF=
、 BF−。A typical catalyst is tetrafluorosilane SiF.
, is. Other Lewis acids, such as trimethylsilyl triflate (CHs )s 5iO8O= CF=
, BF-.
AICL I TiCL r 5TIC14などもこの
反応の触媒として有効である。これらのうちT iC1
4及び5nC14はアセトニトリルと反応して沈澱を生
じたので、塩化メチレン溶媒中で反応させた。触媒の使
用量は例えば基質に対し5モルチ前後を用いるが必要に
応じ増減してよい。普通には1〜10モル係程度の触媒
を用いると室温前後又はそれ以下の温和な条件で反応を
進めることができる。もちろん副反応などの問題がなけ
ればよシ広いi度範囲例えば0〜100℃から反応温度
を選んでもよい。AICL I TiCL r 5TIC14 and the like are also effective as catalysts for this reaction. Among these, T iC1
Since 4 and 5nC14 reacted with acetonitrile to form a precipitate, they were reacted in a methylene chloride solvent. The amount of catalyst used is, for example, about 5 molti based on the substrate, but it may be increased or decreased as necessary. Generally, when a catalyst having a molar ratio of about 1 to 10 is used, the reaction can be carried out under mild conditions around room temperature or below. Of course, if there are no problems such as side reactions, the reaction temperature may be selected from a wider range of degrees, for example 0 to 100 degrees Celsius.
例1.(メタクリル酸トリフェニルメチル=TrMA)
メタクリル酸トリメチルシリルエステル(1,25グ、
7.91 mmol )とフッ化トリフェニルメチル
(2,07y 、 7.91mmo 1 ) の乾燥
アセトニトリル(2+−1’)溶液にアルゴン雰囲気下
、141℃で、テトラフルオロシラン(0,08モル/
diアセトニトリル溶液、4.9cr71.0.3.9
6mmo1)を加えた。同じ温度で6時間攪拌したのち
、生成した黄色の混合物を、フッ化カリ(8,02)を
含むpH7,4のリン酸塩緩衝溶液(80c4)で0℃
に保ちながら激しく攪拌したものの中へ注イだ。この水
溶液をエーテル・ヘキサン2:1混合物(50c4)で
2回抽出し、有機相を合わせて Na HCOs水溶液
と、食塩水で洗い、無水の硫酸ナトリウム上で乾燥し真
空で蒸発させた。Example 1. (Triphenylmethyl methacrylate = TrMA)
Methacrylic acid trimethylsilyl ester (1.25 g,
7.91 mmol) and triphenylmethyl fluoride (2,07y, 7.91 mmol) in dry acetonitrile (2+-1') under an argon atmosphere at 141°C, tetrafluorosilane (0.08 mol/
diacetonitrile solution, 4.9cr71.0.3.9
6 mmol) was added. After stirring for 6 hours at the same temperature, the resulting yellow mixture was stirred with a phosphate buffer solution (80c4) containing potassium fluoride (8,02) at pH 7.4 at 0°C.
Pour into the mixture while stirring vigorously. The aqueous solution was extracted twice with a 2:1 mixture of ether/hexane (50c4) and the combined organic phases were washed with aqueous Na HCOs and brine, dried over anhydrous sodium sulfate and evaporated in vacuo.
残った固体をヘキサンから再結晶したところTrMA
(2,42!F、 94%収率)が無色柱状晶として得
られた。When the remaining solid was recrystallized from hexane, TrMA
(2,42!F, 94% yield) was obtained as colorless columnar crystals.
触点98−99℃(文献値101−102℃);IR(
CC14)1725.1490.1140Crn−’;
’HNMR(CDCl2)61.99 (31(、dd
、 J=1.0 、1.4Hz)、 5.60 (LH
,m)。Touch point 98-99℃ (literature value 101-102℃); IR (
CC14) 1725.1490.1140Crn-';
'HNMR (CDCl2) 61.99 (31(, dd
, J=1.0, 1.4Hz), 5.60 (LH
, m).
6.23 (LH,m)、 7.2−7.5 (15H
,m) ;MS rrv/z 328 (M+)。6.23 (LH, m), 7.2-7.5 (15H
, m); MS rrv/z 328 (M+).
260.259,243,183,165,105,8
5.83゜77 。260.259,243,183,165,105,8
5.83°77.
上記の反応をアセトニトリル−d3中で6時間おこない
、反応混合物をHNMR分析したところ、理論上のトリ
メチルフルオロシラン(δ0.21.d。The above reaction was carried out in acetonitrile-d3 for 6 hours, and HNMR analysis of the reaction mixture revealed that the theoretical trimethylfluorosilane (δ0.21.d.
J(+H,F=7.’ 5 Hz )がメタクリル酸ト
リフェニルメチルとならんで見出された。J(+H,F=7.' 5 Hz) was found along with triphenylmethyl methacrylate.
例2(デカン酸トリフェニルメチル) デカン酸トリメチルシリルエステル(232η。Example 2 (triphenylmethyl decanoate) Decanoic acid trimethylsilyl ester (232η.
0.95 rr+mol )、 フッ化トリフェニル
メチル(249ml+。0.95 rr+mol), triphenylmethyl fluoride (249ml+.
0.95モル)及びSiF、(0,08モル/dm’
アセトニトリル溶液0.62crt1.0.05.mm
ol )をアセトニトリル(2,5crl )に溶解し
、16℃で6時間攪拌した。反応混合物は例1と同様に
処理したところ、油状の残渣が得られ、トリエチルアミ
ン(2%)死守したシリカゲル上、ヘキサン、エーテル
(5:1)混合物を展開液と用いクロマトグラフ分離し
た。純粋なデカン酸トリフェニルメチルは、無色油状物
(361■、88%)として得られた。0.95 mol) and SiF, (0.08 mol/dm'
Acetonitrile solution 0.62crt1.0.05. mm
ol) was dissolved in acetonitrile (2.5 crl) and stirred at 16°C for 6 hours. The reaction mixture was treated in the same manner as in Example 1, and an oily residue was obtained, which was chromatographed on silica gel coated with triethylamine (2%) using a mixture of hexane and ether (5:1) as the developing solution. Pure triphenylmethyl decanoate was obtained as a colorless oil (361 cm, 88%).
IR(CC14’) 1760.1500.1150
cm−’ ; ’H’NMR(cDcl、)δ0.8.
7 (3H,br t、J=6.0 Hz)、 1.
0.7−1.73 (14H,m )2.43 (2
H,t、 J、 =6.8Hz ) 7.1−7、.
4 (15H,、m) ;MS、m/z 414 (M
+L 260.259゜244.243,165,78
.77 。IR (CC14') 1760.1500.1150
cm-';'H' NMR (cDcl,) δ0.8.
7 (3H, br t, J=6.0 Hz), 1.
0.7-1.73 (14H, m)2.43 (2
H,t,J, =6.8Hz) 7.1-7,.
4 (15H,, m); MS, m/z 414 (M
+L 260.259°244.243,165,78
.. 77.
例3(安息香酸トリフェニルメチル) 安息香酸トリメチルシリルエステル(372+++y。Example 3 (triphenylmethyl benzoate) Benzoic acid trimethylsilyl ester (372+++y.
1.92mmol )+フッ化トリフェニルメチル(5
03rq、 1.92mmol)+及びテトラフルオロ
シラy(0,08モル/d−アセトニトリル溶液、 1
.2c40.11訓o1)をアセトニトリル(4cJ)
に溶解し、16℃で4時間攪拌した。反応混合物を例1
と同様に処理し、ヘキサンとベンゼンの10:1混合物
から再結晶して安息香酸トリフェニルメチル(671m
r、96%)を無色板状晶として得た。mp 170−
171℃、(文献値168−170℃) ; IR(C
C14) 1740.1600 、1500゜1270
C1n−’;’HNMR(CDC13)67.1−7.
6 (18H,m)。1.92 mmol) + triphenylmethyl fluoride (5
03rq, 1.92mmol) + and tetrafluorosilay (0.08mol/d-acetonitrile solution, 1
.. 2c40.11 lesson o1) in acetonitrile (4cJ)
and stirred at 16°C for 4 hours. Example 1 reaction mixture
and recrystallized from a 10:1 mixture of hexane and benzene to give triphenylmethyl benzoate (671 m
r, 96%) was obtained as colorless platelets. mp 170-
171℃, (literature value 168-170℃); IR(C
C14) 1740.1600, 1500°1270
C1n-';'HNMR (CDC13) 67.1-7.
6 (18H, m).
8.13 (2H,dd、 J= 1.j、 7.8.
Hz ) ; MS−364(M+)、 260.25
9.244.243.85.83 。8.13 (2H, dd, J= 1.j, 7.8.
Hz) ; MS-364 (M+), 260.25
9.244.243.85.83.
例4(n−オクチルトIJフェニルメチルエーテル)フ
ン化トリフェニルメチル(210my、 0.8mmo
l)にテトラフルオロシラン(0,04モル/山ゼアセ
トニトリル溶液、 1crtl、 0.04mmol
)を加え生ずる黄色溶液に、n−オクチルトリメチルシ
リルエーテル( 1 6 2,my 、 0.8皿o1
)のアセトニトリル溶液(4Crd)を18℃下、黄
色が消えぬ速度(約1.5時間を要す)で滴下し反応を
完結させる。反応混合物を例2と同様に処理しく展開液
ヘキサン−エーテル30:1混合液)、目的物(269
■,90%)を無色の油状物として得た。Example 4 (n-octylt IJ phenylmethyl ether) triphenylmethyl fluoride (210my, 0.8mmo
l) to tetrafluorosilane (0.04 mol/mountain zeacetonitrile solution, 1 crtl, 0.04 mmol)
) was added to the resulting yellow solution, and n-octyltrimethylsilyl ether (162,my, 0.8 plate o1
) is added dropwise at 18° C. at a rate that does not cause the yellow color to disappear (it takes about 1.5 hours) to complete the reaction. The reaction mixture was treated in the same manner as in Example 2.
(2, 90%) was obtained as a colorless oil.
IR( CCI4) 1590, 1480. 108
0, 1060crn−’; InNMR (CDC1
.)δ 0.85(3H.、 t, J =6Hz )
、 1.1−1、7.(12H,’m)、3.03(
2H,t,J=−6Hz)、7.1 −7、5(15H
,m)。IR (CCI4) 1590, 1480. 108
0, 1060crn-'; InNMR (CDC1
.. ) δ 0.85 (3H., t, J = 6Hz)
, 1.1-1, 7. (12H,'m), 3.03(
2H, t, J = -6Hz), 7.1 -7, 5 (15H
, m).
例5 (フェニルトリフェニルメチルエーテル)フェニ
ルトリメチルシリルエーテル(166η。Example 5 (Phenyltriphenylmethyl ether) Phenyltrimethylsilyl ether (166η.
1、0 mmol ) 、フッ化トリフェニルメチル1
、0rnmol)+及びSiF. ( 0.0 8モル
/dn?アセトニトリル溶液+ 0.6 3C4,
o.o 5mmol )をアセトニトリル(2ctd)
に溶解し、15℃で24時間攪拌した。例2と同様に処
理しく展開液ヘキサンーエ゛ーチル30:1混合物)目
的物(286rl,85%)を無色の油状物として得た
。この油状物をエタノール溶液から再結晶したところ無
色の柱状晶を得た。1,0 mmol), triphenylmethyl fluoride 1
, 0rnmol) + and SiF. (0.0 8 mol/dn? Acetonitrile solution + 0.6 3C4,
o. o 5 mmol) in acetonitrile (2 ctd)
and stirred at 15°C for 24 hours. The procedure was repeated in the same manner as in Example 2, and the desired product (286 ml, 85%) was obtained as a colorless oil (developing solution: hexane-ethyl 30:1 mixture). When this oil was recrystallized from an ethanol solution, colorless columnar crystals were obtained.
mp103−104℃(文献値103℃) ; IR(
CCI4)1600、 1500. 1450. 12
20z−’: ’H NMR(CDCl2)δ6,6−
7、1 ( 5H, m) 7.1−7.5 (1 5
H, m) ; MS m/z244、243,165
,94 。mp103-104℃ (literature value 103℃); IR (
CCI4) 1600, 1500. 1450. 12
20z-': 'H NMR (CDCl2) δ6,6-
7,1 (5H, m) 7.1-7.5 (1 5
H, m); MS m/z244, 243,165
,94.
例6(触媒)
テトラフルオロシランに代えているいろの触媒を用い例
1と同様にメタクリル酸トリメチルシリルとフッ化トリ
フェニルメチルとを反応させた。Example 6 (Catalyst) Trimethylsilyl methacrylate and triphenylmethyl fluoride were reacted in the same manner as in Example 1 using a colored catalyst instead of tetrafluorosilane.
特記ない限りS i F4の場合と同様 触媒は基質に
対し5モル係、溶媒はアセトニトリルであり、反応温度
は室温である。Unless otherwise specified, as in the case of S i F4, the catalyst has a 5 molar ratio to the substrate, the solvent is acetonitrile, and the reaction temperature is room temperature.
(1) (CH3)ssiOsOzcFi 6時間
の反応で目的物TrMA収率80%
(2) AlCl2 14時間の反応で目的物Tr
MA収率85 %
(3) BF3・OEt2 触媒5モル係で一夜を
経て(18時間)40% <らい迄進行したとこ イ
ろで反応が止1っていたので、更に
5モル係の触媒を加え4時間させて
完結させた。TrMA収率86チ
(4) TiCl− (4)(5)の触媒にアセト
ニトリルと反応して沈澱を生じだので溶媒として
塩化メチレンを用いた。(1) (CH3)ssiOsOzcFi 80% yield of target product TrMA after 6 hours reaction (2) AlCl2 Target product TrMA after 14 hours reaction
MA yield: 85% (3) BF3/OEt2 After overnight (18 hours) using 5 mol of catalyst, the reaction reached 40%. It took an additional 4 hours to complete. TrMA yield: 86 cm (4) Since the catalyst of TiCl- (4) (5) reacted with acetonitrile to form a precipitate, methylene chloride was used as the solvent.
室温4時間で反応液に無色となり、 すでに反応は終っていた。The reaction solution becomes colorless after 4 hours at room temperature. The reaction had already finished.
TrMA収率89%
(5) SnCl− 塩化メチレン溶媒、短時間(
0.5時間未満)で縮合は進行するが、例
1と同様の処理をおこなうと分解し
チドリフェニルメチルアルコールに
なった。TrMA yield 89% (5) SnCl- methylene chloride solvent, short time (
Condensation progressed in less than 0.5 hours), but when the same treatment as in Example 1 was carried out, it decomposed to become tidriphenylmethyl alcohol.
(6) HF 100〜120モル%と多量を用い
ても反応は進まなかった。(6) Even when a large amount of HF (100 to 120 mol%) was used, the reaction did not proceed.
(1) 〜(4)で得たTrMAは、’H NMRと融
点が標準品と一致することで確認し
た。The TrMA obtained in (1) to (4) was confirmed by 'H NMR and melting point matching that of the standard product.
列7
メタクリル酸トリメチルシリル(158■、1■01)
と臭化トリフェニルメチル(323mr、 1mmol
)をアセトニトリル(30mg)に溶解し、16℃で1
時間攪拌した。薄層クロマトで目的物が定量的に生成し
ていることが確認できた。Column 7 Trimethylsilyl methacrylate (158■, 1■01)
and triphenylmethyl bromide (323 mr, 1 mmol
) was dissolved in acetonitrile (30 mg) and incubated at 16°C.
Stir for hours. It was confirmed by thin layer chromatography that the target product was quantitatively produced.
例8
メタクリル酸トリメチルシリル(158+++p、 1
mrnol)と塩化トリフェニルメチル(279rq
、 1 mmol )をアセトニトリル(30yd)に
溶解し、16℃で2時間攪拌した。薄層クロマトで目的
物TrMAとトリフェニルメチルアルコールが6:4の
比で生成していることが確認できた。Example 8 Trimethylsilyl methacrylate (158+++p, 1
mrnol) and triphenylmethyl chloride (279rq
, 1 mmol) was dissolved in acetonitrile (30 yd) and stirred at 16°C for 2 hours. It was confirmed by thin layer chromatography that the target substance TrMA and triphenylmethyl alcohol were produced in a ratio of 6:4.
Claims (1)
ルキルシリル誘導体を三級アルコールに対応するハロゲ
ン化物と反応させることを特徴とするカルボン酸、アル
コール又はフェノールの三級アルコール誘導体の製法A method for producing a tertiary alcohol derivative of a carboxylic acid, alcohol, or phenol, which comprises reacting an O-trialkylsilyl derivative of a carboxylic acid, alcohol, or phenol with a halide corresponding to the tertiary alcohol.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58095042A JPS59222433A (en) | 1983-05-31 | 1983-05-31 | Production of tertiary alcohol derivative |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58095042A JPS59222433A (en) | 1983-05-31 | 1983-05-31 | Production of tertiary alcohol derivative |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59222433A true JPS59222433A (en) | 1984-12-14 |
JPH046179B2 JPH046179B2 (en) | 1992-02-05 |
Family
ID=14127009
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58095042A Granted JPS59222433A (en) | 1983-05-31 | 1983-05-31 | Production of tertiary alcohol derivative |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59222433A (en) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58173126A (en) * | 1982-03-27 | 1983-10-12 | バイエル・アクチエンゲゼルシヤフト | Manufacture of aromatic ether and aromatic polyether |
-
1983
- 1983-05-31 JP JP58095042A patent/JPS59222433A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58173126A (en) * | 1982-03-27 | 1983-10-12 | バイエル・アクチエンゲゼルシヤフト | Manufacture of aromatic ether and aromatic polyether |
Also Published As
Publication number | Publication date |
---|---|
JPH046179B2 (en) | 1992-02-05 |
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