JPS59216138A - 自己増感型感光性樹脂 - Google Patents

自己増感型感光性樹脂

Info

Publication number
JPS59216138A
JPS59216138A JP9054283A JP9054283A JPS59216138A JP S59216138 A JPS59216138 A JP S59216138A JP 9054283 A JP9054283 A JP 9054283A JP 9054283 A JP9054283 A JP 9054283A JP S59216138 A JPS59216138 A JP S59216138A
Authority
JP
Japan
Prior art keywords
sensitizing
photosensitive resin
reaction
self
cinnamate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9054283A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0339303B2 (enExample
Inventor
Tatatomi Nishikubo
忠臣 西久保
Koji Iizawa
飯沢　孝司
Eiji Takahashi
栄治 高橋
Fumihiko Nono
野々　文彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Japan Science and Technology Agency
Shingijutsu Kaihatsu Jigyodan
Original Assignee
Research Development Corp of Japan
Shingijutsu Kaihatsu Jigyodan
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Research Development Corp of Japan, Shingijutsu Kaihatsu Jigyodan filed Critical Research Development Corp of Japan
Priority to JP9054283A priority Critical patent/JPS59216138A/ja
Publication of JPS59216138A publication Critical patent/JPS59216138A/ja
Publication of JPH0339303B2 publication Critical patent/JPH0339303B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
JP9054283A 1983-05-23 1983-05-23 自己増感型感光性樹脂 Granted JPS59216138A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9054283A JPS59216138A (ja) 1983-05-23 1983-05-23 自己増感型感光性樹脂

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9054283A JPS59216138A (ja) 1983-05-23 1983-05-23 自己増感型感光性樹脂

Publications (2)

Publication Number Publication Date
JPS59216138A true JPS59216138A (ja) 1984-12-06
JPH0339303B2 JPH0339303B2 (enExample) 1991-06-13

Family

ID=14001296

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9054283A Granted JPS59216138A (ja) 1983-05-23 1983-05-23 自己増感型感光性樹脂

Country Status (1)

Country Link
JP (1) JPS59216138A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04170486A (ja) * 1990-11-02 1992-06-18 Dainippon Ink & Chem Inc 硬化性樹脂組成物

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04170486A (ja) * 1990-11-02 1992-06-18 Dainippon Ink & Chem Inc 硬化性樹脂組成物

Also Published As

Publication number Publication date
JPH0339303B2 (enExample) 1991-06-13

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