JPS59204820A - パタ−ン欠陥検出方法 - Google Patents

パタ−ン欠陥検出方法

Info

Publication number
JPS59204820A
JPS59204820A JP8041783A JP8041783A JPS59204820A JP S59204820 A JPS59204820 A JP S59204820A JP 8041783 A JP8041783 A JP 8041783A JP 8041783 A JP8041783 A JP 8041783A JP S59204820 A JPS59204820 A JP S59204820A
Authority
JP
Japan
Prior art keywords
pattern
light
spatial filter
fourier transform
optical fourier
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8041783A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0420166B2 (enrdf_load_html_response
Inventor
Kazuo Watanabe
一生 渡辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP8041783A priority Critical patent/JPS59204820A/ja
Publication of JPS59204820A publication Critical patent/JPS59204820A/ja
Publication of JPH0420166B2 publication Critical patent/JPH0420166B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956Inspecting patterns on the surface of objects
    • G01N21/95623Inspecting patterns on the surface of objects using a spatial filtering method

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
JP8041783A 1983-05-09 1983-05-09 パタ−ン欠陥検出方法 Granted JPS59204820A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8041783A JPS59204820A (ja) 1983-05-09 1983-05-09 パタ−ン欠陥検出方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8041783A JPS59204820A (ja) 1983-05-09 1983-05-09 パタ−ン欠陥検出方法

Publications (2)

Publication Number Publication Date
JPS59204820A true JPS59204820A (ja) 1984-11-20
JPH0420166B2 JPH0420166B2 (enrdf_load_html_response) 1992-03-31

Family

ID=13717713

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8041783A Granted JPS59204820A (ja) 1983-05-09 1983-05-09 パタ−ン欠陥検出方法

Country Status (1)

Country Link
JP (1) JPS59204820A (enrdf_load_html_response)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004177377A (ja) * 2002-11-29 2004-06-24 Hitachi Ltd 検査方法および検査装置

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004177377A (ja) * 2002-11-29 2004-06-24 Hitachi Ltd 検査方法および検査装置
US7315363B2 (en) 2002-11-29 2008-01-01 Hitachi High-Technologies Corporation Inspection method and inspection apparatus
US7586593B2 (en) 2002-11-29 2009-09-08 Hitachi High-Tech Electronics Engineering Co., Ltd. Inspection method and inspection apparatus
US7586594B2 (en) 2002-11-29 2009-09-08 Hitachi High-Technologies Corporation Method for inspecting defect and apparatus for inspecting defect
US7903244B2 (en) 2002-11-29 2011-03-08 Hitachi High-Technologies Corporation Method for inspecting defect and apparatus for inspecting defect
US8094295B2 (en) 2002-11-29 2012-01-10 Hitachi High-Technologies Corporation Inspection method and inspection apparatus
US8269959B2 (en) 2002-11-29 2012-09-18 Hitachi High-Technologies Corporation Inspection method and inspection apparatus

Also Published As

Publication number Publication date
JPH0420166B2 (enrdf_load_html_response) 1992-03-31

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