JPS59204154A - Acetal derivative and production thereof - Google Patents

Acetal derivative and production thereof

Info

Publication number
JPS59204154A
JPS59204154A JP58075808A JP7580883A JPS59204154A JP S59204154 A JPS59204154 A JP S59204154A JP 58075808 A JP58075808 A JP 58075808A JP 7580883 A JP7580883 A JP 7580883A JP S59204154 A JPS59204154 A JP S59204154A
Authority
JP
Japan
Prior art keywords
general formula
represent
formula
acetal
acetal derivative
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58075808A
Other languages
Japanese (ja)
Other versions
JPH0414099B2 (en
Inventor
Akira Tanabe
陽 田辺
Noritada Matsuo
憲忠 松尾
Sumio Nishida
西田 寿美雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Priority to JP58075808A priority Critical patent/JPS59204154A/en
Publication of JPS59204154A publication Critical patent/JPS59204154A/en
Publication of JPH0414099B2 publication Critical patent/JPH0414099B2/ja
Granted legal-status Critical Current

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Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00Technologies relating to chemical industry
    • Y02P20/50Improvements relating to the production of bulk chemicals
    • Y02P20/52Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts

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  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)

Abstract

NEW MATERIAL:A compound of formula I (R1 and R2 are lower alkyl or R1 and R2 link at the terminals thereof to form alkylene; R3 is H or lower acyl). EXAMPLE:3-Amino-4-fluor-benzaldehyde ethylene acetal. USE:Useful as a synthetic intermediate for aldehyde compounds which are synthetic raw materials for insecticides and acaricides. PREPARATION:A nitrobenzene derivative of formula II is catalytically reduced in the presence of a catalyst, e.g. palladium-carbon or platinum dioxide, in a solvent, e.g. methanol or ethanol, at 10-30 deg.C to give the aimed compound of formula I (R3 is H).

Description

【発明の詳細な説明】 本発明は、一般式(I) 〔式中、R1およびR2は共に低級アルキル基を表わす
か、またはRoとR2とが末端で結合し、アルキレン基
を表わし、鳥 は水素原子または低級アシル基を表わす
。〕で示されるアセタール誘導体およびその製造法に関
する。
DETAILED DESCRIPTION OF THE INVENTION The present invention provides a compound of the general formula (I) [wherein R1 and R2 both represent a lower alkyl group, or Ro and R2 are bonded at the terminals and represent an alkylene group; Represents a hydrogen atom or a lower acyl group. ] and its production method.

ニル基またはl−プロピニル基を表わす。represents a nyl group or l-propynyl group.

瓜は一般式 %式% (ここで、Xは塩素原子または臭素原子を表わす。)で
示される基を表わす。〕 で示される新規なエステル化合物が、優れた殺虫、殺ダ
ニ活性を有することが見出されている。
Melon represents a group represented by the general formula % (where X represents a chlorine atom or a bromine atom). ] It has been discovered that the novel ester compound shown below has excellent insecticidal and acaricidal activity.

本発明者らは、上記一般式1)で示されるエステル化合
物の、アルコール成分の合成法につさ種々検討を重ねた
結果、上記一般式(I)で示されるアセタール誘導体と
、一般式@)〔式中、R4は前述と同じ意味を有する。
As a result of various studies on the method of synthesizing the alcohol component of the ester compound represented by the above general formula 1), the present inventors found that the acetal derivative represented by the above general formula (I) and the general formula @) [In the formula, R4 has the same meaning as above.

〕で示されるブロムベンゼン誘導体を、塩基と飼または
銅化合物の存在下に反応させ、次いで、必要に応じ脱ア
シル化した後、脱アセタール化することにより、上記一
般式1)で示されるエステル化合物の合成原料となる一
般式〔式中、R4は前述と同じ意味を有する。〕で示さ
れるアルデヒド化合物が、効率よく得られることを見出
すと共に、前記一般式(I)で示されるアセタール誘導
体がその重要な中間体となることを見出し、本発明を完
成するに至った。
] The bromobenzene derivative represented by the formula 1) is reacted with a base in the presence of a base or a copper compound, and then deacylated if necessary and then deacetalized to produce an ester compound represented by the above general formula 1). General formula serving as a raw material for synthesis [wherein R4 has the same meaning as above. It was discovered that the aldehyde compound represented by the formula (I) can be obtained efficiently, and the acetal derivative represented by the general formula (I) was found to be an important intermediate thereof, leading to the completion of the present invention.

即ち、本発明は、前記一般式(I)で示されるアセター
ル誘導体と、その製造法として、〔式中、几□およびR
2は前述と同じ意味を有する。〕 で示されるニトロベンゼン誘導体を、接触還元すること
による一般式(■′) 〔式中、R1およびR2は前述と同じ意味を有する。〕 で示されるアセタール誘導体の製造法および該アセター
ル誘導体にさらに低級カルボン酸無水物または低級カル
ボン酸ハライドを反応させることによる一般式(I#) 〔式中、R1およびR2は前述と同じ意味を有し、現は
低級アシル基を表わす。〕 で示されるアセタール誘導体の製造法を提供するもので
ある。
That is, the present invention provides an acetal derivative represented by the general formula (I) and a method for producing the same, [wherein 几□ and R
2 has the same meaning as above. ] General formula (■') obtained by catalytically reducing the nitrobenzene derivative represented by [In the formula, R1 and R2 have the same meanings as above. ] A method for producing an acetal derivative represented by the general formula (I#) by further reacting the acetal derivative with a lower carboxylic acid anhydride or a lower carboxylic acid halide [wherein R1 and R2 have the same meanings as above] However, it currently represents a lower acyl group. ] The present invention provides a method for producing an acetal derivative represented by the following.

以下に、本発明につき詳しく説明する。The present invention will be explained in detail below.

前記一般式(I)で示されるアセタール誘導体において
、置換基R1およびR2としては、メチル基、エチル基
、n−プロピル基などの低級アルキル基または、凡、と
R2とが一緒になって、エチレン基を表わす場合などを
挙げることができる。
In the acetal derivative represented by the general formula (I), the substituents R1 and R2 include a lower alkyl group such as a methyl group, an ethyl group, and an n-propyl group; For example, it represents a group.

一般式(I)で示される本発明のアセタール誘導体の製
造法において、一般式(V)で示されるニトロベンゼン
誘導体を接触還元する際の触媒としては、パラジウム−
炭素、二酸化白金に代表される、芳香族ニトロ化合物を
アニリン誘導体に還元するのに用いられる通常の触媒が
用いられ、その使用量は、前記一般式(V)で示される
ニトロベンゼン誘導体に対し、0.01〜10モル%、
好ましくは、o、 i〜5モル%の範囲である。
In the method for producing the acetal derivative of the present invention represented by the general formula (I), the catalyst for catalytic reduction of the nitrobenzene derivative represented by the general formula (V) is palladium-
A common catalyst used to reduce an aromatic nitro compound to an aniline derivative, typified by carbon and platinum dioxide, is used, and the amount used is 0. .01-10 mol%,
Preferably, the range is from o to 5 mol%.

また、本接触還元反応において使用される溶媒としては
、メタノール、エタノールなどのアルコール系溶媒や酢
酸工jルなどの不活性溶媒が挙げられる。
Further, examples of the solvent used in this catalytic reduction reaction include alcoholic solvents such as methanol and ethanol, and inert solvents such as acetic acid.

使用される水素ガスの圧力は1〜10気圧、好ましくは
1〜8気圧の範囲であり、反応温度は0°Cから使用す
る溶媒の沸点、好ましくはlO〜ao’cの範囲である
The pressure of the hydrogen gas used is in the range of 1 to 10 atm, preferably 1 to 8 atm, and the reaction temperature is in the range of 0°C to the boiling point of the solvent used, preferably 1O to ao'c.

上記のような接触還元反応の後、触媒の除去および溶媒
の留去を行なうことにより、目的とする一般式(1′)
で示されるアセタール誘導体を得ることができ、この時
、溶媒の留去に先立ち、予め反応溶媒を乾燥しておくこ
とが望ましい。
After the catalytic reduction reaction as described above, the desired general formula (1') is obtained by removing the catalyst and distilling off the solvent.
An acetal derivative represented by can be obtained. At this time, it is desirable to dry the reaction solvent in advance before distilling off the solvent.

このようにして得られる一般式(I′)で示されるアセ
タール誘導体に、低級カルボン酸無水物または低級カル
ボン酸クロリドをピリジン、トリエチルアミンなどの脱
酸剤の存在下に、反応させることによる、通常のアシル
化反応により、一般式(I#)で示されるアセタール誘
導体を得ることができる。
The acetal derivative represented by the general formula (I') thus obtained is reacted with a lower carboxylic acid anhydride or a lower carboxylic acid chloride in the presence of a deoxidizing agent such as pyridine or triethylamine. Through the acylation reaction, an acetal derivative represented by the general formula (I#) can be obtained.

尚、本発明に関する一般式(V)で示されるニトロベン
ゼン誘導体は、4−フルオロ−3−二トロベンズアルデ
ヒドに、p−)ルエンスルホン酸や硫酸の存在下、エチ
レン°グリコール、オルト蟻酸メチル、オルト蟻酸エチ
ルなどを反応させることによる、通常のアセタール化反
応により容易に得ることができる。
The nitrobenzene derivative represented by the general formula (V) related to the present invention is prepared by adding ethylene glycol, methyl orthoformate, orthoformic acid to 4-fluoro-3-nitrobenzaldehyde in the presence of p-)luenesulfonic acid or sulfuric acid. It can be easily obtained by a normal acetalization reaction by reacting ethyl or the like.

以下に、実施例および参考例にて、本発明をさらに詳細
に説明するが、勿論、本発明がこれらに限定されるもの
ではない。
The present invention will be explained in more detail below with reference to Examples and Reference Examples, but the present invention is of course not limited to these.

実施例1 4−フルオロ−8−二トローベンズアルデヒドエチレン
アセタール3.Ofを酢酸エチル100 ttttに溶
解し、これに二酸化白金100岬を加え、常圧下に水素
ガスを導入しながら、室温にて8時間接触還元反応を行
った。
Example 1 4-Fluoro-8-nitrobenzaldehyde ethylene acetal 3. Of was dissolved in 100 tttt of ethyl acetate, 100 tttt of platinum dioxide was added thereto, and a catalytic reduction reaction was carried out at room temperature for 8 hours while introducing hydrogen gas under normal pressure.

この時点において、も早水素ガスの吸収は認められず、
また反応生成物のガスクロマトグラフィーによる分析の
結果、原料化合物は残存していなかった。
At this point, no early hydrogen gas absorption was observed.
Further, as a result of analysis of the reaction product by gas chromatography, no starting material compound remained.

次いで、反応液をセライト濾過し、得られたろ液を無水
硫酸マグネシウムで乾燥後、溶媒を留去し、はぼ純粋な
3−アミノ−4−フルオローベンズアルデヒドエチレン
アセクール2.5yを得た。
Next, the reaction solution was filtered through Celite, and the resulting filtrate was dried over anhydrous magnesium sulfate, and then the solvent was distilled off to obtain 2.5y of extremely pure 3-amino-4-fluorobenzaldehyde ethylene acecool.

収率 97% m、 p  48〜49.5°C 実施例2 4−フルオロ−3−ニトロベンズアルデヒドエチレンア
セタール8.0flz99.5%エタノール100 m
lに溶解し、これに5%パラジウム−炭素200mgを
加え、常圧下に水素ガスを導入しながら、室温にて8時
間還元反応を行った。
Yield 97% m, p 48-49.5°C Example 2 4-fluoro-3-nitrobenzaldehyde ethylene acetal 8.0 flz99.5% ethanol 100 m
200 mg of 5% palladium-carbon was added thereto, and a reduction reaction was carried out at room temperature for 8 hours while introducing hydrogen gas under normal pressure.

次いで、反応液にさらに200qの5%パラジウム−炭
素を加え、同条件下に1時間接触;唯元反応を行った。
Next, 200q of 5% palladium-carbon was further added to the reaction solution, and the mixture was contacted for 1 hour under the same conditions to carry out a simple reaction.

この時点において、も重水素ガスの吸収は認められず、
また反応生成物のガスクロマトグラフィーによる分析の
結果、原料化合物は残存していなかった。
At this point, no absorption of deuterium gas was observed.
Further, as a result of analysis of the reaction product by gas chromatography, no starting material compound remained.

次いで、反応液をセライト濾過し、得られたP液を約5
0−になるまで濃縮した後、飽和炭酸水素ナトリウム水
溶液50M1に注加し、エーテルで抽出した。
Next, the reaction solution was filtered through Celite, and the obtained P solution was
After concentrating to 0-, it was poured into a 50 M1 saturated aqueous sodium hydrogen carbonate solution and extracted with ether.

有機層を水および飽和食塩水で洗浄し、無水硫酸マグネ
シウムで乾燥後、溶媒を留去し、残渣として2.71の
生成物を得た。
The organic layer was washed with water and saturated brine, dried over anhydrous magnesium sulfate, and then the solvent was distilled off to obtain a product of 2.71 as a residue.

該生成物を乾燥ピリジン20.g/に溶解し、水冷下に
、無水酢酸2.Ofを攪拌しながら滴下した。滴下後、
さらに8時間室温で攪拌を続けた後、反応液を氷501
に注加し、エーテルで抽出した。
The product was dried in pyridine for 20 minutes. 2.g/ of acetic anhydride under water cooling. Of was added dropwise while stirring. After dripping,
After continuing to stir at room temperature for an additional 8 hours, the reaction solution was poured into ice cubes.
and extracted with ether.

有機層を水および硫酸銅水溶液で洗浄し、ピリジンを除
去した後、さらに飽和炭酸水素ナトリウム水溶液で2回
洗浄し、無水硫酸マグネシウムで乾燥後、溶媒を留去し
、残渣として2.6gの生成物を得た。
The organic layer was washed with water and an aqueous copper sulfate solution to remove pyridine, and then washed twice with a saturated aqueous sodium bicarbonate solution, dried over anhydrous magnesium sulfate, and the solvent was distilled off to yield 2.6 g as a residue. I got something.

次いで、該生成物をシリカゲルカラムクロマトグラフィ
ー(溶出液:クロロホルム)で精製し、純粋な3−アセ
トアミノ−4−フルオロベンズアルデヒドエチレンアセ
タール1.90yを得た。
The product was then purified by silica gel column chromatography (eluent: chloroform) to obtain 1.90 y of pure 3-acetamino-4-fluorobenzaldehyde ethylene acetal.

収率 59% m、p  58.2°C 参考例1 4−フルオロ−3−アセトアミノベンズアルデヒドエチ
レンアセタール0.5.2y1炭酸カリウム0.421
.塩化第一銅0.07fおよヒフロモベンゼン8.62
gを反応器に入れ、窒素気流下に内温140〜150°
Cで13時間工見拌した。
Yield 59% m, p 58.2°C Reference Example 1 4-Fluoro-3-acetaminobenzaldehyde ethylene acetal 0.5.2y1 Potassium carbonate 0.421
.. Cuprous chloride 0.07f and hyfromobenzene 8.62
Put g into the reactor and reduce the internal temperature to 140-150° under nitrogen flow.
The mixture was stirred at C for 13 hours.

反応液を放冷した後、セライト濾過し、得られた炉液を
エーテルで2回抽出した。抽出液を飽和炭酸水素ナトリ
ウム水溶液で1回洗浄し、無水硫酸ナトリウムで乾燥後
、溶媒を留去し、残渣として0.951の生成物を得た
After the reaction solution was allowed to cool, it was filtered through Celite, and the resulting filtrate solution was extracted twice with ether. The extract was washed once with a saturated aqueous sodium bicarbonate solution, dried over anhydrous sodium sulfate, and then the solvent was distilled off to obtain a product of 0.951 as a residue.

次いで、該生成物に、IN−水酸化ナトリウム溶液20
πlを加え、室温下に2時間攪拌した後、水慮で冷却し
ながら、これに10%硫酸20m1を徐々に滴下し、滴
下後2時間攪拌しtこ・ 反応液をエーテルで2回抽出し、抽出液を飽和炭酸水素
ナトリウム水溶液で洗浄し、次いで無水硫酸マグネシウ
ムで乾燥後、エーテルを留去した。
The product was then treated with 20 mL of IN-sodium hydroxide solution.
After stirring at room temperature for 2 hours, 20 ml of 10% sulfuric acid was gradually added dropwise to this while cooling, and after the dropwise addition, the mixture was stirred for 2 hours.The reaction solution was extracted twice with ether. The extract was washed with a saturated aqueous sodium bicarbonate solution, then dried over anhydrous magnesium sulfate, and the ether was distilled off.

得られた残渣をシリカゲルカラムクロマト ・グラフィ
ー(溶出液:塩化メチレン)で精製シ、純粋な3−アニ
リノ−4−フルオロベンズアルデヒドo、4oyを得た
The obtained residue was purified by silica gel column chromatography (eluent: methylene chloride) to obtain pure 3-anilino-4-fluorobenzaldehyde.

収率 81% m、p  115〜117°C 参考例2 3−アミノ−4−フルオロベンズアルデヒドエチレンア
セタール0.80f、炭酸カリウム0.2’lf/、塩
化第一銅0.05Fおよびブロモベンゼンt、aoyを
反応容器に入れ、窒素気流下に内温180〜140°C
で10時間攪拌した。
Yield 81% m, p 115-117°C Reference Example 2 3-amino-4-fluorobenzaldehyde ethylene acetal 0.80f, potassium carbonate 0.2'lf/, cuprous chloride 0.05F and bromobenzene t, Place the aoy into a reaction container and maintain the internal temperature to 180-140°C under a nitrogen stream.
The mixture was stirred for 10 hours.

反応液を放冷した後、これに10%塩酸10ゴを加え、
50℃で2時間攪拌し、次いで反応液をセライト濾過し
、炉液を水酸化ナトリウムで中和後、エーテルで2回抽
出した。
After cooling the reaction solution, 10 g of 10% hydrochloric acid was added to it.
The mixture was stirred at 50° C. for 2 hours, and then the reaction solution was filtered through celite, the filtrate was neutralized with sodium hydroxide, and extracted twice with ether.

抽出液を飽和炭酸水素ナトリウム水溶液で1回洗浄し、
無水硫酸マグネシウムで乾燥後1、溶媒を留去した。
The extract was washed once with a saturated aqueous sodium bicarbonate solution,
After drying over anhydrous magnesium sulfate, the solvent was distilled off.

得られた残渣をシリカゲルカラムクロマトグラフィー(
溶出液:塩化メチレン)で精製し、純粋な3−アニリノ
−4−フルオロベンズアルデヒド0.141を得た。
The resulting residue was subjected to silica gel column chromatography (
Eluent: methylene chloride) to obtain 0.141 of pure 3-anilino-4-fluorobenzaldehyde.

収率 33% 参考例3 4−フルオロ−8−ニトロベンズアルデヒド10//、
エチレングリコール5.5yおよびP−1ルエンスルホ
ン酸100 f/Ifをトルエン50m1に溶解した後
、加熱還流下にトルエン100m1を滴加しながら、共
沸脱水を行ない、水を含むトルエン液約100薄/を2
時間を要し留出させた。
Yield 33% Reference Example 3 4-fluoro-8-nitrobenzaldehyde 10//,
After dissolving 5.5y of ethylene glycol and 100 f/If of P-1 toluene sulfonic acid in 50 ml of toluene, azeotropic dehydration was carried out while adding 100 ml of toluene dropwise under heating and reflux to obtain an approximately 100 dilute toluene solution containing water. /2
It took time to distill it out.

内容液をガスクロマトグラフィーにて分析しjこところ
、原料の転換率は98%であった。
The content liquid was analyzed by gas chromatography, and the conversion rate of the raw material was 98%.

反応液を放冷後、飽和炭酸水素ナトリウム水溶液に性態
し、分液した。
After the reaction solution was allowed to cool, it was diluted with a saturated aqueous sodium hydrogen carbonate solution and separated.

有機層を、水および飽和食塩水で洗浄し、無水硫酸マグ
ネシウムで乾燥後、溶媒を留去し、淡黄色の油状物質と
して、4−フルオロ−3−ニトロ−ベンズアルデヒドエ
チレンアセクール12.8yを得た(収率: 97.6
%)。
The organic layer was washed with water and saturated brine, dried over anhydrous magnesium sulfate, and then the solvent was distilled off to obtain 12.8y of 4-fluoro-3-nitro-benzaldehyde ethylene acecure as a pale yellow oil. (Yield: 97.6
%).

該生成物は、そのガスクロマトグラムおよびNM、aス
ペクトルから、はぼ純粋であった。
The product was fairly pure from its gas chromatogram and NM,a spectrum.

nD 1.508O NMRデータ(0DCd3.TMS) 6.80〜7.80(m、8H) 5.70     (8,LH) 8.90〜4.10 (m、 4fl[)手続補正書(
肖)?f5y) 1 事件の表示 昭和S:ど年 特許願第゛79と01号2、発明の名称 アセター、I/誘導係むよび゛々0裂遣法3 補正をす
る者 事件との関係  特許出願人 大阪市東区北浜5丁目15番地 (209)住友化学工業株式会社 代表各 −t   77    メ: 4、代理人 大阪市東区北浜5丁目15番地 り 肩 補正の対象 明細書全文 グ、補正の内容 手続補正書(自発) 昭和58年 6月ノ3日 特許庁長官 若 杉 和 夫 殿 1、事件の表示 昭和58年 特許願第75808号 2、発明の名称 アセタール誘導体およびその製造法 8、補正をする者 事件との関係  特許出願人 住 所  大阪市東区北浜5丁目15番地名 称  (
209)住友化学工業株式会社代表者    土 方 
  武 4、代理人 住 所  大阪市東区北浜5丁目15番地5、補正の対
象 明細書の発明の詳細な説明の欄 6、補正の内容 (1)昭和58年6月I3日付゛手続補正書(浄書明細
書)第13頁下より第5行目に「溶液」とあるを「水溶
液」と訂正する。
nD 1.508O NMR data (0DCd3.TMS) 6.80-7.80 (m, 8H) 5.70 (8, LH) 8.90-4.10 (m, 4fl[) Procedural amendment (
Portrait)? f5y) 1 Indication of the case Showa S: What year Patent application No. 79 and No. 01 2, Title of the invention Aceter, I/Induction related and 0 0 separation law 3 Person making the amendment Relationship with the case Patent applicant 5-15 Kitahama, Higashi-ku, Osaka (209) Representative of Sumitomo Chemical Co., Ltd. -t 77 Mail: 4, Agent 5-15 Kitahama, Higashi-ku, Osaka, Japan Full text of specification to be amended, content of amendment Procedures for amendment Written by Mr. Kazuo Wakasugi, Commissioner of the Japan Patent Office, June 3, 1982 (1) Indication of the case 1982 Patent Application No. 75808 (2) Name of the invention Acetal derivatives and their manufacturing process 8, Person making the amendment Relationship to the incident Patent applicant address 5-15 Kitahama, Higashi-ku, Osaka Name (
209) Sumitomo Chemical Co., Ltd. Representative Hijikata
Take 4, Agent address: 5-15 Kitahama, Higashi-ku, Osaka City, Detailed explanation of the invention in the specification subject to amendment, column 6, Contents of amendment (1) June 13, 1981: Procedural amendment ( In the fifth line from the bottom of page 13, the word "solution" is corrected to "aqueous solution."

(2)  同第18頁下より第3行目に「硫酸」とある
を「塩酸」と訂正するっ (3)  同第14頁下より第16頁最下行に「水酸化
ナトリウム」とあるを「水酸化ナトリウム水溶液」と訂
正する。
(2) From the bottom of page 18, in the third line, the word "sulfuric acid" is corrected to "hydrochloric acid." (3) From the bottom of page 14, in the bottom line of page 16, the word "sodium hydroxide" is corrected. Correct it to "aqueous sodium hydroxide solution."

(4)同第16頁最下行の後に、下記を追加する。(4) Add the following after the bottom line of page 16.

[実施例3 4−フルオロ−3−ニトロベンズアルデヒドジエチルア
セクール2.43yを酢酸エチルl O(l meに溶
解し、これに二酸化白金100 myを加え、常圧下に
水素ガスを導入しながら室温にて6時間接触還元反応を
行った。
[Example 3 2.43 y of 4-fluoro-3-nitrobenzaldehyde diethyl acecure was dissolved in ethyl acetate lO(l me), 100 my of platinum dioxide was added thereto, and the mixture was heated to room temperature while introducing hydrogen gas under normal pressure. A catalytic reduction reaction was carried out for 6 hours.

この時点においても早、水素ガスの吸収は認められず、
また反応生成物のガスクロマトグラフィーによる分析の
結果、原料化合物は残存していなかった。次いで反応液
をセライII濾過し、得られたF液を無水硫酸マグネシ
ウムで乾燥後、溶媒を留去し、はぼ純粋な3−アミノ−
4−フルオロベンズアルデヒドジエチルアセタール1.
50pを得た。
Even at this point, no absorption of hydrogen gas was observed.
Further, as a result of analysis of the reaction product by gas chromatography, no starting material compound remained. Next, the reaction solution was filtered through Serai II, and the obtained solution F was dried over anhydrous magnesium sulfate, the solvent was distilled off, and almost pure 3-amino-
4-fluorobenzaldehyde diethyl acetal 1.
Got 50p.

収率 70% nD23,01.5620 参考例4 4−フルオロ−3−二トロベンズアルデヒド5、Oyを
オルツギ酸エチルI B、 L Pに溶解させ、p−)
ルエンスルホン酸100〜を加え、室温下5時間放置し
た。内容液をガスクロマトグラフィーにて分析したとこ
ろ、原料の転換率は95%であった。
Yield 70% nD23,01.5620 Reference Example 4 4-Fluoro-3-nitrobenzaldehyde 5, Oy was dissolved in ethyl orthoformate I B, L P, p-)
100~ of luenesulfonic acid was added, and the mixture was left to stand at room temperature for 5 hours. When the content liquid was analyzed by gas chromatography, the conversion rate of the raw material was 95%.

次いで、過剰の、オルツギ酸エチルを留去した後、減圧
蒸留を行ったところ、淡黄色ノ油状物質として、4−フ
ルオロ−8−二トロベンズアルデヒドジエチルアセター
ル5.52を得た。
Then, after distilling off excess ethyl orthformate, vacuum distillation was performed to obtain 5.52 g of 4-fluoro-8-nitrobenzaldehyde diethyl acetal as a pale yellow oily substance.

該化合物は、そのガスクロマトグラムおよびN MRス
ペクトルから、はぼ純粋であった0 102〜b 収率 76% NMRデータ(CDC#a 、TMS  、δ値)7、
 l O〜8.80 (m、 BH)5.50(S、L
H) 寥 3.55(g、4H) 1.20  (t、6H) 参考例5 4−フルオロ−3−アセトアミノベンズアルデヒドジエ
チルアセクール1.0y、炭酸カリウム0.7:dy、
塩化第一銅0. l B yおよびブロモベンゼン6.
45yを反応容器に入れ、窒素気流下に内温140〜1
50゛Cで15時間攪拌した。
The compound was nearly pure from its gas chromatogram and NMR spectrum. Yield 76% NMR data (CDC#a, TMS, δ value) 7.
l O ~ 8.80 (m, BH) 5.50 (S, L
H) Weight: 3.55 (g, 4H) 1.20 (t, 6H) Reference example 5 4-fluoro-3-acetaminobenzaldehyde diethylacecool 1.0y, potassium carbonate 0.7:dy,
Cuprous chloride 0. l B y and bromobenzene6.
45y was placed in a reaction container and the internal temperature was raised to 140-1.
The mixture was stirred at 50°C for 15 hours.

反応液を放冷した後、セライ)濾過し、炉上物をエーテ
ルで洗い込んだ。得られたP液を飽和炭酸水素ナトリウ
ム水溶液で1回洗浄し、無水硫酸す) IJウムで乾燥
後、溶媒を留去し、残液として1.98yの生成物を得
た。
After the reaction solution was allowed to cool, it was filtered and the reactor was washed with ether. The obtained P solution was washed once with a saturated aqueous sodium bicarbonate solution, dried over anhydrous sulfuric acid, and then the solvent was distilled off to obtain a 1.98y product as a residual liquid.

次いで、該生成物にIN−水酸化すl−IJウム水溶液
2 Q rneを加え、室温下に2時間ま2時間攪拌し
た。
Next, 2 Q rne of an IN-sulfur hydroxide aqueous solution was added to the product, and the mixture was stirred at room temperature for 2 to 2 hours.

反応液をエーテルで2回抽出し、抽出液を飽和炭酸水素
すl−IJウム水溶液で洗浄し、次いで無水硫酸マグネ
シウムで乾燥後、エーテルを留去した。
The reaction solution was extracted twice with ether, the extract was washed with a saturated sodium bicarbonate aqueous solution, and then dried over anhydrous magnesium sulfate, and the ether was distilled off.

得られた残液をシリカゲルカラムクロマトクラフィー(
溶出液:塩化メチレン)で精製し7、純粋な8−アニリ
ノ−4−フルオロベンズアルデヒド0.49yを得た。
The resulting residual liquid was subjected to silica gel column chromatography (
Eluent: methylene chloride) to give 0.49y of pure 8-anilino-4-fluorobenzaldehyde.

収率 65%Yield 65%

Claims (1)

【特許請求の範囲】 〔式中、揚およびR2は共に低級アルキル基を表わすか
、またはR1とR2とが末端で結合し、アルキレン基を
表わし、R3は水素原子または低級アシル基を表わす。 〕で示されるアセタール誘導体。 (2)一般式 〔式中、R1およびR2は共に低級アルキル基を表わす
か、またはR1とR2とが末端で結合し、アルキレン基
を表わす。〕 で示されるニトロベンゼン誘導体を、接触還元すること
を特徴とする一般式 〔式中、孔、およびR2は前述と同じ意味を有する。〕 で示されるアセタール誘導体の製造法。 (8)一般式 〔式中、R1およびR2は共に低級アルキル基を表わす
か、またはR1とR2とが末端で結合し、アルキレン基
を表わす。〕 テ示されるニトロベンゼン誘導体を、接触還元し、得ら
れる一般式 〔式中、R1およびR2は前述と同じ意味を有する。〕 で示されるアセタール誘導体に低級カルボン酸無水物ま
たは低級カルボン酸/1ライドを反応させることを特徴
とする一般式 〔式中、几、およびR2は前述と同じ意味を表わし、現
は低級アシル基を表わす。〕で示されるアセタール誘導
体の製造法。
[Claims] [In the formula, both R and R2 represent a lower alkyl group, or R1 and R2 are bonded at the terminals to represent an alkylene group, and R3 represents a hydrogen atom or a lower acyl group. ] Acetal derivative shown. (2) General formula [wherein R1 and R2 both represent a lower alkyl group, or R1 and R2 are bonded at the terminals to represent an alkylene group. ] A general formula characterized by catalytically reducing a nitrobenzene derivative represented by the formula [wherein the pore and R2 have the same meanings as above. ] A method for producing an acetal derivative shown in (8) General formula [wherein R1 and R2 both represent a lower alkyl group, or R1 and R2 are bonded at the terminals to represent an alkylene group. ] The nitrobenzene derivative shown above is catalytically reduced to obtain a general formula: [wherein R1 and R2 have the same meanings as above.] ] A general formula characterized by reacting an acetal derivative represented by a lower carboxylic acid anhydride or a lower carboxylic acid/monide [wherein, 几 and R2 represent the same meanings as above, and are now lower acyl groups] represents. ] A method for producing an acetal derivative.
JP58075808A 1983-04-28 1983-04-28 Acetal derivative and production thereof Granted JPS59204154A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58075808A JPS59204154A (en) 1983-04-28 1983-04-28 Acetal derivative and production thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58075808A JPS59204154A (en) 1983-04-28 1983-04-28 Acetal derivative and production thereof

Publications (2)

Publication Number Publication Date
JPS59204154A true JPS59204154A (en) 1984-11-19
JPH0414099B2 JPH0414099B2 (en) 1992-03-11

Family

ID=13586860

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58075808A Granted JPS59204154A (en) 1983-04-28 1983-04-28 Acetal derivative and production thereof

Country Status (1)

Country Link
JP (1) JPS59204154A (en)

Also Published As

Publication number Publication date
JPH0414099B2 (en) 1992-03-11

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